Shielding, Particulate Reducing High Vacuum Components
    1.
    发明申请
    Shielding, Particulate Reducing High Vacuum Components 有权
    屏蔽,颗粒减少高真空组件

    公开(公告)号:US20110142382A1

    公开(公告)日:2011-06-16

    申请号:US13034770

    申请日:2011-02-25

    IPC分类号: F16C29/00 B23K31/02 B32B15/00

    摘要: A method of forming a gate valve for use in a high vacuum environment of an electron gun by machining a core of non-magnetic nickel-chromium-molybdenum-iron-tungsten-silicon-carbon alloy that is weldable with nickel alloys and has a tensile strength of about 750 megapascals, machining a cladding of nickel-iron, welding the core to the cladding to form the gate valve, and machining the gate valve so as to remove any dimensional differences at an interface between the core and the cladding. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic alloy, good vacuum performance, and tight mechanical tolerance control. Also, because the alloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.

    摘要翻译: 一种形成用于电子枪的高真空环境中的闸阀的方法,该方法是通过加工可与镍合金焊接的非磁性镍铬钼铁 - 钨 - 硅 - 碳合金芯,并且具有拉伸强度 强度为约750兆帕,加工镍铁包层,将芯焊接到包层以形成闸阀,并加工闸阀,以消除芯和包层之间的界面处的任何尺寸差异。 以这种方式,由于通过加工而不是部件组装来控制最终机械公差,因此获得极高的对准精度。 最后一部分提供了由镍合金壳提供的场屏蔽,由非磁性合金提供的低杂散场,良好的真空性能和严格的机械公差控制。 此外,由于与不锈钢和钛相比,该合金具有低氧化速度的优点,所以由于诸如电子束轰击的条件,存在较少的污染物积聚。

    Shielding, particulate reducing high vacuum components
    2.
    发明授权
    Shielding, particulate reducing high vacuum components 有权
    屏蔽,颗粒减少高真空组件

    公开(公告)号:US08092927B2

    公开(公告)日:2012-01-10

    申请号:US13034770

    申请日:2011-02-25

    摘要: A method of forming a gate valve for use in a high vacuum environment of an electron gun by machining a core of non-magnetic nickel-chromium-molybdenum-iron-tungsten-silicon-carbon alloy that is weldable with nickel alloys and has a tensile strength of about 750 megapascals, machining a cladding of nickel-iron, welding the core to the cladding to form the gate valve, and machining the gate valve so as to remove any dimensional differences at an interface between the core and the cladding. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic alloy, good vacuum performance, and tight mechanical tolerance control. Also, because the alloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.

    摘要翻译: 一种形成用于电子枪的高真空环境中的闸阀的方法,该方法是通过加工可与镍合金焊接的非磁性镍铬钼铁 - 钨 - 硅 - 碳合金芯,并且具有拉伸强度 强度为约750兆帕,加工镍铁包层,将芯焊接到包层以形成闸阀,并加工闸阀,以消除芯和包层之间的界面处的任何尺寸差异。 以这种方式,由于通过加工而不是部件组装来控制最终机械公差,因此获得极高的对准精度。 最后一部分提供了由镍合金壳提供的场屏蔽,由非磁性合金提供的低杂散场,良好的真空性能和严格的机械公差控制。 此外,由于与不锈钢和钛相比,该合金具有低氧化速度的优点,所以由于诸如电子束轰击的条件,存在较少的污染物积聚。

    Shielding, particulate reducing high vacuum components
    3.
    发明授权
    Shielding, particulate reducing high vacuum components 有权
    屏蔽,颗粒减少高真空组件

    公开(公告)号:US07919193B1

    公开(公告)日:2011-04-05

    申请号:US11877713

    申请日:2007-10-24

    IPC分类号: B32B15/04 B32B15/18

    摘要: A component for use in a high vacuum environment, the component including a core of non-magnetic Hastelloy with a cladding of nickel-iron covering the core at least in part. The component can be, for example, at least one of a gate valve for use in a high vacuum environment of an electron gun, a bearing, a slide way, a gate valve bearing, a rotary slide, a linear slide, an electron beam column, and electron beam chamber, and a vacuum chamber. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic Hastelloy, good vacuum performance, and tight mechanical tolerance control. Also, because Hastelloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.

