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    HIGHLY CROSSLINKED POLYMER DIELECTRIC FILMS FOR IMPROVED CAPACITOR PERFORMANCE
    91.
    发明申请
    HIGHLY CROSSLINKED POLYMER DIELECTRIC FILMS FOR IMPROVED CAPACITOR PERFORMANCE 有权
    用于改进电容器性能的高交织聚合物电介质膜

    公开(公告)号：US20140362493A1

    公开(公告)日：2014-12-11

    申请号：US14292349

    申请日：2014-05-30

    Applicant: Brewer Science Inc.

    Inventor： Marc Weimer

    IPC: H01G4/06 ,  C08F120/58

    CPC classification number: C08F120/58 ,  H01G4/18 ,  H01G4/32 ,  Y10T428/31855

    Abstract: New polymeric dielectric materials are provided for high power capacitors, especially for mobile and weapons applications. These materials utilize aminoplast crosslinking in their polymeric structure. The aminoplast crosslinking ability of these materials allows them to be customized for a number of applications, but also allows the materials to have a higher crosslinking density, leading to higher dielectric constants, higher breakdown voltage, and higher thermal stability. These materials can be incorporated into current capacitor manufacturing schemes with little to no processing changes.

    Abstract translation: 为高功率电容器提供了新的聚合介电材料，特别适用于移动和武器应用。 这些材料在其聚合物结构中利用氨基塑料交联。 这些材料的氨基塑料交联能力使得它们可以针对多种应用进行定制，而且还允许材料具有更高的交联密度，导致更高的介电常数，更高的击穿电压和更高的热稳定性。 这些材料可以结合到电流电容器制造方案中，几乎没有处理变化。

    MULTIFUNCTIONAL ALCOHOL DISPERSIONS OF CARBON NANOTUBES
    94.
    发明申请
    MULTIFUNCTIONAL ALCOHOL DISPERSIONS OF CARBON NANOTUBES 审中-公开
    碳纳米管的多功能酒精分散体

    公开(公告)号：US20130288064A1

    公开(公告)日：2013-10-31

    申请号：US13870497

    申请日：2013-04-25

    Applicant: BREWER SCIENCE INC.

    Inventor： Molly Hladik

    IPC: C09D11/00

    CPC classification number: C09D11/52 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/174 ,  D04H1/4242 ,  Y10T428/31786 ,  Y10T428/31993

    Abstract: New carbon nanotube (CNT) compositions and methods of using those compositions are provided. Raw carbon nanotubes are mechanically dispersed via milling into multifunctional alcohols and mixtures of multifunctional alcohols and solvents to form pastes or dispersions that are viscous enough to be printed using standard means such as screen printing. These pastes or dispersions are stable in both dilute and concentrated solution. The invention allows films to be formed on substrates (e.g., plastics, glass, metals, ceramics).

    Abstract translation: 提供了新的碳纳米管（CNT）组合物和使用这些组合物的方法。 原始碳纳米管通过研磨机械分散成多官能醇和多官能醇和溶剂的混合物，以形成粘性足以使用诸如丝网印刷的标准方法印刷的糊状物或分散体。 这些糊剂或分散体在稀释和浓缩溶液中都是稳定的。 本发明允许在基底（例如塑料，玻璃，金属，陶瓷）上形成膜。

    ASSIST LAYERS FOR EUV LITHOGRAPHY
    95.
    发明申请
    ASSIST LAYERS FOR EUV LITHOGRAPHY 有权
    辅助层用于EUV LITHOGRAPHY

    公开(公告)号：US20130129995A1

    公开(公告)日：2013-05-23

    申请号：US13682050

    申请日：2012-11-20

    Applicant: Brewer Science Inc.

    Inventor： Tantiboro Ouattara ,  Carlton A. Washburn ,  Vandana Krishnamurthy ,  Douglas Guerrero

    IPC: G03F7/09 ,  G03F7/20

    CPC classification number: G03F7/092 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/11 ,  G03F7/2004 ,  Y10S977/755 ,  Y10T428/24917

    Abstract: The present invention provides novel methods of fabricating microelectronics structures, and the resulting structures formed thereby, using EUV lithographic processes. The method involves utilizing an assist layer immediately below the photoresist layer. The assist layer can either be directly applied to the substrate, or it can be applied to any intermediate layer(s) that may be applied to the substrate. The preferred assist layers are formed from spin-coatable, polymeric compositions. The inventive method allows reduced critical dimensions to be achieved with improved dose-to-size ratios, while improving adhesion and reducing or eliminating pattern collapse issues.

