Double pass double etalon spectrometer
    1.
    发明授权
    Double pass double etalon spectrometer 有权
    双通双标准光谱仪

    公开(公告)号:US06359693B2

    公开(公告)日:2002-03-19

    申请号:US09737181

    申请日:2000-12-14

    IPC分类号: G01B902

    CPC分类号: G01J3/26

    摘要: A first double pass etalon based spectrometer. In a preferred embodiment a second etalon matched to the first double pass etalon is used to produce extremely precise fringe data. Spectral components of a diffused beam are angularly separated as they are transmitted through an etalon. A retroreflector reflects the transmitted components back through the etalon. Twice transmitted spectral components are directed through a second etalon and focused onto a light detector which in a preferred embodiment is a photo diode array. The spectrometer is very compact producing the extremely precise fringe data permitting bandwidth measurements with precision needed for microlithography for both &Dgr;&lgr;FWHM and &Dgr;&lgr;95%.

    摘要翻译: 第一个基于双通道标准具的光谱仪。 在优选实施例中,与第一双通道标准具匹配的第二标准具用于产生非常精确的边缘数据。 扩散光束的光谱分量在透射通过标准具时被角度地分离。 后向反射镜通过标准具反射传输的组件。 两次透射的光谱分量被引导通过第二标准具并聚焦到光检测器上,在一个优选实施例中是光电二极管阵列。 光谱仪非常紧凑,产生极其精确的条纹数据,允许对DELTAlambdFWHM和DELTAlambd 95%的微光刻所需的精度进行带宽测量。

    Narrow band laser with fine wavelength control
    2.
    发明授权
    Narrow band laser with fine wavelength control 有权
    窄带激光器,具有良好的波长控制

    公开(公告)号:US06192064B1

    公开(公告)日:2001-02-20

    申请号:US09470724

    申请日:1999-12-22

    IPC分类号: H01S308

    摘要: A smart laser having automatic computer control of pulse energy, wavelength and bandwidth using feedback signals from a wavemeter. Pulse energy is controlled by controlling discharge voltage. Wavelength is controlled by very fine and rapid positioning of an RMAX mirror in a line narrowing module. Bandwidth is controller by adjusting the curvature of a grating in the line narrowing module. Preferred embodiments include automatic feedback control of horizontal and vertical beam profile by automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the RMAX tilt. Other preferred embodiments include automatic adjustment of the horizontal position of the laser chamber within the resonance cavity. In preferred embodiments, feedback signals from a wavelength monitor are used to position the RMAX mirror. In other preferred embodiments a separate laser beam reflected off the RMAX mirror on to a photodiode array is used to position the mirror.

    摘要翻译: 智能激光器具有使用来自波形计的反馈信号自动计算脉冲能量,波长和带宽的计算机控制。 通过控制放电电压来控制脉冲能量。 通过在线窄模块中的RMAX镜子的非常精细和快速的定位来控制波长。 带宽是通过调整线窄化模块中的光栅的曲率来控制的。 优选实施例包括通过自动调节光束扩展器棱镜所在的棱镜板和自动调整RMAX倾斜来自动反馈水平和垂直光束轮廓。 其它优选实施例包括在谐振腔内自动调整激光室的水平位置。 在优选实施例中,使用来自波长监视器的反馈信号来定位RMAX镜。 在其它优选实施例中,使用从RMAX镜反射到光电二极管阵列上的分离的激光束来定位反射镜。

    High resolution spectral measurement device
    4.
    发明授权
    High resolution spectral measurement device 有权
    高分辨率光谱测量装置

    公开(公告)号:US06713770B2

    公开(公告)日:2004-03-30

    申请号:US10098975

    申请日:2002-03-15

    IPC分类号: G01J314

    摘要: A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.

    摘要翻译: 高分辨率光谱测量装置。 优选的实施例在紫外线范围内呈现非常窄的狭缝功能,并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器,并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直,并且准直光照射位于大约Littrow配置中的光栅,其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时,定义狭缝功能,其极窄,例如约0.034μm(FWHM)和约0.091μm(95%积分)。 通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长,可以非常精确地测量激光束的带宽。 在第二实施例中,第二狭缝和光检测器由光电二极管阵列替代,并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。 或者,激光波长可以固定在光栅光谱仪的光谱范围附近,可以扫描标准具。

    High resolution etalon-grating monochromator
    6.
    发明授权
    High resolution etalon-grating monochromator 有权
    高分辨率标准光栅单色仪

    公开(公告)号:US06480275B2

    公开(公告)日:2002-11-12

    申请号:US09772293

    申请日:2001-01-29

    IPC分类号: G01J318

    摘要: A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.

    摘要翻译: 高分辨率标准光栅单色仪。 优选的实施例在紫外范围内呈现非常狭窄的狭缝功能,并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器,并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直,并且准直光照射位于大约Littrow配置中的光栅,其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时,定义狭缝功能,其极窄,例如约0.034μm(FWHM)和约0.091μm(95%积分)。 激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。

    Line narrowed laser with bidirection beam expansion
    9.
    发明授权
    Line narrowed laser with bidirection beam expansion 有权
    线变窄的激光器具有双向光束扩展

    公开(公告)号:US06738410B2

    公开(公告)日:2004-05-18

    申请号:US09738042

    申请日:2000-12-15

    IPC分类号: H01S308

    摘要: A grating based line narrowing unit with bi-directional beam expansion for line narrowing lasers. In a preferred embodiment a beam from the chamber of the laser is expanded in the horizontal direction with a three-prism beam expander and is expanded in the vertical direction with a single prism. A narrow band of wavelengths in the expanded beam is reflected from a grating in a Littrow configuration back via the two beam expanders into the laser chamber for amplification.

    摘要翻译: 一种基于光栅的线窄化单元,具有用于线窄激光器的双向光束扩展。 在优选实施例中,来自激光室的光束在水平方向上用三棱镜光束扩展器扩展,并且在垂直方向上用单个棱镜扩展。 扩展光束中的窄带波长从Littrow配置中的光栅经由两个光束扩展器反射到激光室中以进行放大。