    摘要翻译: 一种用于高真空环境的部件,该部件包括非磁性哈氏合金的核心,其中镍铁包层至少部分地覆盖芯部。 该部件可以是例如用于电子枪的高真空环境中的闸阀中的至少一个,轴承,滑动方式,闸阀轴承,旋转滑块,线性滑块,电子束 柱和电子束室,以及真空室。 以这种方式,由于通过加工而不是部件组装来控制最终机械公差,因此获得极高的对准精度。 最后部分提供了由镍合金壳提供的场屏蔽,由非磁性哈氏合金提供的低杂散场,良好的真空性能和严格的机械公差控制。 此外,由于与不锈钢和钛相比,哈氏合金具有低氧化速度的优点,因为诸如电子束轰击的条件,污染物积聚较少。

    Electron beam column and methods of using same
    5.
    发明授权
    Electron beam column and methods of using same 有权
    电子束柱及其使用方法

    公开(公告)号:US08461526B2

    公开(公告)日:2013-06-11

    申请号:US12958174

    申请日:2010-12-01

    IPC分类号: G01N23/00

    摘要: In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.

    摘要翻译: 在一个实施例中,电子束列的第一真空室具有沿着光轴定位的开口,以便通过沿着该列行进的一次电子束。 发射电子的源被定位在第一真空室内。 光束限制孔被配置成通过发射电子的有限角度范围。 磁浸透镜位于第一真空室的外部,并且被配置为将电子源浸入磁场中,以将发射的电子聚焦到一次电子束中。 物镜被配置为将一次电子束聚焦到衬底表面上的束斑上,以便从束斑产生散射的电子。 可控制偏转器被配置为在衬底表面的区域上扫描束斑。 还公开了其它特征和实施例。

    Immersion gun equipped electron beam column
    6.
    发明授权
    Immersion gun equipped electron beam column 有权
    沉枪配电子束柱

    公开(公告)号:US07821187B1

    公开(公告)日:2010-10-26

    申请号:US12204841

    申请日:2008-09-05

    IPC分类号: H01J27/02

    CPC分类号: H01J37/063 H01J37/145

    摘要: An electron gun of the type having an electron emitter for emitting electrons, including an electrostatic lens and a magnetic lens formed by pole pieces with a winding coil disposed between the magnetic pole pieces. The magnetic lens forms a rotationally symmetrical magnetic field in a gap formed by the pole pieces. The magnetic field forms the magnetic lens and focuses the electrons emitted from the emitter. A vacuum tube separates the electron gun from the magnetic lens. The electron gun is sealed in a vacuum by the vacuum tube and the magnetic lens is shielded in air.

    摘要翻译: 一种具有用于发射电子的电子发射器的电子枪,包括静电透镜和由极片形成的磁性透镜,该磁极具有设置在磁极片之间的绕组线圈。 磁性透镜在由极片形成的间隙中形成旋转对称的磁场。 磁场形成磁透镜并聚焦从发射器发射的电子。 真空管将电子枪与磁性透镜分开。 电子枪由真空管密封在真空中,磁性透镜在空气中被屏蔽。

    High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture
    7.
    发明授权
    High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture 有权
    高灵敏度和高通量的电子束检查柱,通过可调节的光束限制孔径实现

    公开(公告)号:US08294125B2

    公开(公告)日:2012-10-23

    申请号:US12634444

    申请日:2009-12-09

    摘要: One embodiment relates to an electron-beam apparatus for defect inspection and/or review of substrates or for measuring critical dimensions of features on substrates. The apparatus includes an electron gun and an electron column. The electron gun includes an electron source configured to generate electrons for an electron beam and an adjustable beam-limiting aperture which is configured to select and use one aperture size from a range of aperture sizes. Another embodiment relates to providing an electron beam in an apparatus. Advantageously, the disclosed apparatus and methods reduce spot blur while maintaining a high beam current so as to obtain both high sensitivity and high throughput.

    摘要翻译: 一个实施例涉及一种用于缺陷检查和/或检查基板或用于测量基板上的特征的关键尺寸的电子束装置。 该装置包括电子枪和电子柱。 电子枪包括被配置为产生用于电子束的电子的电子源和可调节的光束限制孔,其被配置为从一定范围的孔径尺寸中选择和使用一个孔径尺寸。 另一实施例涉及在装置中提供电子束。 有利地,所公开的装置和方法在保持高光束电流的同时减少斑点模糊,以便获得高灵敏度和高吞吐量。

    Compact arrangement for dual-beam low energy electron microscope
    8.
    发明授权
    Compact arrangement for dual-beam low energy electron microscope 有权
    双光束低能电子显微镜的紧凑布置

    公开(公告)号:US08258474B1

    公开(公告)日:2012-09-04

    申请号:US13071412

    申请日:2011-03-24

    申请人: Marian Mankos

    发明人: Marian Mankos

    IPC分类号: H01J37/26

    摘要: One embodiment relates to an apparatus for generating two spatially overlapping electron beams on a specimen. A first electron beam source is configured to generate a low-energy electron beam, and an energy-dispersive device bends the low-energy electron beam towards an semitransparent electron mirror. The semitransparent electron mirror is biased to reflect the low-energy electron beam. A second electron beam source is configured to generate a high-energy electron beam that passes through an opening in the semitransparent electron mirror. Both the low- and high-energy electron beams enter the same energy-dispersive device that bends both beams towards the specimen. A deflection system positioned between the high-energy electron source and semitransparent electron mirror is configured to deflect the high-energy electron beam by an angle that compensates for the difference in bending angles between the low- and high-energy electron beams introduced by the energy-dispersive device. Other embodiments are also disclosed.

