摘要:
A semiconductor device comprises a drain layer of first conductivity type, drift layers of first and second conductivity types on the drain layer, an insulating film between the drift layers and contacting the drift layers, a first base layer of second conductivity type on a surface of the drift layer of first conductivity type, a source layer of first conductivity type selectively provided on a surface of the first base layer of second conductivity type, a gate insulating film on the first base layer of second conductivity type between the source layer and the drift layer, a gate electrode on the gate insulating film, a second base layer of second conductivity type on a surface of the drift layer, a first main electrode on the drain layer, and a second main electrode on the source layer, the first base layer and the second base layer.
摘要:
Disclosed herein is an insulated-gate thyristor comprising a base layer of a first conductivity type, having first and second major surfaces, a first main-electrode region of the first conductivity type, formed in the first major surface of the base layer, a second main-electrode region of a second conductivity type, formed in the second major surface of the base layer, at least a pair of grooves extending from the first main-electrode region into the base layer, and opposing each other and spaced apart by a predetermined distance, insulated gate electrodes formed within the grooves, and a turn-off insulated-gate transistor structure for releasing carriers of the second conductivity type from the base layer.
摘要:
Disclosed herein is an insulated-gate thyristor comprising a base layer of a first conductivity type, having first and second major surfaces, a first main-electrode region of the first conductivity type, formed in the first major surface of the base layer, a second main-electrode region of a second conductivity type, formed in the second major surface of the base layer, at least a pair of grooves extending from the first main-electrode region into the base layer, and opposing each other and spaced apart by a predetermined distance, insulated gate electrodes formed within the grooves, and a turn-off insulated-gate transistor structure for releasing carriers of the second conductivity type from the base layer.
摘要:
Disclosed herein is an insulated-gate thyristor comprising a base layer of a first conductivity type, having first and second major surfaces, a first main-electrode region of the first conductivity type, formed in the first major surface of the base layer, a second main-electrode region of a second conductivity type, formed in the second major surface of the base layer, at least a pair of grooves extending from the first main-electrode region into the base layer, and opposing each other and spaced apart by a predetermined distance, insulated gate electrodes formed within the grooves, and a turn-off insulated-gate transistor structure for releasing carriers of the second conductivity type from the base layer.
摘要:
Disclosed herein is an insulated-gate thyristor comprising a base layer of a first conductivity type, having first and second major surfaces, a first main-electrode region of the first conductivity type, formed in the first major surface of the base layer, a second main-electrode region of a second conductivity type, formed in the second major surface of the base layer, at least a pair of grooves extending from the first main-electrode region into the base layer, and opposing each other and spaced apart by a predetermined distance, insulated gate electrodes formed within the grooves, and a turn-off insulated-gate transistor structure for releasing carriers of the second conductivity type from the base layer.
摘要:
An n-semiconductor layer is arranged on a low-resistance n-substrate. A drain electrode is in ohmic contact with the n-substrate. A source electrode forms a Schottky junction with the n-semiconductor layer. A gate electrode is arranged adjacent to the source electrode on the n-semiconductor layer through a gate insulating film. When a voltage is applied to the gate electrode to lower the Schottky barrier height at the interface between the source electrode and the n-semiconductor layer, electrons are injected from the source electrode into the n-semiconductor layer, and a current flows in the semiconductor device. A diffusion layer which prevents a decrease in manufacturing time is not required to form in the n-semiconductor layer, and a channel which causes an increase in ON state voltage is not present.
摘要:
A reverse conducting gate turn-off thyristor device in which a gate turn-off thyristor and a reverse conduction diode are integrally formed in the same semiconductor wafer is constituted in such a manner that a part of a gate electrode is arranged in an isolation region that is sandwiched by the gate turn-off thyristor section and the reverse conduction diode section.
摘要:
An MIS controlled gate turn-off thyristor includes a pnpn structure comprised of a first emitter layer, a first base layer, a second base layer and a second emitter layer, and a turn-off MIS transistor for short-circuiting the second base layer to the second emitter layer. A low impurity concentration layer is formed on the second base layer and the second emitter layer is so formed that it extends, through the low impurity concentration layer, into the second base layer. The MIS transistor is formed on the surface portion of said low impurity concentration layer.
摘要:
A semiconductor device includes a first semiconductor layer of a first conductivity type having first and second main surfaces, a second semiconductor layer of a second conductivity type selectively formed on the first main surface of the first semiconductor layer, the second semiconductor layer including a first region having a relatively high injection efficiency and a second region having a relatively low injection efficiency and the first region being surrounded by the second region, a third semiconductor layer of the first conductivity type formed on the second main surface of the first semiconductor layer, a first electrode selectively formed on the second semiconductor layer of the second conductivity type and connected to at least the first region, and a second electrode formed on the third semiconductor layer of the first conductivity type.
摘要:
A semiconductor device includes a voltage-driven switching element having a cathode and an anode, in which a voltage is to be applied between the cathode and anode, a power-supply circuit connected between the cathode and anode of the voltage-driven switching element and comprising capacitors, resistors and a reverse current-low preventing diode, for generating an intermediate voltage, a charging switching element for charging a gate of the voltage-driven switching element, using the intermediate voltage generated by the power-supply circuit, a discharging switching element for discharging the gate of the voltage-driven switching element, and a photovoltaic element for generating a photovoltaic power to control to drive the charging switching element and the discharging switching element.