Mirrors for reducing the effects of spontaneous emissions in photodiodes
    1.
    发明申请
    Mirrors for reducing the effects of spontaneous emissions in photodiodes 有权
    用于减少光电二极管中自发辐射影响的镜子

    公开(公告)号:US20050286594A1

    公开(公告)日:2005-12-29

    申请号:US11026385

    申请日:2004-12-30

    IPC分类号: H01S5/00 H01S5/026 H01S5/183

    摘要: An optical structure that reduces the effects of spontaneous emissions from the active region of a laser. An optical structure includes optimizations to reduce the effects of spontaneous emissions. The optical structure includes a VCSEL with top and bottom DBR mirrors and an active region connected to the mirrors. The optical structure further includes a photodiode connected to the VCSEL. One or more optimizations may be included in the optical structure including optically absorbing materials, varying the geometry of the structure to change reflective angles, using optical apertures, changing the reflectivity of one or more mirrors, changing the photodiode to be more impervious to spontaneous emissions, and using ion implants to reduce photoluminescence efficiency.

    摘要翻译: 一种降低激光器有源区自发发射效应的光学结构。 光学结构包括优化以减少自发辐射的影响。 光学结构包括具有顶部和底部DBR反射镜的VCSEL和连接到反射镜的有源区域。 光学结构还包括连接到VCSEL的光电二极管。 可以在光学结构中包括一个或多个优化,包括光学吸收材料,改变结构的几何形状以改变反射角度,使用光学孔径,改变一个或多个反射镜的反射率,将光电二极管改变为对自发辐射更为不透明 ,并使用离子注入来降低光致发光效率。

    Distributed bragg reflector for optoelectronic device
    2.
    发明申请
    Distributed bragg reflector for optoelectronic device 有权
    光电器件分布式布拉格反射器

    公开(公告)号:US20050190812A1

    公开(公告)日:2005-09-01

    申请号:US11119292

    申请日:2005-04-29

    IPC分类号: H01S5/183 H01S5/42 H01S3/08

    摘要: This disclosure concerns devices such as DBRs, one example of which includes at least one first mirror layers having an oxidized region extending from an edge of the DBR to an oxide termination edge that is situated greater than a first distance from the edge of the DBR. The DBR also includes at least one second mirror layer having an oxidized region extending from the edge of the DBR to an oxide termination edge that is situated less than a second distance from the edge of the DBR, such that the first distance is greater than the second distance. Additionally, a first mirror layer includes an oxidizable material at a concentration that is higher than the concentration of the oxidizable material in any of the second mirror layers. Finally, a first mirror layer is doped with an impurity at a higher level than one of the second mirror layers.

    摘要翻译: 本公开涉及诸如DBR的设备,其一个示例包括至少一个第一镜像层,其具有从DBR的边缘延伸到距离DBR的边缘大于第一距离的氧化物终止边缘的氧化区域。 DBR还包括至少一个第二镜层,其具有从DBR的边缘延伸到氧化物终止边缘的氧化区域,该氧化物终止边缘距离DBR的边缘小于第二距离,使得第一距离大于 第二距离。 此外,第一镜层包括浓度高于任何第二镜层中的可氧化材料的浓度的可氧化材料。 最后,第一镜层掺杂有比第二镜层中的一个更高的杂质。

    Electron affinity engineered VCSELs
    3.
    发明申请
    Electron affinity engineered VCSELs 有权
    电子亲和性工程VCSELs

    公开(公告)号:US20050031011A1

    公开(公告)日:2005-02-10

    申请号:US10767920

    申请日:2004-01-29

    摘要: A VCSEL having an N-type Bragg mirror with alternating layers of high bandgap (low index) and low bandgap (high index) layers of AlGaAs. The layers may be separated by a step change of Al composition followed by a graded region, and vice versa for the next layer, in the N-type mirror to result in a lower and more linear series resistance. Also, an N-type spacer layer may be adjacent to an active region of quantum wells. There may be a similar step in a change of Al composition from the nearest layer of the N-type mirror to the N-type spacer formed from a lower bandgap direct AlGaAs layer to provide lower free carrier absorption. With electron affinity engineering, a minority carrier hole barrier may be inserted adjacent to the quantum wells to improve hole confinement at high current density and high temperature.

