公开(公告)号：US6008914A

公开(公告)日：1999-12-28

申请号：US935161

申请日：1997-09-22

申请人： Tomohiro Sasagawa ,  Kenyu Haruta ,  Yukio Sato ,  Hitoshi Wakata, deceased ,  Mitsuo Inoue ,  Akihiro Suzuki ,  Shuichi Fujikawa ,  Yoshio Saito

发明人： Tomohiro Sasagawa ,  Kenyu Haruta ,  Yukio Sato ,  Hitoshi Wakata, deceased ,  Mitsuo Inoue ,  Akihiro Suzuki ,  Shuichi Fujikawa ,  Yoshio Saito

IPC分类号： B23K26/06 ,  B23K26/067 ,  B23K26/38 ,  G03H1/08 ,  G03H1/16 ,  G02B5/32 ,  G02B27/44 ,  G02B27/46

CPC分类号： G03H1/0005 ,  B23K26/0604 ,  B23K26/066 ,  B23K26/067 ,  B23K26/386 ,  G03H1/08 ,  G03H1/16 ,  G03H2001/0094

摘要： The laser transfer machining apparatus comprises a shaping unit for shaping the laser beam so that the laser beam has a beam pattern which corresponds to a desired pattern to be machined in the object to be machined and a generating unit disposed separately from the shaping unit for simultaneously generating a plurality of laser beams each having the beam pattern from the laser beam shaped by the shaping unit. The generating unit is adapted to emit the plural laser beams while simultaneously defining a plurality of radiation directions of the generated plural laser beams to the object to be machined. The laser transfer machining apparatus can provide a high efficiency of utilization of light and reduce the time required for machining. Furthermore, the laser transfer machining apparatus can utilize a laser with a relatively low spatially coherence such as an eximer laser.

摘要翻译： 激光传递加工装置包括：成形单元，用于使激光束成形，使得激光束具有对应于待加工物体中要加工的期望图案的光束图案;以及与成形单元分开设置的发生单元，用于同时 产生多个激光束，每个激光束具有来自由成形单元成形的激光束的光束图案。 发生单元适于发射多个激光束，同时将所生成的多个激光束的多个辐射方向限定到待加工物体。 激光转印加工装置可以提供高效率的光利用并减少加工所需的时间。 此外，激光转印加工装置可以利用具有较低空间相干性的激光器，例如准分子激光器。

公开(公告)号：US6110291A

公开(公告)日：2000-08-29

申请号：US689313

申请日：1996-08-07

申请人： Kenyu Haruta ,  Koichi Ono ,  Hitoshi Wakata ,  Mutsumi Tsuda ,  Yoshio Saito ,  Keisuke Nanba ,  Kazuyoshi Kojima ,  Tetsuya Takami ,  Akihiro Suzuki ,  Tomohiro Sasagawa ,  Kenichi Kuroda ,  Toshiyuki Oishi ,  Yukihiko Wada ,  Akihiko Furukawa ,  Yasuji Matsui ,  Akimasa Yuki ,  Takaaki Kawahara ,  Hideki Yabe ,  Taisuke Furukawa ,  Kouji Kise ,  Noboru Mikami ,  Tsuyoshi Horikawa ,  Tetsuo Makita ,  Kazuo Kuramoto ,  Naohiko Fujino ,  Hiroshi Kuroki ,  Tetsuo Ogama ,  Junji Tanimura

发明人： Kenyu Haruta ,  Koichi Ono ,  Hitoshi Wakata ,  Mutsumi Tsuda ,  Yoshio Saito ,  Keisuke Nanba ,  Kazuyoshi Kojima ,  Tetsuya Takami ,  Akihiro Suzuki ,  Tomohiro Sasagawa ,  Kenichi Kuroda ,  Toshiyuki Oishi ,  Yukihiko Wada ,  Akihiko Furukawa ,  Yasuji Matsui ,  Akimasa Yuki ,  Takaaki Kawahara ,  Hideki Yabe ,  Taisuke Furukawa ,  Kouji Kise ,  Noboru Mikami ,  Tsuyoshi Horikawa ,  Tetsuo Makita ,  Kazuo Kuramoto ,  Naohiko Fujino ,  Hiroshi Kuroki ,  Tetsuo Ogama ,  Junji Tanimura

IPC分类号： C23C14/02 ,  C23C14/08 ,  C23C14/22 ,  C23C14/28 ,  C23C14/34 ,  C23C14/54 ,  C23C14/56 ,  C23C14/00

CPC分类号： C23C14/087 ,  C23C14/022 ,  C23C14/22 ,  C23C14/28 ,  C23C14/3471 ,  C23C14/54 ,  C23C14/541 ,  C23C14/547 ,  C23C14/564 ,  Y10S505/732

