公开(公告)号：US09355851B2

公开(公告)日：2016-05-31

申请号：US13588393

申请日：2012-08-17

申请人： Jong-Won Hong ,  Hei-Seung Kim ,  Kyoung-hee Nam ,  In-sun Park ,  Jong-Myeong Lee

发明人： Jong-Won Hong ,  Hei-Seung Kim ,  Kyoung-hee Nam ,  In-sun Park ,  Jong-Myeong Lee

IPC分类号： H01L21/762 ,  H01L21/763 ,  H01L21/288 ,  H01L23/532 ,  H01L27/115 ,  H01L21/768 ,  H01L27/108

CPC分类号： H01L21/76879 ,  H01L21/2885 ,  H01L21/76846 ,  H01L21/76847 ,  H01L21/76861 ,  H01L21/76864 ,  H01L21/76873 ,  H01L21/76877 ,  H01L21/76882 ,  H01L23/53238 ,  H01L27/10894 ,  H01L27/10897 ,  H01L27/11529 ,  H01L2221/1089 ,  H01L2924/0002 ,  H01L2924/00

摘要： A semiconductor device includes a metal pattern filling a trench formed through at least a portion of an insulating interlayer on a substrate and including copper, and a wetting improvement layer pattern in the metal pattern including at least one of tantalum, tantalum nitride, titanium, titanium nitride, ruthenium, cobalt and manganese.

摘要翻译： 半导体器件包括填充通过衬底上的绝缘中间层的至少一部分形成并包括铜的沟槽的金属图案，以及金属图案中的包含钽，氮化钽，钛，钛中的至少一种的润湿改善层图案 氮化物，钌，钴和锰。

公开(公告)号：US09044756B2

公开(公告)日：2015-06-02

申请号：US13588025

申请日：2012-08-17

申请人： Byeong-woo Bae ,  Sung-dong Lee ,  Hong-seong Suk ,  Jina Yoo ,  Ki-won Lee ,  Jong-won Hong ,  Duck-sung Nam

发明人： Byeong-woo Bae ,  Sung-dong Lee ,  Hong-seong Suk ,  Jina Yoo ,  Ki-won Lee ,  Jong-won Hong ,  Duck-sung Nam

IPC分类号： B01L3/00 ,  G01N33/487 ,  G01N35/00

CPC分类号： G01N27/3274 ,  B01L3/545 ,  G01N33/48771 ,  G01N2035/00772

摘要： An apparatus for reading identification information of a biosensor is provided, including a biosensor sensing unit detecting the biosensor, a light-emitting unit emitting light on an identification information recording unit when the biosensor sensing unit detects the biosensor, the identification information recording unit having the identification information of the biosensor recorded thereon, a light-receiving unit that receives the light emitted from the light-emitting unit, and reflected or refracted by or passing through the identification information recording section, and an identification information reading unit analyzing the light received by the light-receiving unit and reading the identification information of the biosensor.

摘要翻译： 提供一种用于读取生物传感器的识别信息的装置，包括检测生物传感器的生物传感器感测单元，当生物传感器感测单元检测到生物传感器时在识别信息记录单元上发光的发光单元，具有 记录在其上的生物传感器的识别信息，接收从发光单元发射并被识别信息记录部分反射或折射或通过的光的光接收单元，以及识别信息读取单元， 光接收单元并读取生物传感器的识别信息。

公开(公告)号：US08865252B2

公开(公告)日：2014-10-21

申请号：US13031756

申请日：2011-02-22

申请人： Yong Sup Choi ,  Myeng-Woo Nam ,  Jong-Won Hong ,  Seok-Rak Chang ,  Eun-Sun Choi

发明人： Yong Sup Choi ,  Myeng-Woo Nam ,  Jong-Won Hong ,  Seok-Rak Chang ,  Eun-Sun Choi

