公开(公告)号：US09048283B2

公开(公告)日：2015-06-02

申请号：US13542507

申请日：2012-07-05

申请人： Ping-Yin Liu ,  Shih-Wei Lin ,  Xin-Hua Huang ,  Lan-Lin Chao ,  Chia-Shiung Tsai

发明人： Ping-Yin Liu ,  Shih-Wei Lin ,  Xin-Hua Huang ,  Lan-Lin Chao ,  Chia-Shiung Tsai

IPC分类号： H01L21/30 ,  H01L23/00

CPC分类号： H01L24/80 ,  H01L24/03 ,  H01L24/05 ,  H01L24/08 ,  H01L24/27 ,  H01L24/74 ,  H01L24/94 ,  H01L2224/02215 ,  H01L2224/0361 ,  H01L2224/03616 ,  H01L2224/0381 ,  H01L2224/05647 ,  H01L2224/05687 ,  H01L2224/08145 ,  H01L2224/74 ,  H01L2224/7501 ,  H01L2224/75101 ,  H01L2224/7565 ,  H01L2224/75753 ,  H01L2224/75824 ,  H01L2224/80004 ,  H01L2224/80007 ,  H01L2224/8001 ,  H01L2224/80011 ,  H01L2224/80013 ,  H01L2224/80014 ,  H01L2224/80065 ,  H01L2224/80075 ,  H01L2224/80097 ,  H01L2224/80121 ,  H01L2224/80136 ,  H01L2224/80203 ,  H01L2224/80895 ,  H01L2224/80896 ,  H01L2224/83889 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/1461 ,  H01L2924/351 ,  Y10T156/15 ,  Y10T156/1744 ,  H01L2924/00012 ,  H01L2224/80 ,  H01L2924/05442 ,  H01L2924/00

摘要： Hybrid bonding systems and methods for semiconductor wafers are disclosed. In one embodiment, a hybrid bonding system for semiconductor wafers includes a chamber and a plurality of sub-chambers disposed within the chamber. A robotics handler is disposed within the chamber that is adapted to move a plurality of semiconductor wafers within the chamber between the plurality of sub-chambers. The plurality of sub-chambers includes a first sub-chamber adapted to remove a protection layer from the plurality of semiconductor wafers, and a second sub-chamber adapted to activate top surfaces of the plurality of semiconductor wafers prior to hybrid bonding the plurality of semiconductor wafers together. The plurality of sub-chambers also includes a third sub-chamber adapted to align the plurality of semiconductor wafers and hybrid bond the plurality of semiconductor wafers together.

摘要翻译： 公开了用于半导体晶片的混合键合系统和方法。 在一个实施例中，用于半导体晶片的混合键合系统包括腔室和设置在腔室内的多个子腔室。 机器人处理器设置在腔室内，其适于移动多个子室内的室内的多个半导体晶片。 多个子室包括适于从多个半导体晶片去除保护层的第一子室，以及适于在混合结合多个半导体之前激活多个半导体晶片的顶表面的第二子室 晶圆在一起 多个子室还包括适于对准多个半导体晶片并将多个半导体晶片混合地结合在一起的第三子室。

公开(公告)号：US20140011324A1

公开(公告)日：2014-01-09

申请号：US13542507

申请日：2012-07-05

申请人： Ping-Yin Liu ,  Shih-Wei Lin ,  Xin-Hua Huang ,  Lan-Lin Chao ,  Chia-Shiung Tsai

发明人： Ping-Yin Liu ,  Shih-Wei Lin ,  Xin-Hua Huang ,  Lan-Lin Chao ,  Chia-Shiung Tsai

