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    Method and apparatus for uniform direct radiant heating in a rapid thermal processing reactor
    1.
    发明授权
    Method and apparatus for uniform direct radiant heating in a rapid thermal processing reactor 失效
    快速热处理反应器中均匀直接辐射加热的方法和装置

    公开(公告)号：US06391804B1

    公开(公告)日：2002-05-21

    申请号：US09590824

    申请日：2000-06-09

    申请人： Robert W. Grant ,  Benjamin J. Petrone ,  Ronald F. Klopp ,  Theodore E. Farley ,  Paul D. Mumbauer

    发明人： Robert W. Grant ,  Benjamin J. Petrone ,  Ronald F. Klopp ,  Theodore E. Farley ,  Paul D. Mumbauer

    IPC分类号： H01L21324

    CPC分类号： H01L21/67115 ,  H01L21/67109

    摘要： Method and apparatus for uniform direct radiant heating in a rapid thermal processing reactor where uniformity of temperature across the width and breadth of a semiconductor wafer is achieved by placement of a dome-shaped thermal insert in close proximity to a semiconductor wafer in process. Thermal energy is absorbed by the thermal insert from the semiconductor wafer at a high rate where the spacing between the thermal insert and semiconductor wafer is at a minimum and at a gradually reduced rate where the spacing between the thermal insert and semiconductor wafer is gradually increased. A guard ring is also incorporated to negate bottom side reflective thermal energy exposure.

    摘要翻译： 在快速热处理反应器中用于均匀直接辐射加热的方法和装置，其中半导体晶片的宽度和宽度上的温度均匀度通过将半圆形热插入件放置在非常接近半导体晶片的过程中来实现。 热能被热插入物从半导体晶片以高速率吸收，其中热插入物和半导体晶片之间的间隔处于最小并且逐渐降低的速率，其中热插入物和半导体晶片之间的间隔逐渐增加。 还结合了保护环以抵消底部反射热能暴露。

    Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical-systems
    2.
    发明授权
    Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical-systems 有权
    用于生产微电子机械系统的基板的等温批处理的系统和方法

    公开(公告)号：US07771563B2

    公开(公告)日：2010-08-10

    申请号：US10991554

    申请日：2004-11-18

    申请人： Robert W. Grant ,  Benjamin J. Petrone ,  Paul D. Mumbauer

    发明人： Robert W. Grant ,  Benjamin J. Petrone ,  Paul D. Mumbauer

    IPC分类号： H01L21/306 ,  C03C25/68

    CPC分类号： H01L21/6719 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67303 ,  H01L21/67306 ,  H01L21/6732 ,  H01L21/67323 ,  H01L21/67748 ,  H01L21/67757 ,  H01L21/67781

    摘要： A system and method for processing substrates that achieves isothermal and uniform fluid flow processing conditions for a plurality of substrates. In one aspect, the invention is a system and method that utilizes matching the emissivity value of the surfaces of a process chamber that oppose exposed surfaces of the substrates with the emissivity value of the exposed surfaces to achieve isothermal conditions throughout a substrate stack. In another aspect, the invention is system and method of processing substrates in a process chamber that exhibits excellent fluid flow uniformity by eliminating cavities or geometrical irregularities in the process chamber profile due to substrate loading openings. In yet anther aspect, the invention is a system and method of processing substrates wherein the process chamber comprises a liner and a shell, the liner constructed of a highly thermally conductive material, such as carbon, and the shell is constructed of a non-porous material, such as stainless steel.

