Photosensitive polyimide composition, polyimide film and semiconductor device using the same
    10.
    发明授权
    Photosensitive polyimide composition, polyimide film and semiconductor device using the same 失效
    光敏聚酰亚胺组合物,聚酰亚胺膜和使用其的半导体器件

    公开(公告)号:US07745096B2

    公开(公告)日:2010-06-29

    申请号:US11861948

    申请日:2007-09-26

    IPC分类号: G03F7/004 G03F7/30

    摘要: A photosensitive polyimide composition, a polyimide film, and a semiconductor device using the same are disclosed. The photosensitive polyimide composition can be cured by heating. A polyhydroxyimide is used as a base resin and can be mixed with a photoacid generator and a cross-linking agent having two or more vinylether groups. A film of the photosensitive polyimide composition can be developed by treatment with an alkaline aqueous solution. Embodiments of the invention enable improvement in production yield and reliability in a highly-integrated memory semiconductor packaging processes.

    摘要翻译: 公开了光敏聚酰亚胺组合物,聚酰亚胺膜和使用其的半导体器件。 感光性聚酰亚胺组合物可以通过加热固化。 使用聚羟基酰亚胺作为基础树脂,并且可以与光酸产生剂和具有两个或更多个乙烯基醚基团的交联剂混合。 感光性聚酰亚胺组合物的膜可以通过用碱性水溶液处理而显影。 本发明的实施例能够在高度集成的存储器半导体封装工艺中提高生产成品率和可靠性。