公开(公告)号：US07485690B2

公开(公告)日：2009-02-03

申请号：US11148380

申请日：2005-06-09

申请人： Yoshitaka Hamada ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Takeshi Asano ,  Takafumi Ueda ,  Dirk Pfeiffer

发明人： Yoshitaka Hamada ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Takeshi Asano ,  Takafumi Ueda ,  Dirk Pfeiffer

IPC分类号： C08G77/08

CPC分类号： G03F7/094 ,  G03F7/0752 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/76808

摘要： A sacrificial film-forming composition is provided comprising (A) a silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formulae (1) and (2): X—Y—SiZ3  (1) RnSiZ4-n  (2) wherein Z is a hydrolyzable group, X is a crosslinkable organofunctional group such as an unsubstituted hydroxyl group or a substituted or unsubstituted epoxy, acyloxy or acryloxy group, Y is a single bond or a divalent hydrocarbon group, R is hydrogen or a monovalent hydrocarbon group, and n is an integer of 0 to 3, the silicone resin being capable of crosslinking reaction by the crosslinkable organofunctional group in formula (1), (B) a crosslinking agent, (C) an acid generator, and (D) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is effectively dissolvable in a stripping solution.

摘要翻译： 提供牺牲性成膜组合物，其包含（A）作为具有式（1）和（2）的可水解硅烷的共水解缩合物的硅氧烷树脂：<？在线配方说明=“在线配方” end =“lead”？> XY-SiZ3（1）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line formula end =“lead”？> RnSiZ4-n（2）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中Z是可水解基团，X是可交联的有机官能团，例如 未取代的羟基或取代或未取代的环氧基，酰氧基或丙烯酰氧基，Y为单键或二价烃基，R为氢或一价烃基，n为0〜3的整数，有机硅树脂为 能够通过式（1）中的交联性有机官能团交联反应，（B）交联剂，（C）酸产生剂和（D）有机溶剂进行交联反应。 该组合物具有提高的储存稳定性，填充性能，粘附性和涂层均匀性，足以形成有效地溶解在剥离溶液中的牺牲膜。

公开(公告)号：US07417104B2

公开(公告)日：2008-08-26

申请号：US11148371

申请日：2005-06-09

申请人： Motoaki Iwabuchi ,  Yoshitaka Hamada ,  Tsutomu Ogihara ,  Takeshi Asano ,  Takafumi Ueda

发明人： Motoaki Iwabuchi ,  Yoshitaka Hamada ,  Tsutomu Ogihara ,  Takeshi Asano ,  Takafumi Ueda

IPC分类号： C08G77/08 ,  C08L83/04

CPC分类号： C08G77/04 ,  C08G77/08 ,  C08G77/14 ,  C09D183/04 ,  C09D183/06 ,  G03F7/0757 ,  H01L21/02123 ,  H01L21/02211 ,  H01L21/02282 ,  H01L21/0276 ,  H01L21/31144 ,  H01L21/3121 ,  H01L21/76808

摘要： A porous film-forming composition is provided comprising (A) a polymer obtained by hydrolytic condensation of a hydrolyzable silane having formula (1): R1n—Si—R24-n  (1) wherein R1 is a monovalent organic group or hydrogen, R2 is a hydrolyzable group or a hydroxyl group and n is an integer of 0 to 3, a hydrolyzate thereof or a partial condensate thereof, with the proviso that at least one silicon compound having an organic crosslinkable group as R1 is included, the polymer being capable of crosslinking reaction by the organic crosslinkable group, and (B) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is dissolvable in a stripping solution.

摘要翻译： 提供了一种多孔成膜组合物，其包含（A）通过具有式（1）的可水解硅烷的水解缩合得到的聚合物：<？in-line-formula description =“In-line Formulas”end =“lead” （1）<β在线公式描述中的一个或多个（1） 其中R 1是一价有机基团或氢，R 2是可水解基团或羟基，并且其中R 1是一价有机基团或氢原子， n为0〜3的整数，其水解物或其部分缩合物，条件是含有至少一种具有有机交联基团的硅化合物为R 1，所述聚合物能够 通过有机交联基团进行交联反应，和（B）有机溶剂。 该组合物具有提高的储存稳定性，填充性能，粘合性和涂层均匀性，足以形成可溶于剥离溶液中的牺牲膜。