IPC分类号： C23C16/00 ,  B05D5/06 ,  H01L21/677 ,  H01L51/56 ,  H01L21/67 ,  H01L21/673 ,  H01L21/687

CPC分类号： H01L21/6776 ,  H01L21/67173 ,  H01L21/6732 ,  H01L21/68764 ,  H01L51/56

摘要： A thin film deposition apparatus that can be easily used to manufacture large-sized display devices on a mass scale and that improves manufacturing yield, and a method of manufacturing an organic light-emitting display device by using the thin film deposition apparatus. The thin film deposition apparatus includes: a loading unit to place a substrate, which is a deposition target, on an electrostatic chuck; a deposition unit including a chamber, and a thin film deposition assembly that is disposed in the chamber and forms a thin film on the substrate placed on the electrostatic chuck; an unloading unit to separate the substrate on which deposition is completed from the electrostatic chuck; a first conveyor unit to sequentially move the electrostatic chuck having the substrate thereon to the loading unit, to the deposition unit, and finally, to the unloading unit, wherein the first conveyor unit includes: one pair of first guide rails and one pair of second guide rails disposed in parallel; at least one first guide block engaged with the first guide rails, respectively; and at least one second guide block engaged with the second guide rails, respectively.

摘要翻译： 可以容易地用于大规模制造大尺寸显示装置并提高制造成品率的薄膜沉积装置，以及通过使用薄膜沉积装置制造有机发光显示装置的方法。 薄膜沉积装置包括：装载单元，将作为沉积靶的基板放置在静电卡盘上; 包括室的沉积单元和设置在室中并在放置在静电卡盘上的基板上形成薄膜的薄膜沉积组件; 卸载单元，用于将其上完成了沉积的基板从静电卡盘分离; 第一传送单元，其顺序地将其上具有基板的静电卡盘移动到装载单元，到沉积单元，最后到达卸载单元，其中第一传送单元包括：一对第一导轨和一对第二传送单元 平行布置的导轨; 分别与所述第一导轨接合的至少一个第一引导块; 以及分别与第二导轨接合的至少一个第二引导块。

公开(公告)号：US08384087B2

公开(公告)日：2013-02-26

申请号：US12805995

申请日：2010-08-27

申请人： Yong-Duck Son ,  Ki-Yong Lee ,  Joon-Hoo Choi ,  Min-Jae Jeong ,  Seung-Kyu Park ,  Kil-Won Lee ,  Jae-Wan Jung ,  Dong-Hyun Lee ,  Byung-Soo So ,  Hyun-Woo Koo ,  Ivan Maidanchuk ,  Jong-Won Hong ,  Heung-Yeol Na ,  Seok-Rak Chang

发明人： Yong-Duck Son ,  Ki-Yong Lee ,  Joon-Hoo Choi ,  Min-Jae Jeong ,  Seung-Kyu Park ,  Kil-Won Lee ,  Jae-Wan Jung ,  Dong-Hyun Lee ,  Byung-Soo So ,  Hyun-Woo Koo ,  Ivan Maidanchuk ,  Jong-Won Hong ,  Heung-Yeol Na ,  Seok-Rak Chang

IPC分类号： H01L27/14

CPC分类号： H01L29/66757 ,  H01L27/1277 ,  H01L27/3262

摘要： A thin film transistor includes a substrate, a buffer layer on the substrate, a semiconductor layer including source/drain regions and a channel region on the buffer layer, a gate insulating layer corresponding to the channel region, a gate electrode corresponding to the channel region, and source/drain electrodes electrically connected to the semiconductor layer. A polysilicon layer of the channel region may include only a low angle grain boundary, and a high angle grain boundary may be disposed in a region of the semiconductor layer that is apart from the channel region.

摘要翻译： 薄膜晶体管包括衬底，衬底上的缓冲层，包括源极/漏极区域和缓冲层上的沟道区域的半导体层，对应于沟道区域的栅极绝缘层，对应于沟道区域的栅电极 以及与半导体层电连接的源极/漏极。 沟道区域的多晶硅层可以仅包括低角度晶界，并且可以在离开沟道区域的半导体层的区域中设置高角度晶界。

公开(公告)号：US08124524B2

公开(公告)日：2012-02-28

申请号：US12711812

申请日：2010-02-24

申请人： Kyung-In Choi ,  Sang-Woo Lee ,  Jong-Myeong Lee ,  Jong-Won Hong ,  Hyun-Bae Lee

发明人： Kyung-In Choi ,  Sang-Woo Lee ,  Jong-Myeong Lee ,  Jong-Won Hong ,  Hyun-Bae Lee

IPC分类号： H01L21/4763

CPC分类号： H01L23/5226 ,  H01L21/76846 ,  H01L21/76858 ,  H01L23/53223 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

摘要： Methods of forming a metal interconnection structure are provided. The methods include forming an insulating layer on a semiconductor substrate including a first metal interconnection. The insulating layer is patterned to form an opening that exposes the first metal interconnection. A first diffusion barrier layer is formed on the exposed first metal interconnection. After forming the first diffusion barrier layer, a second diffusion barrier layer is formed on the first diffusion barrier layer in the opening, the second diffusion barrier layer contacting a sidewall of the opening. A second metal interconnection is formed on the second diffusion barrier layer.

