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36 条记录 (耗时 0.023 秒)

    Photosensitive resin composition for color filter production
    1.
    发明授权
    Photosensitive resin composition for color filter production 失效
    用于滤色片生产的感光树脂组合物

    公开(公告)号：US5882843A

    公开(公告)日：1999-03-16

    申请号：US557841

    申请日：1995-11-14

    申请人： Takanori Kudo ,  Yuko Nozaki ,  Kazuya Nagao ,  Yuki Nanjo

    发明人： Takanori Kudo ,  Yuko Nozaki ,  Kazuya Nagao ,  Yuki Nanjo

    IPC分类号： G03F7/00 ,  G03F7/033 ,  G03F7/038 ,  G03F7/032

    CPC分类号： G03F7/0388 ,  G03F7/0007 ,  G03F7/033

    摘要： A photosensitive resin composition is disclosed.The photosensitive resin composition is characterized by containing (a) a reaction product of a polymer having a specific segment with (3,4-epoxycylohexyl)-methyl methacrylate, (b) a polymerization initiator allowing the initiation of the polymerization of said reaction product when irradiated with an actinic radiation, and (c) a solvent. Preferably, the composition further contains (d) a thermal crosslinker, a compound having a polymerizable unsaturated bond and/or a pigment in addition to the above ingredients.According to the present invention, there is provided the photosensitive resin composition which has such excellent characteristics that it has high sensitivity, it does not require a heat treatment between exposure-development steps, it causes little change of sensitivity and pattern shape with time from the exposure to the development, it has high heat resistance, it permits the use of an aqueous system in the development step and it has good storage stability.

    摘要翻译： 公开了一种感光性树脂组合物。 感光性树脂组合物的特征在于含有（a）具有特定链段的聚合物与（3,4-环氧环己基） - 甲基丙烯酸甲酯的反应产物，（b）允许引发所述反应产物的聚合的聚合引发剂的反应产物， 用光化辐射照射，和（c）溶剂。 优选地，除了上述成分之外，组合物还含有（d）热交联剂，具有可聚合不饱和键的化合物和/或颜料。 根据本发明，提供了具有这样优异特性的感光性树脂组合物，其具有高灵敏度，不需要在曝光显影步骤之间进行热处理，因此随着时间的推移，敏感性和图案形状几乎不变化 暴露于开发中，其耐热性高，允许在显影步骤中使用水性体系，并且具有良好的储存稳定性。

    Colored, photosensitive resin composition
    2.
    发明授权
    Colored, photosensitive resin composition 失效
    彩色，感光性树脂组合物

    公开(公告)号：US5641594A

    公开(公告)日：1997-06-24

    申请号：US507301

    申请日：1995-08-25

    申请人： Takanori Kudo ,  Yuko Nozaki ,  Kazuya Nagao ,  Yuki Nanjo ,  Hiroshi Okazaki ,  Yoshiaki Kinoshita ,  Seiya Masuda ,  Munirathna Padmanaban ,  Natsumi Suehiro

    发明人： Takanori Kudo ,  Yuko Nozaki ,  Kazuya Nagao ,  Yuki Nanjo ,  Hiroshi Okazaki ,  Yoshiaki Kinoshita ,  Seiya Masuda ,  Munirathna Padmanaban ,  Natsumi Suehiro

    IPC分类号： G03F7/00 ,  G03F7/008 ,  G03F7/031 ,  G03C5/56 ,  G03F7/012 ,  G03F7/033

    CPC分类号： G03F7/008 ,  G03F7/0007 ,  G03F7/031

    摘要： A colored, photosensitive resin composition of a pigment dispersing-type is disclosed.The colored, photosensitive resin composition is characterized by containing (a) a polymer having alcohlic or phenolic hydroxyl groups, (b) a compound capable of producing a nitrene when irradiated with an actinic radiation, (c) a pigment, and (d) a solvent. Preferably, the composition further contains (e) a heat crosslinking agent and/or (f) a compound having a polymerizable double bond in addition to the above ingredients.According to the present invention, the production of a color filter need not be performed in an inert gas atmosphere, does not require an oxygen barrier film and does not require heating during the period of from the exposure step to the development step. Thus, the use of the composition permits the color filter production steps to be made significantly simple so that the composition provides a great value in industrial utilization.