公开(公告)号：US07541134B2

公开(公告)日：2009-06-02

申请号：US11150565

申请日：2005-06-10

申请人： Motoaki Iwabuchi ,  Yoshitaka Hamada ,  Tsutomu Ogihara ,  Takeshi Asano ,  Takafumi Ueda ,  Dirk Pfeiffer

发明人： Motoaki Iwabuchi ,  Yoshitaka Hamada ,  Tsutomu Ogihara ,  Takeshi Asano ,  Takafumi Ueda ,  Dirk Pfeiffer

IPC分类号： G03F7/11 ,  G03F7/039 ,  G03F7/095

CPC分类号： G03F7/091 ,  Y10S438/952

摘要： The present invention provides a material for an antireflective film characterized by high etching selectivity with respect to a resist, that is, which has a fast etching speed when compared to the resist, and in addition, can be removed without damage to a film which is to be processed. The present invention also provides a pattern formation method for forming an antireflective film layer on a substrate using this antireflective film-forming composition, and a pattern formation method that uses this antireflective film as a hard mask, and a pattern formation method that uses this antireflective film as a hard mask for processing the substrate. The present invention also provides an antireflective film-forming composition comprising an organic solvent, a cross linking agent, and a polymer comprising a light absorbing group obtained by hydrolyzing and condensing more than one type of silicon compound, a crosslinking group and a non-crosslinking group.

摘要翻译： 本发明提供了一种抗反射膜的材料，其特征在于相对于抗蚀剂具有高蚀刻选择性，即与抗蚀剂相比具有快的蚀刻速度，并且还可以除去不损坏膜的膜 待处理。 本发明还提供了使用该防反射膜形成组合物在基板上形成抗反射膜层的图案形成方法，以及使用该抗反射膜作为硬掩模的图案形成方法以及使用该抗反射膜的图案形成方法 膜作为加工基材的硬掩模。 本发明还提供一种抗反射膜形成组合物，其包含有机溶剂，交联剂和包含通过水解和缩合多于一种硅化合物，交联基团和非交联的光吸收基团的聚合物 组。

公开(公告)号：US07385021B2

公开(公告)日：2008-06-10

申请号：US11148161

申请日：2005-06-09

申请人： Yoshitaka Hamada ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Takeshi Asano ,  Takafumi Ueda

发明人： Yoshitaka Hamada ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Takeshi Asano ,  Takafumi Ueda

IPC分类号： C08G77/08

CPC分类号： G03F7/0752 ,  C08K5/0025 ,  C08L83/06 ,  G03F7/091 ,  G03F7/11 ,  C08L2666/28

摘要： A sacrificial film-forming composition is provided comprising (A) an organofunctional silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formula (1) and formula (2) and/or (3): X—Y—SiZ3   (1) RnSiZ4-n   (2) P—SiZ3   (3) wherein Z is a hydrolyzable group, X is a crosslinkable organofunctional group, Y is a single bond or a divalent hydrocarbon group, R is hydrogen or a monovalent hydrocarbon group, n is an integer of 0-3, and P is a substituent group which readily decomposes and volatilizes upon thermal decomposition, (B) a crosslinking agent, (C) an acid generator, (D) an extender or porogen, and (E) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is effectively dissolvable in a stripping solution.

摘要翻译： 提供了牺牲成膜组合物，其包含（A）有机官能有机硅树脂，其为具有式（1）和式（2）和/或（3）的可水解硅烷的共水解缩合物：<β直列式 描述=“在线公式”end =“lead”？> XY-SiZ 3（1）<？in-line-formula description =“In-line Formulas”end =“tail”？ > <？in-line-formula description =“In-line Formulas”end =“lead”？> R SiZ 4-n（2） line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> P-SiZ <3 >（3）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中Z是可水解基团，X是可交联的有机官能团，Y是单键或二价烃基 ，R为氢或一价烃基，n为0-3的整数，P为在热分解时容易分解挥发的取代基，（B）交联剂，（C）aci （D）增量剂或致孔剂，和（E）有机溶剂。 该组合物具有提高的储存稳定性，填充性能，粘附性和涂层均匀性，足以形成有效地溶解在剥离溶液中的牺牲膜。

公开(公告)号：US20050277756A1

公开(公告)日：2005-12-15

申请号：US11148371

申请日：2005-06-09

申请人： Motoaki Iwabuchi ,  Yoshitaka Hamada ,  Tsutomu Ogihara ,  Takeshi Asano ,  Takafumi Ueda

发明人： Motoaki Iwabuchi ,  Yoshitaka Hamada ,  Tsutomu Ogihara ,  Takeshi Asano ,  Takafumi Ueda

