Multiple zone gas distribution apparatus for thermal control of semiconductor wafer
    1.
    发明授权
    Multiple zone gas distribution apparatus for thermal control of semiconductor wafer 有权
    用于半导体晶片热控制的多区域气体分配装置

    公开(公告)号:US07156951B1

    公开(公告)日:2007-01-02

    申请号:US10600273

    申请日:2003-06-20

    IPC分类号: C23F1/00 H01L21/306 C23C16/00

    CPC分类号: H01L21/67109 H01L21/3065

    摘要: A gas distribution apparatus delivers a coolant gas, such as helium, to an upper surface of a chuck for controlling a temperature of a wafer placed on the chuck. The gas distribution apparatus allows first and second zones, such as an inner zone and an outer zone of the chuck, to be supplied with a coolant gas at different pressures for control of the temperature across the wafer. The gas distribution apparatus includes a pressure and flow control system for supplying the coolant gas at selected pressures and bleed lines which provide the dual function of allowing rapid evacuation of the inner and outer zones and preventing excess pressure from one zone from migrating to another zone.

    摘要翻译: 气体分配装置将诸如氦气的冷却剂气体输送到卡盘的上表面,以控制放置在卡盘上的晶片的温度。 气体分配装置允许在不同压力下向第一和第二区域(例如卡盘的内部区域和外部区域)供应冷却剂气体,以控制跨越晶片的温度。 气体分配装置包括用于以选定压力供应冷却剂气体的压力和流量控制系统以及排气管线,其提供允许内部和外部区域的快速排空并防止来自一个区域的过度压力迁移到另一个区域的双重功能。

    Vehicle ignition interlock systems having transdermal alcohol sensor
    2.
    发明申请
    Vehicle ignition interlock systems having transdermal alcohol sensor 有权
    具有透皮酒精传感器的车辆点火互锁系统

    公开(公告)号:US20060237252A1

    公开(公告)日:2006-10-26

    申请号:US11113770

    申请日:2005-04-25

    IPC分类号: B60K28/00 B60L1/00 G08B23/00

    摘要: A vehicle ignition interlock system includes a breath analyzer, a transdermal alcohol sensor configured to be worn by the vehicle operator, and a controller operably connected to the breath analyzer, to the transdermal alcohol sensor, and to an ignition system of the vehicle. The transdermal alcohol sensor is configured to be worn by the vehicle operator, and is configured to detect alcohol through the skin of the vehicle operator. The controller is configured to override one or more periodic breath analyzer retests if alcohol is not detected through the skin of the operator by the transdermal alcohol sensor. The controller is configured to increase the frequency of periodic breath analyzer retests of the vehicle operator in response to the transdermal alcohol sensor detecting alcohol through the skin of the operator. A proximity sensor detects proximity of the transdermal alcohol sensor relative to a vehicle operator area.

    摘要翻译: 车辆点火互锁系统包括呼吸分析仪,构造成由车辆操作者佩戴的透皮酒精传感器,以及可操作地连接到呼吸分析仪,经皮酒精传感器和车辆的点火系统的控制器。 透皮酒精传感器构造成由车辆操作者佩戴,并且被配置为通过车辆操作者的皮肤检测酒精。 控制器被配置为超过一个或多个周期性呼吸分析器重新测试,如果通过透皮酒精传感器未检测到操作者的皮肤的酒精。 控制器被配置为响应于透皮酒精传感器通过操作者的皮肤检测酒精来增加车辆操作者的周期性呼吸分析器重新测试的频率。 接近传感器检测透皮酒精传感器相对于车辆操作者区域的接近度。

    Gas injection system for plasma processing
    4.
    发明授权
    Gas injection system for plasma processing 失效
    用于等离子体处理的气体注入系统

    公开(公告)号:US6013155A

    公开(公告)日:2000-01-11

    申请号:US885353

    申请日:1997-06-30

    摘要: A plasma processing system for plasma processing of substrates such as semiconductor wafers. The system includes a plasma processing chamber, a substrate support for supporting a substrate within the processing chamber, a dielectric member having an interior surface facing the substrate support, the dielectric member forming a wall of the processing chamber, a gas supply comprising one or more injector tubes extending rectilinearly in the plasma processing chamber and having one or more orifices in a sidewall for supplying gas into the chamber, and an RF energy source such as a planar coil which inductively couples RF energy through the dielectric member and into the chamber to energize the process gas into a plasma state. The gas is supplied through orifices located outside of regions at the distal tip of the injector tubes where electric field lines are concentrated. The arrangement minimizes clogging of the orifices since the orifices are located away from areas where most build-up of process byproducts occur on the injector tube.