    摘要翻译： 一种用于处理实现多个基板的等温且均匀的流体流动处理条件的基板的系统和方法。 在一个方面，本发明是一种系统和方法，利用将处理室的与基板的暴露表面相对的表面的发射率与暴露表面的发射率值相匹配来实现整个衬底叠层的等温条件。 在另一方面，本发明是在处理室中处理衬底的系统和方法，其通过消除由于衬底加载开口而导致的处理室轮廓中的空腔或几何不规则性而显示出优异的流体流动均匀性。 在另一方面，本发明是一种处理衬底的系统和方法，其中处理室包括衬套和壳体，衬套由高导热性材料（例如碳）构成，壳体由无孔 材质，如不锈钢。

    High frequency sonic substrate processing module
    4.
    发明授权
    High frequency sonic substrate processing module 失效
    高频声波底物处理模块

    公开(公告)号：US5017236A

    公开(公告)日：1991-05-21

    申请号：US396116

    申请日：1989-08-21

    申请人： Sherman U. Moxness ,  Robert W. Grant

    发明人： Sherman U. Moxness ,  Robert W. Grant

    IPC分类号： B08B3/12 ,  H01L21/00

    CPC分类号： H01L21/67023 ,  B08B3/12 ,  Y10S134/902

    摘要： A single substrate high frequency sonic processing module uses a substrate chamber dimensionally sized to the substrate for immersing the substrate in processing solution. Sonic wave permeable membranes form two ends of the substrate chamber along a sonic wave path therethrough. A sonic wave generated by a transducer external to the substrate chamber, travels through sonic wave conducting liquid in contact with the first membrane, external to the substrate chamber. The liquid is shaped by a sonic wave guide of continuously diminishing cross sectional area along the sonic wave path therethrough, thus intensifying and concentrating the sonic wave entering the substrate chamber. The sonic wave passes through the second membrane to a sonic absorbing and dissipating ante chamber. A method for sonic processing of substrates is disclosed. The individual sonic processing modules are combined into a single system for simultaneously processing plural substrates. The minimal sized substrate chamber provides effective processing with minimal processing solution, minimizing cost and disposal. The shaped wave guide concentrates and intensifies the sonic wave guide to provide enhanced processing.

    摘要翻译： 单个基板高频声波处理模块使用尺寸适合于基板的基板室，将基板浸入处理溶液中。 声波透过膜沿着声波通道从基底腔的两端形成。 由衬底室外部的换能器产生的声波通过与衬底室外部的第一膜接触的声波导电液体传播。 液体由声波引导器形成，声波导体沿着声波通道的横截面积不断减小，从而增强和集中进入基底腔室的声波。 声波通过第二个膜通过声波吸收和消散的前室。 公开了一种用于基底的声处理的方法。 单独的声处理模块被组合成单个系统以同时处理多个基板。 最小尺寸的基板腔室提供有效的处理，最少的处理解决方案，最大限度地降低成本和 成形波导集中和强化声波引导，以提供增强的处理。

    Methods for producing textured electrode based energy storage device
    6.
    发明授权
    Methods for producing textured electrode based energy storage device 失效
    用于生产基于感应电极的储能装置的方法

    公开(公告)号：US08529746B2

    公开(公告)日：2013-09-10

    申请号：US13018586

    申请日：2011-02-01

    申请人： Robert W. Grant ,  Matthew Sweetland

    发明人： Robert W. Grant ,  Matthew Sweetland

    IPC分类号： H01M4/139 ,  C25D9/02

    CPC分类号： H01M4/366 ,  C09D5/24 ,  C09D179/02 ,  C25D3/42 ,  C25D5/40 ,  C25D5/44 ,  C25D9/02 ,  C25D11/00 ,  C25D13/12 ,  C25F3/04 ,  H01G9/0029 ,  H01G9/042 ,  H01G11/24 ,  H01G11/48 ,  H01G11/52 ,  H01G11/86 ,  H01M2/1653 ,  H01M4/0452 ,  H01M4/0461 ,  H01M4/0466 ,  H01M4/134 ,  H01M4/137 ,  H01M4/1395 ,  H01M4/1399 ,  H01M10/052 ,  H01M10/0525 ,  Y02E60/13

    摘要： This method enables the use of nanowire or nano-textured forms of Polyaniline and other conductive polymers in energy storage components. The delicate nature of these very high surface area materials are preserved during the continuous electrochemical synthesis, drying, solvent application and physical assembly. The invention also relates to a negative electrode that is comprised of etched, lithiated aluminum that is safer and lighter weight than conventional carbon based lithium-ion negative electrodes. The invention provides for improved methods for making negative and positive electrodes and for energy storage devices containing them. The invention provides sufficient stability in organic solvent and electrolyte solutions, where the prior art processes commonly fail. The invention further provides stability during repetitive charge and discharge. The invention also provides for novel microstructure protecting support membranes to be used in an energy storage device.