    摘要翻译： PCT No.PCT / JP94 / 02085 Sec。 371日期1995年8月25日 102（e）日期1995年8月25日PCT 1994年12月12日PCT PCT。 公开号WO95 / 18399 日期：1995年7月6日公开了一种着色的颜料分散型感光性树脂组合物。 着色的感光性树脂组合物的特征在于，含有（a）具有异羟基或酚羟基的聚合物，（b）当用光化辐射照射时能够产生硝酸的化合物，（c）颜料，（d） 溶剂。 优选地，除了上述成分之外，组合物还含有（e）热交联剂和/或（f）具有可聚合双键的化合物。 根据本发明，滤色器的制造不需要在惰性气体气氛中进行，在从曝光步骤到显影步骤的期间，不需要氧阻隔膜，不需要加热。 因此，使用该组合物可以使滤色器制造步骤显着简单，从而使组合物在工业应用中提供了巨大的价值。

    Radiation-sensitive mixture comprising a basic iodonium compound
    3.
    发明授权
    Radiation-sensitive mixture comprising a basic iodonium compound 失效
    包含碱性碘鎓化合物的辐射敏感性混合物

    公开(公告)号：US5663035A

    公开(公告)日：1997-09-02

    申请号：US420787

    申请日：1995-04-12

    申请人： Seiya Masuda ,  Munirathna Padmanaban ,  Takanori Kudo ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Yuko Nozaki ,  Hiroshi Okazaki ,  Klaus Jurgen Przybilla

    发明人： Seiya Masuda ,  Munirathna Padmanaban ,  Takanori Kudo ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Yuko Nozaki ,  Hiroshi Okazaki ,  Klaus Jurgen Przybilla

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/0045

    摘要： A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base.The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.

    摘要翻译： 用于生产半导体元件的辐射敏感性混合物，其具有高灵敏度和高分辨率，其可以通过碱性水溶液开发，并且其基于新的概念，其中稳定的酸潜像由 使用辐射分解碱。 该混合物的特征在于包含作为必需组分的a）不溶于水但可溶于碱性水溶液的粘合剂; b1）具有至少一个可被酸切割的键的化合物，或b2）具有至少一个键的化合物，其通过酸与化合物a）交联; c）当照射时产生酸的化合物; 和d）碱性碘鎓化合物。

    Radiation sensitive composition
    4.
    发明授权
    Radiation sensitive composition 失效
    辐射敏感组合物

    公开(公告)号：US5595855A

    公开(公告)日：1997-01-21

    申请号：US390045

    申请日：1995-02-17

    申请人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Takanori Kudo ,  Seiya Masuda ,  Yuko Nozaki ,  Hiroshi Okazaki ,  Georg Pawlowski

    发明人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Takanori Kudo ,  Seiya Masuda ,  Yuko Nozaki ,  Hiroshi Okazaki ,  Georg Pawlowski

    IPC分类号： C08L25/00 ,  C08L25/18 ,  C08L59/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  G03C1/72

    CPC分类号： G03F7/038 ,  G03F7/0045

    摘要： A chemically amplified radiation sensitive composition comprising: (a) a copolymer such as poly(4-hydroxystyrene-co-styrene), (b) a dissolution inhibitor such as polyacetal or (b') a crosslinking agent, (c) a radiation sensitive compound capable of generating an acid upon exposure to actinic radiation, (d) a radiation sensitive base capable of stabilizing the width of lines throughout steps from exposure to post-exposure bake treatment, and (e) a solvent for dissolving the components (a) to (d), can realize fine lines and spaces down to 0.22 microns, for example, using KrF laser, and possesses excellent heat and etch resistance and adhesiveness to substrates, and produces patterns with low standing waves arising due to substrate reflectiveness of exposed light.

