公开(公告)号：US10013518B2

公开(公告)日：2018-07-03

申请号：US13935275

申请日：2013-07-03

Applicant: KLA-Tencor Corporation

Inventor： Michael S. Bakeman ,  Andrei V. Shchegrov ,  Qiang Zhao ,  Zhengquan Tan

IPC: G06F17/50 ,  G03F7/20 ,  G03F1/70

CPC classification number: G06F17/5068 ,  G03F1/70 ,  G03F7/70608 ,  G03F7/70625

Abstract: Structural parameters of a specimen are determined by fitting models of the response of the specimen to measurements collected by different measurement techniques in a combined analysis. Models of the response of the specimen to at least two different measurement technologies share at least one common geometric parameter. In some embodiments, a model building and analysis engine performs x-ray and optical analyses wherein at least one common parameter is coupled during the analysis. The fitting of the response models to measured data can be done sequentially, in parallel, or by a combination of sequential and parallel analyses. In a further aspect, the structure of the response models is altered based on the quality of the fit between the models and the corresponding measurement data. For example, a geometric model of the specimen is restructured based on the fit between the response models and corresponding measurement data.

公开(公告)号：US20180108578A1

公开(公告)日：2018-04-19

申请号：US15782542

申请日：2017-10-12

Applicant: KLA-Tencor Corporation

Inventor： Stilian Ivanov Pandev ,  Dzmitry Sanko ,  Andrei V. Shchegrov

IPC: H01L21/66 ,  G01N21/95 ,  G01B11/06 ,  G01N21/25 ,  G03F7/20

CPC classification number: H01L22/12 ,  G01B11/0625 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/255 ,  G01N21/9503 ,  G01N2021/213 ,  G03F7/705 ,  G03F7/70625 ,  H01L22/26

Abstract: Methods and systems for estimating values of parameters of interest based on repeated measurements of a wafer during a process interval are presented herein. In one aspect, one or more optical metrology subsystems are integrated with a process tool, such as an etch tool or a deposition tool. Values of one or more parameters of interest measured while the wafer is being processed are used to control the process itself. The measurements are performed quickly and with sufficient accuracy to enable yield improvement of a semiconductor fabrication process flow. In one aspect, values of one or more parameters of interest are estimated based on spectral measurements of wafers under process using a trained signal response metrology (SRM) measurement model. In another aspect, a trained signal decontamination model is employed to generate decontaminated optical spectra from measured optical spectra while the wafer is being processed.

公开(公告)号：US09915524B2

公开(公告)日：2018-03-13

申请号：US14708454

申请日：2015-05-11

Applicant: KLA-Tencor Corporation

Inventor： Noam Sapiens ,  Kevin A. Peterlinz ,  Alexander Buettner ,  Kerstin Purrucker ,  Andrei V. Shchegrov

IPC: G01N21/21 ,  G01B11/24 ,  G03F7/20 ,  G01N21/956

CPC classification number: G01B11/24 ,  G01B2210/56 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625

Abstract: Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition.

公开(公告)号：US20180051984A1

公开(公告)日：2018-02-22

申请号：US15784153

申请日：2017-10-15

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Shankar Krishnan ,  Kevin Peterlinz ,  Thaddeus Gerard Dziura ,  Noam Sapiens ,  Stilian Ivanov Pandev

IPC: G01B11/27 ,  H01L21/66 ,  G03F7/20 ,  G03F7/00

CPC classification number: G01B11/272 ,  G01B2210/56 ,  G03F7/0002 ,  G03F7/70141 ,  G03F7/70625 ,  H01L22/12 ,  H01L22/30

Abstract: Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a single patterned target and a multiple patterned target are measured, the collected data fit to a combined measurement model, and the value of a structural parameter indicative of a geometric error induced by the multiple patterning process is determined based on the fit. In some other examples, light having a diffraction order different from zero is collected and analyzed to determine the value of a structural parameter that is indicative of a geometric error induced by a multiple patterning process. In some embodiments, a single diffraction order different from zero is collected. In some examples, a metrology target is designed to enhance light diffracted at an order different from zero.

