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公开(公告)号：US08351022B2
公开(公告)日：2013-01-08
申请号：US12774284
申请日：2010-05-05
CPC分类号： G03B27/54 , G03F7/7025
摘要： A radiation beam modification apparatus for controlling a property of a beam of radiation in a lithographic apparatus includes a flexible sheet provided with a plurality of apertures, and a positioning apparatus comprising a first rotatable member and a second rotatable member, wherein a first end portion of the flexible sheet is coupled to the first rotatable member, a second end portion of the flexible sheet is coupled to the second rotatable member and a central portion of the flexible sheet extends between the first rotatable member and the second rotatable member. The apertures may be used to control the numerical aperture of a projection system of a lithographic apparatus.
摘要翻译： 用于控制光刻设备中的辐射束的性质的辐射束修改设备包括设置有多个孔的柔性片和包括第一可旋转构件和第二可旋转构件的定位装置，其中第一端部 柔性片联接到第一可旋转构件，柔性片的第二端部联接到第二可旋转构件，并且柔性片的中心部分在第一可旋转构件和第二可旋转构件之间延伸。 孔可用于控制光刻设备的投影系统的数值孔径。
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公开(公告)号：US20100315612A1
公开(公告)日：2010-12-16
申请号：US12774284
申请日：2010-05-05
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/7025
摘要： A radiation beam modification apparatus for controlling a property of a beam of radiation in a lithographic apparatus includes a flexible sheet provided with a plurality of apertures, and a positioning apparatus comprising a first rotatable member and a second rotatable member, wherein a first end portion of the flexible sheet is coupled to the first rotatable member, a second end portion of the flexible sheet is coupled to the second rotatable member and a central portion of the flexible sheet extends between the first rotatable member and the second rotatable member. The apertures may be used to control the numerical aperture of a projection system of a lithographic apparatus.
摘要翻译： 用于控制光刻设备中的辐射束的性质的辐射束修改设备包括设置有多个孔的柔性片和包括第一可旋转构件和第二可旋转构件的定位装置，其中第一端部 柔性片联接到第一可旋转构件，柔性片的第二端部联接到第二可旋转构件，并且柔性片的中心部分在第一可旋转构件和第二可旋转构件之间延伸。 孔可用于控制光刻设备的投影系统的数值孔径。
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公开(公告)号：US20120229782A1
公开(公告)日：2012-09-13
申请号：US13408471
申请日：2012-02-29
申请人： Han-Kwang Nienhuys , Martinus Anges Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Olesksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Anges Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Olesksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
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公开(公告)号：US20110075154A1
公开(公告)日：2011-03-31
申请号：US12964483
申请日：2010-12-09
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
摘要翻译： 一种用于校准光刻设备中的编码器的方法，所述编码器包括传感器和光栅，所述编码器被配置为测量所述光刻设备的可移动支撑件的位置，所述方法包括使用干涉仪测量所述可移动支撑件的位置; 并且基于由干涉仪测量的可移动支撑件的位置来校准编码器。
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公开(公告)号：US07880901B2
公开(公告)日：2011-02-01
申请号：US12781202
申请日：2010-05-17
CPC分类号： G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
摘要： A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
摘要翻译： 一种用于校准光刻设备中的编码器的方法，所述编码器包括传感器和光栅，所述编码器被配置为测量所述光刻设备的可移动支撑件的位置，所述方法包括使用干涉仪测量所述可移动支撑件的位置; 并且基于由干涉仪测量的可移动支撑件的位置来校准编码器。
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公开(公告)号：US20080297744A1
公开(公告)日：2008-12-04
申请号：US11806662
申请日：2007-06-01
申请人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
发明人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
摘要翻译： 浸没式光刻设备被描述为具有排出构造以从衬底的边缘和其上支撑衬底的衬底台之间的间隙去除液体的漏液。 排水管设置有向衬底提供液体的装置，而与衬底台的位置无关，和/或在排水管内使气体饱和的装置。 这些措施减少了由于排水管中的液体蒸发导致的热负荷变化。
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7.发明授权Lithographic apparatus, projection system, method of projecting and device manufacturing method 有权平版印刷设备，投影系统，投影方法和器件制造方法公开(公告)号：US07170580B2
公开(公告)日：2007-01-30
申请号：US10823772
申请日：2004-04-14
CPC分类号： G03F9/7019 , G03F7/70258 , G03F7/70725 , G03F7/70775 , G03F7/709 , G03F9/7011
摘要： A projection system includes at least one projection device configured to receive a beam of radiation coming from a first object and project the beam to a second object. The projection system further includes a sensor configured to measure a spatial orientation of the at least one projection device and a processing unit configured to communicate with the at least one sensor. The processing unit is configured to communicate with a positioning device configured to adjust the position of at least one of the first object and the second object based on the measured spatial orientation of the at least one projection device.
