Triresorcinyl triazines
    1.
    发明授权
    Triresorcinyl triazines 有权
    三氯甲基三嗪

    公开(公告)号:US06346619B1

    公开(公告)日:2002-02-12

    申请号:US09303579

    申请日:1999-05-03

    CPC classification number: C07D251/24

    Abstract: Compounds of the formula in which Z, Z′ and Z″ independently of one another are a group of the formula II and R7 is a radical of the formula III, IV or V in which n is 1 or 2; R4, R5 and R6 independently of one another are C1-C18alkyl; C5-C12cycloalkyl; C2-C18alkenyl; phenyl; C7-C11phenylalkyl; C7-C11alkylphenyl; C1-C18alkyl substituted by phenyl, OH, C1-C18alkoxy, C5-C12cycloalkoxy, C3-C18alkenyloxy, COOH, COOR11, O—COR12, CONH2, CONHR13, CONR13NR14, CN,NH2, NHR13, NR13R14, NHCOR12, C6-C15bicycloalkyl, C6-C16bicycloalkyl-alkoxy, C6-C16bicycloalkenyl-alkoxy or C6-C15tricycloalkoxy; C5-C12cycloalkyl substituted by OH, C1-C4alkyl, C2-C6alkenyl or O—COR12; or COR15; CO—X—R11; or SO2—R16; or C3-C50alkyl interrupted by O and/or substituted by OH, phenoxy or C7-C18alkylphenoxy; or R5 and R6 together form a ring structure; X and Y independently of one another are O, NH, NR13 or S; and the other symbols are as defined in claim 1 are effective as stabilizers for organic material against the damaging effect of light, oxygen and/or heat.

    Abstract translation: Z,Z'和Z'彼此独立的烷氧基化合物是式II和R7的基团,其是n为1或2的式III,IV或Vin的基团; R 4,R 5和R 6彼此独立地为C 1 -C 18烷基; C 5 -C 12环烷基; C 2 -C 18烯基; 苯基; C7-C11苯基烷基; C7-C11烷基苯基; 被苯基,OH,C1-C18烷氧基,C5-C12环烷氧基,C3-C18链烯氧基,COOH,COOR11,O-COR12,CONH2,CONHR13,CONR13NR14,CN,NH2,NHR13,NR13R14,NHCOR12,C6-C15双环烷基,C6 C16双环烷基 - 烷氧基,C6-C16双环烯基 - 烷氧基或C6-C15三环烷氧基; 被OH,C 1 -C 4烷基,C 2 -C 6烯基或O-COR 12取代的C 5 -C 12环烷基; 或COR15; CO-X-R11; 或SO2-R16; 或被O和/或被OH,苯氧基或C 7 -C 18烷基苯氧基取代的C 3 -C 50烷基; 或R5和R6一起形成环结构; X和Y彼此独立地是O,NH,NR 13或S; 而其它符号如权利要求1中所定义的作为有机材料的稳定剂有效地抵抗光,氧和/或热的破坏作用。

    Trisresorcinyltriazines
    3.
    发明授权
    Trisresorcinyltriazines 有权
    三氯甲基三嗪

    公开(公告)号:US06509400B2

    公开(公告)日:2003-01-21

    申请号:US09973397

    申请日:2001-10-09

    CPC classification number: C07D251/24

    Abstract: Compounds of the formula in which Z, Z′ and Z″ independently of one another are a group of the formula II and R7 is a radical of the formula III, IV or V in which n is 1 or 2; R4, R5 and R6 independently of one another are C1-C18alkyl; C5-C12cycloalkyl; C2-C18alkenyl; phenyl; C7-C11phenylalkyl; C7-C11alkylphenyl; C1-C18alkyl substituted by phenyl, OH, C1-C18alkoxy, C5-C12cycloalkoxy, C3-C18alkenyloxy, COOH, COOR11, O—COR12, CONH2, CONHR13, CONR13R14, CN, NH2, NHR13, NR13R14, NHCOR12, C6-C15bicycloalkyl, C6-C16bicycloalkyl-alkoxy, C6-C16bicycloalkenyl-alkoxy or C6-C15tricycloalkoxy; C5-C12cycloalkyl substituted by OH, C1-C4alkyl, C2-C6alkenyl or O—COR12; or COR15; CO—X—R11; or SO2—R16; or C3-C50alkyl interrupted by O and/or substituted by OH, phenoxy or C7-C18alkylphenoxy; or R5 and R6 together form a ring structure; X and Y independently of one another are O, NH, NR13 or S; and the other symbols are as defined in claim 1 are effective as stabilizers for organic material against the damaging effect of light, oxygen and/or heat.