    摘要翻译: 具有具有高带隙(低折射率)和低带隙(高折射率)AlGaAs层的交替层的N型布拉格反射镜的VCSEL。 这些层可以通过Al组分的阶跃变化和随后的渐变区域分离,反之亦然,在N型反射镜中可以产生更低和更线性的串联电阻。 此外,N型间隔层可以与量子阱的有源区相邻。 从最近的N型反射镜层到由较低带隙的直接AlGaAs层形成的N型间隔物的Al组成变化可能有类似的步骤,以提供较低的自由载流子吸收。 通过电子亲和力工程,可以在量子阱附近插入少数载流子阱屏障,以在高电流密度和高温下改善孔隙限制。

    Optimizing mirror reflectivity for reducing spontaneous emissions in photodiodes
    4.
    发明申请
    Optimizing mirror reflectivity for reducing spontaneous emissions in photodiodes 有权
    优化镜面反射率,以减少光电二极管中的自发辐射

    公开(公告)号:US20050286595A1

    公开(公告)日:2005-12-29

    申请号:US11027717

    申请日:2004-12-30

    IPC分类号: H01S5/00 H01S5/026 H01S5/183

    摘要: An optical structure that reduces the effects of spontaneous emissions from the active region of a laser. An optical structure includes optimizations to reduce the effects of spontaneous emissions. The optical structure includes a VCSEL with top and bottom DBR mirrors and an active region connected to the mirrors. The optical structure further includes a photodiode connected to the VCSEL. One or more optimizations may be included in the optical structure including optically absorbing materials, varying the geometry of the structure to change reflective angles, using optical apertures, changing the reflectivity of one or more mirrors, changing the photodiode to be more impervious to spontaneous emissions, and using ion implants to reduce photoluminescence efficiency.

    摘要翻译: 一种降低激光器有源区自发发射效应的光学结构。 光学结构包括优化以减少自发辐射的影响。 光学结构包括具有顶部和底部DBR反射镜的VCSEL和连接到反射镜的有源区域。 光学结构还包括连接到VCSEL的光电二极管。 可以在光学结构中包括一个或多个优化,包括光学吸收材料,改变结构的几何形状以改变反射角度,使用光学孔径,改变一个或多个反射镜的反射率,将光电二极管改变为对自发辐射更为不透明 ,并使用离子注入来降低光致发光效率。

    Obsorbing layers for reduced spontaneous emission effects in an integrated photodiode
    5.
    发明申请
    Obsorbing layers for reduced spontaneous emission effects in an integrated photodiode 有权
    吸收层用于降低集成光电二极管中的自发发射效应

    公开(公告)号:US20050286583A1

    公开(公告)日:2005-12-29

    申请号:US11026095

    申请日:2004-12-30

    IPC分类号: H01S5/00 H01S5/026 H01S5/183

    摘要: An optical structure that reduces the effects of spontaneous emissions from the active region of a laser. An optical structure includes optimizations to reduce the effects of spontaneous emissions. The optical structure includes a VCSEL with top and bottom DBR mirrors and an active region connected to the mirrors. The optical structure further includes a photodiode connected to the VCSEL. One or more optimizations may be included in the optical structure including optically absorbing materials, varying the geometry of the structure to change reflective angles, using optical apertures, changing the reflectivity of one or more mirrors, changing the photodiode to be more impervious to spontaneous emissions, and using ion implants to reduce photoluminescence efficiency.

    摘要翻译: 一种降低激光器有源区自发发射效应的光学结构。 光学结构包括优化以减少自发辐射的影响。 光学结构包括具有顶部和底部DBR反射镜的VCSEL和连接到反射镜的有源区域。 光学结构还包括连接到VCSEL的光电二极管。 可以在光学结构中包括一个或多个优化,包括光学吸收材料,改变结构的几何形状以改变反射角度,使用光学孔径,改变一个或多个反射镜的反射率,将光电二极管改变为对自发辐射更为不透明 ,并使用离子注入来降低光致发光效率。

    Lens with reflective surface
    6.
    发明申请
    Lens with reflective surface 有权
    透镜带反光面

    公开(公告)号:US20050180471A1

    公开(公告)日:2005-08-18

    申请号:US10781590

    申请日:2004-02-17

    申请人: Bo Chen James Biard

    发明人: Bo Chen James Biard

    摘要: A lens having a reflective surface, and systems that use such a lens. The lens includes a transmissive part for passing a portion of an incident light beam, and a reflective part for reflecting a portion of the incident light beam, and the reflective part is preferably substantially non-transmissive. Such a lens may be particularly suitable in systems that include a back monitor photo detector that is used for sampling and controlling the output power of a light source.