摘要翻译： 提供形成金属互连结构的方法。 所述方法包括在包括第一金属互连的半导体衬底上形成绝缘层。 图案化绝缘层以形成露出第一金属互连的开口。 在暴露的第一金属互连上形成第一扩散阻挡层。 在形成第一扩散阻挡层之后，在开口中的第一扩散阻挡层上形成第二扩散阻挡层，第二扩散阻挡层与开口的侧壁接触。 第二金属互连形成在第二扩散阻挡层上。

公开(公告)号：US20120000986A1

公开(公告)日：2012-01-05

申请号：US13009279

申请日：2011-01-19

申请人： Min-Jae JEONG ,  Ki-Yong Lee ,  Jong-Won Hong ,  Heung-Yeol Na ,  Eu-Gene Kang ,  Seok-Rak Chang ,  Jin-Wook Seo ,  Tae-Hoon Yang ,  Yun-Mo Chung ,  Byung-Soo Soo ,  Byoung-Keon Park ,  Dong-Hyun Lee ,  Kil-Won Lee ,  Won-Bong Baek ,  Jong-Ryuk Park ,  Bo-Kyung Choi ,  Ivan Maidanchuk ,  Jae-Wan Jung

发明人： Min-Jae JEONG ,  Ki-Yong Lee ,  Jong-Won Hong ,  Heung-Yeol Na ,  Eu-Gene Kang ,  Seok-Rak Chang ,  Jin-Wook Seo ,  Tae-Hoon Yang ,  Yun-Mo Chung ,  Byung-Soo Soo ,  Byoung-Keon Park ,  Dong-Hyun Lee ,  Kil-Won Lee ,  Won-Bong Baek ,  Jong-Ryuk Park ,  Bo-Kyung Choi ,  Ivan Maidanchuk ,  Jae-Wan Jung

IPC分类号： F24D5/00

CPC分类号： C23C16/4481 ,  C23C16/45525 ,  C23C16/52

摘要： A canister for a deposition apparatus and a deposition apparatus using the same, and more particularly, a canister for a deposition apparatus that can provide a uniform amount of source material contained in a reaction gas supplied into a deposition chamber and improve safety in the supply of the source material, and a deposition apparatus using the canister. The deposition apparatus includes a deposition chamber; a canister supplying a reaction gas into the deposition chamber; and a carrier gas supplier for supplying a carrier gas into the canister, in which the canister includes a main body, a heating unit heating the main body and a temperature measuring unit disposed under the main body.

摘要翻译： 一种用于沉积设备的罐和使用其的沉积设备，更具体地，涉及一种用于沉积设备的罐，其可以提供均匀量的源材料，所述源材料包含在供应到沉积室中的反应气体中，并且提高了供应 源材料和使用该罐的沉积装置。 沉积设备包括沉积室; 向所述沉积室供应反应气体的罐; 以及载体气体供给器，用于将载气供应到罐中，其中罐包括主体，加热单元加热主体，温度测量单元设置在主体下方。

公开(公告)号：US20110244120A1

公开(公告)日：2011-10-06

申请号：US13031756

申请日：2011-02-22

申请人： Yong Sup CHOI ,  Myeng-Woo Nam ,  Jong-Won Hong ,  Seok-Rak Chang ,  Eun-Sun Choi

发明人： Yong Sup CHOI ,  Myeng-Woo Nam ,  Jong-Won Hong ,  Seok-Rak Chang ,  Eun-Sun Choi

