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公开(公告)号:US06359693B2
公开(公告)日:2002-03-19
申请号:US09737181
申请日:2000-12-14
IPC分类号: G01B902
CPC分类号: G01J3/26
摘要: A first double pass etalon based spectrometer. In a preferred embodiment a second etalon matched to the first double pass etalon is used to produce extremely precise fringe data. Spectral components of a diffused beam are angularly separated as they are transmitted through an etalon. A retroreflector reflects the transmitted components back through the etalon. Twice transmitted spectral components are directed through a second etalon and focused onto a light detector which in a preferred embodiment is a photo diode array. The spectrometer is very compact producing the extremely precise fringe data permitting bandwidth measurements with precision needed for microlithography for both &Dgr;&lgr;FWHM and &Dgr;&lgr;95%.
摘要翻译: 第一个基于双通道标准具的光谱仪。 在优选实施例中,与第一双通道标准具匹配的第二标准具用于产生非常精确的边缘数据。 扩散光束的光谱分量在透射通过标准具时被角度地分离。 后向反射镜通过标准具反射传输的组件。 两次透射的光谱分量被引导通过第二标准具并聚焦到光检测器上,在一个优选实施例中是光电二极管阵列。 光谱仪非常紧凑,产生极其精确的条纹数据,允许对DELTAlambdFWHM和DELTAlambd 95%的微光刻所需的精度进行带宽测量。
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公开(公告)号:US06192064B1
公开(公告)日:2001-02-20
申请号:US09470724
申请日:1999-12-22
申请人: John M. Algots , Christopher A. Marchi , Frederick G. Erie , Jesse D. Buck , Alexander I. Ershov , Palash P. Das , Igor V. Fomenkov
发明人: John M. Algots , Christopher A. Marchi , Frederick G. Erie , Jesse D. Buck , Alexander I. Ershov , Palash P. Das , Igor V. Fomenkov
IPC分类号: H01S308
CPC分类号: G03F7/70025 , G02B5/1828 , G03F7/70483 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/08009 , H01S3/08059 , H01S3/08081 , H01S3/0812 , H01S3/086 , H01S3/10 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/1392 , H01S3/225 , H01S3/2256
摘要: A smart laser having automatic computer control of pulse energy, wavelength and bandwidth using feedback signals from a wavemeter. Pulse energy is controlled by controlling discharge voltage. Wavelength is controlled by very fine and rapid positioning of an RMAX mirror in a line narrowing module. Bandwidth is controller by adjusting the curvature of a grating in the line narrowing module. Preferred embodiments include automatic feedback control of horizontal and vertical beam profile by automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the RMAX tilt. Other preferred embodiments include automatic adjustment of the horizontal position of the laser chamber within the resonance cavity. In preferred embodiments, feedback signals from a wavelength monitor are used to position the RMAX mirror. In other preferred embodiments a separate laser beam reflected off the RMAX mirror on to a photodiode array is used to position the mirror.
摘要翻译: 智能激光器具有使用来自波形计的反馈信号自动计算脉冲能量,波长和带宽的计算机控制。 通过控制放电电压来控制脉冲能量。 通过在线窄模块中的RMAX镜子的非常精细和快速的定位来控制波长。 带宽是通过调整线窄化模块中的光栅的曲率来控制的。 优选实施例包括通过自动调节光束扩展器棱镜所在的棱镜板和自动调整RMAX倾斜来自动反馈水平和垂直光束轮廓。 其它优选实施例包括在谐振腔内自动调整激光室的水平位置。 在优选实施例中,使用来自波长监视器的反馈信号来定位RMAX镜。 在其它优选实施例中,使用从RMAX镜反射到光电二极管阵列上的分离的激光束来定位反射镜。
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公开(公告)号:US06735236B2
公开(公告)日:2004-05-11
申请号:US09451407
申请日:1999-11-30
申请人: Raymond F. Cybulski , Alexander I. Ershov , Eckehard D. Onkels , Palash P. Das , Danilo K. Richardson , Jesse D. Buck
发明人: Raymond F. Cybulski , Alexander I. Ershov , Eckehard D. Onkels , Palash P. Das , Danilo K. Richardson , Jesse D. Buck
IPC分类号: H01S308
CPC分类号: G03F7/70025 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/0401 , H01S3/08009 , H01S3/08059 , H01S3/0812 , H01S3/086 , H01S3/13 , H01S3/134 , H01S3/1392 , H01S3/225 , H01S3/2256
摘要: A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of hot gas layers present on the face of the grating. In preferred embodiments a stream of gas is directed across the face of the grating. In other embodiments the effect of the hot gas layer is reduced with the use of helium as a purge gas and in other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
摘要翻译: 用于生产高能量激光束的线窄激光器的基于光栅的线窄化装置。 提供了用于最小化存在于光栅表面上的热气层的不利影响的技术。在优选实施例中,气流指向光栅的表面。 在其它实施例中,通过使用氦气作为净化气体来减少热气体层的影响,在其他实施例中,减少吹扫气体压力以减少热气体层的光学效应。
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公开(公告)号:US06713770B2
公开(公告)日:2004-03-30
申请号:US10098975
申请日:2002-03-15
申请人: Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith , Daniel J. W. Brown
发明人: Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith , Daniel J. W. Brown
IPC分类号: G01J314
CPC分类号: G01J3/26 , G01J1/4257 , G01J3/02 , G01J3/0205 , G01J3/12 , G01J3/1804 , G01J3/22 , G01J9/02
摘要: A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.
