公开(公告)号：US20110239289A1

公开(公告)日：2011-09-29

申请号：US13153385

申请日：2011-06-03

申请人： Xin Wang ,  Lee Chen ,  John Chiong

发明人： Xin Wang ,  Lee Chen ,  John Chiong

IPC分类号： G06F15/173 ,  G06F21/00

CPC分类号： H04L63/102 ,  H04L12/66 ,  H04L29/06 ,  H04L61/6022 ,  H04L61/6068 ,  H04L63/02 ,  H04L63/0281 ,  H04L63/04 ,  H04L63/08 ,  H04L63/0853 ,  H04L63/10 ,  H04L63/30 ,  H04L63/308 ,  H04L65/1003 ,  H04L65/1006 ,  H04L65/1069 ,  H04L65/4007 ,  H04L67/14 ,  H04L67/141 ,  H04L67/146

摘要： The inventive system includes a host, a network including a security gateway, and a public application. Established are an access session between the network and the host and an application session between the public application and the network. An application session record is created for the application session, and includes the user's public user identity used to access the public application, the user's private user identity used to access the network, a host identity, and an application session time. To determine the private user identity for the application session, the security gateway sends a query with the host identity and the application session time. These are compared with the host identity and access session time in an access session record. If they match, then the private user identity in the access session record is returned, and it is stored as the private user identity in the application session record.

摘要翻译： 本发明的系统包括主机，包括安全网关的网络和公共应用。 建立在网络和主机之间的访问会话以及公共应用程序和网络之间的应用程序会话。 为应用会话创建应用会话记录，并且包括用于访问公共应用的用户的公共用户标识，用于访问网络的用户的私有用户标识，主机标识和应用会话时间。 为了确定应用程序会话的私有用户身份，安全网关发送具有主机标识和应用程序会话时间的查询。 这些与访问会话记录中的主机身份和访问会话时间进行比较。 如果匹配，则返回访问会话记录中的私有用户身份，并将其作为私有用户身份存储在应用程序会话记录中。

公开(公告)号：US20110081500A1

公开(公告)日：2011-04-07

申请号：US12574101

申请日：2009-10-06

申请人： Jianping Zhao ,  Lee Chen

发明人： Jianping Zhao ,  Lee Chen

IPC分类号： B05D3/04 ,  B05D3/06 ,  B05D5/12 ,  B05C11/00

CPC分类号： H01L21/76877 ,  B05D1/62 ,  B05D3/148 ,  H01L21/76801 ,  H01L21/76814 ,  H01L21/76825 ,  H01L21/76829 ,  H01L21/76831 ,  H01L21/76832 ,  H01L21/76834 ,  H01L21/76841 ,  H01L21/76843

摘要： A method of integrating a fluorine-based dielectric with a metallization scheme is described. The method includes forming a fluorine-based dielectric layer on a substrate, forming a metal-containing layer on the substrate, and adding a buffer layer or modifying a composition of the fluorine-based dielectric layer proximate an interface between the fluorine-based dielectric layer and the metal-containing layer.

摘要翻译： 描述了一种将氟基电介质与金属化方案集成的方法。 该方法包括在基板上形成氟基电介质层，在基板上形成含金属层，并在氟基介电层之间的界面附近添加缓冲层或修饰氟基电介质层的组成 和含金属层。