摘要： A thin film forming apparatus using laser includes a chamber (1), a target (5) placed therein, a laser light source (10) for emitting laser beam to target (5), and a substrate holder (3). When target (5) is irradiated with laser beam (16), a plume (15) is generated, and materials included in plume (15) are deposited on the surface of a substrate (2) held by substrate holder (3). The laser beam emitted from laser light source (10) has its cross section shaped to a desired shape when passed through a shielding plate (4804), for example, so that the surface of the target (5) is irradiated with the beam having uniform light intensity distribution. Therefore, a plume (15) having uniform density distribution of active particles is generated, and therefore a thin film of high quality can be formed over a wide area with uniform film quality, without damaging the substrate.

公开(公告)号：US5305338A

公开(公告)日：1994-04-19

申请号：US757419

申请日：1991-09-10

申请人： Hitoshi Wakata ,  Akihiro Suzuki ,  Kenyu Haruta ,  Haruhiko Nagai ,  Akihiko Iwata ,  Shinji Murata ,  Isamu Tanakura ,  Tomohiro Sasagawa ,  Yuito Kimura

发明人： Hitoshi Wakata ,  Akihiro Suzuki ,  Kenyu Haruta ,  Haruhiko Nagai ,  Akihiko Iwata ,  Shinji Murata ,  Isamu Tanakura ,  Tomohiro Sasagawa ,  Yuito Kimura

IPC分类号： H01S3/0971 ,  H01S3/00 ,  H03K17/08

CPC分类号： H01S3/0971 ,  H01L2924/0002

摘要： A switch device used for a laser device, includes series-parallel connected switch elements or modules. The switch elements or modules are simultaneously turned on by trigger signals from trigger circuits. The transmission lines for connecting the trigger circuits to respective switch elements are equal to one another in length. A protecting circuit is provided for the switch elements, and indicators are provided for indicating the shortcircuit of the switch elements. In the switch device, the number of wires for the switch elements is made small and heat generated from the switch elements is effectively radiated. The modules are easily stacked, and firmly connected to a control unit for controlling the switch elements. A discharge excited laser device using the switch device has a high efficiency and a long lifetime and is reliable.

摘要翻译： 用于激光装置的开关装置包括串联并联的开关元件或模块。 开关元件或模块通过来自触发电路的触发信号同时导通。 用于将触发电路连接到各个开关元件的传输线的长度彼此相等。 为开关元件提供保护电路，并且提供用于指示开关元件的短路的指示器。 在开关装置中，用于开关元件的导线的数量变小，并且从开关元件产生的热量被有效地辐射。 模块容易堆叠，并且牢固地连接到用于控制开关元件的控制单元。 使用开关器件的放电激发激光器具有高效率和长寿命，并且是可靠的。

公开(公告)号：US5258994A

公开(公告)日：1993-11-02

申请号：US718534

申请日：1991-06-19

申请人： Kenyu Haruta ,  Akihiro Suzuki ,  Akihiko Iwata ,  Yasushi Minamitani ,  Hitoshi Wakata ,  Tomohiro Sasagawa ,  Takashi Kumagai

发明人： Kenyu Haruta ,  Akihiro Suzuki ,  Akihiko Iwata ,  Yasushi Minamitani ,  Hitoshi Wakata ,  Tomohiro Sasagawa ,  Takashi Kumagai

IPC分类号： H01S3/0971 ,  H01S3/097

CPC分类号： H01S3/0971

摘要： A discharge-excited laser apparatus includes a pair of discharge electrodes extending in a direction of an optical axis; a plurality of charging capacitors charged by a power source; a plurality of peaking capacitors arranged in parallel in a longitudinal direction of the discharge electrodes and receiving energy accumulated in the charging capacitors; and a plurality of semiconductor switches arranged with conductive plates in the longitudinal direction of the discharge electrodes and connected in series and in parallel to the peaking capacitors. The construction of the semiconductor switches enables uniform shift of the energy in the charging capacitors to the peaking capacitors and reduction of inductance of a loop for capacity shifting.

