公开(公告)号：US06713770B2

公开(公告)日：2004-03-30

申请号：US10098975

申请日：2002-03-15

申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith ,  Daniel J. W. Brown

发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith ,  Daniel J. W. Brown

IPC分类号： G01J314

CPC分类号： G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/12 ,  G01J3/1804 ,  G01J3/22 ,  G01J9/02

摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.

摘要翻译： 高分辨率光谱测量装置。 优选的实施例在紫外线范围内呈现非常窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。 通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长，可以非常精确地测量激光束的带宽。 在第二实施例中，第二狭缝和光检测器由光电二极管阵列替代，并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。 或者，激光波长可以固定在光栅光谱仪的光谱范围附近，可以扫描标准具。

公开(公告)号：US06801560B2

公开(公告)日：2004-10-05

申请号：US10056619

申请日：2002-01-23

申请人： David S. Knowles ,  Daniel J. W. Brown ,  Richard L. Sandstrom ,  German E. Rylov ,  Eckehard D. Onkels ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd

发明人： David S. Knowles ,  Daniel J. W. Brown ,  Richard L. Sandstrom ,  German E. Rylov ,  Eckehard D. Onkels ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd

IPC分类号： H01S322

CPC分类号： H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.

公开(公告)号：US06625191B2

公开(公告)日：2003-09-23

申请号：US10012002

申请日：2001-11-30

申请人： David S. Knowles ,  Daniel J. W. Brown ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Palash P. Das ,  Stuart L. Anderson ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Eckehard D. Onkels ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd ,  Jeffrey Oicles

发明人： David S. Knowles ,  Daniel J. W. Brown ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Palash P. Das ,  Stuart L. Anderson ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Eckehard D. Onkels ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd ,  Jeffrey Oicles

IPC分类号： H01S322

CPC分类号： G01J1/4257 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

公开(公告)号：US06480275B2

公开(公告)日：2002-11-12

申请号：US09772293

申请日：2001-01-29

申请人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith

发明人： Richard L. Sandstrom ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Scott T. Smith

IPC分类号： G01J318

CPC分类号： G01J3/12 ,  G01J1/4257 ,  G01J3/22 ,  G01J3/26 ,  G01J9/02

摘要： A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.

摘要翻译： 高分辨率标准光栅单色仪。 优选的实施例在紫外范围内呈现非常狭窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。 激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。

公开(公告)号：US07058107B2

公开(公告)日：2006-06-06

申请号：US10804281

申请日：2004-03-18

申请人： David S. Knowles ,  Daniel J. W. Brown ,  Richard L. Sandstrom ,  German E. Rylov ,  Eckehard D. Onkels ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd

发明人： David S. Knowles ,  Daniel J. W. Brown ,  Richard L. Sandstrom ,  German E. Rylov ,  Eckehard D. Onkels ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd

IPC分类号： H01S3/22

CPC分类号： H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.

摘要翻译： 一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。 提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 配置为MOPA并被专门设计用作集成电路光刻的光源的F 2 N 2激光系统中的优选实施例。 在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器配备有用于选择最强的F 2/2谱线的线选择包。

公开(公告)号：US06985508B2

公开(公告)日：2006-01-10

申请号：US10627215

申请日：2003-07-24

申请人： David S. Knowles ,  Daniel J. W. Brown ,  Herve A. Besaucele ,  David W. Meyers ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Palash P. Das ,  Stuart L. Anderson ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Eckehard D. Onkels ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd ,  Jeffrey Oicles

发明人： David S. Knowles ,  Daniel J. W. Brown ,  Herve A. Besaucele ,  David W. Meyers ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Palash P. Das ,  Stuart L. Anderson ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Eckehard D. Onkels ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd ,  Jeffrey Oicles

IPC分类号： H01S3/22

CPC分类号： G01J1/4257 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

摘要翻译： 一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。 提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。 在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器配备有具有非常快的调谐镜的线窄化封装，能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长，精度小于0.2μm。

公开(公告)号：US06738410B2

公开(公告)日：2004-05-18

申请号：US09738042

申请日：2000-12-15

申请人： William N. Partlo ,  Alexander I. Ershov ,  Scott T. Smith

发明人： William N. Partlo ,  Alexander I. Ershov ,  Scott T. Smith

IPC分类号： H01S308

CPC分类号： G03F7/70025 ,  G03F7/70575 ,  H01S3/0401 ,  H01S3/10 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225

摘要： A grating based line narrowing unit with bi-directional beam expansion for line narrowing lasers. In a preferred embodiment a beam from the chamber of the laser is expanded in the horizontal direction with a three-prism beam expander and is expanded in the vertical direction with a single prism. A narrow band of wavelengths in the expanded beam is reflected from a grating in a Littrow configuration back via the two beam expanders into the laser chamber for amplification.