    Abstract translation: Z,Z'和Z'彼此独立的烷氧基化合物是式II和R7的基团,其是n为1或2的式III,IV或Vin的基团; R 4,R 5和R 6彼此独立地为C 1 -C 18烷基; C5-C12环烷基; C 2 -C 18烯基; 苯基; C7-C11苯基烷基; C7-C11烷基苯基; 被苯基,OH,C1-C18烷氧基,C5-C12环烷氧基,C3-C18链烯氧基,COOH,COOR11,O-COR12,CONH2,CONHR13,CONR13R14,CN,NH2,NHR13,NR13R14,NHCOR12,C6-C15双环烷基,C6 C16双环烷基 - 烷氧基,C6-C16双环烯基 - 烷氧基或C6-C15三环烷氧基; 被OH,C 1 -C 4烷基,C 2 -C 6烯基或O-COR 12取代的C 5 -C 12环烷基; 或COR15; CO-X-R11; 或SO2-R16; 或被O和/或被OH,苯氧基或C 7 -C 18烷基苯氧基取代的C 3 -C 50烷基; 或R5和R6一起形成环结构; X和Y彼此独立地是O,NH,NR 13或S; 而其它符号如权利要求1中所定义的作为有机材料的稳定剂有效地抵抗光,氧和/或热的破坏作用。

    Heat-sensitive coating compositions based on resorcinyl triazine derivatives
    6.
    发明授权
    Heat-sensitive coating compositions based on resorcinyl triazine derivatives 有权
    基于间苯二酚三嗪衍生物的热敏涂料组合物

    公开(公告)号:US08865620B2

    公开(公告)日:2014-10-21

    申请号:US12529718

    申请日:2008-03-05

    Abstract: The present invention provides heat-sensitive coating compositions, which comprise a color developer of formula (1) or mixtures thereof wherein R1 can be hydrogen, C1-20-alkyl, C3-8-cycloalkyl, C2-10-alkenyl, aryl or SO3H, and R2 and R3 can be the same or different and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8, SR9, SO3H or COOR10 and R4 and R5 can be the same or different, and can be hydrogen, halogen, C1-20-alkyl, C3-8-cyclo-alkyl, C2-10-alkenyl, aryl, OR6, NR7R8 or SR9, R6, R7, R8, R9 and R10 can be the same or different and can be hydrogen, C1-30-alkyl, C3-8-cycloalkyl, C2-10-alkenyl or aryl, wherein C1-20-alkyl can be unsubstituted or substituted with one or more C3-8-cycloalkyl, C2-10-alkenyl, phenyl, halogen, OR11, NR12R13, SR14, SO3H or COOR15, and aryl can be unsubstituted or substituted with one or more halogen, C1-10-alkyl, halogenated C1-10-alkyl, C3-8-cycloalkyl C2-10-alkenyl, phenyl, OR11, NR12R13, SR14, SO3H or COOR15, wherein R11, R12, R13, R14 and R15 can be the same or different and can be hydrogen, C1-10-alkyl, C3-8-cycloalkyl or C2-10-alkenyl, a process for the preparation of these compositions, a process of coating substrates with these compositions, substrates coated with these compositions, a process for preparing marked substrates using these compositions, marked substrates obtainable by the latter process, and certain color developers.