IPC分类号： G03F7/11 ,  C08G77/14 ,  C08G77/26 ,  C08K5/00 ,  C08L83/04 ,  C09D183/02 ,  C09D183/04 ,  G03F7/40 ,  H01L21/027 ,  H01L21/312

CPC分类号： C08G77/04 ,  C08G77/08 ,  C08G77/14 ,  C09D183/04 ,  C09D183/06 ,  G03F7/0757 ,  H01L21/02123 ,  H01L21/02211 ,  H01L21/02282 ,  H01L21/0276 ,  H01L21/31144 ,  H01L21/3121 ,  H01L21/76808

摘要： A porous film-forming composition is provided comprising (A) a polymer obtained by hydrolytic condensation of a hydrolyzable silane having formula (1): R1n—Si—R24-n   (1) wherein R1 is a monovalent organic group or hydrogen, R2 is a hydrolyzable group or a hydroxyl group and n is an integer of 0 to 3, a hydrolyzate thereof or a partial condensate thereof, with the proviso that at least one silicon compound having an organic crosslinkable group as R1 is included, the polymer being capable of crosslinking reaction by the organic crosslinkable group, and (B) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is dissolvable in a stripping solution.

摘要翻译： 提供了一种多孔成膜组合物，其包含（A）通过具有式（1）的可水解硅烷的水解缩合得到的聚合物：<？in-line-formula description =“In-line Formulas”end =“lead” （1）<β在线公式描述中的一个或多个（1） 其中R 1是一价有机基团或氢，R 2是可水解基团或羟基，并且其中R 1是一价有机基团或氢原子， n为0〜3的整数，其水解物或其部分缩合物，条件是含有至少一种具有有机交联基团的硅化合物为R 1，所述聚合物能够 通过有机交联基团进行交联反应，和（B）有机溶剂。 该组合物具有提高的储存稳定性，填充性能，粘合性和涂层均匀性，足以形成可溶于剥离溶液中的牺牲膜。

公开(公告)号：US20050277755A1

公开(公告)日：2005-12-15

申请号：US11148161

申请日：2005-06-09

申请人： Yoshitaka Hamada ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Takeshi Asano ,  Takafumi Ueda

发明人： Yoshitaka Hamada ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Takeshi Asano ,  Takafumi Ueda

IPC分类号： G03F7/11 ,  C08G77/00 ,  C08G77/14

CPC分类号： G03F7/0752 ,  C08K5/0025 ,  C08L83/06 ,  G03F7/091 ,  G03F7/11 ,  C08L2666/28

摘要： A sacrificial film-forming composition is provided comprising (A) an organofunctional silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formula (1) and formula (2) and/or (3): X—Y—SiZ3  (1) RnSiZ4-n  (2) P—SiZ3  (3) wherein Z is a hydrolyzable group, X is a crosslinkable organofunctional group, Y is a single bond or a divalent hydrocarbon group, R is hydrogen or a monovalent hydrocarbon group, n is an integer of 0-3, and P is a substituent group which readily decomposes and volatilizes upon thermal decomposition, (B) a crosslinking agent, (C) an acid generator, (D) an extender or porogen, and (E) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is effectively dissolvable in a stripping solution.

摘要翻译： 提供了牺牲成膜组合物，其包含（A）有机官能有机硅树脂，其为具有式（1）和式（2）和/或（3）的可水解硅烷的共水解缩合物：<β直列式 描述=“在线公式”end =“lead”？> XY-SiZ 3（1）<？in-line-formula description =“In-line Formulas”end =“tail”？ > <？in-line-formula description =“In-line Formulas”end =“lead”？> R SiZ 4-n（2） line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> P-SiZ <3 >（3）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中Z是可水解基团，X是可交联的有机官能团，Y是单键或二价烃基 R为氢或一价烃基，n为0-3的整数，P为热分解时容易分解挥发的取代基，（B）交联剂，（C） 酸发生剂，（D）增量剂或致孔剂，和（E）有机溶剂。 该组合物具有提高的储存稳定性，填充性能，粘附性和涂层均匀性，足以形成有效地溶解在剥离溶液中的牺牲膜。

公开(公告)号：US20050277058A1

公开(公告)日：2005-12-15

申请号：US11150565

申请日：2005-06-10

申请人： Motoaki Iwabuchi ,  Yoshitaka Hamada ,  Tsutomu Ogihara ,  Takeshi Asano ,  Takafumi Ueda ,  Dirk Pfeiffer

