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1.发明授权Antireflective coatings for high-resolution photolithographic synthesis of DNA arrays 有权用于高分辨率光刻合成DNA阵列的抗反射涂层公开(公告)号：US08859196B2
公开(公告)日：2014-10-14
申请号：US13275521
申请日：2011-10-18
申请人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
发明人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00711 , B01J2219/00722 , C12Q1/6837 , C40B40/06 , G03F7/091 , C12Q2545/101
摘要： The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
摘要翻译： 本发明提供了一种聚合物阵列和通过提供一种具有第一层的衬底来形成聚合物阵列的方法，所述第一层包括在固体载体上的一个或多个电介质涂层和包含设置在第一层上的多个聚合物的第二层。 本发明还提供了使用光导合成法在基底上形成聚合物阵列的方法，该方法是通过提供具有第一层的基底，该第一层包含固体支持物上的一个或多个电介质涂层，通过使第一层与硅烷化接触来衍生第一层 试剂和设置在所述第一层上的第二层，其中所述第二层包括用光不稳定保护基团保护的官能团。
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2.发明申请Antireflective Coatings for High-Resolution Photolithographic Synthesis of DNA Array 有权用于高分辨率光刻合成DNA阵列的抗反射涂层公开(公告)号：US20120035083A1
公开(公告)日：2012-02-09
申请号：US13275521
申请日：2011-10-18
申请人： Mark O. Trulson , Martin J. Goldberg , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Richard P. Rava , Dana Truong
发明人： Mark O. Trulson , Martin J. Goldberg , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Richard P. Rava , Dana Truong
IPC分类号： C40B50/18
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00711 , B01J2219/00722 , C12Q1/6837 , C40B40/06 , G03F7/091 , C12Q2545/101
摘要： The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
摘要翻译： 本发明提供了一种聚合物阵列和通过提供一种具有第一层的衬底来形成聚合物阵列的方法，所述第一层包括在固体载体上的一个或多个电介质涂层和包含设置在第一层上的多个聚合物的第二层。 本发明还提供了使用光导合成法在基底上形成聚合物阵列的方法，该方法是通过提供具有第一层的基底，该第一层包含固体支持物上的一个或多个电介质涂层，通过使第一层与硅烷化接触来衍生第一层 试剂和设置在所述第一层上的第二层，其中所述第二层包括用光不稳定保护基团保护的官能团。
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公开(公告)号：US06309831B1
公开(公告)日：2001-10-30
申请号：US09245329
申请日：1999-02-05
IPC分类号： C12Q168
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00378 , B01J2219/00387 , B01J2219/00432 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00608 , B01J2219/00659 , B01J2219/00675 , B01J2219/00677 , B01J2219/00689 , B01J2219/00693 , B01J2219/00695 , B01J2219/00711 , B01J2219/00722 , C07K1/045 , C07K1/047 , C40B40/06 , C40B50/14 , C40B60/14 , G07C3/14
摘要： A method of manufacturing items in parallel. Selected samples of items to be manufactured are subjected to additional steps in a manufacturing process. If such sample items meet the requisite quality control standard, remaining items are subjected to further manufacturing steps. If the sample items which have been further processed do not meet the requisite quality control standard, the lot from which the samples do not undergo the additional manufacturing step. Invention provides an improved method of manufacturing in that it prevents unnecessary manufacturing steps.
摘要翻译： 并行制造物品的方法。 要制造的物品的选定样品在制造过程中经受另外的步骤。 如果这些样品符合必要的质量控制标准，剩余物品将进行进一步的制造步骤。 如果进一步处理的样品不符合必要的质量控制标准，样品不经过附加制造步骤的批次。 本发明提供了一种改进的制造方法，因为它可防止不必要的制造步骤。
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公开(公告)号：US06239273B1
公开(公告)日：2001-05-29
申请号：US09427850
申请日：1999-10-26
申请人： R. Fabian Pease , Glenn McGall , Martin J. Goldberg , Richard P. Rava , Stephen P. A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
发明人： R. Fabian Pease , Glenn McGall , Martin J. Goldberg , Richard P. Rava , Stephen P. A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
IPC分类号： C07M2100
CPC分类号： G03F7/00 , B01J19/0046 , B01J2219/00378 , B01J2219/00382 , B01J2219/00385 , B01J2219/00427 , B01J2219/00432 , B01J2219/00454 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B41M3/00 , B82Y30/00 , C07B2200/11 , C07H21/00 , C07K1/047 , C40B40/06 , C40B40/10 , C40B50/14 , C40B60/14
摘要： A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.
摘要翻译： 一种用于选择性地将印刷材料施加到基底上以在基底的选定区域合成寡核苷酸阵列的方法和装置。 印刷材料包括阻挡材料，单体序列，核苷，去保护剂，载体材料等。 该方法和装置还依赖于基于标准的基于DMT的化学，以及气相脱保护剂如固体TCA等。
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5.发明授权Printing oligonucleotide arrays using deprotection agents solely in the vapor phase 失效使用去保护剂仅在气相中印刷寡核苷酸阵列
公开(公告)号：US5831070A
公开(公告)日：1998-11-03
申请号：US635272
申请日：1996-04-19
申请人： R. Fabian Pease , Glenn McGall , Martin J. Goldberg , Richard P. Rava , Stephen P. A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
发明人： R. Fabian Pease , Glenn McGall , Martin J. Goldberg , Richard P. Rava , Stephen P. A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
IPC分类号： B01J19/00 , B41M3/00 , C07H21/00 , C40B40/06 , C40B50/14 , C40B60/14 , G03F7/00 , C07H21/02 , C07K5/00 , C07K16/00
CPC分类号： C07H21/00 , B01J19/0046 , G03F7/00 , B01J2219/00378 , B01J2219/00382 , B01J2219/00385 , B01J2219/00427 , B01J2219/00454 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00639 , B01J2219/00659 , B01J2219/00722 , B41M3/00 , C40B40/06 , C40B50/14 , C40B60/14
摘要： A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.
