Electroless gold plating solution
    4.
    发明授权
    Electroless gold plating solution 失效
    化学镀金液

    公开(公告)号:US5560764A

    公开(公告)日:1996-10-01

    申请号:US514763

    申请日:1995-08-14

    IPC分类号: C23C18/44 C23C18/52

    CPC分类号: C23C18/44

    摘要: The present invention provides an electroless gold plating solution which offers deposition layers exactly onto predetermined areas on the surface of the workpiece, without undesirable spread of prated areas. The electroless gold plating solution according to the invention contains 2-20 g/l of dimethylamine as amine group.

    摘要翻译: 本发明提供了一种无电镀金镀液,其将沉积层精确地提供到工件表面上的预定区域上,而不会不期望地涂覆区域。 根据本发明的无电镀金液含有2-20g / l二胺作为胺基。

    Vulcanizable fluororubber composition
    5.
    发明授权
    Vulcanizable fluororubber composition 失效
    可硫化氟橡胶组合物

    公开(公告)号:US4910260A

    公开(公告)日:1990-03-20

    申请号:US254729

    申请日:1988-10-07

    IPC分类号: C08K3/22 C08K5/14 C08K13/02

    CPC分类号: C08K5/14 C08K13/02 C08K3/22

    摘要: A vulcanizable fluororubber composition which comprises:(a) a fluorine-containing elastomeric copolymer of vinylidene fluoride with at least one other ethylenically unsaturated monomer copolymerizable therewith;(b) an organic peroxide;(c) a polyfunctional compound;(d) at least one member selected from the group consisting of bivalent metal hydroxides and bivalent metal oxides; and(e) an organic base.

    Method and apparatus for automatically controlling arc welding
    7.
    发明授权
    Method and apparatus for automatically controlling arc welding 失效
    自动控制电弧焊接的方法和装置

    公开(公告)号:US4280137A

    公开(公告)日:1981-07-21

    申请号:US005075

    申请日:1979-01-22

    摘要: Disclosed is a method and apparatus for automatically controlling arc welding, wherein pieces of optical information provided by at least two bands of different wavelengths of light radiated from a weld area being arc-welded under predetermined welding conditions are alternately picked up by an optical device to extract various weld factors representing the actual status of the weld area from these pieces of optical information, and the extracted weld factors representing the actual status of the weld area are compared with the desired values of the weld factors representing the desired status of the weld area to compute the error or errors of the welding conditions, so that the welding conditions can be corrected on the basis of the detected error or errors of the welding conditions, whereby the weld factors can be controlled to the desired values.

    摘要翻译: 公开了一种用于自动控制电弧焊接的方法和装置,其中由在预定焊接条件下被焊接的焊接区域辐射的不同波长的光的至少两个带提供的光信息由光学装置交替拾取, 从这些光学信息提取表示焊接区域的实际状态的各种焊接因子,将表示焊接区域的实际状态的提取的焊接因子与表示焊接区域的期望状态的焊接因子的期望值进行比较 以计算焊接条件的误差或误差,从而可以基于检测到的焊接条件的误差或误差来校正焊接条件,从而可将焊接因子控制到期望的值。

    Palladium plating solution
    8.
    发明申请
    Palladium plating solution 有权
    钯镀液

    公开(公告)号:US20070205109A1

    公开(公告)日:2007-09-06

    申请号:US11711516

    申请日:2007-02-27

    IPC分类号: C25D3/50

    摘要: The invention provides a plating solution capable of forming a palladium plating film which can further improve solder characteristics in surface treatment of a composition made of a nickel plating film, a palladium plating film and a gold plating film on a surface of a conductor formed from a metal such as copper. In a palladium plating solution of the invention containing a soluble palladium salt and an electrically conductive salt having a liquid composition containing germanium, the amount of the soluble palladium salt is 0.1 g/l to 50 g/l in terms of a reduced value of palladium metal, the amount of the electrically conductive salt is 10 g/l to 400 g/l and the amount of the germanium is 0.1 mg/l to 1000 mg/l.

    摘要翻译: 本发明提供一种能够形成钯电镀膜的电镀液,其能够进一步提高由镀镍膜,镀钯膜和镀金膜构成的组合物的表面处理中的焊料特性, 金属如铜。 在含有可溶性钯盐和含有锗的液体组合物的导电盐的本发明的钯电镀溶液中,根据钯的还原值,可溶性钯盐的量为0.1g / l至50g / l 金属,导电盐的量为10g / l至400g / l,锗的量为0.1mg / l至1000mg / l。

    Electroless gold plating solution
    10.
    发明授权
    Electroless gold plating solution 失效
    化学镀金液

    公开(公告)号:US5614004A

    公开(公告)日:1997-03-25

    申请号:US514603

    申请日:1995-08-14

    IPC分类号: C23C18/44 C23C18/31

    CPC分类号: C23C18/44

    摘要: The present invention provides an electroless gold plating solution which does not precipitate gold at high concentrations of thallium or lead compound, while retaining its effects such as increased deposition rate and larger crystallite sizes in the deposited layer. The electroless gold plating solution according to the invention contains 0.1-10 g/l of a chelating agent, such as diethylenetriaminetetraacetic acid (DTPA), ethylenediaminetetraacetic acid or nitrilotriacetic acid, DTPA being a preferable agent.

    摘要翻译: 本发明提供了一种在高浓度的铊或铅化合物中不析出金的化学镀金溶液,同时保留其沉积速率和沉积层中较大的微晶尺寸等效果。 根据本发明的无电镀金液含有0.1-10g / l螯合剂,如二亚乙基三胺四乙酸(DTPA),乙二胺四乙酸或次氮基三乙酸,DTPA是优选的试剂。