摘要:
A vertical NAND structure includes one or more mid-string devices having at least two functional modes. In the first mode, the one or more mid-string devices couple the bodies of stacks of NAND memory cells to the substrate for erase operations. In the second mode, the one or more mid-string devices couple the body of a first stack of NAND memory cells to a body of a second stack of memory NAND memory cells, allowing the two stacks operate as a single NAND string for read and programming operations.
摘要:
Memory arrays and methods of their formation are disclosed. One such memory array has memory-cell strings are formed adjacent to separated substantially vertical, adjacent semiconductor structures, where the separated semiconductor structures couple the memory cells of the respective strings in series. For some embodiments, two dielectric pillars may be formed from a dielectric formed in a single opening, where each of the dielectric pillars has a pair of memory-cell strings adjacent thereto and where at least one memory cell of one of the strings on one of the pillars and at least one memory cell of one of the strings on the other pillar are commonly coupled to an access line.
摘要:
Metal nanocrystal memories are fabricated to include higher density states, stronger coupling with the channel, and better size scalability, than has been available with semiconductor nanocrystal devices. A self-assembled nanocrystal formation process by rapid thermal annealing of ultra thin metal film deposited on top of gate oxide is integrated with NMOSFET to fabricate such devices. Devices with Au, Ag, and Pt nanocrystals working in the F-N tunneling regime, with hot-carrier injection as the programming mechanism, demonstrate retention times up to 106s, and provide 2-bit-per-cell storage capability.
摘要:
A method for defining patterns in an integrated circuit comprises defining a plurality of features in a first photoresist layer using photolithography over a first region of a substrate. The method further comprises using pitch multiplication to produce at least two features in a lower masking layer for each feature in the photoresist layer. The features in the lower masking layer include looped ends. The method further comprises covering with a second photoresist layer a second region of the substrate including the looped ends in the lower masking layer. The method further comprises etching a pattern of trenches in the substrate through the features in the lower masking layer without etching in the second region. The trenches have a trench width.
摘要:
One method for sensing includes changing a sense condition of a particular layer responsive to a programming rate of that particular layer (e.g., relative to other layers). In one embodiment, the target threshold voltage range can be shifted lower for a slower programming layer. This might be accomplished by biasing the bit lines of slower programming layers with higher bit line voltages as compared to bit line voltages of faster programming layers.
摘要:
Some embodiments include memory arrays. The memory arrays can have global bitlines extending along a first horizontal direction, vertical local bitlines extending perpendicularly from the global bitlines, and wordlines extending along a second horizontal direction which is perpendicular to the first horizontal direction. The global bitlines may be subdivided into a first series at a first elevational level, and a second series at a second elevational level which is different from the first elevational level. The global bitlines of the first series can alternate with the global bitlines of the second series. There can be memory cell material directly between the wordlines and the vertical local bitlines. The memory cell material may form a plurality of memory cells uniquely addressed by wordline/global bitline combinations. Some embodiments include cross-point memory cell units that have areas of about 2F2.
摘要:
Methods for sensing and memory devices are disclosed. One such method for sensing includes changing a sense condition of a particular layer responsive to a programming rate of that particular layer (e.g., relative to other layers).
摘要:
Memory arrays and methods of their formation are disclosed. One such memory array has memory-cell strings are formed adjacent to separated substantially vertical, adjacent semiconductor structures, where the separated semiconductor structures couple the memory cells of the respective strings in series. For some embodiments, two dielectric pillars may be formed from a dielectric formed in a single opening, where each of the dielectric pillars has a pair of memory-cell strings adjacent thereto and where at least one memory cell of one of the strings on one of the pillars and at least one memory cell of one of the strings on the other pillar are commonly coupled to an access line.
摘要:
Some embodiments include methods of patterning materials. A mass may be formed over a material, and a first mask may be formed over the mass. First spacers may be formed along features of the first mask, and then the first mask may be removed to leave a second mask corresponding to the first spacers. A pattern of the second mask may be partially transferred into the mass to form an upper portion of the mass into a third mask. The first spacers may be removed from over the third mask, and then second spacers be formed along features of the third mask. The second spacers are a fourth mask. A pattern of the fourth mask may be transferred into a bottom portion of the mass, and then the bottom portion may be used as a mask during processing of the underlying material.
摘要:
Strings of memory cells having a string select gate configured to selectively couple ends of a string to a data line and a source line concurrently, memory devices incorporating such strings and methods for accessing and forming such strings are provided. For example, non-volatile memory devices are disclosed that utilize vertical structure NAND strings of serially-connected non-volatile memory cells. One such string including two or more serially-connected non-volatile memory cells where each end of the string shares a string select gate with the other end of the string is disclosed.