PROCESS OF FORMING A GRID ELECTRODE ON THE FRONT-SIDE OF A SILICON WAFER
    92.
    发明申请
    PROCESS OF FORMING A GRID ELECTRODE ON THE FRONT-SIDE OF A SILICON WAFER 有权
    在硅砂的正面形成网状电极的工艺

    公开(公告)号:US20100294359A1

    公开(公告)日:2010-11-25

    申请号:US12783761

    申请日:2010-05-20

    摘要: A process of forming a front-grid electrode on a silicon wafer having an ARC layer, comprising the steps: (1) printing and drying a metal paste A comprising an inorganic content comprising 0.5 to 8 wt.-% of glass frit and having fire-through capability, wherein the metal paste A is printed on the ARC layer to form a bottom set of thin parallel finger lines, (2) printing and drying a metal paste B comprising an inorganic content comprising 0.2 to 3 wt.-% of glass frit over the bottom set of finger lines, wherein the metal paste B is printed in a grid pattern which comprises (i) thin parallel finger lines forming a top set of finger lines superimposing the bottom set of finger lines and (ii) busbars intersecting the finger lines at right angle, and (3) firing the double-printed silicon wafer, wherein the inorganic content of metal paste B contains less glass frit plus optionally present other inorganic additives than the inorganic content of metal paste A.

    摘要翻译: 一种在具有ARC层的硅晶片上形成前栅格电极的方法,包括以下步骤:(1)印刷和干燥包含0.5至8重量%玻璃料并具有火焰的无机物含量的金属糊剂A 通过能力,其中金属糊剂A印刷在ARC层上以形成底部薄的平行指线,(2)印刷和干燥包含含有0.2至3重量%玻璃的无机物质的金属浆料B 玻璃料覆盖在底部指状线组上,其中金属糊料B以网格图案打印,该网格图案包括(i)薄的平行指线,形成叠加了底部指状线组的顶部一组指纹线,以及(ii)与 指状物为直角,(3)烧制双面印刷的硅晶片,其中金属糊料B的无机物含量比金属膏A的无机物含量少,玻璃料加上任选存在的其它无机添加剂。