Protective thin film for FPDS, method for producing said thin film and FPDS using said thin film
    9.
    发明授权
    Protective thin film for FPDS, method for producing said thin film and FPDS using said thin film 失效
    用于FPDS的保护性薄膜,使用所述薄膜制造所述薄膜和FPDS的方法

    公开(公告)号:US06821616B1

    公开(公告)日:2004-11-23

    申请号:US09457743

    申请日:1999-12-10

    IPC分类号: B32B904

    摘要: The present invention provides a protecting film capable of preventing deterioration in adhesion and matching to a substrate (dielectric layer), and deterioration in electric insulation. The protecting film includes a film body composed of MgO or the like which is inhibited from reacting with CO2 gas and H2O gas in air to prevent degeneration of MgO or the like into MgCO3 and Mg(OH)2, etc. harmful to FPD. The film body is formed on the surface of the substrate, and the fluoride layer is formed on the surface of the film body. The fluoride layer is represented by MOXFY (M is Mg, Ca, Sr, Ba, an alkali earth complex metal, a rare earth metal, or a complex metal of an alkali earth metal and a rare earth metal, 0≦X

    摘要翻译: 本发明提供能够防止粘合性劣化和与基板(电介质层)匹配的保护膜以及电绝缘性的劣化。 保护膜包括由MgO等构成的膜体,其被抑制与空气中的CO 2气体和H 2 O气体反应,以防止MgO等变为对FPD有害的MgCO 3和Mg(OH)2等。 在基材的表面上形成膜体,并且在膜体的表面上形成氟化物层。 氟化物层由MOXFY(M是Mg,Ca,Sr,Ba,碱土金属络合物,稀土金属或碱土金属和稀土金属的复合金属,0 <= X 2 ,0

    Aluminum nitride substrate and method of producing the same
    10.
    发明授权
    Aluminum nitride substrate and method of producing the same 失效
    氮化铝基板及其制造方法

    公开(公告)号:US5780162A

    公开(公告)日:1998-07-14

    申请号:US489677

    申请日:1995-06-13

    IPC分类号: H01L21/48 H01L23/15 B32B15/00

    摘要: An aluminum nitride (AlN) substrate comprising an AIN sinter, an Al.sub.2 O.sub.3 layer provided on the sinter, and a glass-mixed Al.sub.2 O.sub.3 layer which is provided on the Al.sub.2 O.sub.3 layer and contains Al.sub.2 O.sub.3 and glass mixed therewith, preferably with an oxide particle-dispersed glass layer and a main glass layer provided on the glass-mixed Al.sub.2 O.sub.3 layer. The AlN substrate has heat dissipation properties closer to those of AlN itself, does not cause generation of air bubbles at the junction interface between the AlN sinter and the glass-containing layer, and has excellent surface smoothness and corrosion resistance. The very fine conductive layer, etc. may be readily and firmly formed on the substrate in a stable manner.

    摘要翻译: 包含AlN烧结体,设置在烧结体上的Al 2 O 3层的氮化铝(AlN)衬底以及设置在Al 2 O 3层上并含有Al 2 O 3和玻璃的玻璃混合Al 2 O 3层,优选与氧化物粒子分散玻璃 层和设置在玻璃混合Al 2 O 3层上的主玻璃层。 AlN衬底具有更接近于AlN本身的散热性能,不会在AlN烧结体和含玻璃层之间的接合界面处产生气泡,并且具有优异的表面平滑性和耐腐蚀性。 非常细的导电层等可以以稳定的方式容易且牢固地形成在基板上。