摘要:
A gas distribution apparatus delivers a coolant gas, such as helium, to an upper surface of a chuck for controlling a temperature of a wafer placed on the chuck. The gas distribution apparatus allows first and second zones, such as an inner zone and an outer zone of the chuck, to be supplied with a coolant gas at different pressures for control of the temperature across the wafer. The gas distribution apparatus includes a pressure and flow control system for supplying the coolant gas at selected pressures and bleed lines which provide the dual function of allowing rapid evacuation of the inner and outer zones and preventing excess pressure from one zone from migrating to another zone.
摘要:
A vehicle ignition interlock system includes a breath analyzer, a transdermal alcohol sensor configured to be worn by the vehicle operator, and a controller operably connected to the breath analyzer, to the transdermal alcohol sensor, and to an ignition system of the vehicle. The transdermal alcohol sensor is configured to be worn by the vehicle operator, and is configured to detect alcohol through the skin of the vehicle operator. The controller is configured to override one or more periodic breath analyzer retests if alcohol is not detected through the skin of the operator by the transdermal alcohol sensor. The controller is configured to increase the frequency of periodic breath analyzer retests of the vehicle operator in response to the transdermal alcohol sensor detecting alcohol through the skin of the operator. A proximity sensor detects proximity of the transdermal alcohol sensor relative to a vehicle operator area.
摘要:
A method of depositing a dielectric film on a substrate in a process chamber of an inductively coupled plasma-enhanced chemical vapor deposition reactor. Gap filling between electrically conductive lines on a semiconductor substrate and depositing a cap layer are achieved. Films having significantly improved physical characteristics including reduced film stress are produced by heating the substrate holder on which the substrate is positioned in the process chamber.
摘要:
A plasma processing system for plasma processing of substrates such as semiconductor wafers. The system includes a plasma processing chamber, a substrate support for supporting a substrate within the processing chamber, a dielectric member having an interior surface facing the substrate support, the dielectric member forming a wall of the processing chamber, a gas supply comprising one or more injector tubes extending rectilinearly in the plasma processing chamber and having one or more orifices in a sidewall for supplying gas into the chamber, and an RF energy source such as a planar coil which inductively couples RF energy through the dielectric member and into the chamber to energize the process gas into a plasma state. The gas is supplied through orifices located outside of regions at the distal tip of the injector tubes where electric field lines are concentrated. The arrangement minimizes clogging of the orifices since the orifices are located away from areas where most build-up of process byproducts occur on the injector tube.
摘要:
An electrostatic chuck comprises an electrode cap with a dielectric layer for attracting and holding the back side of a semiconductor wafer positioned on the top surface of the dielectric layer, and a lower electrode. The electrostatic chuck is heated by resistive heating elements attached to or embedded within the chuck. The electrostatic chuck is cooled by circulating liquid coolant through the body of the chuck. Coolant gas is provided at the back side of the semiconductor wafer to improve thermal transfer. A feedback control mechanism maintains the chuck, and consequently the wafer, at a predetermined temperature by actively controlling both the heating and the cooling functions.
摘要:
A vehicle ignition interlock system includes a breath analyzer and a controller operably connected to the breath analyzer and to an ignition system of the vehicle. The breath analyzer detects the breath alcohol level of a vehicle operator and is configured to prevent vehicle ignition if a breath alcohol level is greater than or equal to a threshold value. The controller requires the vehicle operator to periodically take breath analyzer “retests” after vehicle ignition in order to allow vehicle operation to continue. The breath analyzer also detects the presence of alcohol within the vehicle, such as alcohol emanating from an open container of alcohol. The controller may override one or more periodic retests if alcohol is not detected within the vehicle over a predetermined period of time. In addition, the controller may increase the frequency of periodic retests of the vehicle operator in response to detecting alcohol within the vehicle.
摘要:
A vehicle ignition interlock system includes a breath analyzer and a controller operably connected to the breath analyzer and to an ignition system of the vehicle. The controller compares detected breath alcohol levels of the vehicle operator with a threshold value, and is configured to prevent vehicle ignition if a breath alcohol level detected by the breath analyzer is greater than or equal to a threshold value. The controller also requires the vehicle operator to periodically take breath analyzer retests after vehicle ignition in order to allow vehicle operation to continue. The controller can reduce the frequency of periodic retests in response to one or more retests when the breath alcohol level of the vehicle operator is below a threshold value. The system may include a transdermal alcohol sensor, a mouth contamination sensor, a mouth contamination sensor, and redundant alcohol sensors.
摘要:
A non-destructive and simple method for cleaning a new or used electrostatic chuck comprises a wet cleaning process, which removes contaminants deposited on a surface of the electrostatic chuck.
摘要:
A plasma processing system for processes such as chemical vapor deposition includes a plasma processing chamber, a substrate holder for supporting a substrate within the processing chamber, a dielectric member having an interior surface facing the substrate holder, the dielectric member forming a wall of the processing chamber a gas supply for supplying gas to the chamber, directed towards the substrate, and an RF energy source such as a planar coil which inductively couples RF energy through the dielectric member and into the chamber to energize the process gas into a plasma state. The gas supply may comprise a primary gas ring and a secondary gas ring for supplying gases or gas mixtures into the chamber. The gas supply may further include injectors attached to the primary gas ring which inject gas into the chamber, directed toward the substrate. The plasma processing system may also include a cooling mechanism for cooling the primary gas ring during processing.