摘要:
The present disclosure relates to a method for manufacturing a multi-junction solar cell device comprising the steps of: providing a first substrate, providing a second substrate having a lower surface and an upper surface, forming at least one first solar cell layer on the first substrate to obtain a first wafer structure, forming at least one second solar cell layer on the upper surface of the second substrate to obtain a second wafer structure, and bonding the first wafer structure to the second wafer structure, wherein the at least one first solar cell layer is bonded to the lower surface of the second substrate and removing the first substrate.
摘要:
A device for back-scattering an incident light ray, including: a host substrate; a structured layer; a first face in contact with a front face of the host substrate; a second flat face parallel to the first face; a first material and a second material which form, in a mixed plane, alternating surfaces at least one of whose dimensions is between 300 nm and 800 nm, the mixed plane is between the first and second face of the structured layer; wherein the refractive index of the first and of the second material are different, the structured layer is covered by a specific layer, the specific layer is made of a material which is different from the first and second materials of the structured layer, and the specific layer is crystalline and semi-conductive.
摘要:
Three dimensionally integrated semiconductor systems include a photoactive device operationally coupled with a current/voltage converter on a semiconductor-on-insulator (SeOI) substrate. An optical interconnect is operatively coupled to the photoactive device. A semiconductor device is bonded over the SeOI substrate, and an electrical pathway extends between the current/voltage converter and the semiconductor device bonded over the SeOI substrate. Methods of forming such systems include forming a photoactive device on an SeOI substrate, and operatively coupling a waveguide with the photoactive device. A current/voltage converter may be formed over the SeOI substrate, and the photoactive device and the current/voltage converter may be operatively coupled with one another. A semiconductor device may be bonded over the SeOI substrate and operatively coupled with the current/voltage converter.
摘要:
Methods of fabricating semiconductor devices or structures include forming structures of a semiconductor material overlying a layer of a compliant material, subsequently changing the viscosity of the compliant material to relax the semiconductor material structures, and utilizing the relaxed semiconductor material structures as a seed layer in forming a continuous layer of relaxed semiconductor material. In some embodiments, the layer of semiconductor material may comprise a III-V type semiconductor material, such as, for example, indium gallium nitride. Novel intermediate structures are formed during such methods. Engineered substrates include a continuous layer of semiconductor material having a relaxed lattice structure.
摘要:
Methods and apparatus are described for a two axis tracking mechanism for a concentrated photovoltaic system. Two or more paddle structures containing multiple CPV modules are installed onto each tilt axle on the common roll axle as part of the two-axis tracking mechanism's solar array. The two or more paddle structures couple across the common roll axle on that tilt axle. The common roll axle and each paddle assembly are manufactured in simple modular sections that assemble easily in the field while maintaining the alignment of the tracker assembly.
摘要:
A substrate comprises a base wafer, an insulating layer over the base wafer, and a top semiconductor layer over the insulating layer on a side thereof opposite the base wafer. The insulating layer comprises a charge-confining layer confined on one or both sides with diffusion barrier layers, wherein the charge-confining layer has a density of charges in absolute value higher than 1010 charges/cm2. Alternatively, the insulating layer comprises charge-trapping islands embedded therein, wherein the charge-trapping islands have a total density of charges in absolute value higher than 1010 charges/cm2.
摘要翻译:衬底包括基底晶片,在基底晶片上方的绝缘层,以及在与基底晶片相对的一侧上的绝缘层上的顶部半导体层。 绝缘层包括限制在具有扩散阻挡层的一侧或两侧的电荷限制层,其中电荷限制层的绝对值的电荷密度高于1010电荷/ cm 2。 或者,绝缘层包括嵌入其中的电荷捕获岛,其中电荷捕获岛具有高于1010电荷/ cm 2的绝对值的电荷的总密度。
摘要:
A method for transferring a layer of semiconductor by providing a donor substrate that includes a useful layer of a semiconductor material, a confinement structure that includes a confinement layer of a semiconductor material having a chemical composition that is different than that of the useful layer, and two protective layers of semiconductor material that is distinct from the confinement layer with the protective layers being arranged on both sides of the confinement layer; introducing ions into the donor substrate, bonding the donor substrate to a receiver substrate, subjecting the donor and receiver substrates to a heat treatment that provides an increase in temperature during which the confinement layer attracts the ions in order to concentrate them in the confinement layer, and detaching the donor substrate from the receiver substrate by breaking the confinement layer.
摘要:
A heterostructure that includes, successively, a support substrate of a material having an electrical resistivity of less than 10−3 ohm·cm and a thermal conductivity of greater than 100 W·m−1·K−1, a bonding layer, a first seed layer of a monocrystalline material of composition AlxInyGa(1-x-y)N, a second seed layer of a monocrystalline material of composition AlxInyGa(1-x-y)N, and an active layer of a monocrystalline material of composition AlxInyGa(1-x-y)N, and being present in a thickness of between 3 and 100 micrometers. The materials of the support substrate, the bonding layer and the first seed layer are refractory at a temperature of greater than 750° C., the active layer and second seed layer have a difference in lattice parameter of less than 0.005 Å, the active layer is crack-free, and the heterostructure has a specific contact resistance between the bonding layer and the first seed layer that is less than or equal to 0.1 ohm·cm2.
摘要翻译:一种异质结构,其依次包括具有小于10-3欧姆·厘米的电阻率和大于100W·m-1·K-1的导热率的材料的支撑基板,接合层,第一 组成为Al x In y Ga(1-xy)N的单晶材料的第二晶种层和组成为Al x In y Ga(1-xy)N的单晶材料的有源层的组成为Al x In y Ga(1-xy)N的单晶材料的籽晶层, N,并且以3至100微米的厚度存在。 支撑衬底,结合层和第一种子层的材料在大于750℃的温度下是难熔的,活性层和第二种子层的晶格参数差异小于0.005,活性层 无裂纹,并且异质结构在接合层和第一种子层之间具有小于或等于0.1欧姆·cm 2的比接触电阻。
摘要:
A method for preparing a substrate for detaching a layer by irradiation of the substrate with a light flux for heating a buried region of the substrate and bringing about decomposition of the material of that region to detach the detachment layer. The method includes fabricating an intermediate substrate including a first buried layer, and a second covering layer that covers all or part of the first layer, with the covering layer being substantially transparent to the light flux and with the buried layer formed by implantation of particles into the substrate, followed by absorbing the flux, and selectively and adiabatically irradiating a treated region of the buried layer until at least partial decomposition of the material constituting it ensues.
摘要:
A method of producing a heterostructure by bonding at least one first substrate having a first thermal expansion coefficient onto a second substrate having a second thermal expansion coefficient, with the first thermal expansion coefficient being different from the second thermal expansion coefficient. Prior to bonding, trenches are formed in one of the two substrates from the bonding surface of the substrate. The trenches are filled with a material having a third thermal expansion coefficient lying between the first and second thermal expansion coefficients.