公开(公告)号：US07781340B2

公开(公告)日：2010-08-24

申请号：US11713617

申请日：2007-03-05

申请人： Lee Chen ,  Audunn Ludviksson

发明人： Lee Chen ,  Audunn Ludviksson

IPC分类号： H01L21/00

CPC分类号： H01L21/28185 ,  H01L21/31116 ,  H01L21/31122 ,  H01L21/67069 ,  H01L21/67253 ,  H01L29/51 ,  H01L29/517

摘要： A system and a method to remove a layer of high-k dielectric material during the manufacturing of an integrated circuit. In one embodiment of the invention, an etch reactant is employed to form volatile etch products when reacted with high-k layers. Alternately, high-k layers can be anisotropically etched of in accordance with a patterned photoresist or hard mask, where a hyperthermal beam of neutral atoms is used to aid in the reaction of an etch reactant with a high-k layer. Alternately, a hyperthermal beam of neutral atoms or a plasma treatment can used to modify a high-k layer, and subsequently etch the modified high-k layer utilizing an etch reactant that reacts with the modified high-k layer. In still another embodiment of the invention, the hyperthermal beam of neutral atoms is used to etch a high-k layer through physical bombardment of the high-k layer.

摘要翻译： 在制造集成电路期间去除高k电介质材料层的系统和方法。 在本发明的一个实施方案中，当与高k层反应时，使用蚀刻反应物形成挥发性蚀刻产物。 或者，高k层可以根据图案化的光致抗蚀剂或硬掩模进行各向异性蚀刻，其中使用中性原子的超热束来帮助蚀刻反应物与高k层的反应。 或者，可以使用中性原子的超热束或等离子体处理来修饰高k层，随后使用与修饰的高k层反应的蚀刻反应物蚀刻修饰的高k层。 在本发明的另一个实施例中，使用中性原子的超热束来通过物理轰击高k层蚀刻高k层。

公开(公告)号：US20090242790A1

公开(公告)日：2009-10-01

申请号：US12059855

申请日：2008-03-31

申请人： Lee Chen ,  Lin Xu ,  Ronald Victor Bravenec

发明人： Lee Chen ,  Lin Xu ,  Ronald Victor Bravenec

IPC分类号： H01J37/04

CPC分类号： H01J37/05 ,  H01J37/32422 ,  H01J37/32935 ,  H01J49/443 ,  H01J2237/053

摘要： An ion energy analyzer is described for use in diagnosing the ion energy distribution (IED) of ions incident on a radio frequency (RF) biased substrate immersed in plasma. The ion energy analyzer comprises an entrance grid exposed to the plasma, an ion selection grid disposed proximate to the entrance grid, an electron rejection grid disposed proximate to the ion selection grid, and an ion current collector disposed proximate to the electron rejection grid. The ion selection grid is coupled to an ion selection voltage source configured to positively bias the ion selection grid by an ion selection voltage, and the electron rejection grid is coupled to an electron rejection voltage source configured to negatively bias the electron rejection grid by an electron rejection voltage. Furthermore, an ion current meter is coupled to the ion current collector to measure the ion current.

摘要翻译： 描述了用于诊断入射在等离子体中的射频（RF）偏压衬底上的离子的离子能量分布（IED）的离子能量分析器。 离子能量分析器包括暴露于等离子体的入口栅格，靠近入口栅格设置的离子选择栅格，靠近离子选择栅极设置的电子排斥栅格，以及靠近电子排斥栅极设置的离子集电器。 离子选择网格耦合到离子选择电压源，其被配置为通过离子选择电压对离子选择栅极进行正偏置，并且电子抑制栅极耦合到被配置为通过电子负偏置电子排斥栅极的电子阻挡电压源 拒绝电压。 此外，离子电流计耦合到离子集电器以测量离子电流。

公开(公告)号：US07584714B2

公开(公告)日：2009-09-08

申请号：US10953791

申请日：2004-09-30

申请人： Lee Chen ,  Caiz Hong Tian ,  Naoki Matsumoto

发明人： Lee Chen ,  Caiz Hong Tian ,  Naoki Matsumoto

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01J37/32522 ,  H01J37/32192 ,  H01J37/3222

摘要： A surface wave plasma (SWP) source having an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. A power coupling system is coupled to the EM wave launcher, and configured to provide the EM energy to the EM wave launcher for forming the plasma. A mode scrambler coupled to the plasma surface of the EM wave launcher, and configured to reduce mode jumping between the desired EM wave mode and another EM wave mode.