    Abstract translation: 本发明提供热敏涂料组合物,其包含式(1)的显色剂或其混合物,其中R 1可以是氢,C 1-20烷基,C 3-8 - 环烷基,C 2-10 - 烯基,芳基或SO 3 H ,R2和R3可以相同或不同,可以是氢,卤素,C 1-20烷基,C 3-8 - 环烷基,C 2-10 - 烯基,芳基,OR 6,NR 7 R 8,SR 9,SO 3 H或COOR 10和 R4和R5可以相同或不同,可以是氢,卤素,C 1-20烷基,C 3-8 - 环烷基,C 2-10 - 烯基,芳基,OR 6,NR 7 R 8或SR 9,R 6,R 7,R 8 ,R 9和R 10可以相同或不同,并且可以是氢,C 1-30 - 烷基,C 3-8 - 环烷基,C 2-10 - 烯基或芳基,其中C 1-20 - 烷基可以是未取代的或被一个或多个 C 3-8 - 环烷基,C 2-10 - 烯基,苯基,卤素,OR 11,NR 12 R 13,SR 14,SO 3 H或COOR 15,芳基可以是未被取代的或被一个或多个卤素取代,C 1-10烷基,卤代C 1-10 - 烷基,C 3-8 - 环烷基C2-10 - 烯基,苯基,OR11,NR12R13,SR14,SO3H或COOR15,其中 在R 11,R 12,R 13,R 14和R 15可以相同或不同,可以是氢,C 1-10 - 烷基,C 3-8 - 环烷基或C 2-10 - 烯基,一种制备这些组合物的方法, 涂覆这些组合物的基材,用这些组合物涂布的基材,使用这些组合物制备标记的基材的方法,通过后一方法获得的标记的底物和某些显色剂。

    Sulphonium salt initiators
    8.
    发明授权
    Sulphonium salt initiators 有权
    锍盐引发剂

    公开(公告)号:US08512934B2

    公开(公告)日:2013-08-20

    申请号:US12681784

    申请日:2008-09-29

    Abstract: Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2-C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and interrupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1-C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6-C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6-C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

    Abstract translation: 式(I)化合物,其中X为单键,CRaRbO,S,NRC,NCORC,CO,SO或SO2; L,L1,L2,L3,L4,L5,L6,L7和L8例如为氢,R1或COT; T表示T1或O-T2; 例如,T 1和T 2是氢,C 1 -C 20烷基,C 3 -C 12环烷基,C 2 -C 20烯基,C 5 -C 12环烯基,C 6 -C 14芳基,C 3 -C 12杂芳基,被一个或多个D,C 2 -C 20烷基取代的C 1 -C 20烷基,被一个或多个 E,被一个或多个D取代并被一个或多个E或Q中断的C 2 -C 20烷基; R1,R2,R3,R4,Ra,Rb和Rc为T1; D是例如R5,OR5,SR5或Q1; E例如为O,S,COO或Q2; R5和R6例如是氢,C1-C12烷基或苯基; Q是例如C 6 -C 12二环烷基,C 6 -C 12双环烯基或C 6 -C 12三环烷基; Q1是例如C 6 -C 14芳基或C 3 -C 12杂芳基; Q2是例如C 6 -C 14亚芳基或C 3 -C 12杂芳基; Y是阴离子; M是阳离子; 条件是L,L1,L2,L3,L4,L5,L6,L7和L8中的至少一个不是氢; 并且(i)T1或T2中的至少一个是组Q; 或(ii)至少一个D为基团Q1; 或(iii)至少一个E为基团Q2; 适合作为光催化剂。

    Process for the production of strongly adherent coatings
    9.
    发明授权
    Process for the production of strongly adherent coatings 有权
    生产强粘附涂层的方法

    公开(公告)号:US08414982B2

    公开(公告)日:2013-04-09

    申请号:US11792747

    申请日:2005-12-12

    Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, wherein in a first step a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step b) one or more defined photoinitiators or mixtures of defined photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate, in a third step c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) on the substrate so pretreated is applied a further coating.

    Abstract translation: 本发明涉及一种用于在无机或有机基底上生产强粘附涂层的方法,其中在第一步骤中,a)使低温等离子体,电晕放电或火焰作用于无机或有机基底上, 在第二步中b)将一种或多种限定的光引发剂或含有至少一种烯键式不饱和基团的单体,或上述物质的溶液,悬浮液或乳液的限定的光引发剂或混合物,优选常压下施用于 无机或有机衬底,第三步骤c)使用合适的方法,将上述物质用电磁波干燥和/或照射,并且任选地在第四步骤d)中,将预处理施加到另外的涂层上。

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