摘要翻译： 放电激励激光装置包括沿光轴方向延伸的一对放电电极; 由电源充电的多个充电电容器; 多个峰值电容器，沿着放电电极的纵向方向平行设置，并且接收蓄积在充电电容器中的能量; 以及多个半导体开关，其沿着放电电极的长度方向排列有导电板，并且与峰值电容器串联并联。 半导体开关的结构使得充电电容器中的能量均匀地移动到峰值电容器，并且减小用于容量偏移的回路的电感。

公开(公告)号：US06753548B2

公开(公告)日：2004-06-22

申请号：US10420779

申请日：2003-04-23

申请人： Tetsuya Ogawa ,  Hidetada Tokioka ,  Yukio Sato ,  Mitsuo Inoue ,  Tomohiro Sasagawa ,  Mitsutoshi Miyasaka

发明人： Tetsuya Ogawa ,  Hidetada Tokioka ,  Yukio Sato ,  Mitsuo Inoue ,  Tomohiro Sasagawa ,  Mitsutoshi Miyasaka

IPC分类号： H01L2904

CPC分类号： H01L27/1285 ,  B23K26/0732 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/268 ,  H01L27/1296

摘要： The laser heat treatment of an amorphous or polycrystalline silicon film material is conducted by forming a laser beam generated from a pulse laser source having a wavelength of 350 nm to 800 nm into a linear beam having a width and a length, and directing the linear beam onto a film material formed on a substrate.

摘要翻译： 通过将具有350nm至800nm波长的脉冲激光源产生的激光束形成为具有宽度和长度的直线光束来进行非晶或多晶硅膜材料的激光热处理，并且引导线性光束 在形成在基板上的薄膜材料上。

公开(公告)号：US06566683B1

公开(公告)日：2003-05-20

申请号：US09708608

申请日：2000-11-09

申请人： Tetsuya Ogawa ,  Hidetada Tokioka ,  Yukio Sato ,  Mitsuo Inoue ,  Tomohiro Sasagawa ,  Mitsutoshi Miyasaka

发明人： Tetsuya Ogawa ,  Hidetada Tokioka ,  Yukio Sato ,  Mitsuo Inoue ,  Tomohiro Sasagawa ,  Mitsutoshi Miyasaka

IPC分类号： H01L2904

CPC分类号： H01L27/1285 ,  B23K26/0732 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/268 ,  H01L27/1296

摘要： The laser heat treatment of an amorphous or polycrystalline silicon film material is conducted by forming a laser beam generated from a pulse laser source having a wavelength of 350 nm to 800 nm into a linear beam having a width and a length, and directing the linear beam onto a film material formed on a substrate.

摘要翻译： 通过将具有350nm至800nm波长的脉冲激光源产生的激光束形成为具有宽度和长度的直线光束来进行非晶或多晶硅膜材料的激光热处理，并且引导线性光束 在形成在基板上的薄膜材料上。

公开(公告)号：US06437284B1

公开(公告)日：2002-08-20

申请号：US09599645

申请日：2000-06-23

申请人： Tatsuki Okamoto ,  Tetsuya Ogawa ,  Keisuke Furuta ,  Hidetada Tokioka ,  Tomohiro Sasagawa ,  Junichi Nishimae ,  Mitsuo Inoue ,  Yukio Sato

发明人： Tatsuki Okamoto ,  Tetsuya Ogawa ,  Keisuke Furuta ,  Hidetada Tokioka ,  Tomohiro Sasagawa ,  Junichi Nishimae ,  Mitsuo Inoue ,  Yukio Sato

IPC分类号： B23K2606

CPC分类号： B23K26/0732 ,  B23K2101/40 ,  H01L21/02675 ,  H01L21/2026

摘要： An optical system that controls laser beam spot profile for forming a high performance thin film by a laser heat treatment process is provided. In the optical system that irradiates a rectangular laser beam on a film formed on a substrate, intensity distribution forming, apparatus makes the intensity distribution uniform in the longitudinal direction while maintaining the properties of the laser beam 2 such as directivity in the direction of shorter side, making it possible to concentrate the light to a limit permitted by the nature of the laser beam and achieve the maximum intensity gradient on the film disposed on the substrate. Thus a steep temperature distribution can be generated on the film disposed on the substrate and, as a result, high performance thin film can be formed.

摘要翻译： 提供了通过激光热处理工艺控制用于形成高性能薄膜的激光束光斑轮廓的光学系统。 在形成在基板上的膜上照射矩形激光束的光学系统中，强度分布形成装置使得强度分布沿长度方向均匀，同时保持激光束2的特性，例如沿短边方向的方向性 ，使得可以将光集中到由激光束的性质允许的极限，并且在设置在基板上的膜上实现最大强度梯度。 因此，可以在设置在基板上的膜上产生陡峭的温度分布，结果，可以形成高性能的薄膜。

