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    Salt, resist composition and method for producing resist pattern
    8.
    发明专利
    Salt, resist composition and method for producing resist pattern 有权
    盐，抗性组合物和生产耐药图案的方法

    公开(公告)号：JP2012197261A

    公开(公告)日：2012-10-18

    申请号：JP2012031375

    申请日：2012-02-16

    Applicant: Sumitomo Chemical Co Ltd ,  住友化学株式会社

    Inventor： YAMAGUCHI NORIFUMI ,  ICHIKAWA KOJI

    IPC: C07D327/08 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC classification number: C07D327/08 ,  C07C309/04 ,  C07C309/06 ,  C07C309/13 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/029 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/121 ,  Y10S430/123

    Abstract: PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern by an excellent focus margin (DOF) and a new salt used for the resist composition.SOLUTION: This salt is expressed by formula (1) [wherein, Q, Qare each independently F or 1-6C perfluoroalkyl; Lis a group expressed by *-CO-O-L- or a group expressed by *-CH-O-L-, in which the * is a bonding hand with the carbon atom of -C(Q)(Q)-; L, Lare each independently a 1-15C aliphatic saturated hydrocarbon group or the like: ring Wis a 2-36C heterocyclic ring; Rto Rare each independently H, a halogen atom, hydroxy or the like; and Z is a single bond or divalent linking group].

    Abstract translation: 要解决的问题：提供能够通过优异的聚焦余量（DOF）和用于抗蚀剂组合物的新盐产生抗蚀剂图案的抗蚀剂组合物。

    解决方案：该盐由式（1）表示[其中，Q 1 ，Q 2 各自独立地为F 或1-6C全氟烷基; L 1 是由* -CO-OL a 表示的组或由* -CH 2 -OL b - ，其中*是与-C的碳原子的键合键（Q 1 ）（Q 2 ） - ; L a ，L b 各自独立地为1-15C脂族饱和烃基等：环W 1 是2-36C杂环; e1 至R e13 各自独立地为H，卤素原子，羟基等; Z为单键或二价连接基团]。 版权所有（C）2013，JPO＆INPIT

    Salt, resist composition, and method for producing resist pattern
    9.
    发明专利
    Salt, resist composition, and method for producing resist pattern 有权
    盐，抗蚀剂组合物和生产耐火图案的方法

    公开(公告)号：JP2012067079A

    公开(公告)日：2012-04-05

    申请号：JP2011169947

    申请日：2011-08-03

    Applicant: Sumitomo Chemical Co Ltd ,  住友化学株式会社

    Inventor： YOSHIDA ISAO ,  ICHIKAWA KOJI

    IPC: C07C309/17 ,  C07C381/12 ,  C08K5/36 ,  C08L101/02 ,  C09K3/00 ,  G03F7/004 ,  G03F7/039

    CPC classification number: C07C309/17 ,  C07C381/12 ,  C07C2603/74 ,  C07D233/60 ,  C07D327/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    Abstract: PROBLEM TO BE SOLVED: To solve the problem that a conventional acid generator-containing resist composition sometimes gives a pattern whose line edge roughness (LER) is not always satisfactory.SOLUTION: There is disclosed a salt represented by formula (I) [wherein Qand Q, which are independent of each other, denote fluorine atoms or 1C-6C perfluoroalkyl groups; Land L, which are independent of each other, denote divalent 1C-17C saturated hydrocarbon groups; some of the methylene groups which constitute the saturated hydrocarbon may be replaced by oxygen atoms or carbonyl groups; ring Wand ring W. which are independent of each other, denote 3C-36C aliphatic rings; Rand R, which are independent of each other, denote 1C-6C alkyl groups; Rdenotes a 1C-12C hydrocarbon group; t and u, which are independent of each other, denote integers of 0-2; and Zdenotes an organic counter ion].

    Abstract translation: 解决的问题为了解决传统含酸产生剂的抗蚀剂组合物有时给出线边缘粗糙度（LER）不总是令人满意的图案的问题。 解决方案：公开了由式（I）[其中Q 1 和Q 2 表示的盐， 彼此独立地表示氟原子或1C-6C全氟烷基; L 1 和彼此独立的L 2 表示二价1C-17C饱和烃基; 构成饱和烃的一些亚甲基可被氧原子或羰基取代; 环W 1 ，并振铃W 2 。 彼此独立地表示3C-36C脂肪族环; R 2 和彼此独立的R 4 表示1C-6C烷基; R 3 表示1C-12C烃基; 彼此独立的t和u表示0-2的整数; Z + 表示有机抗衡离子]。 版权所有（C）2012，JPO＆INPIT

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