摘要:
There is provided a scanning electron microscope capable of achieving a size reduction of the device while at the same time suppressing the increase in column temperature as well as maintaining performance, e.g., resolution, etc. With respect to a scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons from the sample, the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens.
摘要:
There is provided a scanning electron microscope capable of achieving a size reduction of the device while at the same time suppressing the increase in column temperature as well as maintaining performance, e.g., resolution, etc. With respect to a scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons from the sample, the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens.
摘要:
An object of the invention is provide a scanning electron microscope including a permanent magnet forming a condenser lens with a variable value of probe current.To achieve the object, the scanning electron microscope including the permanent magnet forming the condenser lens as an embodiment of the invention, includes a mechanism for adjusting a distance between an electron source and an anode electrode. Further, the mechanism for adjusting the distance between the electron source and the anode electrode, includes a removable spacer arranged under a lower portion of the anode electrode.
摘要:
Provided is an inspection apparatus or observation apparatus enabling appropriate inspection or observation of a sample in an easy-to-use manner, using a charged-particle technique and an optical technique. Specifically, provided is an inspection or observation apparatus including: a first casing forming at least part of a first space constituting at least part of a region through which a primary charged-particle beam emitted from a charged-particle irradiation section reaches a sample, the first space capable of being maintained in a vacuum state; a second casing provided on the first casing to form at least part of a second space capable of storing the sample therein; a partition wall section for partitioning the first space and the second space from each other, the partition wall section disposed so as to be coaxial with the charged-particle irradiation section when the sample is irradiated with the primary charged-particle beam from the charged-particle irradiation section; and an optical observation section for casting light onto the sample and detecting light from the sample from the same direction as the charged-particle irradiation section.
摘要:
A scanning electron microscope includes a main scanning electron microscope unit having an electron optical column and a sample chamber, a controller over the main scanning electron microscope unit, a single housing that houses both the main scanning electron microscope unit and the controller, and a bottom plate disposed under the single housing, the main scanning electron microscope unit and the controller. A first leg member is attached to a bottom face of the bottom plate on a side of the controller with a first opening hole provided through the bottom plate on a side of the main scanning electron microscope unit, and a damper is fixed to a bottom face of the main scanning electron microscope unit and disposed through the first opening hole.
摘要:
Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that a thin film (10) is used to separate a vacuum environment and an air atmosphere (or a gas environment), an attachment (121) capable of holding the thin film (10) and whose interior can be maintained at an air atmosphere or a gas environment is inserted into a vacuum chamber (7) of a high vacuum charged particle microscope. The attachment (121) is vacuum-sealed and fixed to a vacuum partition of the vacuum sample chamber. Image quality is further improved by replacing the atmosphere in the attachment with helium or a light-elemental gas that has a lower mass than atmospheric gases such as nitrogen or water vapor.
摘要:
In an environmental scanning electron microscope in which differential pumping for maintaining the pressure ratio between an electron optical system and a specimen chamber at a predetermined value is effected and a probe electric current is conditioned to meet a predetermined or more value so as to permit observation of uncooked food and moist specimens in low vacuum, there are provided three stages of objective apertures used as apertures for an objective lens for an electron beam in the electron optical system and used also as orifices for differential pumping for maintaining the pressure ratio between the electron optical system and the specimen chamber at a predetermined value. Then, a deflection fulcrum of the electron beam in the electron optical system is set at a mid stage of the three-stage objective aperture.
摘要:
A charged particle beam device capable of observing a sample in an air atmosphere or gas atmosphere has a thin film for separating the atmospheric pressure space from the decompressed space. A vacuum evacuation pump evacuates a first housing; and a detector detects a charged particle beam (obtained by irradiation of the sample) in the first housing. A thin film is provided to separate the inside of the first housing and the inside of a second housing at least along part of the interface between the first and second housings. An opening part is formed in the thin film so that its opening area on a charged particle irradiation unit's side is larger than its opening area on the sample side; and the thin film which covers the sample side of the opening part transmits or allows through the primary charged particle beam and the charged particle beam.