    摘要翻译： 该方法能够在能量存储组件中使用纳米线或纳米纹理形式的聚苯胺和其它导电聚合物。 在连续电化学合成，干燥，溶剂应用和物理组装过程中，这些非常高的表面积材料的微妙性质得以保留。 本发明还涉及一种负极，其由蚀刻的锂化铝组成，其比常规碳基锂离子负极更安全和更轻。 本发明提供了用于制造负极和正极以及包含它们的储能装置的改进方法。 本发明在有机溶剂和电解质溶液中提供足够的稳定性，其中现有技术的方法通常失效。 本发明进一步提供重复充电和放电期间的稳定性。 本发明还提供了用于能量存储装置中的用于新颖的微结构保护支撑膜。

    Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size
    8.
    发明授权
    Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size 失效
    具有减少雾粒度的薄膜雾化液体沉积的方法和装置

    公开(公告)号：US06258733B1

    公开(公告)日：2001-07-10

    申请号：US09620751

    申请日：2000-07-21

    申请人： Narayan Solayappan ,  Robert W. Grant ,  Larry D. McMillan ,  Carlos A. Paz de Araujo

    发明人： Narayan Solayappan ,  Robert W. Grant ,  Larry D. McMillan ,  Carlos A. Paz de Araujo

    IPC分类号： A01L2131

    CPC分类号： C23C18/12 ,  B05D1/007 ,  B05D1/04 ,  C23C16/40 ,  C23C16/448 ,  C23C16/45561 ,  C23C16/45565 ,  C23C18/1216 ,  H01L21/31691 ,  H01L28/55

    摘要： A mass flow controller controls the delivery of a precursor to a mist generator. The precursor is misted utilizing a venturi in which a combination of oxygen and nitrogen gas is charged by a corona wire and passes over a precursor-filled throat. The mist is refined using a particle inertial separator, electrically filtered so that it comprises predominantly negative ions, passes into a velocity reduction chamber, and then flows into a deposition chamber through inlet ports in an inlet plate that is both a partition between the chambers and a grounded electrode. The inlet plate is located above and substantially parallel to the plane of the substrate on which the mist is to be deposited. The substrate is positively charged to a voltage of about 5000 volts. There are 440 inlet ports per square inch in an 39 square inch inlet port area of the inlet plate directly above the substrate. The inlet port area is approximately equal to the substrate area. An exhaust port defines a channel about the periphery of an exhaust plane parallel to and below the substrate plane.

    摘要翻译： 质量流量控制器控制前体到雾发生器的输送。 使用文丘里管雾化前体，其中氧气和氮气的组合由电晕丝充电并且通过前体填充的喉部。 使用粒子惯性分离器精制雾，使其主要包含负离子，进入减速室，然后通过入口板中的入口板流入沉积室，该入口板是室和室之间的隔板 接地电极。 入口板位于要沉积雾的基底的平面上方并且基本上平行。 基板被充电至约5000伏特的电压。 在基板正上方的入口板的39平方英寸进口端口区域中每平方英寸有440个入口端口。 入口面积大致等于衬底面积。 排气口围绕平行于和低于衬底平面的排气平面的周边限定通道。