    摘要翻译: 具有反射表面的透镜和使用这种透镜的系统。 透镜包括用于使入射光束的一部分通过的透射部分和用于反射入射光束的一部分的反射部分,并且反射部分优选地基本上不透射。 这种透镜可以特别适用于包括用于对光源的输出功率进行采样和控制的背面监视器光电检测器的系统。

    Providing photonic control over wafer borne semiconductor devices
    8.
    发明申请
    Providing photonic control over wafer borne semiconductor devices 有权
    提供晶圆传导半导体器件的光子控制

    公开(公告)号:US20070117242A1

    公开(公告)日:2007-05-24

    申请号:US10486666

    申请日:2002-08-12

    IPC分类号: H01L21/00 H01L33/00

    摘要: Disclosed are methods for providing wafer photonic flow control to a semiconductor wafer (1700) having a substrate (1720), at least one active layer (1765) and at least one surface layer (1710). Photonic flow control can be achieved through the formation of trenches (1725) and/or insulating implants (1730) formed in said wafer (1700), whereby active regions (1760) are defined by trenches (1725) that operate as nonconductive areas (1750). Methods of and systems for wafer level burn-in (WLBI) of semiconductor devices are also disclosed. Photonic flow control at the wafer level is important when using WLBI methods and systems.

    摘要翻译: 公开了用于向具有衬底(1720),至少一个有源层(1765)和至少一个表面层(1710)的半导体晶片(1700)提供晶片光子流控制的方法。 可以通过形成在所述晶片(1700)中形成的沟槽(1725)和/或绝缘植入物(1730)来实现光子流控制,由此有源区域(1760)由作为非导电区域(1750)的沟槽(1725)限定 )。 还公开了半导体器件的晶片级老化(WLBI)的方法和系统。 使用WLBI方法和系统时,晶圆级的光子流量控制很重要。

    VERTICAL CAVITY SURFACE EMITTING LASER INCLUDING TRENCH AND PROTON IMPLANT ISOLATION
    10.
    发明申请
    VERTICAL CAVITY SURFACE EMITTING LASER INCLUDING TRENCH AND PROTON IMPLANT ISOLATION 有权
    垂直孔表面发射激光,包括TRENCH和PROTON植入物分离

    公开(公告)号:US20070053399A1

    公开(公告)日:2007-03-08

    申请号:US11554473

    申请日:2006-10-30

    IPC分类号: H01S5/00

    摘要: A VCSEL with nearly planar intracavity contact. A bottom DBR mirror is formed on a substrate. A first conduction layer region is formed on the bottom DBR mirror. An active layer, including quantum wells, is on the first conduction layer region. A trench is formed into the active layer region. The trench is formed in a wagon wheel configuration with spokes providing mechanical support for the active layer region. The trench is etched approximately to the first conduction layer region. Proton implants are provided in the wagon wheel and configured to render the spokes of the wagon wheel insulating. A nearly planar electrical contact is formed as an intracavity contact for connecting the bottom of the active region to a power supply. The nearly planar electrical contact is formed in and about the trench.

    摘要翻译: 具有几乎平面的腔内接触的VCSEL。 在基板上形成底部DBR反射镜。 在底部DBR镜上形成第一导电层区域。 包括量子阱的有源层在第一导电层区域上。 沟槽形成有源层区域。 沟槽形成为具有为活动层区域提供机械支撑的轮辐车轮构造。 沟槽被蚀刻到第一导电层区域附近。 质子植入物被提供在货车轮中并且被配置成使得货车车轮的轮辐绝缘。 形成近似平面的电接触件作为用于将有源区域的底部连接到电源的腔内接触。 几乎平面的电接触形成在沟槽中和周围。