IPC分类号： H01L21/50

CPC分类号： H01L24/80 ,  H01L24/03 ,  H01L24/05 ,  H01L24/08 ,  H01L24/27 ,  H01L24/74 ,  H01L24/94 ,  H01L2224/02215 ,  H01L2224/0361 ,  H01L2224/03616 ,  H01L2224/0381 ,  H01L2224/05647 ,  H01L2224/05687 ,  H01L2224/08145 ,  H01L2224/74 ,  H01L2224/7501 ,  H01L2224/75101 ,  H01L2224/7565 ,  H01L2224/75753 ,  H01L2224/75824 ,  H01L2224/80004 ,  H01L2224/80007 ,  H01L2224/8001 ,  H01L2224/80011 ,  H01L2224/80013 ,  H01L2224/80014 ,  H01L2224/80065 ,  H01L2224/80075 ,  H01L2224/80097 ,  H01L2224/80121 ,  H01L2224/80136 ,  H01L2224/80203 ,  H01L2224/80895 ,  H01L2224/80896 ,  H01L2224/83889 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/1461 ,  H01L2924/351 ,  Y10T156/15 ,  Y10T156/1744 ,  H01L2924/00012 ,  H01L2224/80 ,  H01L2924/05442 ,  H01L2924/00

摘要： Hybrid bonding systems and methods for semiconductor wafers are disclosed. In one embodiment, a hybrid bonding system for semiconductor wafers includes a chamber and a plurality of sub-chambers disposed within the chamber. A robotics handler is disposed within the chamber that is adapted to move a plurality of semiconductor wafers within the chamber between the plurality of sub-chambers. The plurality of sub-chambers includes a first sub-chamber adapted to remove a protection layer from the plurality of semiconductor wafers, and a second sub-chamber adapted to activate top surfaces of the plurality of semiconductor wafers prior to hybrid bonding the plurality of semiconductor wafers together. The plurality of sub-chambers also includes a third sub-chamber adapted to align the plurality of semiconductor wafers and hybrid bond the plurality of semiconductor wafers together.

摘要翻译： 公开了用于半导体晶片的混合键合系统和方法。 在一个实施例中，用于半导体晶片的混合键合系统包括腔室和设置在腔室内的多个子腔室。 机器人处理器设置在腔室内，其适于移动多个子室内的室内的多个半导体晶片。 多个子室包括适于从多个半导体晶片去除保护层的第一子室，以及适于在混合结合多个半导体之前激活多个半导体晶片的顶表面的第二子室 晶圆在一起 多个子室还包括适于对准多个半导体晶片并将多个半导体晶片混合地结合在一起的第三子室。

公开(公告)号：US20130320556A1

公开(公告)日：2013-12-05

申请号：US13488745

申请日：2012-06-05

申请人： Ping-Yin Liu ,  Xin-Hua Huang ,  Lan-Lin Chao ,  Chia-Shiung Tsai

发明人： Ping-Yin Liu ,  Xin-Hua Huang ,  Lan-Lin Chao ,  Chia-Shiung Tsai

IPC分类号： H01L23/48 ,  H01L21/762

CPC分类号： H01L25/0657 ,  H01L24/03 ,  H01L24/05 ,  H01L24/08 ,  H01L24/80 ,  H01L24/92 ,  H01L24/94 ,  H01L25/50 ,  H01L2224/03845 ,  H01L2224/05026 ,  H01L2224/05147 ,  H01L2224/05571 ,  H01L2224/056 ,  H01L2224/05611 ,  H01L2224/08147 ,  H01L2224/08502 ,  H01L2224/80097 ,  H01L2224/80203 ,  H01L2224/80204 ,  H01L2224/80345 ,  H01L2224/80805 ,  H01L2224/80896 ,  H01L2224/80986 ,  H01L2224/92 ,  H01L2224/9202 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/1461 ,  H01L2224/80 ,  H01L2224/83 ,  H01L2924/00012 ,  H01L2924/01032 ,  H01L2924/00 ,  H01L2224/05552

摘要： Three dimensional integrated circuit (3DIC) structures and hybrid bonding methods for semiconductor wafers are disclosed. A 3DIC structure includes a first semiconductor device having first conductive pads disposed within a first insulating material on a top surface thereof, the first conductive pads having a first recess on a top surface thereof. The 3DIC structure includes a second semiconductor device having second conductive pads disposed within a second insulating material on a top surface thereof coupled to the first semiconductor device, the second conductive pads having a second recess on a top surface thereof. A sealing layer is disposed between the first conductive pads and the second conductive pads in the first recess and the second recess. The sealing layer bonds the first conductive pads to the second conductive pads. The first insulating material is bonded to the second insulating material.