摘要翻译： 一种具有电磁（EM）波发射器的表面波等离子体（SWP）源，其被配置为通过在等离子体附近的EM波发射器的等离子体表面上产生表面波来将期望的EM波模式中的EM能量耦合到等离子体。 功率耦合系统耦合到EM波发射器，并且被配置为向用于形成等离子体的EM波发射器提供EM能量。 耦合到所述EM波发射器的等离子体表面并且被配置为减少所期望的EM波模式和另一EM波模式之间的模式跳跃的模式扰频器。

公开(公告)号：US07572386B2

公开(公告)日：2009-08-11

申请号：US11499679

申请日：2006-08-07

申请人： Peter L.G. Ventzek ,  Lee Chen ,  Akira Koshiishi ,  Ikuo Sawada

发明人： Peter L.G. Ventzek ,  Lee Chen ,  Akira Koshiishi ,  Ikuo Sawada

IPC分类号： B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC分类号： H01L21/0273 ,  H01J37/3233 ,  H01L21/0337

摘要： A method of pre-treating a mask layer prior to etching an underlying thin film is described. A thin film, such as a dielectric film, is etched using plasma that is enhanced with a ballistic electron beam. In order to reduce the loss of pattern definition, such as line edge roughness effects, the mask layer is treated with an electron beam in the absence of an atomic halogen specie prior to proceeding with the etching process.

摘要翻译： 描述了在蚀刻下面的薄膜之前对掩模层进行预处理的方法。 使用通过弹道电子束增强的等离子体蚀刻诸如电介质膜的薄膜。 为了减少诸如线边缘粗糙度效应的图案定义的损失，在进行蚀刻工艺之前，在没有原子卤素物质的情况下用电子束处理掩模层。

公开(公告)号：US07552126B2

公开(公告)日：2009-06-23

申请号：US11446028

申请日：2006-06-02

申请人： Lee Chen ,  John Chiong ,  Phillip Kwan

发明人： Lee Chen ,  John Chiong ,  Phillip Kwan

IPC分类号： G06F17/30

CPC分类号： H04L63/10 ,  H04L63/1425

摘要： Systems and methods of managing access records of user access to a secure data network include an access record gateway and an access record datastore; the access record gateway being in communication with an access server of the secure data network; and the access record datastore being in communication with the access record gateway. The access record gateway acquires user access information, such as time information; records the user access information in at least one access record; and stores the at least one access record in the access record datastore. The access record gateway also acquires user access activity information, such as user access termination information, and updates previously recorded user access information with the user access activity information. The at least one access record includes a plurality of sub-records, selected from a list including a user information sub-record, a network information sub-record, and a time information sub-record. The system may include a security application in communication with the access record gateway to query for an access record satisfying the security query parameter(s).

摘要翻译： 管理对安全数据网络的用户访问的访问记录的系统和方法包括访问记录网关和访问记录数据存储; 所述接入记录网关与所述安全数据网络的接入服务器通信; 并且访问记录数据存储与访问记录网关通信。 接入记录网关获取用户接入信息，如时间信息; 将用户访问信息记录在至少一个访问记录中; 并将至少一个访问记录存储在访问记录数据存储中。 访问记录网关还获取诸如用户访问终止信息的用户访问活动信息，并且用用户访问活动信息更新先前记录的用户访问信息。 所述至少一个访问记录包括从包括用户信息子记录，网络信息子记录和时间信息子记录的列表中选择的多个子记录。 系统可以包括与访问记录网关通信的安全应用，以查询满足安全查询参数的访问记录。

