Vertical NAND memory
    1.
    发明授权
    Vertical NAND memory 有权
    垂直NAND存储器

    公开(公告)号:US08508999B2

    公开(公告)日:2013-08-13

    申请号:US13451656

    申请日:2012-04-20

    IPC分类号: G11C11/34

    摘要: A vertical NAND structure includes one or more mid-string devices having at least two functional modes. In the first mode, the one or more mid-string devices couple the bodies of stacks of NAND memory cells to the substrate for erase operations. In the second mode, the one or more mid-string devices couple the body of a first stack of NAND memory cells to a body of a second stack of memory NAND memory cells, allowing the two stacks operate as a single NAND string for read and programming operations.

    摘要翻译: 垂直NAND结构包括具有至少两个功能模式的一个或多个中串式装置。 在第一模式中,一个或多个中串式装置将NAND存储器单元堆叠的主体耦合到衬底以进行擦除操作。 在第二模式中,一个或多个中串装置将第一堆NAND存储器单元的主体耦合到第二堆存储器NAND存储器单元的主体,允许两个堆作为单个NAND串用于读取和 编程操作。

    MEMORY ARRAYS HAVING SUBSTANTIALLY VERTICAL, ADJACENT SEMICONDUCTOR STRUCTURES AND THE FORMATION THEREOF

    公开(公告)号:US20120012921A1

    公开(公告)日:2012-01-19

    申请号:US12836853

    申请日:2010-07-15

    申请人: Zengtao Liu

    发明人: Zengtao Liu

    IPC分类号: H01L27/088 H01L21/8239

    摘要: Memory arrays and methods of their formation are disclosed. One such memory array has memory-cell strings are formed adjacent to separated substantially vertical, adjacent semiconductor structures, where the separated semiconductor structures couple the memory cells of the respective strings in series. For some embodiments, two dielectric pillars may be formed from a dielectric formed in a single opening, where each of the dielectric pillars has a pair of memory-cell strings adjacent thereto and where at least one memory cell of one of the strings on one of the pillars and at least one memory cell of one of the strings on the other pillar are commonly coupled to an access line.

    Multibit metal nanocrystal memories and fabrication
    3.
    发明授权
    Multibit metal nanocrystal memories and fabrication 有权
    多位金属纳米晶体的记忆和制作

    公开(公告)号:US07259984B2

    公开(公告)日:2007-08-21

    申请号:US10718662

    申请日:2003-11-24

    IPC分类号: G11C11/34

    摘要: Metal nanocrystal memories are fabricated to include higher density states, stronger coupling with the channel, and better size scalability, than has been available with semiconductor nanocrystal devices. A self-assembled nanocrystal formation process by rapid thermal annealing of ultra thin metal film deposited on top of gate oxide is integrated with NMOSFET to fabricate such devices. Devices with Au, Ag, and Pt nanocrystals working in the F-N tunneling regime, with hot-carrier injection as the programming mechanism, demonstrate retention times up to 106s, and provide 2-bit-per-cell storage capability.

    摘要翻译: 金属纳米晶体存储器被制造成包括比半导体纳米晶体器件可用的更高密度状态,更强的与沟道的耦合以及更好的尺寸可扩展性。 通过沉积在栅极氧化物顶部的超薄金属膜的快速热退火的自组装纳米晶体形成工艺与NMOSFET集成以制造这种器件。 具有在FN隧穿状态下工作的Au,Ag和Pt纳米晶体的器件以热载流子注入作为编程机制,证明保留时间高达10 6,并提供2位/ 细胞储存能力。

    Sense operation in a stacked memory array device
    5.
    发明授权
    Sense operation in a stacked memory array device 有权
    堆叠式存储器阵列器件中的检测操作

    公开(公告)号:US08559231B2

    公开(公告)日:2013-10-15

    申请号:US13043005

    申请日:2011-03-08

    IPC分类号: G11C16/06

    摘要: One method for sensing includes changing a sense condition of a particular layer responsive to a programming rate of that particular layer (e.g., relative to other layers). In one embodiment, the target threshold voltage range can be shifted lower for a slower programming layer. This might be accomplished by biasing the bit lines of slower programming layers with higher bit line voltages as compared to bit line voltages of faster programming layers.

