Substrate and process for producing the same
    1.
    发明申请
    Substrate and process for producing the same 审中-公开
    基材及其制造方法

    公开(公告)号:US20070024800A1

    公开(公告)日:2007-02-01

    申请号:US10558934

    申请日:2004-06-01

    IPC分类号: G02F1/1333

    摘要: A photosensitive transparent resin film, provided selectively with a groove reaching a transparent substrate is formed on the transparent substrate, and a wiring portion is provided in the groove substantially in flush with the photosensitive transparent resin film. The wiring portion can be formed quickly while controlling the thickness easily by preprocessing the surface of the photosensitive transparent resin film or the bottom face of the groove before the wiring portion is set in the groove.

    摘要翻译: 选择性地设置到达透明基板的槽的光敏透明树脂膜形成在透明基板上,并且布线部分设置在基本上与感光透明树脂膜齐平的槽中。 在将布线部分设置在槽中之前,可以通过预处理感光性透明树脂膜的表面或槽的底面来容易地控制厚度,同时可以快速形成布线部分。

    SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    2.
    发明申请
    SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 审中-公开
    基板及其制造方法

    公开(公告)号:US20100184289A1

    公开(公告)日:2010-07-22

    申请号:US12749143

    申请日:2010-03-29

    IPC分类号: H01L21/768

    摘要: A photosensitive transparent resin film, provided selectively with a groove reaching a transparent substrate is formed on the transparent substrate, and a wiring portion is provided in the groove substantially in flush with the photosensitive transparent resin film. The wiring portion can be formed quickly while controlling the thickness easily by preprocessing the surface of the photosensitive transparent resin film or the bottom face of the groove before the wiring portion is set in the groove.

    摘要翻译: 选择性地设置到达透明基板的槽的光敏透明树脂膜形成在透明基板上,并且布线部分设置在基本上与感光透明树脂膜齐平的槽中。 在将布线部分设置在槽中之前,可以通过预处理感光性透明树脂膜的表面或槽的底面来容易地控制厚度,同时可以快速形成布线部分。

    Apparatus for Producing Electronic Device Such as Display Device, Method of Producing Electronic Device Such as Display Device, and Electronic Device Such as Display Device
    5.
    发明申请
    Apparatus for Producing Electronic Device Such as Display Device, Method of Producing Electronic Device Such as Display Device, and Electronic Device Such as Display Device 审中-公开
    用于制造诸如显示装置的电子装置的装置,诸如显示装置的电子装置的制造方法以及诸如显示装置的电子装置

    公开(公告)号:US20080315201A1

    公开(公告)日:2008-12-25

    申请号:US11992046

    申请日:2005-09-16

    摘要: An object of the present invention is to reduce an adverse effect of an atmosphere in a heat treatment device used in production of an electronic device, imparted on characteristics of the produced electronic device. To attain the object, an inner surface of the heat treatment device is covered with an oxide passive-state film and bringing the surface roughness of the inner surface to 1 μm or less in terms of a central mean roughness Ra. According to this type of heat treatment device, in curing a heat curable resin, deterioration in the heat curable resin caused by decomposition or dissociation of the heat curable resin, can be reduced.

    摘要翻译: 本发明的一个目的是减少赋予所生产的电子设备的特性的用于生产电子设备的热处理装置中的气氛的不良影响。 为了实现该目的,热处理装置的内表面被氧化物被动状态膜覆盖,并且以中心平均粗糙度Ra为基准使内表面的表面粗糙度为1μm以下。 根据这种类型的热处理装置,在固化热固性树脂时,可以降低由热固性树脂的分解或解离引起的热固性树脂的劣化。

    Circuit Board And Manufacturing Method Thereof
    7.
    发明申请
    Circuit Board And Manufacturing Method Thereof 审中-公开
    电路板及其制造方法

    公开(公告)号:US20080029476A1

    公开(公告)日:2008-02-07

    申请号:US10594599

    申请日:2005-02-24

    IPC分类号: H01B13/00

    摘要: A circuit board having high adhessiveness contact between electrically insulating layers and having a low interlayer electric resistance is provided. A circuit board is provided with a first conductive layer formed on a core (1) and a first electrically insulating layer formed thereon. In the circuit board, a first conductor layer has a surface roughness Ra of 0.1 nm or more but less than 100 nm, and a first primer layer having a thiol compound as a main material is provided between the first conductive layer and the first electrically insulating layer. Thus, the circuit board which has excellent adhesiveness between the first conductor layer and the first electrically insulating layer and is also applicable to high frequency signal is provided.

    摘要翻译: 提供一种电绝缘层之间具有高粘合性接触并具有低层间电阻的电路板。 电路板设置有形成在芯部(1)上的第一导电层和形成在其上的第一电绝缘层。 在电路板中,第一导体层的表面粗糙度Ra为0.1nm以上且小于100nm,在第一导电层和第一电绝缘层之间设置具有硫醇化合物作为主要材料的第一底漆层 层。 因此,提供了在第一导体层和第一电绝缘层之间具有优异的粘合性并且也适用于高频信号的电路板。

    Gas production facility, gas supply container, and gas for manufacture of electronic devices
    8.
    发明申请
    Gas production facility, gas supply container, and gas for manufacture of electronic devices 审中-公开
    天然气生产设备,气体供应容器和用于制造电子设备的气体

    公开(公告)号:US20110124928A1

    公开(公告)日:2011-05-26

    申请号:US12929271

    申请日:2011-01-12

    CPC分类号: C23C30/00 C23C4/11 C23C8/02

    摘要: An apparatus for producing a gas using a raw material gas having high reactivity, in particular, a fluorinated hydrocarbon, or a vessel for supplying the gas, characterized in that the surface of a portion thereof contacting with the gas has an average roughness of 1 μm or less in terms of a center line average roughness Ra. It is preferred that an oxide-based passivated film such as a film based on chromium oxide, aluminum oxide, yttrium oxide, magnesium oxide or the like is formed on the surface having a roughness controlled as above. The above apparatus and vessel can be suitably used for preventing the contamination of a raw material gas originated from a gas production apparatus or a vessel for supplying the gas.