摘要翻译： 公开了用于半导体晶片的三维集成电路（3DIC）结构和混合键合方法。 3DIC结构包括第一半导体器件，其第一导电焊盘设置在其顶表面上的第一绝缘材料内，第一导电焊盘在其顶表面上具有第一凹部。 3DIC结构包括第二半导体器件，其第二导电焊盘设置在耦合到第一半导体器件的顶表面上的第二绝缘材料内，第二导电焊盘在其顶表面上具有第二凹槽。 密封层设置在第一导电垫和第一凹槽和第二凹槽中的第二导电垫之间。 密封层将第一导电焊盘连接到第二导电焊盘。 第一绝缘材料结合到第二绝缘材料上。

公开(公告)号：US09054121B2

公开(公告)日：2015-06-09

申请号：US13280075

申请日：2011-10-24

申请人： Ping-Yin Liu ,  Xin-Hua Huang ,  Hsin-Ting Huang ,  Yuan-Chih Hsieh ,  Jung-Huei Peng ,  Lan-Lin Chao ,  Chia-Shiung Tsai ,  Chun-Wen Cheng

发明人： Ping-Yin Liu ,  Xin-Hua Huang ,  Hsin-Ting Huang ,  Yuan-Chih Hsieh ,  Jung-Huei Peng ,  Lan-Lin Chao ,  Chia-Shiung Tsai ,  Chun-Wen Cheng

IPC分类号： H01L21/31 ,  H01L49/02 ,  B81C1/00 ,  H01G5/16

CPC分类号： B81B7/0058 ,  B81B3/0005 ,  B81B3/0021 ,  B81C1/00269 ,  B81C1/00793 ,  B81C2201/053 ,  B81C2203/0109 ,  H01G5/16 ,  H01L28/60

摘要： A method includes forming a MEMS device, forming a bond layer adjacent the MEMS device, and forming a protection layer over the bond layer. The steps of forming the bond layer and the protection layer include in-situ deposition of the bond layer and the protection layer.

摘要翻译： 一种方法包括形成MEMS器件，形成与MEMS器件相邻的接合层，并在接合层上形成保护层。 形成接合层和保护层的步骤包括接合层和保护层的原位沉积。

公开(公告)号：US08945344B2

公开(公告)日：2015-02-03

申请号：US13554751

申请日：2012-07-20

申请人： Xin-Hua Huang ,  Ping-Yin Liu ,  Hung-Hua Lin ,  Yuan-Chih Hsieh ,  Lan-Lin Chao ,  Chia-Shiung Tsai

发明人： Xin-Hua Huang ,  Ping-Yin Liu ,  Hung-Hua Lin ,  Yuan-Chih Hsieh ,  Lan-Lin Chao ,  Chia-Shiung Tsai

IPC分类号： B32B38/10

CPC分类号： H01L21/67092 ,  Y10T156/11 ,  Y10T156/1132 ,  Y10T156/1153 ,  Y10T156/1189 ,  Y10T156/1911 ,  Y10T156/1944 ,  Y10T156/1972

摘要： Systems and methods of separating bonded wafers are disclosed. In one embodiment, a system for separating bonded wafers includes a support for the bonded wafers and means for applying a sheer force to the bonded wafers. The system also includes means for applying a vacuum to the bonded wafers.

摘要翻译： 公开了分离键合晶片的系统和方法。 在一个实施例中，用于分离接合的晶片的系统包括用于接合的晶片的支撑件和用于向结合的晶片施加纯粹的力的装置。 该系统还包括用于向接合晶片施加真空的装置。