    摘要翻译: 用于感测的一种方法包括响应于该特定层的编程速率(例如,相对于其它层)改变特定层的感测条件。 在一个实施例中,对于较慢的编程层,目标阈值电压范围可以更低。 与较快编程层的位线电压相比,可以通过将较慢编程层的位线与较高位线电压相比较来实现。

    Memory arrays having substantially vertical, adjacent semiconductor structures and the formation thereof
    8.
    发明授权
    Memory arrays having substantially vertical, adjacent semiconductor structures and the formation thereof 有权
    存储器阵列具有基本垂直的相邻半导体结构及其形成

    公开(公告)号:US08237213B2

    公开(公告)日:2012-08-07

    申请号:US12836853

    申请日:2010-07-15

    申请人: Zengtao Liu

    发明人: Zengtao Liu

    IPC分类号: H01L29/792 H01L21/8239

    摘要: Memory arrays and methods of their formation are disclosed. One such memory array has memory-cell strings are formed adjacent to separated substantially vertical, adjacent semiconductor structures, where the separated semiconductor structures couple the memory cells of the respective strings in series. For some embodiments, two dielectric pillars may be formed from a dielectric formed in a single opening, where each of the dielectric pillars has a pair of memory-cell strings adjacent thereto and where at least one memory cell of one of the strings on one of the pillars and at least one memory cell of one of the strings on the other pillar are commonly coupled to an access line.

    摘要翻译: 公开了其阵列及其形成方法。 一个这样的存储器阵列具有与分离的基本上垂直的相邻半导体结构相邻的存储单元串,其中分离的半导体结构将各个串的存储单元串联耦合。 对于一些实施例,两个介电柱可以由在单个开口中形成的电介质形成,其中每个介电柱具有与其相邻的一对存储单元串,并且其中一个串中的至少一个存储单元位于 支柱和另一个支柱上的串中的一个的至少一个存储单元通常耦合到接入线。

    Methods Of Patterning Materials, And Methods Of Forming Memory Cells
    9.
    发明申请
    Methods Of Patterning Materials, And Methods Of Forming Memory Cells 审中-公开
    图案化材料的方法和形成记忆细胞的方法

    公开(公告)号:US20110129991A1

    公开(公告)日:2011-06-02

    申请号:US12629722

    申请日:2009-12-02

    IPC分类号: H01L21/28 G03F7/20

    摘要: Some embodiments include methods of patterning materials. A mass may be formed over a material, and a first mask may be formed over the mass. First spacers may be formed along features of the first mask, and then the first mask may be removed to leave a second mask corresponding to the first spacers. A pattern of the second mask may be partially transferred into the mass to form an upper portion of the mass into a third mask. The first spacers may be removed from over the third mask, and then second spacers be formed along features of the third mask. The second spacers are a fourth mask. A pattern of the fourth mask may be transferred into a bottom portion of the mass, and then the bottom portion may be used as a mask during processing of the underlying material.

    摘要翻译: 一些实施例包括图案化材料的方法。 可以在材料上形成质量,并且可以在物质上方形成第一掩模。 可以沿着第一掩模的特征形成第一间隔物,然后可以去除第一掩模以留下对应于第一间隔物的第二掩模。 第二掩模的图案可以部分地转移到质量体中以形成质量的上部成为第三掩模。 可以从第三掩模上方移除第一间隔物,然后沿着第三掩模的特征形成第二间隔物。 第二间隔物是第四掩模。 第四掩模的图案可以被转移到质量的底部,然后底部可以在下面的材料的加工期间用作掩模。

    STRINGS OF MEMORY CELLS HAVING STRING SELECT GATES, MEMORY DEVICES INCORPORATING SUCH STRINGS, AND METHODS OF ACCESSING AND FORMING THE SAME
    10.
    发明申请
    STRINGS OF MEMORY CELLS HAVING STRING SELECT GATES, MEMORY DEVICES INCORPORATING SUCH STRINGS, AND METHODS OF ACCESSING AND FORMING THE SAME 有权
    带有选择门的存储器单元的行,包含这样的行的存储器件及其访问和形成方法

    公开(公告)号:US20120182805A1

    公开(公告)日:2012-07-19

    申请号:US13006762

    申请日:2011-01-14

    申请人: Zengtao Liu

    发明人: Zengtao Liu

    摘要: Strings of memory cells having a string select gate configured to selectively couple ends of a string to a data line and a source line concurrently, memory devices incorporating such strings and methods for accessing and forming such strings are provided. For example, non-volatile memory devices are disclosed that utilize vertical structure NAND strings of serially-connected non-volatile memory cells. One such string including two or more serially-connected non-volatile memory cells where each end of the string shares a string select gate with the other end of the string is disclosed.

    摘要翻译: 具有字符串选择栅的存储单元串被配置成同时选择性地将字符串的端部耦合到数据线和源极线,提供包含这种字符串的存储器件以及用于访问和形成这种字符串的方法。 例如,公开了利用串行连接的非易失性存储器单元的垂直结构NAND串的非易失性存储器件。 一种这样的串包括两个或多个串联的非易失性存储单元,其中串的每一端与串的另一端共享串选择门。