公开(公告)号：US20170356853A1

公开(公告)日：2017-12-14

申请号：US15671661

申请日：2017-08-08

Applicant: KLA-Tencor Corporation

Inventor： Noam Sapiens ,  Andrei V. Shchegrov ,  Stilian Ivanov Pandev

IPC: G01N21/93 ,  G01N21/956 ,  G01N21/95 ,  G01N21/47

CPC classification number: G01N21/93 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2201/06113 ,  G01N2201/062 ,  G01N2201/10 ,  G01N2201/1296

Abstract: In one embodiment, apparatus and methods for determining a parameter of a target are disclosed. A target having an imaging structure and a scatterometry structure is provided. An image of the imaging structure is obtained with an imaging channel of a metrology tool. A scatterometry signal is also obtained from the scatterometry structure with a scatterometry channel of the metrology tool. At least one parameter, such as overlay error, of the target is determined based on both the image and the scatterometry signal.

公开(公告)号：US09719932B1

公开(公告)日：2017-08-01

申请号：US14532971

申请日：2014-11-04

Applicant: KLA-Tencor Corporation

Inventor： Derrick Shaughnessy ,  Michael S. Bakeman ,  Guorong V. Zhuang ,  Andrei V. Shchegrov ,  Leonid Poslavsky

IPC: G01N21/00 ,  G01N21/67 ,  G01N21/95 ,  H01S3/0915

CPC classification number: G01N21/9501 ,  G01N2201/061 ,  G03F7/70616 ,  H01L22/12

Abstract: Methods and systems are described herein for producing high radiance illumination light for use in semiconductor metrology based on a confined, sustained plasma. One or more plasma confining circuits introduce an electric field, a magnetic field, or a combination thereof to spatially confine a sustained plasma. The confinement of the sustained plasma decreases the size of the induced plasma resulting in increased radiance. In addition, plasma confinement may be utilized to shape the plasma to improve light collection and imaging onto the specimen. The induced fields may be static or dynamic. In some embodiments, additional energy is coupled into the confined, sustained plasma to further increase radiance. In some embodiments, the pump energy source employed to sustained the plasma is modulated in combination with the plasma confining circuit to reduce plasma emission noise.

公开(公告)号：US20170146399A1

公开(公告)日：2017-05-25

申请号：US15369560

申请日：2016-12-05

Applicant: KLA-Tencor Corporation

Inventor： Gregory R. Brady ,  Andrei V. Shchegrov ,  Lawrence D. Rotter ,  Derrick A. Shaughnessy ,  Anatoly Shchemelinin ,  Ilya Bezel ,  Muzammil A. Arain ,  Anatoly A. Vasiliev ,  James Andrew Allen ,  Oleg Shulepov ,  Andrew V. Hill ,  Ohad Bachar ,  Moshe Markowitz ,  Yaron Ish-Shalom ,  Ilan Sela ,  Amnon Manassen ,  Alexander Svizher ,  Maxim Khokhlov ,  Avi Abramov ,  Oleg Tsibulevsky ,  Daniel Kandel ,  Mark Ghinovker

IPC: G01J3/10 ,  H01J65/04 ,  G01J3/02 ,  G02B6/293 ,  G01J3/12

CPC classification number: G01J3/10 ,  F21V13/00 ,  F21V13/08 ,  F21V13/12 ,  G01J3/0218 ,  G01J3/12 ,  G02B6/29332 ,  G02B6/29362 ,  G02B6/29388 ,  G02B6/29395 ,  G02B6/3508 ,  G02B6/353 ,  H01J65/04

Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

公开(公告)号：US20170016815A1

公开(公告)日：2017-01-19

申请号：US15217549

申请日：2016-07-22

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Lawrence D. Rotter ,  David Y. Wang ,  Andrei Veldman ,  Kevin Peterlinz ,  Gregory Brady ,  Derrick A. Shaughnessy

IPC: G01N21/21 ,  G01B11/06 ,  G01N21/47 ,  G01N21/55

CPC classification number: G01N21/211 ,  G01B11/0616 ,  G01N21/4738 ,  G01N21/55 ,  G01N2021/213 ,  G03F7/70608 ,  G03F7/70625 ,  G03F7/70633

Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology.