摘要翻译： 一种用于选择性地将印刷材料施加到基底上以在基底的选定区域合成寡核苷酸阵列的方法和装置。 印刷材料包括阻挡材料，单体序列，核苷，去保护剂，载体材料等。 该方法和装置还依赖于基于标准的基于DMT的化学和气相脱保护剂如固体TCA等。
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公开(公告)号：US08067578B2
公开(公告)日：2011-11-29
申请号：US12634475
申请日：2009-12-09
申请人： Martin J Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin J Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US06667394B2
公开(公告)日：2003-12-23
申请号：US09841405
申请日：2001-04-24
申请人： R. Fabian Pease , Glenn McGall , Martin J. Goldberg , Richard P. Rava , Stephen P. A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
发明人： R. Fabian Pease , Glenn McGall , Martin J. Goldberg , Richard P. Rava , Stephen P. A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
IPC分类号： C07H2100
CPC分类号： G03F7/00 , B01J19/0046 , B01J2219/00378 , B01J2219/00382 , B01J2219/00385 , B01J2219/00427 , B01J2219/00432 , B01J2219/00454 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B41M3/00 , B82Y30/00 , C07B2200/11 , C07H21/00 , C07K1/047 , C40B40/06 , C40B40/10 , C40B50/14 , C40B60/14
摘要： A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.
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8.发明授权Printing molecular library arrays using deprotection agents solely in the vapor phase 失效使用去保护剂仅在气相中印刷分子库阵列
公开(公告)号：US5599695A
公开(公告)日：1997-02-04
申请号：US395604
申请日：1995-02-27
申请人： R. Fabian Pease , Glenn McGall , Martin J. Goldberg , Richard P. Rava , Stephen P. A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
发明人： R. Fabian Pease , Glenn McGall , Martin J. Goldberg , Richard P. Rava , Stephen P. A. Fodor , Virginia Goss , Lubert Stryer , James L. Winkler
IPC分类号： B01J19/00 , B41M3/00 , C07H21/00 , C40B40/06 , C40B50/14 , C40B60/14 , G03F7/00 , C12P19/34 , C07H21/02 , C07K5/00 , G01N33/543
CPC分类号： C07H21/00 , B01J19/0046 , G03F7/00 , B01J2219/00378 , B01J2219/00382 , B01J2219/00385 , B01J2219/00427 , B01J2219/00454 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00639 , B01J2219/00659 , B01J2219/00722 , B41M3/00 , C40B40/06 , C40B50/14 , C40B60/14
摘要： A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.
摘要翻译： 一种用于选择性地将印刷材料施加到基底上以在基底的选定区域合成寡核苷酸阵列的方法和装置。 印刷材料包括阻挡材料，单体序列，核苷，去保护剂，载体材料等。 该方法和装置还依赖于基于标准的基于DMT的化学，以及气相脱保护剂如固体TCA等。
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9.发明授权Methods for photolithographic synthesis of polymer arrays utilizing anti-reflective coatings 失效使用抗反射涂层的光刻合成聚合物阵列的方法公开(公告)号：US08309496B2
公开(公告)日：2012-11-13
申请号：US13273399
申请日：2011-10-14
申请人： Martin J. Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin J. Goldberg , Martin Diggelman , Earl A. Hubbell , Glenn H. McGall , Nam Quoc Ngo , MacDonald Morris , Melvin Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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10.发明申请ANTIREFLECTIVE COATINGS FOR HIGH-RESOLUTION PHOTOLITHOGRAPHIC SYNTHESIS OF DNA ARRAY 有权DNA阵列高分辨光谱合成的抗反射涂层公开(公告)号：US20110003716A1
公开(公告)日：2011-01-06
申请号：US12832781
申请日：2010-07-08
申请人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
发明人： Mark O. Trulson , Glenn H. McGall , Bei-Shen Sywe , Lisa T. Kajisa , Dana Truong , Richard P. Rava , Martin J. Goldberg
IPC分类号： C40B50/18
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B01J2219/00711 , B01J2219/00722 , C12Q1/6837 , C40B40/06 , G03F7/091 , C12Q2545/101
摘要： The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
摘要翻译： 本发明提供了一种聚合物阵列和通过提供一种具有第一层的衬底来形成聚合物阵列的方法，所述第一层包括在固体载体上的一个或多个电介质涂层和包含设置在第一层上的多个聚合物的第二层。 本发明还提供了使用光导合成法在基底上形成聚合物阵列的方法，该方法是通过提供具有第一层的基底，该第一层包含固体支持物上的一个或多个电介质涂层，通过使第一层与硅烷化接触来衍生第一层 试剂和设置在所述第一层上的第二层，其中所述第二层包括用光不稳定保护基团保护的官能团。
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