发明人： Motoaki Iwabuchi ,  Yoshitaka Hamada ,  Tsutomu Ogihara ,  Takeshi Asano ,  Takafumi Ueda ,  Dirk Pfeiffer

IPC分类号： G03F7/11 ,  C08G77/14 ,  G03C1/492 ,  G03F7/09 ,  H01L21/027

CPC分类号： G03F7/091 ,  Y10S438/952

摘要： The present invention provides a material for an antireflective film characterized by high etching selectivity with respect to a resist, that is, which has a fast etching speed when compared to the resist, and in addition, can be removed without damage to a film which is to be processed. The present invention also provides a pattern formation method for forming an antireflective film layer on a substrate using this antireflective film-forming composition, and a pattern formation method that uses this antireflective film as a hard mask, and a pattern formation method that uses this antireflective film as a hard mask for processing the substrate. The present invention provides an antireflective film-forming composition comprising an organic solvent, a cross linking agent, and a polymer comprising a light absorbing group obtained by hydrolyzing and condensing more than one type of silicon compound, a crosslinking group and a non-crosslinking group.

摘要翻译： 本发明提供了一种抗反射膜的材料，其特征在于相对于抗蚀剂具有高蚀刻选择性，即与抗蚀剂相比具有快的蚀刻速度，并且还可以除去不损坏膜的膜 待处理。 本发明还提供了使用该防反射膜形成组合物在基板上形成抗反射膜层的图案形成方法，以及使用该抗反射膜作为硬掩模的图案形成方法以及使用该抗反射膜的图案形成方法 膜作为加工基材的硬掩模。 本发明提供了一种抗反射膜形成组合物，其包含有机溶剂，交联剂和包含通过水解和缩合多于一种硅化合物，交联基团和非交联基团而获得的光吸收基团的聚合物 。

公开(公告)号：US20050274692A1

公开(公告)日：2005-12-15

申请号：US11148380

申请日：2005-06-09

申请人： Yoshitaka Hamada ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Takeshi Asano ,  Takafumi Ueda ,  Pfeiffer Dirk

发明人： Yoshitaka Hamada ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Takeshi Asano ,  Takafumi Ueda ,  Pfeiffer Dirk

IPC分类号： G03F7/11 ,  B44C1/22 ,  G03F1/00 ,  G03F7/075 ,  G03F7/09 ,  H01L21/027

CPC分类号： G03F7/094 ,  G03F7/0752 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/76808

摘要： A sacrificial film-forming composition is provided comprising (A) a silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formulae (1) and (2): X—Y—SiZ3   (1) RnSiZ4-n   (2) wherein Z is a hydrolyzable group, X is a crosslinkable organofunctional group such as an unsubstituted hydroxyl group or a substituted or unsubstituted epoxy, acyloxy or acryloxy group, Y is a single bond or a divalent hydrocarbon group, R is hydrogen or a monovalent hydrocarbon group, and n is an integer of 0 to 3, the silicone resin being capable of crosslinking reaction by the crosslinkable organofunctional group in formula (1), (B) a crosslinking agent, (C) an acid generator, and (D) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is effectively dissolvable in a stripping solution.

摘要翻译： 提供牺牲性成膜组合物，其包含（A）作为具有式（1）和（2）的可水解硅烷的共水解缩合物的硅氧烷树脂：<？在线配方说明=“在线配方” end =“lead”？> XY-SiZ 3（1）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula 描述=“在线公式”end =“lead”？> R SiZ 4-n（2）<？in-line-formula description =“In- 其中Z是可水解基团，X是可交联的有机官能团如未取代的羟基或取代或未取代的环氧基，酰氧基或丙烯酰氧基，Y是单键或二价烃 基团，R为氢或一价烃基，n为0〜3的整数，有机硅树脂能够通过式（1）中的交联性有机官能团交联反应，（B）交联剂，（C） 酸产生剂，和（D）有机溶剂。 该组合物具有提高的储存稳定性，填充性能，粘附性和涂层均匀性，足以形成有效地溶解在剥离溶液中的牺牲膜。

公开(公告)号：US20080290472A1

公开(公告)日：2008-11-27

申请号：US12029562

申请日：2008-02-12

申请人： Fujio Yagihashi ,  Yoshitaka Hamada ,  Takeshi Asano ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Hideo Nakagawa ,  Masaru Sasago