IPC分类号： B05D5/06 ,  B05C13/00 ,  B05B1/00 ,  B05B15/04

CPC分类号： H01L21/6776 ,  H01L21/67173 ,  H01L21/6732 ,  H01L21/68764 ,  H01L51/56

摘要： A thin film deposition apparatus that can be easily used to manufacture large-sized display devices on a mass scale and that improves manufacturing yield, and a method of manufacturing an organic light-emitting display device by using the thin film deposition apparatus. The thin film deposition apparatus includes: a loading unit to place a substrate, which is a deposition target, on an electrostatic chuck; a deposition unit including a chamber, and a thin film deposition assembly that is disposed in the chamber and forms a thin film on the substrate placed on the electrostatic chuck; an unloading unit to separate the substrate on which deposition is completed from the electrostatic chuck; a first conveyor unit to sequentially move the electrostatic chuck having the substrate thereon to the loading unit, to the deposition unit, and finally, to the unloading unit, wherein the first conveyor unit includes: one pair of first guide rails and one pair of second guide rails disposed in parallel; at least one first guide block engaged with the first guide rails, respectively; and at least one second guide block engaged with the second guide rails, respectively.

摘要翻译： 可以容易地用于大规模制造大尺寸显示装置并提高制造成品率的薄膜沉积装置，以及通过使用薄膜沉积装置制造有机发光显示装置的方法。 薄膜沉积装置包括：装载单元，将作为沉积靶的基板放置在静电卡盘上; 包括室的沉积单元和设置在室中并在放置在静电卡盘上的基板上形成薄膜的薄膜沉积组件; 卸载单元，用于将其上完成了沉积的基板从静电卡盘分离; 第一传送单元，其顺序地将其上具有基板的静电卡盘移动到装载单元，到沉积单元，最后到达卸载单元，其中第一传送单元包括：一对第一导轨和一对第二传送单元 平行布置的导轨; 分别与所述第一导轨接合的至少一个第一引导块; 以及分别与第二导轨接合的至少一个第二引导块。

公开(公告)号：US07972941B2

公开(公告)日：2011-07-05

申请号：US12165805

申请日：2008-07-01

申请人： Jong-Won Hong ,  Gil-Heyun Choi ,  Jong-Myeong Lee ,  Geum-Jung Seong

发明人： Jong-Won Hong ,  Gil-Heyun Choi ,  Jong-Myeong Lee ,  Geum-Jung Seong

IPC分类号： H01L21/322

CPC分类号： H01L21/28176 ,  H01L21/76826 ,  H01L27/10855 ,  H01L27/11521

摘要： A gate structure is formed on a substrate. An insulating interlayer is formed covering the gate structure. The substrate is heat treated while exposing a surface of the insulating interlayer to a hydrogen gas atmosphere. A silicon nitride layer is formed directly on the interlayer insulating layer after the heat treatment and a metal wiring is formed on the insulating interlayer. The metal wiring may include copper. Heat treating the substrate while exposing a surface of the interlayer insulating layer to a hydrogen gas atmosphere may be preceded by forming a plug through the first insulating interlayer that contacts the substrate, and the metal wiring may be electrically connected to the plug. The plug may include tungsten.

摘要翻译： 在基板上形成栅极结构。 形成覆盖栅极结构的绝缘中间层。 在将绝缘中间层的表面暴露于氢气气氛的同时对基板进行热处理。 在热处理之后，在层间绝缘层上直接形成氮化硅层，在绝缘中间层上形成金属配线。 金属布线可以包括铜。 在将层间绝缘层的表面暴露于氢气气氛的同时对基板进行热处理之前，可以通过与基板接触的第一绝缘中间层形成插塞，并且金属布线可以电连接到插头。 插头可以包括钨。

公开(公告)号：US20110114963A1

公开(公告)日：2011-05-19

申请号：US12805995

申请日：2010-08-27

申请人： Yong-Duck Son ,  Ki-Yong Lee ,  Joon-Hoo Choi ,  Min-Jae Jeong ,  Seung-Kyu Park ,  Kil-Won Lee ,  Jae-Wan Jung ,  Dong-Hyun Lee ,  Byung-Soo So ,  Hyun-Woo Koo ,  Ivan Maidanchuk ,  Jong-Won Hong ,  Heung-Yeol Na ,  Seok-Rak Chang

发明人： Yong-Duck Son ,  Ki-Yong Lee ,  Joon-Hoo Choi ,  Min-Jae Jeong ,  Seung-Kyu Park ,  Kil-Won Lee ,  Jae-Wan Jung ,  Dong-Hyun Lee ,  Byung-Soo So ,  Hyun-Woo Koo ,  Ivan Maidanchuk ,  Jong-Won Hong ,  Heung-Yeol Na ,  Seok-Rak Chang

IPC分类号： H01L51/52 ,  H01L29/786 ,  H01L21/336

CPC分类号： H01L29/66757 ,  H01L27/1277 ,  H01L27/3262

摘要： A thin film transistor includes a substrate, a buffer layer on the substrate, a semiconductor layer including source/drain regions and a channel region on the buffer layer, a gate insulating layer corresponding to the channel region, a gate electrode corresponding to the channel region, and source/drain electrodes electrically connected to the semiconductor layer. A polysilicon layer of the channel region may include only a low angle grain boundary, and a high angle grain boundary may be disposed in a region of the semiconductor layer that is apart from the channel region.

