Abstract:
A light having a pulse frequency higher than about 300 Hz is generated. The light is irradiated on an amorphous silicon thin film for a predetermined time period to form an initial polysilicon crystal. The light is transported in a predetermined direction to grow the initial polysilicon crystal. A laser beam having a decreased output energy is irradiated on the amorphous silicon thin film to crystallize the amorphous silicon thin film to a polysilicon thin film so that the load of an apparatus for generating the laser beam is decreased, and the lifetime of the apparatus for generating the laser beam increases.
Abstract:
A light having a pulse frequency higher than about 300 Hz is generated. The light is irradiated on an amorphous silicon thin film for a predetermined time period to form an initial polysilicon crystal. The light is transported in a predetermined direction to grow the initial polysilicon crystal. A laser beam having a decreased output energy is irradiated on the amorphous silicon thin film to crystallize the amorphous silicon thin film to a polysilicon thin film so that the load of an apparatus for generating the laser beam is decreased, and the lifetime of the apparatus for generating the laser beam increases.
Abstract:
In a method of manufacturing a polysilicon thin film and a method of manufacturing a TFT having the thin film, a laser beam is irradiated on a portion of an amorphous silicon thin film to liquefy the portion of the amorphous silicon thin film. The amorphous silicon thin film is on a first end portion of a substrate. The liquefied silicon is crystallized to form silicon grains. The laser beam is shifted from the first end portion towards a second end portion of the substrate opposite the first end portion by an interval in a first direction. The laser beam is then irradiated onto a portion of the amorphous silicon thin film adjacent to the silicon grains to form a first polysilicon thin film. Therefore, electrical characteristics of the amorphous silicon thin film may be improved.
Abstract:
In a method of manufacturing a polysilicon thin film and a method of manufacturing a TFT having the thin film, a laser beam is irradiated on a portion of an amorphous silicon thin film to liquefy the portion of the amorphous silicon thin film. The amorphous silicon thin film is on a first end portion of a substrate. The liquefied silicon is crystallized to form silicon grains. The laser beam is shifted from the first end portion towards a second end portion of the substrate opposite the first end portion by an interval in a first direction. The laser beam is then irradiated onto a portion of the amorphous silicon thin film adjacent to the silicon grains to form a first polysilicon thin film. Therefore, electrical characteristics of the amorphous silicon thin film may be improved.
Abstract:
In a method of manufacturing a polysilicon thin film and a method of manufacturing a TFT having the thin film, a laser beam is irradiated on a portion of an amorphous silicon thin film to liquefy the portion of the amorphous silicon thin film. The amorphous silicon thin film is on a first end portion of a substrate. The liquefied silicon is crystallized to form silicon grains. The laser beam is shifted from the first end portion towards a second end portion of the substrate opposite the first end portion by an interval in a first direction. The laser beam is then irradiated onto a portion of the amorphous silicon thin film adjacent to the silicon grains to form a first polysilicon thin film. Therefore, electrical characteristics of the amorphous silicon thin film may be improved.
Abstract:
To form a dielectric layer, an organometallic precursor is adsorbed on a substrate loaded into a process chamber. The organometallic precursor includes a central metal and ligands bound to the central metal. An inactive oxidant is provided onto the substrate. The inactive oxidant is reactive with the organometallic precursor. An active oxidant is also provided onto the substrate. The active oxidant has a higher reactivity than that of the inactive oxidant.
Abstract:
A power supply including: a power supply circuit for receiving an external power and a battery power, and for outputting a power including at least one of the external power or the battery power to a load; and a battery pack coupled to the power supply circuit, the battery pack including a plurality of batteries, which are arranged into a plurality of battery groups including a first battery group and a second battery group, and configured to provide the battery power. Where, the battery pack is configured to selectively supply a power of the first battery group or a power of the second battery group as the battery power to the power supply circuit according to at least one of a status of the external power, a status of the load, a status of the first battery group, or a status of the second battery group.
Abstract:
The present invention relates to a fluorene-based resin polymer, and a photosensitive resin composition including the same, and the fluorene-based resin polymer according to the exemplary embodiment of the present invention has a high molecular weight, a low acid value, and excellent developing property, adhesive property and stability.
Abstract:
Provided is a self-adhesive composition having excellent weather resistance, adhesive strength, transparency, and durability to durability against ultraviolet rays, containing aliphatic polycarbonate by copolymerization of carbon dioxide and at least one epoxide compound. Also, provided are a self-adhesive film for glass produced from the self-adhesive composition containing aliphatic polycarbonate and a use thereof.
Abstract:
Provided is an eco-friendly poly(propylene carbonate) resin composition for a sheet, which is characterized by using a poly(alkylene carbonate) resin developed by efficiently utilizing carbon dioxide, which is a major contributor to global warding, as a main material, and including appropriate additives, such as, a strength modifier, and a flexibilizer, thereby completely solving environmental hazards controversy of the existing polyvinyl chloride resin products; exhibiting excellent mechanical and thermal properties, processability, post processability (printability, embossing and surface treatment, laminating characteristics) and superior anti-flaming property (low smoke density) and elongation characteristics as compared with the existing polyvinyl chloride resin products; and overcoming an extruding production method which is a small-sized production manner, corresponding to a big defect in thermoplastic plastics emerged as substitutes for polyvinyl chloride resin products and thus applying a calendering process method which is a mass production manner.