Image sensor and image sensing device

    公开(公告)号:US11984467B2

    公开(公告)日:2024-05-14

    申请号:US17368112

    申请日:2021-07-06

    Abstract: An image sensor includes an upper chip having a pixel array connected to a first connecting structure, and a lower chip below the upper chip and having a second connecting structure connected to the first connecting structure and having first and second stacked metal layers with a same thickness, a third metal layer on the second metal layer and thicker than the second metal layer, a fourth metal layer on the third metal layer and thicker than the third metal layer, first through third insulating layers alternating with the first through fourth metal layers, a first memory device with a first MTJ element in at least one of the first and second insulating layers, and a second memory device with a second MTJ element different from the first MTJ element, the second MTJ element being in at least one of the first through third insulating layers.

    Apparatus and method for exchanging probe

    公开(公告)号:US10222414B2

    公开(公告)日:2019-03-05

    申请号:US15286626

    申请日:2016-10-06

    Abstract: An apparatus for exchanging a probe includes a stacker configured to receive a probe and to align the probe, a probe connector connected to the probe, and a laser alignment unit including a light emitter and a light receiver. The light emitter is configured to emit a laser beam to the probe, and the light receiver is configured to detect the laser beam reflected by the probe. The laser alignment unit is configured to detect when the probe is properly aligned on the probe connector using the light receiver, and the laser alignment unit is configured to stop moving the stacker when it is detected that the probe is properly aligned.

    PROCESS MANAGEMENT SYSTEMS USING COMPARISON OF STATISTICAL DATA TO PROCESS PARAMETERS AND PROCESS MANAGEMENT DEVICES
    6.
    发明申请
    PROCESS MANAGEMENT SYSTEMS USING COMPARISON OF STATISTICAL DATA TO PROCESS PARAMETERS AND PROCESS MANAGEMENT DEVICES 审中-公开
    使用统计数据比较处理参数和过程管理设备的过程管理系统

    公开(公告)号:US20150248127A1

    公开(公告)日:2015-09-03

    申请号:US14635193

    申请日:2015-03-02

    Abstract: A process management system can include a processing device that can be configured to perform a semiconductor process on a plurality of wafers, the processing device controlled by a process parameter. A control device can be configured to acquire statistical data relating to the process parameter and can be configured to select a reference wafer from the plurality of wafers. The control device can be configured to compare a respective process parameter used for the reference wafer with the statistical data and can be configured to set a reference condition for the process parameter.

    Abstract translation: 过程管理系统可以包括处理设备,其可被配置为在多个晶片上执行半导体处理,该处理设备由过程参数控制。 控制装置可以被配置为获取与过程参数相关的统计数据,并且可以被配置为从多个晶片中选择参考晶片。 控制装置可以被配置为将用于参考晶片的相应过程参数与统计数据进行比较,并且可以被配置为设置用于过程参数的参考条件。

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