摘要翻译： 投影系统包括至少一个投影装置，其被配置为接收来自第一物体的辐射束并且将光束投射到第二物体。 投影系统还包括被配置为测量所述至少一个投影装置的空间取向的传感器和被配置为与所述至少一个传感器通信的处理单元。 处理单元被配置成与定位装置进行通信，该定位装置被配置为基于所测量的至少一个投影装置的空间取向来调整第一物体和第二物体中的至少一个的位置。
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8.发明授权Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby 失效平版印刷设备，校准方法，校准板，器件制造方法以及由此制造的器件公开(公告)号：US06955074B2
公开(公告)日：2005-10-18
申请号：US10746141
申请日：2003-12-29
申请人： Leon Martin Levasier , Anastasius Jacobus Anicetus Bruinsma , Jacob Fredrik Friso Klinkhamer , Gerrit Johannes Nijmeijer , Petra Albertina Margaretha Dekkers-Rog
发明人： Leon Martin Levasier , Anastasius Jacobus Anicetus Bruinsma , Jacob Fredrik Friso Klinkhamer , Gerrit Johannes Nijmeijer , Petra Albertina Margaretha Dekkers-Rog
CPC分类号： G03F7/7085 , G03F7/70516 , G03F9/7011 , G03F9/7019 , G03F9/7034 , Y10T29/49771
摘要： A method according to one embodiment of the invention may be performed using a calibration plate having at least one alignment marker and at least one height profile. First, the calibration plate is positioned using an alignment sensor. Then the height profile is measured by a height sensor. Then the calibration plate is rotated by substantially 180 degrees and the two operations are repeated. This procedure results in two measured height profiles, which are compared in order to find a best fit. The amount of shift performed to find the best fit is used to determine a distance between the alignment marker and the X,Y position of the measurement point of the height sensor.
摘要翻译： 根据本发明的一个实施例的方法可以使用具有至少一个对准标记和至少一个高度轮廓的校准板进行。 首先，使用对准传感器定位校准板。 然后通过高度传感器测量高度轮廓。 然后校准板旋转大约180度，并重复两次操作。 该过程导致两个测量的高度分布，其被比较以找到最佳拟合。 用于找到最佳拟合的移位量用于确定对准标记与高度传感器测量点的X，Y位置之间的距离。
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9.发明授权Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method 有权用于校准可以应用这种方法的光刻投影装置和装置的方法公开(公告)号：US06710849B2
公开(公告)日：2004-03-23
申请号：US09944145
申请日：2001-09-04
IPC分类号： G03B2742
CPC分类号： G03F9/7015 , G03F7/70733 , G03F7/7075
摘要： A method for calibrating a lithographic projection apparatus includes identifying a set of two or more reference positions of one a first and a second object table WTa, WTb or MT with a first detection system and simultaneously measuring those reference positions with a first position measuring system, identifying the same set of reference positions of said one object table with a second detection system and simultaneously measuring those reference positions with a second position measuring system, and correlating said first and said second position measuring systems using the measurements of the reference positions.
摘要翻译： 一种用于校准光刻投影设备的方法包括用第一检测系统识别第一和第二物体台WTa，WTb或MT中的一个的两个或更多个参考位置的集合，并且利用第一位置测量系统同时测量这些参考位置， 使用第二检测系统识别所述一个物体表的相同的一组参考位置，并且利用第二位置测量系统同时测量这些参考位置，并且使用参考位置的测量来相关所述第一和所述第二位置测量系统。
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公开(公告)号：US08797504B2
公开(公告)日：2014-08-05
申请号：US13408471
申请日：2012-02-29
申请人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
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