公开(公告)号：US07098953B2

公开(公告)日：2006-08-29

申请号：US09756191

申请日：2001-01-09

申请人： Mitsuo Inoue ,  Tomohiro Sasagawa ,  Hiroaki Sugiura ,  Masao Hamamura

发明人： Mitsuo Inoue ,  Tomohiro Sasagawa ,  Hiroaki Sugiura ,  Masao Hamamura

IPC分类号： G02B13/16 ,  H04N5/225

CPC分类号： H04N5/3415 ,  H04N2201/0458

摘要： An imaging apparatus including at least an imaging device having a plurality of photoelectric transfer devices arranged in matrix-shape to detect a light irradiated to each photoelectric transfer device and transfer to electric signal, and imaging means for imaging an image of a photogenic object on a surface of the imaging devices. The imaging means images at least two similar images of the photogenic subject on different area of the surface of the imaging device, and the imaging apparatus further includes electric signal processing means to form one image of photogenic subject from at least two images of photogenic subject. Since a plurality of images of photogenic subject can be formed on the imaging device by a plurality of image formation lenses, a thinner imaging apparatus can be realized.

摘要翻译： 一种成像装置，至少包括具有多个光电转移装置的成像装置，所述光电转移装置以矩阵形状排列，以检测照射到每个光电转移装置并转移到电信号的光;以及成像装置，用于将成像物体的图像成像在 成像装置的表面。 成像是指成像装置的表面的不同区域上的成像对象的至少两个相似图像的图像，并且成像装置还包括电信号处理装置，用于从至少两个成像受试者的图像形成成像受试者的一个图像。 由于可以通过多个成像透镜在成像装置上形成多个成像对象的图像，因此可以实现更薄的成像装置。

公开(公告)号：US20060250514A1

公开(公告)日：2006-11-09

申请号：US11482819

申请日：2006-07-10

申请人： Mitsuo Inoue ,  Tomohiro Sasagawa ,  Hiroaki Sugiura ,  Masao Hamamura

发明人： Mitsuo Inoue ,  Tomohiro Sasagawa ,  Hiroaki Sugiura ,  Masao Hamamura

IPC分类号： G02B13/16

CPC分类号： H04N5/2254 ,  H04N5/2252 ,  H04N13/156 ,  H04N13/218

摘要： An imaging apparatus including at least an imaging device having a plurality of photoelectric transfer devices arranged in matrix-shape to detect a light irradiated to each photoelectric transfer device and transfer to electric signal, and imaging means for imaging an image of a photogenic object on a surface of the imaging devices. The imaging means images at least two similar images of the photogenic subject on different area of the surface of the imaging device, and the imaging apparatus further includes electric signal processing means to form one image of photogenic subject from at least two images of photogenic subject. Since a plurality of images of photogenic subject can be formed on the imaging device by a plurality of image formation lenses, a thinner imaging apparatus can be realized.

公开(公告)号：US06573161B1

公开(公告)日：2003-06-03

申请号：US09674645

申请日：2000-11-02

申请人： Mitsutoshi Miyasaka ,  Tetsuya Ogawa ,  Hidetada Tokioka ,  Yukio Satoh ,  Mitsuo Inoue ,  Tomohiro Sasagawa

发明人： Mitsutoshi Miyasaka ,  Tetsuya Ogawa ,  Hidetada Tokioka ,  Yukio Satoh ,  Mitsuo Inoue ,  Tomohiro Sasagawa

IPC分类号： H01L2120

CPC分类号： H01L21/02686 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/0262 ,  H01L21/02683 ,  H01L21/02691 ,  H01L21/2026 ,  H01L21/268 ,  H01L27/1296 ,  H01L29/04 ,  H01L29/66757

摘要： A fabrication process is provided for semiconductor devices having a crystalline semiconductor film formed on a substrate, the semiconductor film being an active layer of a transistor and being mainly composed of silicon, and includes at least an underlevel protection layer fabrication step of forming a silicon oxide film as an underlevel protection layer on the substrate; a first processing step of forming a semiconductor film, which is mainly composed of silicon, on the underlevel protection layer; and a second processing step of irradiating a pulsed laser light on the semiconductor film. The semiconductor film is irradiated by a pulsed laser, the wavelength of the pulsed laser light is between 370 and 710 nm. As a result, using a low temperature process, high performance thin film semiconductor devices can be produced simply and reliably.

摘要翻译： 本发明提供一种半导体器件的制造方法，该半导体器件具有在基板上形成的结晶半导体膜，该半导体膜是主要由硅组成的晶体管的有源层，并且至少包括形成氧化硅的底层保护层制造步骤 膜作为衬底上的底层保护层; 在衬底保护层上形成主要由硅构成的半导体膜的第一处理步骤; 以及在半导体膜上照射脉冲激光的第二处理步骤。 半导体膜被脉冲激光照射，脉冲激光的波长在370和710nm之间。 结果，使用低温工艺，可以简单可靠地制造高性能薄膜半导体器件。