公开(公告)号：US08809123B2

公开(公告)日：2014-08-19

申请号：US13488745

申请日：2012-06-05

申请人： Ping-Yin Liu ,  Xin-Hua Huang ,  Lan-Lin Chao ,  Chia-Shiung Tsai

发明人： Ping-Yin Liu ,  Xin-Hua Huang ,  Lan-Lin Chao ,  Chia-Shiung Tsai

IPC分类号： H01L21/00

CPC分类号： H01L25/0657 ,  H01L24/03 ,  H01L24/05 ,  H01L24/08 ,  H01L24/80 ,  H01L24/92 ,  H01L24/94 ,  H01L25/50 ,  H01L2224/03845 ,  H01L2224/05026 ,  H01L2224/05147 ,  H01L2224/05571 ,  H01L2224/056 ,  H01L2224/05611 ,  H01L2224/08147 ,  H01L2224/08502 ,  H01L2224/80097 ,  H01L2224/80203 ,  H01L2224/80204 ,  H01L2224/80345 ,  H01L2224/80805 ,  H01L2224/80896 ,  H01L2224/80986 ,  H01L2224/92 ,  H01L2224/9202 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/1461 ,  H01L2224/80 ,  H01L2224/83 ,  H01L2924/00012 ,  H01L2924/01032 ,  H01L2924/00 ,  H01L2224/05552

摘要： Three dimensional integrated circuit (3DIC) structures and hybrid bonding methods for semiconductor wafers are disclosed. A 3DIC structure includes a first semiconductor device having first conductive pads disposed within a first insulating material on a top surface thereof, the first conductive pads having a first recess on a top surface thereof. The 3DIC structure includes a second semiconductor device having second conductive pads disposed within a second insulating material on a top surface thereof coupled to the first semiconductor device, the second conductive pads having a second recess on a top surface thereof. A sealing layer is disposed between the first conductive pads and the second conductive pads in the first recess and the second recess. The sealing layer bonds the first conductive pads to the second conductive pads. The first insulating material is bonded to the second insulating material.

摘要翻译： 公开了用于半导体晶片的三维集成电路（3DIC）结构和混合键合方法。 3DIC结构包括第一半导体器件，其第一导电焊盘设置在其顶表面上的第一绝缘材料内，第一导电焊盘在其顶表面上具有第一凹部。 3DIC结构包括第二半导体器件，其第二导电焊盘设置在耦合到第一半导体器件的顶表面上的第二绝缘材料内，第二导电焊盘在其顶表面上具有第二凹槽。 密封层设置在第一导电垫和第一凹槽和第二凹槽中的第二导电垫之间。 密封层将第一导电焊盘连接到第二导电焊盘。 第一绝缘材料结合到第二绝缘材料上。

公开(公告)号：US20140020818A1

公开(公告)日：2014-01-23

申请号：US13554751

申请日：2012-07-20

申请人： Xin-Hua Huang ,  Ping-Yin Liu ,  Hung-Hua Lin ,  Yuan-Chih Hsieh ,  Lan-Lin Chao ,  Chia-Shiung Tsai

发明人： Xin-Hua Huang ,  Ping-Yin Liu ,  Hung-Hua Lin ,  Yuan-Chih Hsieh ,  Lan-Lin Chao ,  Chia-Shiung Tsai

IPC分类号： B32B38/10 ,  B32B37/02

CPC分类号： H01L21/67092 ,  Y10T156/11 ,  Y10T156/1132 ,  Y10T156/1153 ,  Y10T156/1189 ,  Y10T156/1911 ,  Y10T156/1944 ,  Y10T156/1972

摘要： Systems and methods of separating bonded wafers are disclosed. In one embodiment, a system for separating bonded wafers includes a support for the bonded wafers and means for applying a sheer force to the bonded wafers. The system also includes means for applying a vacuum to the bonded wafers.

摘要翻译： 公开了分离键合晶片的系统和方法。 在一个实施例中，用于分离接合的晶片的系统包括用于接合的晶片的支撑件和用于向结合的晶片施加纯粹的力的装置。 该系统还包括用于向接合晶片施加真空的装置。

公开(公告)号：US08790946B2

公开(公告)日：2014-07-29

申请号：US13365043

申请日：2012-02-02

申请人： Xin-Hua Huang ,  Ping-Yin Liu ,  Li-Cheng Chu ,  Yuan-Chih Hsieh ,  Lan-Lin Chao ,  Chun-Wen Cheng ,  Chia-Shiung Tsai

发明人： Xin-Hua Huang ,  Ping-Yin Liu ,  Li-Cheng Chu ,  Yuan-Chih Hsieh ,  Lan-Lin Chao ,  Chun-Wen Cheng ,  Chia-Shiung Tsai

IPC分类号： H01L21/52

CPC分类号： B23K20/002 ,  B23K20/023

摘要： A method includes bonding a first bond layer to a second bond layer through eutectic bonding. The step of bonding includes heating the first bond layer and the second bond layer to a temperature higher than a eutectic temperature of the first bond layer and the second bond layer, and performing a pumping cycle. The pumping cycle includes applying a first force to press the first bond layer and the second bond layer against each other. After the step of applying the first force, a second force lower than the first force is applied to press the first bond layer and the second bond layer against each other. After the step of applying the second force, a third force higher than the second force is applied to press the first bond layer and the second bond layer against each other.

