Enhanced doping efficiency of ultrawide bandgap semiconductors by metal-semiconductor assisted epitaxy

    公开(公告)号:US11876147B2

    公开(公告)日:2024-01-16

    申请号:US16424157

    申请日:2019-05-28

    IPC分类号: H01L33/00 H01L33/06 H01L33/32

    摘要: An epitaxial growth process, referred to as metal-semiconductor junction assisted epitaxy, of ultrawide bandgap aluminum gallium nitride (AlGaN) is disclosed. The epitaxy of AlGaN is performed in metal-rich (e.g., Ga-rich) conditions using plasma-assisted molecular beam epitaxy. The excess Ga layer leads to the formation of a metal-semiconductor junction during the epitaxy of magnesium (Mg)-doped AlGaN, which pins the Fermi level away from the valence band at the growth front. The Fermi level position is decoupled from Mg-dopant incorporation; that is, the surface band bending allows the formation of a nearly n-type growth front despite p-type dopant incorporation. With controlled tuning of the Fermi level by an in-situ metal-semiconductor junction during epitaxy, efficient p-type conduction can be achieved for large bandgap AlGaN.

    CO2 reduction toward methane
    9.
    发明授权

    公开(公告)号:US11512399B2

    公开(公告)日:2022-11-29

    申请号:US17116220

    申请日:2020-12-09

    摘要: An electrode of a chemical cell includes a substrate having a surface, an array of conductive projections supported by the substrate and extending outward from the surface of the substrate, each conductive projection of the array of conductive projections having a semiconductor composition for reduction of carbon dioxide (CO2) in the chemical cell, and a catalyst arrangement disposed along each conductive projection of the array of conductive projections, the catalyst arrangement including a copper-based catalyst and an iron-based catalyst for the reduction of carbon dioxide (CO2) in the chemical cell.