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    CW DUV laser with improved stability
    1.
    发明授权
    CW DUV laser with improved stability 有权

    公开(公告)号：US10044166B2

    公开(公告)日：2018-08-07

    申请号：US15335266

    申请日：2016-10-26

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Chuang ,  Xiaoxu Lu ,  John Fielden

    IPC: H01S3/109 ,  G02F1/355 ,  H01S3/00 ,  G02F1/35

    Abstract: A deep ultra-violet (DUV) continuous wave (CW) laser includes a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm, a third harmonic generator module including one or more non-linear optical (NLO) crystals that generate a third harmonic and an optional second harmonic, and a fifth harmonic generator. The fifth harmonic generator module includes a cavity resonant at the fundamental frequency, and combines the fundamental frequency with the third harmonic in a first NLO crystal to generate a fourth harmonic, then combines the fourth harmonic with unconsumed fundamental frequency in a second NLO crystal to generate the fifth harmonic. One or more lenses are used to focus the third and fourth harmonics in the first and second NLO crystals, respectively.

    CW DUV laser with improved stability
    3.
    发明授权
    CW DUV laser with improved stability 有权
    CW DUV激光器具有改进的稳定性

    公开(公告)号：US09509112B2

    公开(公告)日：2016-11-29

    申请号：US14294019

    申请日：2014-06-02

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Chuang ,  Xiaoxu Lu ,  John Fielden

    IPC: H01S3/109 ,  H01S3/00 ,  G02F1/355 ,  G02F1/35

    CPC classification number: H01S3/109 ,  G02F1/353 ,  G02F1/3534 ,  G02F1/3558 ,  G02F2001/3507 ,  G02F2001/354 ,  G02F2201/17 ,  G02F2203/15 ,  H01S3/0092

    Abstract: A deep ultra-violet (DUV) continuous wave (CW) laser includes a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm, a third harmonic generator module including one or more periodically poled non-linear optical (NLO) crystals that generate a third harmonic and an optional second harmonic, and one of a fourth harmonic generator module and a fifth harmonic generator. The fourth harmonic generator module includes a cavity resonant at the fundamental frequency configured to combine the fundamental frequency with the third harmonic to generate a fourth harmonic. The fourth harmonic generator module includes either a cavity resonant at the fundamental frequency for combining the fundamental frequency with the third harmonic to generate a fifth harmonic, or a cavity resonant at the second harmonic frequency for combining the second harmonic and the third harmonic to generate the fifth harmonic.

    Abstract translation: 深紫外（DUV）连续波（CW）激光器包括配置为产生具有在约1μm和1.1μm之间的相应波长的基频的基本CW激光器;三次谐波发生器模块，包括一个或多个周期性极化非线性 产生三次谐波和可选的二次谐波的线性光学（NLO）晶体，以及四次谐波发生器模块和五次谐波发生器之一。 第四谐波发生器模块包括在基频处谐振的腔体，其被配置为将基频与三次谐波组合以产生第四谐波。 第四谐波发生器模块包括在基频处共振的腔体，用于将基频与三次谐波组合以产生五次谐波，或者在二次谐波频率下共振谐振以组合二次谐波和三次谐波，以产生 五次谐波。

    Integrated multi-channel analog front end and digitizer for high speed imaging applications
    4.
    发明授权
    Integrated multi-channel analog front end and digitizer for high speed imaging applications 有权
    集成多通道模拟前端和数字化仪，用于高速成像应用

    公开(公告)号：US09462206B2

    公开(公告)日：2016-10-04

    申请号：US14272454

    申请日：2014-05-07

    Applicant: KLA-Tencor Corporation

    Inventor： David L. Brown ,  Mansour Kermat ,  Lance Glasser ,  Henrik Nielsen ,  Guowu Zheng ,  Kurt Lehman ,  Kenneth F. Hatch ,  Yung-Ho Chuang ,  Venkatraman Iyer

    IPC: H04N5/335 ,  H04N5/228 ,  H04N5/378 ,  H04N5/372 ,  H01L27/146 ,  H04N5/369

    CPC classification number: H04N5/378 ,  H01L27/14634 ,  H04N5/3694 ,  H04N5/37206 ,  H04N5/37213

    Abstract: A module for high speed image processing includes an image sensor for generating a plurality of analog outputs representing an image and a plurality of HDDs for concurrently processing the plurality of analog outputs. Each HDD is an integrated circuit configured to process in parallel a predetermined set of the analog outputs. Each channel of the HDD can include an AFE for conditioning a signal representing one sensor analog output, an ADC for converting a conditioned signal into a digital signal, and a data formatting block for calibrations and formatting the digital signal for transport to an off-chip device. The HDDs and drive electronics are combined with the image sensor into one package to optimize signal integrity and high dynamic range, and to achieve high data rates through use of synchronized HDD channels. Combining multiple modules results in a highly scalable imaging subsystem optimized for inspection and metrology applications.