摘要翻译: 高分辨率光谱测量装置。 优选的实施例在紫外线范围内呈现非常窄的狭缝功能,并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器,并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直,并且准直光照射位于大约Littrow配置中的光栅,其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时,定义狭缝功能,其极窄,例如约0.034μm(FWHM)和约0.091μm(95%积分)。 通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长,可以非常精确地测量激光束的带宽。 在第二实施例中,第二狭缝和光检测器由光电二极管阵列替代,并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。 或者,激光波长可以固定在光栅光谱仪的光谱范围附近,可以扫描标准具。
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公开(公告)号:US06625191B2
公开(公告)日:2003-09-23
申请号:US10012002
申请日:2001-11-30
申请人: David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
发明人: David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
IPC分类号: H01S322
CPC分类号: G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
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公开(公告)号:US06480275B2
公开(公告)日:2002-11-12
申请号:US09772293
申请日:2001-01-29
申请人: Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith
发明人: Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith
IPC分类号: G01J318
CPC分类号: G01J3/12 , G01J1/4257 , G01J3/22 , G01J3/26 , G01J9/02
摘要: A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.
摘要翻译: 高分辨率标准光栅单色仪。 优选的实施例在紫外范围内呈现非常狭窄的狭缝功能,并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器,并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直,并且准直光照射位于大约Littrow配置中的光栅,其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时,定义狭缝功能,其极窄,例如约0.034μm(FWHM)和约0.091μm(95%积分)。 激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。
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公开(公告)号:US07058107B2
公开(公告)日:2006-06-06
申请号:US10804281
申请日:2004-03-18
申请人: David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scott T. Smith , William G. Hulburd
发明人: David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scott T. Smith , William G. Hulburd
IPC分类号: H01S3/22
CPC分类号: H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.
摘要翻译: 一种注射种子模块化气体放电激光系统,其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。 提供两个单独的放电室,其中之一是主振荡器的一部分,其产生在第二放电室中放大的非常窄的带状晶体束。 可以单独控制室,允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 配置为MOPA并被专门设计用作集成电路光刻的光源的F 2 N 2激光系统中的优选实施例。 在优选的MOPA实施例中,每个腔室包括单个切向风扇,其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器配备有用于选择最强的F 2/2谱线的线选择包。
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8.
公开(公告)号:US06985508B2
公开(公告)日:2006-01-10
申请号:US10627215
申请日:2003-07-24
申请人: David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Meyers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
发明人: David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Meyers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
IPC分类号: H01S3/22
CPC分类号: G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
摘要翻译: 一种注射种子模块化气体放电激光系统,其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。 提供两个单独的放电室,其中之一是主振荡器的一部分,其产生在第二放电室中放大的非常窄的带状晶体束。 可以单独控制室,允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。 在优选的MOPA实施例中,每个腔室包括单个切向风扇,其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器配备有具有非常快的调谐镜的线窄化封装,能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长,精度小于0.2μm。
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公开(公告)号:US06738410B2
公开(公告)日:2004-05-18
申请号:US09738042
申请日:2000-12-15
IPC分类号: H01S308
CPC分类号: G03F7/70025 , G03F7/70575 , H01S3/0401 , H01S3/10 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/225
摘要: A grating based line narrowing unit with bi-directional beam expansion for line narrowing lasers. In a preferred embodiment a beam from the chamber of the laser is expanded in the horizontal direction with a three-prism beam expander and is expanded in the vertical direction with a single prism. A narrow band of wavelengths in the expanded beam is reflected from a grating in a Littrow configuration back via the two beam expanders into the laser chamber for amplification.
摘要翻译: 一种基于光栅的线窄化单元,具有用于线窄激光器的双向光束扩展。 在优选实施例中,来自激光室的光束在水平方向上用三棱镜光束扩展器扩展,并且在垂直方向上用单个棱镜扩展。 扩展光束中的窄带波长从Littrow配置中的光栅经由两个光束扩展器反射到激光室中以进行放大。
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公开(公告)号:US06801560B2
公开(公告)日:2004-10-05
申请号:US10056619
申请日:2002-01-23
申请人: David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scott T. Smith , William G. Hulburd
发明人: David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scott T. Smith , William G. Hulburd
IPC分类号: H01S322
CPC分类号: H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.
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