    摘要翻译: 使用反应性高的原料气体,特别是氟化烃或用于供给气体的容器来制造气体的装置,其特征在于,与气体接触的部分的表面的平均粗糙度为1μm 或更小的中心线平均粗糙度Ra。 优选在具有如上控制的粗糙度的表面上形成氧化物基钝化膜,例如基于氧化铬,氧化铝,氧化钇,氧化镁等的膜。 上述设备和容器可适用于防止源自气体生产设备或用于供应气体的容器的原料气体的污染。

    Gas Production Facility, Gas Supply Container, And Gas For Manufacture Of Electronic Devices
    9.
    发明申请
    Gas Production Facility, Gas Supply Container, And Gas For Manufacture Of Electronic Devices 审中-公开
    气体生产设备,气体供应集装箱和气体制造电子设备

    公开(公告)号:US20070282142A1

    公开(公告)日:2007-12-06

    申请号:US10592278

    申请日:2005-02-16

    IPC分类号: C07C19/08 A61L9/00

    CPC分类号: C23C30/00 C23C4/11 C23C8/02

    摘要: An apparatus for producing a gas using a raw material gas having high reactivity, in particular, a fluorinated hydrocarbon, or a vessel for supplying the gas, characterized in that the surface of a portion thereof contacting with the gas has an average roughness of 1 μm or less in terms of a center line average roughness Ra. It is preferred that an oxide-based passivated film such as a film based on chromium oxide, aluminum oxide, yttrium oxide, magnesium oxide or the like is formed on the surface having a roughness controlled as above. The above apparatus and vessel can be suitably used for preventing the contamination of a raw material gas originated from a gas production apparatus or a vessel for supplying the gas.

    摘要翻译: 使用高反应性的原料气体,特别是氟化烃或用于供给气体的容器来生产气体的装置,其特征在于,与气体接触的部分的表面的平均粗糙度为1μm 或更小的中心线平均粗糙度Ra。 优选在具有如上控制的粗糙度的表面上形成氧化物基钝化膜,例如基于氧化铬,氧化铝,氧化钇,氧化镁等的膜。 上述设备和容器可适用于防止源自气体生产设备或用于供应气体的容器的原料气体的污染。

    Positive resist composition
    10.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号:US6013407A

    公开(公告)日:2000-01-11

    申请号:US875045

    申请日:1997-07-08

    IPC分类号: G03F7/022 G03F7/023

    摘要: A positive resist composition is excellent in sensitivity, film loss after development, resolution, thermal-flow resistance, storage stability, exposure margin and focus margin and comprises in combination (A) an alkali-soluble phenol resin, (B) a quinonediazide sulfonate type photosensitive agent and (C) a phenolic compound, wherein the phenolic compound (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having a structural unit represented by the following formula (I) and phenolic compounds (CD) having a structural unit represented by the following formula (II): ##STR1## wherein R.sup.1 to R.sup.3 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, R.sup.4 to R.sup.11 are, independently of one another, a hydrogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an aryl group which may be substituted, or an alkoxy group which may be substituted, and n is a positive integer; and ##STR2## wherein R.sup.12 to R.sup.15 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, with the proviso that at least one of R.sup.12 to R.sup.15 is a hydroxyl group, and m is a positive integer.

    摘要翻译: PCT No.PCT / JP96 / 00061 Sec。 371日期1997年7月8日 102(e)日期1997年7月8日PCT 1996年1月17日PCT PCT。 公开号WO96 / 22563 日期:1996年7月25日正性抗蚀剂组合物具有优异的敏感性,显影后的膜损耗,分辨率,耐热流动性,储存稳定性,曝光余量和聚焦余量,并且包括(A)碱溶性酚醛树脂(B )醌二叠氮化物型光敏剂和(C)酚类化合物,其中所述酚类化合物(C)为选自具有由下式(I)表示的结构单元的酚类化合物(CX))组成的组中的至少一种酚类化合物 )和具有由下式(II)表示的结构单元的酚类化合物(CD):其中R 1至R 3彼此独立地为氢原子,羟基,卤素原子,可被取代的烷基 可被取代的环烷基,可被取代的链烯基,可被取代的烷氧基或可被取代的芳基R4至R11彼此独立地是 氢原子,可以被取代的烷基,可被取代的环烷基,可被取代的烯基,可被取代的芳基或可被取代的烷氧基,n是正的 整数; 并且其中R12至R15彼此独立地为氢原子,羟基,卤素原子,可被取代的烷基,可被取代的环烷基,可被取代的烯基,烷氧基 可以被取代的基团,或可以被取代的芳基,条件是R12至R15中的至少一个是羟基,m是正整数。