公开(公告)号：US07389359B2

公开(公告)日：2008-06-17

申请号：US09982106

申请日：2001-10-19

申请人： Nitin Jain ,  Lee Chen ,  Earl Ferguson ,  Min Zhu

发明人： Nitin Jain ,  Lee Chen ,  Earl Ferguson ,  Min Zhu

IPC分类号： G06F15/173

CPC分类号： H04L12/1886

摘要： A routing system utilizes a layer 2 switch interconnecting several routers to intelligently forward multicast packets throughout an internet exchange carrying multicast content. The layer 2 switch performs protocol snooping to extract a lookup key that is based on network layer protocol information. The lookup key is uniquely formulated to support either shared or explicit source distribution trees. The lookup key is used to query a forwarding memory that returns an outgoing port index. The outgoing port index points to one or more outgoing ports that are eligible to receive the multicast packet. The outgoing ports are also connected to the neighboring device(s) that are designated to receive the multicast packet. The routing system also supports real time maintenance and updating of the forwarding memory based on the periodic exchange of control messages. The routing system is configured to support PIM routers operating in PIM SM or PIM SSM modes. However, the routing system can also support other multicast protocols and/or standards.

摘要翻译： 路由系统利用互连多个路由器的层2交换机来在承载多播内容的互联网交换机中智能地转发多播分组。 第二层交换机执行协议侦听，提取基于网络层协议信息的查找密钥。 查找密钥是独一无二的，用于支持共享或明确的源分发树。 查询键用于查询返回出站端口索引的转发内存。 出站端口索引指向一个或多个有资格接收组播数据包的输出端口。 输出端口也连接到被指定为接收多播分组的相邻设备。 路由系统还支持基于控制消息的周期性交换的转发存储器的实时维护和更新。 路由系统配置为支持以PIM SM或PIM SSM模式运行的PIM路由器。 然而，路由系统还可以支持其他多播协议和/或标准。

公开(公告)号：US20080135518A1

公开(公告)日：2008-06-12

申请号：US11608889

申请日：2006-12-11

申请人： Lee Chen ,  Hiromasa Mochiki

发明人： Lee Chen ,  Hiromasa Mochiki

IPC分类号： C03C25/68 ,  C23C16/00 ,  H01L21/3065

CPC分类号： H01J37/32642 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/3233 ,  H01J37/32587

摘要： A method and system for adjusting and controlling the plasma uniformity in a plasma processing system is described. The plasma processing system includes an electron source electrode to which direct current (DC) power is coupled in order to generate a ballistic electron beam during the etching of the substrate. A ring electrode, provided about a periphery of the substrate and opposite the electron source electrode, is utilized to create a ring hollow cathode plasma to affect changes in the distribution of plasma density.

摘要翻译： 描述了用于调整和控制等离子体处理系统中的等离子体均匀性的方法和系统。 等离子体处理系统包括电子源电极，直流电（DC）功率被耦合到其中，以便在衬底的蚀刻期间产生弹道电子束。 利用设置在基板的周边并且与电子源电极相对的环形电极来产生环空心阴极等离子体，以影响等离子体密度分布的变化。

公开(公告)号：US20070187813A1

公开(公告)日：2007-08-16

申请号：US11352169

申请日：2006-02-10

申请人： Lee Chen ,  Shing Luo ,  Chin Su

发明人： Lee Chen ,  Shing Luo ,  Chin Su

IPC分类号： H01L23/053 ,  H01L23/12

CPC分类号： H01L23/3192 ,  H01L23/552 ,  H01L2924/0002 ,  H01L2924/00

摘要： A semiconductor device comprises a substrate, a patterned metal conductor layer over the substrate, and a passivation layer. The passivation layer may comprise a UV blocking, protection layer, over at least a portion of the substrate and patterned metal conductor layers, and a separation layer between the patterned metal conductor layer and the UV protection layer. The passivation layer may also comprise a gap-filling, hydrogen-blocking layer over the substrate, the patterned metal conductor layer and any UV protection layer.

摘要翻译： 半导体器件包括衬底，衬底上的图案化金属导体层和钝化层。 钝化层可以包括基底和图案化的金属导体层的至少一部分上的UV阻挡保护层，以及图案化的金属导体层和UV保护层之间的分离层。 钝化层还可以包括在衬底上的间隙填充，阻氢层，图案化的金属导体层和任何UV保护层。