摘要:
The present invention relates generally to a new interconnection and a method for making the same, and more particularly, to an elongated solder interconnection and a method for making the same. On an electronic carrier, a pad is formed on which a solder mass is deposited and capped with a metal layer, thereby forming an elongated solder interconnection. A further elongated solder interconnection can now be formed by forming a second solder mass on the first solder mass that has been capped by a metal layer. Additional elongated solder interconnection can be formed by capping the preceding solder mass and/or the last solder mass with a metal capping layer. Alternatively, the encapsulating layer can be in the form of a sidewall spacer formed on the sidewalls of the solder mass.
摘要:
A method for fabricating packaged semiconductor devices in panel format. A flat panel sheet dimensioned for a set of contiguous chips includes a stiff substrate of an insulating plate, and a tape having a surface layer of a first adhesive releasable at elevated temperatures, a core base film, and a bottom layer with a second adhesive attached to the substrate. Attaching a set onto the first adhesive layer, the chip terminals having terminals with metal bumps facing away from the first adhesive layer. Laminating low CTE insulating material to fill gaps between the bumps and to form an insulating frame surrounding the set. Grinding lamination material to expose the bumps. Plasma-cleaning assembly, sputtering uniform metal layer across assembly, optionally plating metal layer, and patterning metal layer to form rerouting traces and extended contact pads.
摘要:
A method (100) of protecting through-substrate via (TSV) die from bonding damage includes providing a substrate including a plurality of TSV die having a topside including active circuitry, a bottomside, and a plurality of TSVs that include an inner metal core that reaches from the topside to protruding TSV tips that extend out from the bottomside (101). A protective layer is formed on or applied to the bottomside of the TSV die including between and over the protruding TSV tips (102). The TSV die is bonded with its topside down onto a workpiece having a workpiece surface and its bottomside up and in contact with a bond head (104). The protective layer reduces damage from the bonding process including warpage of the TSV die by preventing the bond head from making direct contact to the protruding TSV tips.
摘要:
A die, comprising a substrate (10), has pillar bumps (34) formed over its surface in a series of rows and columns. The pillar bump is comprised a copper pillar (26) topped with a solder cap (28) which has been refloewd (28’). The solder can be lead or lead-free. The pillar bump can be columnar, rectangular, ring shaped or wall shaped. The pillar bump may form a square. The pillar bump can find use in high power applications such a Surface Acoustic Wave devices or MEM devices.
摘要:
A method for fabricating packaged semiconductor devices in panel format. A flat panel sheet dimensioned for a set of contiguous chips includes a stiff substrate of an insulating plate, and a tape having a surface layer of a first adhesive releasable at elevated temperatures, a core base film, and a bottom layer with a second adhesive attached to the substrate. Attaching a set onto the first adhesive layer, the chip terminals having terminals with metal bumps facing away from the first adhesive layer. Laminating low CTE insulating material to fill gaps between the bumps and to form an insulating frame surrounding the set. Grinding lamination material to expose the bumps. Plasma-cleaning assembly, sputtering uniform metal layer across assembly, optionally plating metal layer, and patterning metal layer to form rerouting traces and extended contact pads.
摘要:
L'invention concerne un procédé de réalisation d'un plot d'interconnexion (125) sur un élément conducteur (100) comprenant une face supérieure et une paroi latérale ; le procédé étant réalisé à partir d'un substrat (50) dont au moins la face supérieure est isolante ; l'élément conducteur (100) traversant au moins une partie isolante du substrat (50), le procédé étant caractérisé en ce qu'il comprend la séquence d'étapes suivantes : une étape de mise en relief de l'élément conducteur (100), une étape de formation au-dessus de la face supérieure isolante du substrat (50) d'un empilement de couches comportant au moins une couche électriquement conductrice (120) et une couche électriquement résistive (130), une étape de retrait partiel de la couche électriquement résistive (130), une étape de croissance électrolytique sur la partie de la couche électriquement conductrice (120) de sorte à former au moins un plot d'interconnexion (125) sur ledit élément conducteur (100).
摘要:
A semiconductor device including a semiconductor element (121), an electrode pad (24) formed on the semiconductor element (121), and a bump electrode (10) conductively connected to the electrode pad (24) which includes a resin bump (12) formed on an active face (121a) of the semiconductor element (121) and a conductive layer (20) provided from the electrode pad (24) to the surface of the resin bump (12), the conductive layer (20) and the resin bump (12) being arranged without adhesion.
摘要:
A semiconductor device including a semiconductor element (121), an electrode pad (24) formed on the semiconductor element (121), and a bump electrode (10) conductively connected to the electrode pad (24) which includes a resin bump (12) formed on an active face (121a) of the semiconductor element (121) and a conductive layer (20) provided from the electrode pad (24) to the surface of the resin bump (12), the conductive layer (20) and the resin bump (12) being arranged without adhesion.
摘要:
The invention is related to a method of fabricating an attachment bump of a component (11). In accordance with the invention, a flexible preform (13a) is fabricated, which is plated with materials (13b) appropriate for metallurgical bonding. The invention is also related to a method of attaching a component (11) to the surface of a circuit card (15) using bumps. In accordance with the invention, bumps are formed from preforms (13a) made from a flexible material, which preforms (13a) are metallized (13b) over their entire surface. The bump (13a, 13b) is attached to the attachment pads (12a, 16a) of the component (11) and the circuit card (15) by means of metallizations (12b, 13b, 16b) between the attachment pads and the bump. The bond is formed metallurgically by transfusion. The surface of the bonding side of the component (11) is coated with an insulating material (14) before the mentioned bonding elsewhere than at the attachment pads (12). The mentioned insulating material (14) is thermoplastic, thermoplastic resin or thermosetting plastic in the B state. To accomplish metallurgical bonding of the bonding material, bismuth (Bi) is used as part of the material.