    摘要翻译: 一个实施例涉及用于在样本上产生两个空间上重叠的电子束的装置。 第一电子束源被配置为产生低能电子束,并且能量分散器件将低能电子束弯曲成半透明电子镜。 半透明电子镜被偏置以反射低能电子束。 第二电子束源被配置为产生穿过半透明电子反射镜中的开口的高能电子束。 低能量和高能量电子束都进入同样的能量分散装置,使两个光束朝向样品弯曲。 位于高能电子源和半透明电子反射镜之间的偏转系统被配置为使高能电子束偏转角度,该角度补偿由能量引入的低能量和高能量电子束之间的弯曲角度的差异 - 分散设备 还公开了其他实施例。

    High-fidelity reflection electron beam lithography
    9.
    发明授权
    High-fidelity reflection electron beam lithography 失效
    高保真反射电子束光刻

    公开(公告)号:US07692167B1

    公开(公告)日:2010-04-06

    申请号:US11588492

    申请日:2006-10-26

    申请人: Marian Mankos

    发明人: Marian Mankos

    IPC分类号: H01J37/302

    摘要: One embodiment pertains to an apparatus for reflection electron beam lithography, including at least illumination electron-optics, an electron-reflective pattern generator, projection electron-optics, a moving stage holding a target substrate, control circuitry, and a deflection system. The illumination electron-optics is configured to form an illumination electron beam. The electron-reflective pattern generator configured to generate an electron-reflective pattern of pixels and to reflect the illumination electron beam using the pattern to form a patterned electron beam. The projection electron-optics is configured to project the patterned electron beam onto the moving target substrate. The control circuitry is configured to shift the generated pattern in discrete steps in synchronization with the stage motion. The deflection system is configured to deflect said projected patterned electron beam so as to compensate for said stage motion in between discrete shifts of said generated pattern. Other features and embodiments are also disclosed.

    摘要翻译: 一个实施例涉及用于反射电子束光刻的装置,至少包括照明电子光学,电子反射图案发生器,投射电子光学,保持目标衬底的移动台,控制电路和偏转系统。 照明电子光学被配置为形成照明电子束。 电子反射型图形发生器被配置为产生像素的电子反射图案并且使用该图案反射照射电子束以形成图案化的电子束。 投影电子学被配置为将图案化电子束投影到移动目标衬底上。 控制电路被配置为与台阶运动同步地以离散步进移位生成的图案。 偏转系统被配置为偏转所述投影的图案化电子束,以补偿所述生成图案的离散位移之间的所述阶段运动。 还公开了其它特征和实施例。

    Holey mirror arrangement for dual-energy e-beam inspector
    10.
    发明授权
    Holey mirror arrangement for dual-energy e-beam inspector 有权
    双能量电子束检查器的多孔镜配置

    公开(公告)号:US07217924B1

    公开(公告)日:2007-05-15

    申请号:US11205367

    申请日:2005-08-16

    IPC分类号: H01J37/26 G01N23/225

    摘要: One embodiment relates to an apparatus for generating a dual-energy electron beam. A first electron beam source is configured to generate a lower-energy electron beam, and a second electron beam source is configured to generate a higher-energy electron beam. A holey mirror is biased to reflect the lower-energy electron beam. The holey mirror also includes an opening therein through which passes the higher-energy electron beam, thereby forming the dual-energy electron beam. A prism array combiner introduces a first dispersion between the lower-energy electron beam and the higher-energy electron beam within the dual-energy electron beam. A prism array separator is configured to separate the dual-energy electron beam traveling to a substrate from a scattered electron beam traveling away from the substrate. The prism array separator introduces a second dispersion which compensates for the dispersion of the prism array combiner. Other embodiments are also disclosed.

    摘要翻译: 一个实施例涉及一种用于产生双能量电子束的装置。 第一电子束源被配置为产生较低能量的电子束,并且第二电子束源被配置为产生较高能量的电子束。 有孔镜被偏置以反射较低能量的电子束。 多孔镜还包括其中通过高能电子束的开口,从而形成双能电子束。 棱镜阵列组合器在双能电子束内引入低能电子束与高能电子束之间的第一色散。 棱镜阵列分离器被配置为将从衬底传播的散射电子束分离到衬底行进的双能电子束。 棱镜阵列分离器引入补偿棱镜阵列组合器的色散的第二色散。 还公开了其他实施例。