摘要:
A holographic optical element (HOE) includes a substrate structure having rotational symmetry with respect to a rotational axis for rotatively supporting at least two holograms. A first hologram on the substrate structure in the path of a normally incident beam diffracts the beam by a first acute angle and in a first radial direction from the rotational axis to a first redirected path. A second hologram on the substrate structure in the first redirected path diffracts the beam by a different second acute angle and in an opposite second radial direction from the rotational axis to a second redirected path. As a result, the two holograms may be used to achieve a second redirected path at an angle to the rotational axis that has a size which is the difference between the size of the first angle and the size of the second angle. The substrate structure may include first, second, and third disc-shaped substrates bonded together so that the third substrate is in between the first and second substrates, and a thin-film interference filter may be included on the third substrate to suppress zero-order leakage through the first hologram. The filter element may include one of a dielectric stack, a transmission hologram, or a reflectance hologram. The first hologram may be imprinted to achieve total internal reflection of zero-order leakage through the second hologram. An additional interference filter may be included on either the output face of the HOE or on a separate window element in order to reflects any zero-order leakage from the second hologram. The HOE may also have Schmidt-type aberration correction superimposed on at least one of the holograms to compensate for spherical aberrations from an all spherical Cassegrain type of telescope.
摘要:
A low temperature photochemical vapor deposition process for the deposition of a layer of a chosen polymer on the surface of a substrate. The polymer comprises repeating hydrocarbon units linked through oxygen, nitrogen, or sulfur atoms and is formed by reacting a vapor phase monomer precursor containing the hydrocarbon units and a vapor phase precursor containing the oxygen, nitrogen, or sulfur under radiation inducement. The low temperature of the process avoids thermal damage to the substrate. Specifically disclosed polymers are polyphenylether and polyxyleneamine, which are useful, respectively, as insulator or passivation layers in semiconductor devices and circuits, and as adhesives.
摘要:
An error-compensated process for forming a multiple-notch optical filter which is characterized by a continually and accurately varying periodic profile. The optical medium if formed on a substrate so that the profile of the refractive index is multiply sinusoidally modulated to maintain Bragg's law for each component in the multiple-notch profile. In a preferred embodiment, as the optical medium is coated on the substrate, the depositing film is monitored by optical techniques, and feedback information is provided to a computer driven by a pre-programmed process control algorithm so that real time control of the manufacturing process may be accomplished.
摘要:
A substrate having an undesired native oxide layer formed on the surface thereof is treated at a low temperature by exposure to a chosen vapor phase hydrogen-containing precursor in the presence of radiation of a selected wavelength. Upon radiation-inducement, neutral hydrogen species are formed from the precursor and interact with the native oxide to convert the native oxide to a chemically reduced form. By this process, thermal damage and charge damage to the substrate are avoided and the electrical properties of a subsequently formed device are enhanced.
摘要:
A method for determining the susceptibility of solar cell coverglass assemblies to degrade wherein the solar cell assembly contains coated or uncoated coverglass, the method comprises exposing the solar cell coverglass assembly with a pulsing laser having an energy per unit area per pulse which distinguishes by laser damage between coverglass assemblies that have an anomalously high propensity to darken under solar exposure and those that only have a normal, nominal propensity to darken; and, characterizing the propensity of the coverglass assemblies to darken. The process results in an improvement of the long-term power output of solar cells by maintaining optical transparency and reducing temperature increases arising from increased solar absorption in darkened coverglass assemblies.
摘要:
An improved process for depositing an oxide layer on a substrate by exposing the substrate to a selected vapor phase reactant and an oxygen-containing precursor comprising nitrous oxide mixed with molecular oxygen in a predetermined ratio, in the presence of radiation of a selected wavelength. The radiation causes the direct dissociation of the oxygen-containing precursor to form neutral oxygen atoms that react with the vapor phase reactant and form the oxide, which deposits as a layer on the substrate. The rate of reaction to form and deposit the oxide layer is enhanced by the mixing of molecular oxygen with nitrous oxide in the precursor.
摘要:
A method for determining the susceptibility of solar cell cover glass or second surface mirror to ultraviolet (UV) degradation comprises the steps of illuminating the solar cell cover glass with ultra violet light at a preselected illumination angle where the solar cell cover glass reflects a portion of the ultraviolet light; measuring the reflected portion of the ultraviolet light; and, characterizing the propensity of the cover glass or contaminate layer on a second surface mirror to degradation as a function of the reflectance. The process results in an improvement of the long-term power output of solar cells by screening out cover glasses that have a propensity to darken under solar-equivalent UV exposure and thus maintaining optical transparency arising from increased solar absorption in darkened cover glass. The process will additionally result in decreased contaminant levels on thermal control surfaces and less on-orbit degradation.
摘要:
A process for forming on the surface of a substrate a layer of a siloxane polymer by exposing the substrate to a first vapor phase monomer precursor having the formula SiR.sub.x H.sub.4-x where x is 1 to 4 and R is alkyl or phenyl, and a second vapor phase oxygen-containing precursor in the presence of radiation of a predetermined wavelength to bring about the reaction to form the siloxane polymer which deposits on the surface of substrate. The monomer precursor may comprise a mixture, such as SiRH.sub.3 and SiR.sub.2 H.sub.2 with each other or with SiR.sub.3 H. By varying the composition of such mixtures, the composition of the siloxane polymer may be chosen to provide predetermined properties, and, further, may be varied throughout the thickness of the deposited layer.
摘要翻译:通过将基底暴露于具有式SiRxH4-x的第一气相单体前体(其中x为1至4,R为烷基或苯基)和第二蒸气(第二蒸气),在基底表面上形成硅氧烷聚合物层 在预定波长的辐射存在下,使相含氧的前体进行反应以形成沉积在基材表面上的硅氧烷聚合物。 单体前体可以包含彼此或SiR 3 H的混合物,例如SiRH 3和SiR 2 H 2。 通过改变这种混合物的组成,可以选择硅氧烷聚合物的组成以提供预定的性质,并且还可以在沉积层的整个厚度上变化。
摘要:
A passive thermal control blanket and a method for its manufacture, the blanket including a plastic substrate on which is deposited a film that is a homogeneous mixture of silicon and germanium, thereby combining the excellent reflective and electrostatic discharge properties of germanium with the superior adhesion and corrosion resistance properties of silicon. The uniform mixture is preferably obtained by sputtering the two materials simultaneously onto the substrate, using either separate targets, a single mosaic target, or a single composite target.
摘要:
A process for forming a single-notch optical filter having a continually and accurately varying periodic profile. An optical medium is coated on a uniform substrate where the homogeneous optical medium produces a rugate filter, so that the profile of the refractive index follows a sinusoidal pattern and Bragg's law. As the optical medium is coated on the substrate, the depositing film is monitored by optical techniques, and feedback information is provided to a computer driven by a pre-programmed process control algorithm so that real time control of the manufacturing process may be accomplished.