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    Relax gas discharge laser lithography light source
    1.
    发明授权
    Relax gas discharge laser lithography light source 有权
    放气放电激光光刻光源

    公开(公告)号：US07088758B2

    公开(公告)日：2006-08-08

    申请号：US10956784

    申请日：2004-10-01

    申请人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Thomas A. Yager ,  Alexander I. Ershov ,  Robert J. Rafac ,  German E. Rylov

    发明人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Thomas A. Yager ,  Alexander I. Ershov ,  Robert J. Rafac ,  German E. Rylov

    IPC分类号： H01S3/22

    CPC分类号： G01J1/429 ,  B23K26/0622 ,  B23K2101/40 ,  G01J9/02 ,  G02B26/002 ,  G02B26/0875 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/1055 ,  H01S3/225

    摘要： An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.

    摘要翻译： 公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择 用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在色散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置 脉冲光束在可变折射光学元件上。 可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。 脉冲参数测量和脉冲调制控制的其它方面包括响应来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

    High resolution etalon-grating spectrometer
    7.
    发明授权
    High resolution etalon-grating spectrometer 有权

    公开(公告)号：US06538737B2

    公开(公告)日：2003-03-25

    申请号：US10003513

    申请日：2001-10-31

    申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Daniel J. W. Brown

    发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Daniel J. W. Brown

    IPC分类号： G01J314

    CPC分类号： G01J3/12 ,  G01J1/4257 ,  G01J3/22 ,  G01J3/26 ,  G01J9/02

    摘要： A high resolution etalon-grating spectrometer. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The etalon and the grating are placed in a leak-fight enclosure filled with a gas, such as nitrogen or helium. The wavelength scanning of the spectrometer is done by changing the gas pressure in the enclosure during the scan.

    High resolution spectral measurement device
    9.
    发明授权
    High resolution spectral measurement device 有权
    高分辨率光谱测量装置

    公开(公告)号：US06713770B2

    公开(公告)日：2004-03-30

    申请号：US10098975

    申请日：2002-03-15

    申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith ,  Daniel J. W. Brown

    发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith ,  Daniel J. W. Brown

    IPC分类号： G01J314

    CPC分类号： G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/12 ,  G01J3/1804 ,  G01J3/22 ,  G01J9/02

    摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.

    摘要翻译： 高分辨率光谱测量装置。 优选的实施例在紫外线范围内呈现非常窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。 通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长，可以非常精确地测量激光束的带宽。 在第二实施例中，第二狭缝和光检测器由光电二极管阵列替代，并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。 或者，激光波长可以固定在光栅光谱仪的光谱范围附近，可以扫描标准具。