摘要翻译： 薄膜晶体管包括衬底，衬底上的缓冲层，包括源极/漏极区域和缓冲层上的沟道区域的半导体层，对应于沟道区域的栅极绝缘层，对应于沟道区域的栅电极 以及与半导体层电连接的源极/漏极。 沟道区域的多晶硅层可以仅包括低角度晶界，并且可以在离开沟道区域的半导体层的区域中设置高角度晶界。

公开(公告)号：US20100224883A1

公开(公告)日：2010-09-09

申请号：US12714201

申请日：2010-02-26

申请人： Byoung-Keon PARK ,  Tae-Hoo Yang ,  Jin-Wook Seo ,  Ki-Yong Lee ,  Maxim Lisachenko ,  Bo-Kyung Choi ,  Dae-Woo Lee ,  Kil-Won Lee ,  Dong-Hyun Lee ,  Jong-Ryuk Park ,  Ji-Su Ahn ,  Yong-Dae Kim ,  Heung-Yeol Na ,  Min-Jae Jeong ,  Yun-Mo Chung ,  Jong-Won Hong ,  Eu-Gene Kang ,  Seok-Rak Chang ,  Jae-Wan Jung ,  Sang-Yon Yoon

发明人： Byoung-Keon PARK ,  Tae-Hoo Yang ,  Jin-Wook Seo ,  Ki-Yong Lee ,  Maxim Lisachenko ,  Bo-Kyung Choi ,  Dae-Woo Lee ,  Kil-Won Lee ,  Dong-Hyun Lee ,  Jong-Ryuk Park ,  Ji-Su Ahn ,  Yong-Dae Kim ,  Heung-Yeol Na ,  Min-Jae Jeong ,  Yun-Mo Chung ,  Jong-Won Hong ,  Eu-Gene Kang ,  Seok-Rak Chang ,  Jae-Wan Jung ,  Sang-Yon Yoon

IPC分类号： H01L33/16 ,  H01L29/786 ,  H01L21/336 ,  H01L21/20

CPC分类号： H01L29/6675 ,  H01L21/02422 ,  H01L21/02488 ,  H01L21/02532 ,  H01L21/02667 ,  H01L21/02672 ,  H01L27/1277 ,  H01L29/66757 ,  H01L29/66765 ,  H01L29/78696

摘要： A thin film transistor (TFT) and an organic light emitting diode (OLED) display device. The TFT and the OLED display device include a substrate, a buffer layer disposed on the substrate, a semiconductor layer disposed on the buffer layer, a gate electrode insulated from the semiconductor layer, a gate insulating layer insulating the semiconductor layer from the gate electrode, and source and drain electrodes insulated from the gate electrode and partially connected to the semiconductor layer, wherein the semiconductor layer is formed from a polycrystalline silicon layer crystallized by a metal catalyst and the metal catalyst is removed by gettering using an etchant. In addition, the OLED display device includes an insulating layer disposed on the entire surface of the substrate, a first electrode disposed on the insulating layer and electrically connected to one of the source and drain electrodes, an organic layer, and a second electrode.

摘要翻译： 薄膜晶体管（TFT）和有机发光二极管（OLED）显示装置。 TFT和OLED显示装置包括基板，设置在基板上的缓冲层，设置在缓冲层上的半导体层，与半导体层绝缘的栅电极，将半导体层与栅电极绝缘的栅极绝缘层， 以及与栅电极绝缘并且部分地连接到半导体层的源电极和漏电极，其中半导体层由通过金属催化剂结晶的多晶硅层形成，并且使用蚀刻剂通过吸气除去金属催化剂。 此外，OLED显示装置包括设置在基板的整个表面上的绝缘层，设置在绝缘层上并电连接到源极和漏极之一的第一电极，有机层和第二电极。