Systems and methods for forming isolated devices in a handle wafer
    5.
    发明授权
    Systems and methods for forming isolated devices in a handle wafer 有权
    在处理晶片中形成隔离器件的系统和方法

    公开(公告)号:US09257525B2

    公开(公告)日:2016-02-09

    申请号:US13283139

    申请日:2011-10-27

    Abstract: A method for through active-silicon via integration is provided. The method comprises forming an electrical device in a handle wafer. The method also comprises forming an isolation layer over the handle wafer and the electrical device and joining an active layer to the isolation layer. Further, the method comprises forming at least one trench through the active layer and the isolation layer to expose a portion of the handle wafer and depositing an electrically conductive material in the at least one trench, the electrically conductive material providing an electrical connection to the electrical device through the active layer.

    Abstract translation: 提供了一种通过积分硅通过集成的方法。 该方法包括在处理晶片中形成电气装置。 该方法还包括在手柄晶片和电气装置上形成隔离层,并将活性层连接到隔离层。 此外,该方法包括通过有源层和隔离层形成至少一个沟槽,以暴露处理晶片的一部分并在至少一个沟槽中沉积导电材料,导电材料提供与电 设备通过活动层。

    SCHOTTKY DIODE WITH COMBINED FIELD PLATE AND GUARD RING
    8.
    发明申请
    SCHOTTKY DIODE WITH COMBINED FIELD PLATE AND GUARD RING 审中-公开
    肖特基二极管与组合的现场板和保护环

    公开(公告)号:US20120007097A1

    公开(公告)日:2012-01-12

    申请号:US12944163

    申请日:2010-11-11

    Inventor: Francois Hebert

    Abstract: A Schottky diode comprising a merged guard ring and field plate defining a Schottky contact region is provided. A Schottky metal is formed over at least partially over the Schottky contact region and at least partially over the merged guard ring and field plate.

    Abstract translation: 提供了包括合并的保护环和限定肖特基接触区域的场板的肖特基二极管。 肖特基金属至少部分地形成在肖特基接触区域上并且至少部分地在合并的保护环和场板上形成。

    PLANAR GROOVED POWER INDUCTOR STRUCTURE AND METHOD
    9.
    发明申请
    PLANAR GROOVED POWER INDUCTOR STRUCTURE AND METHOD 有权
    平面电力电力电感器结构与方法

    公开(公告)号:US20110107589A1

    公开(公告)日:2011-05-12

    申请号:US13007551

    申请日:2011-01-14

    Abstract: An inductor may include a planar ferrite core. A first group of one or more grooves is formed in a first side of the ferrite core. A second group of two or more grooves is formed in a second side of the ferrite core. The grooves in the first and second groups are oriented such that each groove in the first group overlaps with two corresponding grooves in the second group. A first plurality of vias communicates through the ferrite core between the first and second sides of the ferrite core. Each via is located where a groove in the first group overlaps with a groove in the second group. A conductive material is disposed in the first and second groups of grooves and in the vias to form an inductor coil.

    Abstract translation: 电感器可以包括平面铁氧体磁芯。 第一组一个或多个凹槽形成在铁氧体磁芯的第一侧。 在铁氧体磁芯的第二侧形成有第二组两个或多个凹槽。 第一组和第二组中的凹槽被定向成使得第一组中的每个凹槽与第二组中的两个相应的凹槽重叠。 第一多个通孔在铁氧体磁芯的第一和第二侧之间通过铁氧体磁芯连通。 每个通孔位于第一组中的凹槽与第二组中的凹槽重叠的位置。 导电材料设置在第一和第二组沟槽和通孔中以形成电感线圈。

    PLANAR GROOVED POWER INDUCTOR STRUCTURE AND METHOD
    10.
    发明申请
    PLANAR GROOVED POWER INDUCTOR STRUCTURE AND METHOD 有权
    平面电力电力电感器结构与方法

    公开(公告)号:US20090322461A1

    公开(公告)日:2009-12-31

    申请号:US12165423

    申请日:2008-06-30

    Abstract: An inductor may include a planar ferrite core. A first group of one or more grooves is formed in a first side of the ferrite core. A second group of two or more grooves is formed in a second side of the ferrite core. The grooves in the first and second groups are oriented such that each groove in the first group overlaps with two corresponding grooves in the second group. A first plurality of vias communicates through the ferrite core between the first and second sides of the ferrite core. Each via is located where a groove in the first group overlaps with a groove in the second group. A conductive material is disposed in the first and second groups of grooves and in the vias to form an inductor coil.

    Abstract translation: 电感器可以包括平面铁氧体磁芯。 第一组一个或多个凹槽形成在铁氧体磁芯的第一侧。 在铁氧体磁芯的第二侧形成有第二组两个或多个凹槽。 第一组和第二组中的凹槽被定向成使得第一组中的每个凹槽与第二组中的两个相应的凹槽重叠。 第一多个通孔在铁氧体磁芯的第一和第二侧之间通过铁氧体磁芯连通。 每个通孔位于第一组中的凹槽与第二组中的凹槽重叠的位置。 导电材料设置在第一和第二组沟槽和通孔中以形成电感线圈。

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