发明人： Fujio Yagihashi ,  Yoshitaka Hamada ,  Takeshi Asano ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Hideo Nakagawa ,  Masaru Sasago

IPC分类号： H01L23/58 ,  C08K3/34 ,  C08K3/36 ,  B32B5/18 ,  H01L21/312

CPC分类号： H01L21/31695 ,  C08G77/16 ,  C08G77/70 ,  C08G77/80 ,  C08K3/36 ,  C08L83/04 ,  C09D183/04 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122 ,  H01L21/7682 ,  H01L2221/1047 ,  Y10T428/249953 ,  C08L83/00

摘要： Provided is a porous-film-forming composition containing silicon-oxide-based fine particles and a polysiloxane compound obtained by hydrolysis and condensation reactions, in the presence of an acid catalyst, of a hydrolyzable silane compound containing at least one tetrafunctional alkoxysilane compound represented by the following formula (1): Si(OR1)4   (1) wherein, R1s may be the same or different and each independently represents a linear or branched C1-4 alkyl group and/or at least one alkoxysilane compound represented by the following formula (2): R2nSi(OR3)4-n   (2) wherein, R2(s) may be the same or different when there are plural R2s and each independently represents a linear or branched C1-8 alkyl group, R3(s) may be the same or different when there are plural R3s and each independently represents a linear or branched C1-4 alkyl group, and n is an integer from 1 to 3 in the reaction mixture containing a large excess of water.

摘要翻译： 本发明提供一种多孔膜形成用组合物，其含有氧化硅系微粒和通过水解缩合反应得到的聚硅氧烷化合物，在酸催化剂的存在下，含有至少一种四官能性烷氧基硅烷化合物的水解性硅烷化合物 以下公式（1）：<？in-line-formula description =“In-line formula”end =“lead”？> Si（OR1）4（1）<？in-line-formula description =“In-line 式中，R 1可以相同或不同，各自独立地表示直链或支链C 1-4烷基和/或由下式（2）表示的至少一种烷氧基硅烷化合物： in-line-formula description =“In-line Formulas”end =“lead”？> R2nSi（OR3）4-n（2）<？in-line-formula description =“In-line Formulas”end =“tail” 其中，当有多个R 2并且各自独立地表示直链或支链的C 1-8烷基时，R 2（s）可以相同或不同，R 3（s）可以相同或不同 当存在多个R 3并且各自独立地表示直链或支链C 1-4烷基时，并且n是含有大量过量水的反应混合物中n是1至3的整数。

公开(公告)号：US07332446B2

公开(公告)日：2008-02-19

申请号：US10808692

申请日：2004-03-25

申请人： Tsutomu Ogihara ,  Fujio Yagihashi ,  Yoshitaka Hamada ,  Takeshi Asano ,  Motoaki Iwabuchi ,  Hideo Nakagawa ,  Masaru Sasago

发明人： Tsutomu Ogihara ,  Fujio Yagihashi ,  Yoshitaka Hamada ,  Takeshi Asano ,  Motoaki Iwabuchi ,  Hideo Nakagawa ,  Masaru Sasago

IPC分类号： H01L21/469

CPC分类号： H01L21/02126 ,  C09D183/04 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695

摘要： According to the invention, the thin film having the thickness controlled desirably can be easily formed using common semiconductor processes. Provided is a coating liquid for forming the porous film having an excellent dielectric property and mechanical property. Specifically, the coating liquid for forming a porous film comprises the condensation product obtained by condensation of one or more silicate compounds represented by the formula (X2O) i(SiO2)j(H2O)k and one more organosilate compounds represented by the formula (X2O)a(RSiO1.5)b(H2O)c. Thus, the porous insulating film having sufficient mechanical strength and dielectric properties for use in the semiconductor manufacturing process can be manufactured.

摘要翻译： 根据本发明，可以使用普通的半导体工艺容易地形成具有控制厚度的薄膜。 提供一种用于形成具有优异的介电性能和机械性能的多孔膜的涂布液。 具体地，用于形成多孔膜的涂布液包括通过一种或多种由式（X 2 O 2）O表示的硅酸盐化合物（SiO 2）的缩合获得的缩合产物， （H 2）2）另外，另外还有一种由式（ⅩⅪ）表示的有机硅酸盐化合物 （H 2 O）C（H 2 O）C（H 2 O） 。 因此，可以制造用于半导体制造工艺中具有足够的机械强度和介电性能的多孔绝缘膜。