摘要翻译： 一种方法包括通过共晶接合将第一接合层结合到第二接合层。 接合步骤包括将第一接合层和第二接合层加热至高于第一接合层和第二接合层的共晶温度的温度，并进行泵送循环。 泵送循环包括施加第一力以将第一接合层和第二接合层相互挤压。 在施加第一力的步骤之后，施加比第一力小的第二力以将第一接合层和第二接合层相互挤压。 在施加第二力的步骤之后，施加比第二力高的第三力以将第一接合层和第二接合层相互挤压。

公开(公告)号：US20130203199A1

公开(公告)日：2013-08-08

申请号：US13365043

申请日：2012-02-02

申请人： Xin-Hua Huang ,  Ping-Yin Liu ,  Li-Cheng Chu ,  Yuan-Chih Hsieh ,  Lan-Lin Chao ,  Chun-Wen Cheng ,  Chia-Shiung Tsai

发明人： Xin-Hua Huang ,  Ping-Yin Liu ,  Li-Cheng Chu ,  Yuan-Chih Hsieh ,  Lan-Lin Chao ,  Chun-Wen Cheng ,  Chia-Shiung Tsai

IPC分类号： H01L21/52 ,  B23K31/02

CPC分类号： B23K20/002 ,  B23K20/023

摘要： A method includes bonding a first bond layer to a second bond layer through eutectic bonding. The step of bonding includes heating the first bond layer and the second bond layer to a temperature higher than a eutectic temperature of the first bond layer and the second bond layer, and performing a pumping cycle. The pumping cycle includes applying a first force to press the first bond layer and the second bond layer against each other. After the step of applying the first force, a second force lower than the first force is applied to press the first bond layer and the second bond layer against each other. After the step of applying the second force, a third force higher than the second force is applied to press the first bond layer and the second bond layer against each other.

摘要翻译： 一种方法包括通过共晶接合将第一接合层结合到第二接合层。 接合步骤包括将第一接合层和第二接合层加热至高于第一接合层和第二接合层的共晶温度的温度，并进行泵送循环。 泵送循环包括施加第一力以将第一接合层和第二接合层相互挤压。 在施加第一力的步骤之后，施加比第一力小的第二力以将第一接合层和第二接合层相互挤压。 在施加第二力的步骤之后，施加比第二力高的第三力以将第一接合层和第二接合层相互挤压。

公开(公告)号：US20130099355A1

公开(公告)日：2013-04-25

申请号：US13280075

申请日：2011-10-24

申请人： Ping-Yin Liu ,  Xin-Hua Huang ,  Hsin-Ting Huang ,  Yuan-Chih Hsieh ,  Jung-Huei Peng ,  Lan-Lin Chao ,  Chia-Shiung Tsai ,  Chun-Wen Cheng

发明人： Ping-Yin Liu ,  Xin-Hua Huang ,  Hsin-Ting Huang ,  Yuan-Chih Hsieh ,  Jung-Huei Peng ,  Lan-Lin Chao ,  Chia-Shiung Tsai ,  Chun-Wen Cheng

IPC分类号： H01L29/92 ,  H01L21/02

CPC分类号： B81B7/0058 ,  B81B3/0005 ,  B81B3/0021 ,  B81C1/00269 ,  B81C1/00793 ,  B81C2201/053 ,  B81C2203/0109 ,  H01G5/16 ,  H01L28/60

摘要： A method includes forming a MEMS device, forming a bond layer adjacent the MEMS device, and forming a protection layer over the bond layer. The steps of forming the bond layer and the protection layer include in-situ deposition of the bond layer and the protection layer