    Bung connection
    9.
    发明授权
    Bung connection 失效
    ung连接

    公开(公告)号：US4699298A

    公开(公告)日：1987-10-13

    申请号：US815025

    申请日：1985-12-30

    申请人： Robert W. Grant ,  Joshua P. Waldman

    发明人： Robert W. Grant ,  Joshua P. Waldman

    IPC分类号： B67D1/08 ,  B67D7/02 ,  B67D7/34 ,  B65D83/00

    CPC分类号： B67D7/0294 ,  B67D1/0829 ,  B67D7/344 ,  Y10S285/914

    摘要： A bung connection for a rigid container has a bung body which threads into the bung opening, and has a base wall with two or more access openings which are connected to tubes extending to the flowable material in the container. A tube mounting is removably inserted into the bung body and has flow ports which connect with the access ports in the base wall. Flow tubes connect to the tube mounting. The tube mounting and bung body have a coded pattern of interfitting lugs and recesses which prevent full assembly of the tube mounting and bung body if the coding is wrong. A clamp ring secures the tube mounting in the bung body. A shipping plug and liner replace the tube mounting in the bung body for shipping the container to be refilled and then returned for use again.

    摘要翻译： 用于刚性容器的接头连接件具有螺纹连接到入口开口中的栓体，并且具有底壁，其具有两个或更多个进入开口，所述入口开口连接到延伸到容器中的可流动材料的管。 管安装件可拆卸地插入到主体中并且具有与底壁中的进入端口连接的流动端口。 流管连接到管安装。 管安装和栓体具有相互配合的凸耳和凹槽的编码图案，如果编码错误，则防止管安装和塞体的完全组装。 夹紧环将管安装在栓体中。 运输插头和衬管更换管体中的管安装件，用于运输要重新填充的容器，然后再次返回使用。

    Batch Process for Coating Nanoscale Features and Devices Manufactured From Same
    10.
    发明申请
    Batch Process for Coating Nanoscale Features and Devices Manufactured From Same 审中-公开
    用于涂覆纳米尺度特征的批次工艺和从其制造的器件

    公开(公告)号：US20090186194A1

    公开(公告)日：2009-07-23

    申请号：US12110063

    申请日：2008-04-25

    申请人： Robert W. Grant

    发明人： Robert W. Grant

    IPC分类号： B32B3/30 ,  B32B15/04 ,  C23C18/00 ,  B05D3/00 ,  C23C16/54

    CPC分类号： C23C18/1295 ,  B81C1/0038 ,  C23C18/08 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/1245 ,  C23C18/1275 ,  C23C18/1279 ,  C23C18/1291 ,  H01L21/288 ,  H01L21/76843 ,  H01L21/76898 ,  H01L28/91 ,  Y10T428/24521 ,  Y10T428/24545

    摘要： A process for coating of at least one conformal thin film simultaneously onto the surface of a plurality or batch of substrates having nanoscaled features is provided. The process involves exposing a batch of substrates to a supercritical fluid mixture in a controlled environment, and subsequently heating and cooling the substrate, in the presence of the supercritical fluid mixture, beyond a threshold temperature at which film growth can be enabled to initiate conformal thin film deposition on the surface of the substrate and within the nanoscaled features. The supercritical fluid mixture may be generated in a manner so as to maintain a necessary concentration level of the precursor material to permit sufficient thin film growth within the controlled environment. The supercritical fluid mixture may also be introduced into the controlled environment in a manner which minimizes precipitation or loss of solubility of the precursor material in the mixture. A system of thin film deposition of a batch of substrates is also provided.

    摘要翻译： 提供了将至少一个共形薄膜同时涂覆到具有纳米尺度特征的多个或一批基底的表面上的方法。 该方法包括在受控环境中将一批衬底暴露于超临界流体混合物，并且随后在超临界流体混合物的存在下加热和冷却衬底，超过阈值温度，在该阈值温度下，可以使膜生长以启动保形薄 薄膜沉积在基板的表面上并在纳米尺度的特征内。 超临界流体混合物可以以保持前体材料的必要浓度水平以在受控环境内允许足够的薄膜生长的方式产生。 超临界流体混合物也可以以最小化混合物中前体材料的溶解度的沉淀或损失的方式引入受控环境中。 还提供了一批基板的薄膜沉积系统。