    Abstract translation: 本发明提供了使用EUV光刻工艺制造微电子结构的新颖方法，以及由此形成的所得结构。 该方法包括利用光致抗蚀剂层正下方的辅助层。 辅助层可以直接施加到基底上，或者可以将其施加到可施加到基底上的任何中间层。 优选的辅助层由可旋涂的聚合物组合物形成。 本发明的方法允许通过改进的剂量 - 尺寸比来实现减小的临界尺寸，同时改善粘附性并减少或消除图案塌陷问题。

    Wet-developable anti-reflective compositions
    97.
    发明申请
    Wet-developable anti-reflective compositions 有权
    湿显影抗反射组合物

    公开(公告)号：US20040058275A1

    公开(公告)日：2004-03-25

    申请号：US10601897

    申请日：2003-06-23

    Applicant: Brewer Science, Inc.

    Inventor： Charles J. Neef ,  Vandana Krishnamurthy

    IPC: G03C001/76

    CPC classification number: C08G79/00 ,  C08L85/00 ,  G02B1/111 ,  Y10S430/106 ,  C08L2666/02

    Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers include a light-attenuating moiety having a structure selected from the group consisting of: 1 where: each of X1 and Y is individually selected from the group consisting of electron withdrawing groups; R2 is selected from the group consisting of alkyls and aryls; and R3 is selected from the group consisting of hydrogen and alkyls. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

    Abstract translation: 提供了抗反射组合物和使用这些组合物形成电路的方法。 组合物包含溶解或分散在溶剂体系中的聚合物。 在优选的实施方案中，聚合物包括具有选自下组的结构的光衰减部分：其中：X 1和Y各自独立地选自吸电子基团; R 2选自烷基和芳基; 和R 3选自氢和烷基。 所得到的组合物是旋转碗相容的（即，它们在微光刻工艺的烘烤阶段之前或在室温下储存期间不交联）是湿显影的并且具有优异的光学性能。

    Anti-reflective coating compositions for use with low k dielectric materials
    98.
    发明申请
    Anti-reflective coating compositions for use with low k dielectric materials 有权
    用于低k电介质材料的抗反射涂料组合物

    公开(公告)号：US20030234387A1

    公开(公告)日：2003-12-25

    申请号：US10310099

    申请日：2002-12-03

    Applicant: Brewer Science, Inc.

    Inventor： Rama Puligadda ,  James E. Lamb III ,  Tony D. Flaim

    IPC: G03C001/00

    CPC classification number: G03F7/091 ,  C08F220/28 ,  C08G59/3218 ,  C08J7/047 ,  C08J2425/00 ,  C08J2433/00 ,  C08J2471/00 ,  C09D163/00 ,  H01L21/0276 ,  H01L21/31144 ,  C08L2666/16

    Abstract: Anti-reflective compositions and methods of using those compositions with low dielectric constant materials are provided. In one embodiment, the compositions include polymers comprising recurring monomers having unreacted ring members. In another embodiment, the polymers further comprise recurring monomers comprising ring members reacted with a light attenuating compound so as to open the ring. The compositions can be applied to dielectric layers so as to minimize or prevent reflection during the dual damascene process while simultaneously blocking via or photoresist poisoning which commonly occurs when organic anti-reflective coatings are applied to low dielectric constant layers.

    Abstract translation: 提供抗反射组合物和使用具有低介电常数材料的那些组合物的方法。 在一个实施方案中，组合物包括包含具有未反应的环成员的重复单体的聚合物。 在另一个实施方案中，聚合物还包含包含与光衰减化合物反应以便打开环的环成员的重复单体。 组合物可以施加到电介质层，以便在双镶嵌工艺期间最小化或防止反射，同时阻挡当将有机抗反射涂层施加到低介电常数层时通常发生的通孔或光致抗蚀剂中毒。

    COMPOSITIONS AND METHODS FOR FORMING METAL ORGANIC FRAMEWORK (MOF) FILMS AND RELATED MICROELECTRONIC DEVICES
    100.
    发明申请
    COMPOSITIONS AND METHODS FOR FORMING METAL ORGANIC FRAMEWORK (MOF) FILMS AND RELATED MICROELECTRONIC DEVICES 有权

    公开(公告)号：US20250115770A1

    公开(公告)日：2025-04-10

    申请号：US18912542

    申请日：2024-10-10

    Applicant: Brewer Science, Inc.

    Inventor： Reuben T. Chacko ,  Stephen R. Murphy

    IPC: C09D5/00 ,  C09D7/63 ,  H01L27/146

    Abstract: Materials that are processable as spin coated films with a refractive index of less than about 1.25 are presented. These compositions include metal organic frameworks in a solvent system, with the MOFs including a metal or metal cluster (e.g., zirconium oxide) having organic linkers (e.g., maleic acid, benzene dicarboxylic acid) and optional endcaps to alter pore size, compositional stability, steric, and other properties of the material. The formed films are processable at low temperatures, thus allowing them to be processed on plastics. The provided materials find use in, for example, silicon photonics, augmented reality applications, virtual reality (VR) applications, CMOS image sensors, and micro-OLED applications.

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