Abstract translation: 该系统包括被配置为照亮设置在样品台上的样品的表面的可调制照明源，被配置为检测从样品表面发出的照射的检测器，被配置为将来自可调节照明源的照明引导到 所述样品，集合光学器件被配置为将样品的表面的照射引导到所述检测器;以及调制控制系统，其通信地耦合到所述可调节照明源，其中所述调制控制系统被配置为调制所述可调节照明源的驱动电流 选择的调制频率，其适于产生具有选定的相干特征长度的照明。 此外，本发明包括多个光源的输出的时间顺序交错以产生用于多波长时间顺序光学测量的周期性脉冲串。

公开(公告)号：US09512985B2

公开(公告)日：2016-12-06

申请号：US13774025

申请日：2013-02-22

Applicant: KLA-Tencor Corporation

Inventor： Gregory R. Brady ,  Andrei V. Shchegrov ,  Lawrence D. Rotter ,  Derrick Shaughnessy ,  Anatoly Shchemelinin ,  Ilya Bezel ,  Muzammil A. Arain ,  Anatoly A. Vasiliev ,  James Andrew Allen ,  Oleg Shulepov ,  Andrew V. Hill ,  Ohad Bachar ,  Moshe Markowitz ,  Yaron Ish-Shalom ,  Ilan Sela ,  Amnon Manassen ,  Alexander Svizher ,  Maxim Khokhlov ,  Avi Abramov ,  Oleg Tsibulevsky ,  Daniel Kandel ,  Mark Ghinovker

IPC: F21S8/10 ,  F21V13/08 ,  F21V13/00 ,  F21V13/12 ,  G02B6/35 ,  G02B6/293

CPC classification number: G01J3/10 ,  F21V13/00 ,  F21V13/08 ,  F21V13/12 ,  G01J3/0218 ,  G01J3/12 ,  G02B6/29332 ,  G02B6/29362 ,  G02B6/29388 ,  G02B6/29395 ,  G02B6/3508 ,  G02B6/353 ,  H01J65/04

Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

Abstract translation: 本公开涉及用于向用于光学测量的测量头提供照明的系统。 在本公开的一些实施例中，来自多个照明源的照明光束被组合以将一个或多个所选波长的照明传送到测量头。 在本公开的一些实施例中，控制传送到测量头的照明的强度和/或空间相干性。 在本公开的一些实施例中，一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。

公开(公告)号：US20160334326A1

公开(公告)日：2016-11-17

申请号：US14708454

申请日：2015-05-11

Applicant: KLA-Tencor Corporation

Inventor： Noam Sapiens ,  Kevin A. Peterlinz ,  Alexander Buettner ,  Kerstin Purrucker ,  Andrei V. Shchegrov

IPC: G01N21/21

CPC classification number: G01B11/24 ,  G01B2210/56 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625

Abstract: Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition.

Abstract translation: 呈现方法和系统以减少投影到测量目标上的照明光点尺寸和相关联的外溢到测量目标周围的区域。 在一个方面，空间光调制器（SLM）位于照明光源和测量样本之间的照明路径中。 SLM被配置为在照明光的路径上调制幅度，相位或两者以减少波前误差。 在一些实施例中，SLM的期望状态基于在计量系统的光路中执行的波前测量。 在另一方面，采用具有相对于照明光束倾斜倾斜角的图像平面的照明孔，以克服采用测量样品的倾斜照明的度量系统中的散焦效应。 在一些实施例中，照明孔径，物镜和样本被对准以满足Scheimpflug条件。