    摘要翻译: 用于诸如半导体晶片的衬底等离子体处理的等离子体处理系统。 该系统包括等离子体处理室,用于在处理室内支撑衬底的衬底支撑件,具有面向衬底支撑件的内表面的电介质构件,形成处理室壁的电介质构件,包括一个或多个 喷射器管在等离子体处理室中直线延伸并且在侧壁中具有一个或多个孔以将气体供应到室中;以及RF能量源,例如平面线圈,其通过电介质构件将RF能量感应耦合到腔中以激励 工艺气体进入等离子体状态。 气体通过位于喷射器管的远端的区域外侧的孔提供,其中电场线集中。 该装置使得孔口的堵塞最小化,因为孔口远离喷射器管上发生过程副产物的最多的区域。

    Variable high temperature chuck for high density plasma chemical vapor
deposition
    5.
    发明授权
    Variable high temperature chuck for high density plasma chemical vapor deposition 失效
    用于高密度等离子体化学气相沉积的可变高温卡盘

    公开(公告)号:US5835334A

    公开(公告)日:1998-11-10

    申请号:US724005

    申请日:1996-09-30

    CPC分类号: H01L21/6833 Y10T279/23

    摘要: An electrostatic chuck comprises an electrode cap with a dielectric layer for attracting and holding the back side of a semiconductor wafer positioned on the top surface of the dielectric layer, and a lower electrode. The electrostatic chuck is heated by resistive heating elements attached to or embedded within the chuck. The electrostatic chuck is cooled by circulating liquid coolant through the body of the chuck. Coolant gas is provided at the back side of the semiconductor wafer to improve thermal transfer. A feedback control mechanism maintains the chuck, and consequently the wafer, at a predetermined temperature by actively controlling both the heating and the cooling functions.

    摘要翻译: 静电卡盘包括具有用于吸引并保持位于电介质层的顶表面上的半导体晶片的背面的电介质层的电极帽和下电极。 静电卡盘被附着在卡盘内或嵌入卡盘内的电阻加热元件加热。 通过将液体冷却剂循环通过卡盘的主体来冷却静电卡盘。 冷却剂气体设置在半导体晶片的背面,以改善热转印。 反馈控制机构通过主动地控制加热和冷却功能来将卡盘以及因此的晶片维持在预定温度。

    Vehicle ignition interlock systems that detect the presence of alcohol within vehicles
    7.
    发明申请
    Vehicle ignition interlock systems that detect the presence of alcohol within vehicles 有权
    车辆点火互锁系统,检测车内酒精的存在

    公开(公告)号:US20060238362A1

    公开(公告)日:2006-10-26

    申请号:US11113777

    申请日:2005-04-25

    IPC分类号: G08B23/00

    摘要: A vehicle ignition interlock system includes a breath analyzer and a controller operably connected to the breath analyzer and to an ignition system of the vehicle. The breath analyzer detects the breath alcohol level of a vehicle operator and is configured to prevent vehicle ignition if a breath alcohol level is greater than or equal to a threshold value. The controller requires the vehicle operator to periodically take breath analyzer “retests” after vehicle ignition in order to allow vehicle operation to continue. The breath analyzer also detects the presence of alcohol within the vehicle, such as alcohol emanating from an open container of alcohol. The controller may override one or more periodic retests if alcohol is not detected within the vehicle over a predetermined period of time. In addition, the controller may increase the frequency of periodic retests of the vehicle operator in response to detecting alcohol within the vehicle.

    摘要翻译: 车辆点火互锁系统包括呼吸分析器和可操作地连接到呼吸分析器和车辆的点火系统的控制器。 呼吸分析仪检测车辆驾驶员的呼吸酒精水平,并且被配置为如果呼吸酒精水平大于或等于阈值则防止车辆点燃。 控制器要求车辆操作人员在车辆点火后定期进行呼吸分析仪“重新测试”,以使车辆操作能够继续。 呼吸分析仪还检测车内酒精的存在,例如从开放的酒精容器中发出的酒精。 如果在预定时间段内没有在车辆内检测到酒精,则控制器可以覆盖一个或多个周期性重新测试。 此外,控制器可以响应于检测车辆内的酒精而增加车辆操作者的周期性重新测试的频率。

    Method for high density plasma chemical vapor deposition of dielectric films
    10.
    发明授权
    Method for high density plasma chemical vapor deposition of dielectric films 有权
    介电膜高密度等离子体化学气相沉积方法

    公开(公告)号:US06270862B1

    公开(公告)日:2001-08-07

    申请号:US09359639

    申请日:1999-07-26

    IPC分类号: H05H124

    摘要: A plasma processing system for processes such as chemical vapor deposition includes a plasma processing chamber, a substrate holder for supporting a substrate within the processing chamber, a dielectric member having an interior surface facing the substrate holder, the dielectric member forming a wall of the processing chamber a gas supply for supplying gas to the chamber, directed towards the substrate, and an RF energy source such as a planar coil which inductively couples RF energy through the dielectric member and into the chamber to energize the process gas into a plasma state. The gas supply may comprise a primary gas ring and a secondary gas ring for supplying gases or gas mixtures into the chamber. The gas supply may further include injectors attached to the primary gas ring which inject gas into the chamber, directed toward the substrate. The plasma processing system may also include a cooling mechanism for cooling the primary gas ring during processing.

    摘要翻译: 用于诸如化学气相沉积的工艺的等离子体处理系统包括等离子体处理室,用于在处理室内支撑衬底的衬底保持器,具有面向衬底保持器的内表面的电介质构件,形成处理壁的电介质构件 将用于向腔室供应气体的气体供给,朝向衬底,以及诸如平面线圈的RF能量源,其将RF能量感应耦合通过电介质构件并进入腔室,以将处理气体激励成等离子体状态。 气体供应可以包括用于将气体或气体混合物供应到室中的初级气体环和次级气体环。 气体供应还可以包括连接到主气环的喷射器,其将气体注入到腔室中,指向基底。 等离子体处理系统还可以包括用于在处理期间冷却主气环的冷却机构。