摘要翻译： 一种基于光栅的线窄化单元，具有用于线窄激光器的双向光束扩展。 在优选实施例中，来自激光室的光束在水平方向上用三棱镜光束扩展器扩展，并且在垂直方向上用单个棱镜扩展。 扩展光束中的窄带波长从Littrow配置中的光栅经由两个光束扩展器反射到激光室中以进行放大。

公开(公告)号：US06535531B1

公开(公告)日：2003-03-18

申请号：US10006913

申请日：2001-11-29

申请人： Scott T. Smith ,  Alexander I. Ershov ,  Rajasekhar M. Rao

发明人： Scott T. Smith ,  Alexander I. Ershov ,  Rajasekhar M. Rao

IPC分类号： H01S310

CPC分类号： G03F7/7055 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2258

摘要： A gas discharge laser with a pulse multiplier. In the pulse multiplier, short pulses from the laser are divided into portions and all or all but one of these portions are delayed in delay legs by different time periods and recombined to provide a stretched output pulse having substantially reduced intensity and longer duration as compared to the pulse from the laser. Focusing optics are included in each delay leg to assure that beam size and angular spread of each portion of the combined pulse is not substantially different from other portions of the pulse.

摘要翻译： 具有脉冲倍增器的气体放电激光器。 在脉冲乘法器中，来自激光器的短脉冲被分成多个部分，全部或全部，但是这些部分中的一个在延迟支路中延迟不同的时间段，并且重新组合以提供具有显着降低的强度和更长持续时间的拉伸输出脉冲，与 来自激光的脉冲。 每个延迟支路都包括聚焦光学元件，以确保组合脉冲的每个部分的光束尺寸和角度扩展与脉冲的其他部分基本不同。

公开(公告)号：US06359693B2

公开(公告)日：2002-03-19

申请号：US09737181

申请日：2000-12-14

申请人： Scott T. Smith ,  Alexander I. Ershov ,  Jesse D. Buck

发明人： Scott T. Smith ,  Alexander I. Ershov ,  Jesse D. Buck

IPC分类号： G01B902

CPC分类号： G01J3/26

摘要： A first double pass etalon based spectrometer. In a preferred embodiment a second etalon matched to the first double pass etalon is used to produce extremely precise fringe data. Spectral components of a diffused beam are angularly separated as they are transmitted through an etalon. A retroreflector reflects the transmitted components back through the etalon. Twice transmitted spectral components are directed through a second etalon and focused onto a light detector which in a preferred embodiment is a photo diode array. The spectrometer is very compact producing the extremely precise fringe data permitting bandwidth measurements with precision needed for microlithography for both &Dgr;&lgr;FWHM and &Dgr;&lgr;95%.

摘要翻译： 第一个基于双通道标准具的光谱仪。 在优选实施例中，与第一双通道标准具匹配的第二标准具用于产生非常精确的边缘数据。 扩散光束的光谱分量在透射通过标准具时被角度地分离。 后向反射镜通过标准具反射传输的组件。 两次透射的光谱分量被引导通过第二标准具并聚焦到光检测器上，在一个优选实施例中是光电二极管阵列。 光谱仪非常紧凑，产生极其精确的条纹数据，允许对DELTAlambdFWHM和DELTAlambd 95％的微光刻所需的精度进行带宽测量。

公开(公告)号：US06882674B2

公开(公告)日：2005-04-19

申请号：US10036676

申请日：2001-12-21

申请人： Christian J. Wittak ,  William N. Partlo ,  Richard L. Sandstrom ,  Paul C. Melcher ,  David M. Johns ,  Robert B. Saethre ,  Richard M. Ness ,  Curtis L. Rettig ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Shahryar Rokni ,  Scott T. Smith ,  Stuart L. Anderson ,  John M. Algots ,  Ronald L. Spangler ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  Jerome A. Emilo ,  Clay C. Titus ,  Alex P. Ivaschenko ,  Paolo Zambon ,  Gamaralalage G. Padmabandu ,  Mark S. Branham ,  Sunjay Phatak ,  Raymond F. Cybulski

发明人： Christian J. Wittak ,  William N. Partlo ,  Richard L. Sandstrom ,  Paul C. Melcher ,  David M. Johns ,  Robert B. Saethre ,  Richard M. Ness ,  Curtis L. Rettig ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Shahryar Rokni ,  Scott T. Smith ,  Stuart L. Anderson ,  John M. Algots ,  Ronald L. Spangler ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  Jerome A. Emilo ,  Clay C. Titus ,  Alex P. Ivaschenko ,  Paolo Zambon ,  Gamaralalage G. Padmabandu ,  Mark S. Branham ,  Sunjay Phatak ,  Raymond F. Cybulski

IPC分类号： H01S3/097 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/0975 ,  H01S3/134 ,  H01S3/139 ,  H01S3/225 ,  H01S3/23 ,  H01S3/22

CPC分类号： G03F7/70025 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/041 ,  H01S3/0975 ,  H01S3/134 ,  H01S3/139 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

摘要翻译： 本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。 优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。 在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。