Multilayer structures with layer interconnection
    148.
    发明公开
    Multilayer structures with layer interconnection 失效
    Mehrlagenstrukturen mit Lagenzwischenverbindung。

    公开(公告)号:EP0445759A1

    公开(公告)日:1991-09-11

    申请号:EP91103382.7

    申请日:1991-03-06

    Abstract: A multilayer structure with
       a first electrically conductive pattern (2);
       an insulative layer (4) formed over the first electrically conductive pattern (2);
       a second electrically conductive pattern (3) formed on said insulative layer (4); and
       an electrically conductive pin (5) piercing the insulative layer (4) so as to connect said first (2) and second (3) electrically conductive layers, an end (5A) of said pin (5) being cold-welded to said first electrically conductive pattern (2), another end (5B) of said pin (5) contacting said second electrically conductive pattern (3).
    A method of fabricating such a structure, in which the insulative layer (4) may be of organic resin which is hardened after piercing by the pin (5).

    Abstract translation: 具有第一导电图案(2)的多层结构; 形成在所述第一导电图案(2)上方的绝缘层(4); 形成在所述绝缘层(4)上的第二导电图案(3)。 以及穿过所述绝缘层(4)以便连接所述第一(2)和第二导电层(3)的导电销(5),所述销(5)的端部(5A)被冷焊到所述 第一导电图案(2),所述针(5)的与所述第二导电图案(3)接触的另一端(5B)。 一种制造这种结构的方法,其中绝缘层(4)可以是在被销钉(5)刺穿之后硬化的有机树脂。

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