    摘要翻译： 一种化学增强的辐射敏感组合物，其包含：（a）共聚物如聚（4-羟基苯乙烯 - 共 - 苯乙烯），（b）溶解抑制剂如聚缩醛或（b'）交联剂，（c） 能够在暴露于光化辐射下产生酸的化合物，（d）能够在暴露于曝光后烘烤处理的步骤中稳定整个条纹宽度的辐射敏感性基质，和（e）用于溶解组分的溶剂（a） 至（d），可以实现例如使用KrF激光器至0.22微米的细线和间隔，并且具有优异的耐热和耐蚀刻性以及与衬底的粘附性，并且由于曝光的衬底反射性而产生具有低驻波的图案 。

    Antireflective coating composition and process thereof
    5.
    发明授权
    Antireflective coating composition and process thereof 有权
    防反射涂料组合物及其工艺

    公开(公告)号：US09152051B2

    公开(公告)日：2015-10-06

    申请号：US13917022

    申请日：2013-06-13

    申请人： M. Dalil Rahman ,  Clement Anyadiegwu ,  Douglas McKenzie ,  Takanori Kudo ,  Elizabeth Wolfer ,  Salem K. Mullen

    发明人： M. Dalil Rahman ,  Clement Anyadiegwu ,  Douglas McKenzie ,  Takanori Kudo ,  Elizabeth Wolfer ,  Salem K. Mullen

    IPC分类号： G03F7/09 ,  G03F7/30 ,  G03F7/075 ,  C09D165/00 ,  C09D5/00

    CPC分类号： G03F7/091 ,  C08G2261/314 ,  C08G2261/3424 ,  C09D5/006 ,  C09D165/00 ,  G03F7/0752 ,  G03F7/0757 ,  G03F7/30

    摘要： The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar′ and Ar″ are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —(CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.

    摘要翻译： 本发明涉及一种包含新型聚合物的吸收性硬掩模抗反射涂料组合物，其中新型聚合物在聚合物的主链中包含四个重复单元-A-， - B - ， - C-和-D-，其中A为 重复单元在其骨架中包含稠合芳环，B具有结构（1），C是结构（2）的羟基联苯，D是结构式（3）的衍生化芴，其中R 1是C 1 -C 4烷基，R 2是 C 1 -C 4烷基，R 3和R 4独立地是氢或C 1 -C 4烷基，Ar'和Ar“独立地是苯基或萘衍生部分，R 5和R 6独立地是-OH或 - （CH 2）n OH，其中n = 2-4 ，R 7和R 8独立地为氢或C 1 -C 4烷基。 本发明还涉及使用新型抗反射涂料组合物形成图像的方法。

    BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF
    6.
    发明申请
    BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF 有权
    底部抗反射涂料组合物及其工艺

    公开(公告)号：US20120308939A1

    公开(公告)日：2012-12-06

    申请号：US13153765

    申请日：2011-06-06

    申请人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    发明人： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    IPC分类号： G03F7/20 ,  C08K5/42

    CPC分类号： C09D5/006 ,  G03F7/091

    摘要： The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.

    摘要翻译： 本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个 亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。

    Positive-Working Photoimageable Bottom Antireflective Coating
    9.
    发明申请
    Positive-Working Photoimageable Bottom Antireflective Coating 审中-公开
    正面照相底部防反射涂层

    公开(公告)号：US20110086312A1

    公开(公告)日：2011-04-14

    申请号：US12576622

    申请日：2009-10-09

    申请人： Ralph R. Dammel ,  Srinivasan Chakrapani ,  Munirathna Padmanaban ,  Shinji Miyazaki ,  Edward W. Ng ,  Takanori Kudo ,  Alberto D. Dioses ,  Francis M. Houlihan

    发明人： Ralph R. Dammel ,  Srinivasan Chakrapani ,  Munirathna Padmanaban ,  Shinji Miyazaki ,  Edward W. Ng ,  Takanori Kudo ,  Alberto D. Dioses ,  Francis M. Houlihan

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/091

    摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is wherein W is selected from (C1-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted is or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n≧2. The invention further relates to a process for using such a composition.

    摘要翻译： 本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，结构式（7）的乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂，其中结构（7）其中W选自（C1 -C 30）直链，支链或环状的烷基部分，取代或未取代的（C 3 -C 40）脂环烃部分和取代的或未取代的（C 3 -C 40）环烷基亚烷基部分; R选自C1-C10直链或支链亚烷基，n≥2。 本发明还涉及使用这种组合物的方法。