Method of fabricating vertical light emitting diode
    2.
    发明授权
    Method of fabricating vertical light emitting diode 有权
    制造垂直发光二极管的方法

    公开(公告)号:US09202968B2

    公开(公告)日:2015-12-01

    申请号:US14083856

    申请日:2013-11-19

    CPC classification number: H01L33/0079

    Abstract: Provided is a method of fabricating a vertical light emitting diode (LED). Initially, a semiconductor structure layer including an active layer is formed on a front surface of a growth substrate. A conductive support substrate is formed on the semiconductor structure layer. A rear surface of the growth substrate is abraded to reduce the thickness of the growth substrate. The rear surface of the growth substrate whose thickness is reduced due to the abrasion is dry etched to remove the growth substrate.

    Abstract translation: 提供一种制造垂直发光二极管(LED)的方法。 首先,在生长衬底的前表面上形成包括有源层的半导体结构层。 在半导体结构层上形成导电支撑基板。 研磨生长衬底的后表面以减小生长衬底的厚度。 干燥蚀刻由于磨损而使厚度减小的生长衬底的后表面以除去生长衬底。

Patent Agency Ranking