NON-CONTIGUOUS DUMMY STRUCTURE SURROUNDING THROUGH-SUBSTRATE VIA NEAR INTEGRATED CIRCUIT WIRES
    6.
    发明申请
    NON-CONTIGUOUS DUMMY STRUCTURE SURROUNDING THROUGH-SUBSTRATE VIA NEAR INTEGRATED CIRCUIT WIRES 审中-公开
    通过靠近集成电路的通过基底的非连续的结构

    公开(公告)号:US20160148863A1

    公开(公告)日:2016-05-26

    申请号:US14549846

    申请日:2014-11-21

    IPC分类号: H01L23/498 H01L21/48

    摘要: A three-dimensional (3-D) integrated circuit wiring including a plurality of stacked dielectric levels formed on a substrate includes a plurality of non-contiguous dummy walls patterned in a corresponding dielectric level around a circuit wire keep out zone (KOZ). The non-contiguous dummy walls are formed in the circuit wire KOZ and have an outer side and an opposing inner side that extend along a first direction to define a length. A circuit wire segment is located at a first metal level and a second circuit wire segment is located at a second metal level different from the first metal level. The first and second metal levels are located adjacent the inner side of at least one non-contiguous dummy wall.

    摘要翻译: 包括形成在基板上的多个堆叠电介质层的三维(3-D)集成电路布线包括在电路线保持区(KOZ)周围的相应电介质层中图案化的多个不连续的虚设壁。 不连续的虚设壁形成在电路线KOZ中,具有沿着第一方向延伸以限定长度的外侧和相对的内侧。 电路线段位于第一金属水平处,并且第二电路线段位于不同于第一金属水平的第二金属水平处。 第一和第二金属水平位于邻近至少一个不连续的虚拟壁的内侧。

    METHOD FOR ELECTROCHEMICALLY MANUFACTURING CuSCN NANOWIRES
    10.
    发明申请
    METHOD FOR ELECTROCHEMICALLY MANUFACTURING CuSCN NANOWIRES 有权
    电化学制备CuSCN纳米微粒的方法

    公开(公告)号:US20130334054A1

    公开(公告)日:2013-12-19

    申请号:US13916817

    申请日:2013-06-13

    IPC分类号: H01L21/48

    CPC分类号: H01L21/4885 C25D3/38 C25D9/08

    摘要: A method for forming, on a conductive or semiconductor substrate, nanowires based on CuSCN, including the steps of: preparing an aqueous electrolytic solution from a Cu(II) salt having a concentration lower than 120 mM, a Cu(II) complexing agent from the aminocarboxylic acid family, and a thiocyanate salt, the solution having a pH ranging between 0.1 and 3; electrochemically depositing the aqueous electrolytic solution on the substrate.

    摘要翻译: 一种在导电或半导体衬底上形成基于CuSCN的纳米线的方法,包括以下步骤:从浓度低于120mM的Cu(II)盐制备电解质水溶液,制备Cu(II)络合剂, 氨基羧酸系和硫氰酸盐,该溶液的pH范围在0.1和3之间; 在基材上电化学沉积含水电解液。