    Abstract translation: 用于高速图像处理的模块包括用于产生表示图像的多个模拟输出的图像传感器和用于同时处理多个模拟输出的多个HDD。 每个HDD是被配置为并行处理预定的一组模拟输出的集成电路。 HDD的每个通道可以包括用于调节表示一个传感器模拟输出的信号的AFE，用于将经调节的信号转换成数字信号的ADC，以及用于校准和格式化数字信号以传送到芯片外的数据格式化块 设备。 HDD和驱动电子设备与图像传感器组合成一个封装，以优化信号完整性和高动态范围，并通过使用同步的HDD通道实现高数据速率。 组合多个模块可实现高度可扩展的成像子系统，以优化检测和计量应用。

    193NM Laser And Inspection System
    8.
    发明申请
    193NM Laser And Inspection System 有权
    193NM激光和检测系统

    公开(公告)号：US20140204963A1

    公开(公告)日：2014-07-24

    申请号：US14158615

    申请日：2014-01-17

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Vladimir Dribinski ,  Yujun Deng ,  John Fielden

    IPC: H01S3/00 ,  G01N21/84

    CPC classification number: H01S3/1083 ,  G01N21/84 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02F1/3534 ,  G02F1/3536 ,  G02F1/39 ,  G02F2001/3507 ,  G02F2201/16 ,  H01S3/0078 ,  H01S3/0092 ,  H01S3/0602 ,  H01S3/067

    Abstract: A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.

    Abstract translation: 用于产生约193.4nm的输出波长的激光器包括基本激光器，光参量发生器，第四谐波发生器和混频模块。 耦合到基本激光器的光学参数发生器可以产生下变频信号。 可以耦合到光学参数发生器或基本激光器的第四谐波发生器可以产生四次谐波。 耦合到光参量发生器和第四谐波发生器的混频模块可产生频率等于下变频信号频率的四次谐波和两倍的频率的激光输出。

    EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers
    9.
    发明授权
    EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers 有权
    EUV高通量检测系统，用于在图案化的EUV掩模，掩模毛坯和晶片上进行缺陷检测

    公开(公告)号：US08692986B2

    公开(公告)日：2014-04-08

    申请号：US14014142

    申请日：2013-08-29

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Chuang ,  Richard W. Solarz ,  David R. Shafer ,  Bin-Ming Benjamin Tsai ,  David L. Brown

    IPC: G01N21/00

    CPC classification number: G01N21/95 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/068 ,  G03F1/84 ,  G03F7/70616 ,  H05G2/008

    Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.

    Abstract translation: 对EUV图案化掩模，空白掩模和由EUV图案化掩模生成的图案化晶片的检查需要高倍率和在图像平面上的大视场。 EUV检查系统可以包括指向检查表面的光源，用于检测从被检查表面偏转的光的检测器和用于将来自被检查表面的光引导到检测器的光学配置。 特别地，检测器可以包括多个传感器模块。 另外，光学配置可以包括在小于5米长的光路内提供至少100倍的放大倍数的多个反射镜。 在一个实施例中，光路大约2-3米长。

    193nm laser and inspection system
    10.
    发明授权
    193nm laser and inspection system 有权

    公开(公告)号：US10439355B2

    公开(公告)日：2019-10-08

    申请号：US15901388

    申请日：2018-02-21

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  John Fielden

    IPC: G01N21/95 ,  G02B17/08 ,  H01S3/23 ,  H01S3/00 ,  H01S3/30 ,  H01S3/10 ,  H01S3/067 ,  H01S3/16 ,  H01S3/11 ,  G02F1/35 ,  G02F1/39

    Abstract: An optical inspection system that utilizes sub-200 nm incident light beam to inspect a surface of an object for defects is described. The sub-200 nm incident light beam is generated by combining first light having a wavelength of about 1109 nm with second light having a wavelength of approximately 234 nm. An optical system includes optical components configured to direct the incident light beam to a surface of the object, and image relay optics are configured to collect and relay at least two channels of light to a sensor, where at least one channel includes light reflected from the object, and at least one channel includes light transmitted through the object. The sensor is configured to simultaneously detect both the reflected and transmitted light. A laser for generating the sub-200 nm incident light beam includes a fundamental laser, two or more harmonic generators, a frequency doubler and a two frequency mixing stages.

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