Shielding Unit and Plating Apparatus Including the Same
    2.
    发明申请
    Shielding Unit and Plating Apparatus Including the Same 审中-公开
    屏蔽单元和包括其的电镀设备

    公开(公告)号:US20170051424A1

    公开(公告)日:2017-02-23

    申请号:US15234687

    申请日:2016-08-11

    CPC classification number: C25D21/12 C25D17/008

    Abstract: A shielding unit for a plating apparatus may include a shielding plate, a controlling plate and a rotary actuator. The shielding plate may have a plurality of holes configured to permit a passage of an electrolyte therethrough. The controlling plate may make contact with the shielding plate. The controlling plate may have a plurality of controlling holes for controlling an opening ratio of the plurality of holes of the shielding plate. The rotary actuator may rotate the controlling plate to control the opening ratio of the plurality of holes shielding plate.

    Abstract translation: 电镀装置的屏蔽单元可以包括屏蔽板,控制板和旋转致动器。 屏蔽板可以具有多个构造成允许电解液通过其中的孔。 控制板可以与屏蔽板接触。 控制板可以具有用于控制屏蔽板的多个孔的开口率的多个控制孔。 旋转致动器可旋转控制板以控制多个孔屏蔽板的开口率。

    METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES
    6.
    发明申请
    METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES 审中-公开
    制造半导体器件的方法

    公开(公告)号:US20160163590A1

    公开(公告)日:2016-06-09

    申请号:US14956869

    申请日:2015-12-02

    Abstract: Disclosed is a method of manufacturing a semiconductor device. A preliminary wafer-carrier assembly is formed in such a way that a wafer structure having a plurality of via structures is adhered to a light-penetrating carrier by a photodegradable adhesive. A wafer-carrier assembly having an optical shielding layer for inhibiting or preventing a light penetration is formed such that the wafer structure, the carrier and the adhesive are covered with the optical shielding layer except for the backside of the wafer structure through which the via structures are exposed. An interconnector is formed on the backside of the wafer structure such that the via structures make contact with the interconnector, and the wafer structure and the carrier are separated from each other by irradiating a light to the wafer-carrier assembly. Accordingly, the adhesive is inhibited or prevented from being dissolved during a plasma process on the wafer-carrier assembly.

    Abstract translation: 公开了半导体器件的制造方法。 初步的晶片载体组件形成为具有多个通路结构的晶片结构通过可光降解的粘合剂粘附到透光载体上。 形成具有用于抑制或防止光穿透的光学屏蔽层的晶片载体组件,使得晶片结构,载体和粘合剂被除了晶片结构的背面之外的光学屏蔽层覆盖,通过该晶片结构, 被暴露。 在晶片结构的背面形成互连器,使得通孔结构与互连器接触,并且通过向晶片载体组件照射光而使晶片结构和载体彼此分离。 因此,在晶片载体组件的等离子体处理中,粘合剂被抑制或防止溶解。

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