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    Positive resist composition
    1.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号：US6013407A

    公开(公告)日：2000-01-11

    申请号：US875045

    申请日：1997-07-08

    申请人： Shoji Kawata ,  Hiroshi Hayashi ,  Hirokazu Higashi ,  Takeyoshi Kato ,  Masahiro Nakamura

    发明人： Shoji Kawata ,  Hiroshi Hayashi ,  Hirokazu Higashi ,  Takeyoshi Kato ,  Masahiro Nakamura

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/0236 ,  G03F7/0226 ,  G03F7/0233

    摘要： A positive resist composition is excellent in sensitivity, film loss after development, resolution, thermal-flow resistance, storage stability, exposure margin and focus margin and comprises in combination (A) an alkali-soluble phenol resin, (B) a quinonediazide sulfonate type photosensitive agent and (C) a phenolic compound, wherein the phenolic compound (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having a structural unit represented by the following formula (I) and phenolic compounds (CD) having a structural unit represented by the following formula (II): ##STR1## wherein R.sup.1 to R.sup.3 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, R.sup.4 to R.sup.11 are, independently of one another, a hydrogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an aryl group which may be substituted, or an alkoxy group which may be substituted, and n is a positive integer; and ##STR2## wherein R.sup.12 to R.sup.15 are, independently of one another, a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group which may be substituted, a cycloalkyl group which may be substituted, an alkenyl group which may be substituted, an alkoxy group which may be substituted, or an aryl group which may be substituted, with the proviso that at least one of R.sup.12 to R.sup.15 is a hydroxyl group, and m is a positive integer.

    摘要翻译： PCT No.PCT / JP96 / 00061 Sec。 371日期1997年7月8日 102（e）日期1997年7月8日PCT 1996年1月17日PCT PCT。 公开号WO96 / 22563 日期：1996年7月25日正性抗蚀剂组合物具有优异的敏感性，显影后的膜损耗，分辨率，耐热流动性，储存稳定性，曝光余量和聚焦余量，并且包括（A）碱溶性酚醛树脂（B ）醌二叠氮化物型光敏剂和（C）酚类化合物，其中所述酚类化合物（C）为选自具有由下式（I）表示的结构单元的酚类化合物（CX））组成的组中的至少一种酚类化合物 ）和具有由下式（II）表示的结构单元的酚类化合物（CD）：其中R 1至R 3彼此独立地为氢原子，羟基，卤素原子，可被取代的烷基 可被取代的环烷基，可被取代的链烯基，可被取代的烷氧基或可被取代的芳基R4至R11彼此独立地是 氢原子，可以被取代的烷基，可被取代的环烷基，可被取代的烯基，可被取代的芳基或可被取代的烷氧基，n是正的 整数; 并且其中R12至R15彼此独立地为氢原子，羟基，卤素原子，可被取代的烷基，可被取代的环烷基，可被取代的烯基，烷氧基 可以被取代的基团，或可以被取代的芳基，条件是R12至R15中的至少一个是羟基，m是正整数。