公开(公告)号：US06731005B2

公开(公告)日：2004-05-04

申请号：US10093786

申请日：2002-03-06

申请人： Hajime Koyama ,  Koichi Fukuda

发明人： Hajime Koyama ,  Koichi Fukuda

IPC分类号： H01L2348

CPC分类号： H01L23/5258 ,  H01L2924/0002 ,  H01L2924/00

摘要： A semiconductor device is disclosed, which comprises a semiconductor substrate with which a circuit element is provided, an insulating layer which is provided on the semiconductor substrate and has a concave portion, a first conductive line layer which is provided at the concave portion in the insulating layer and has a first thickness, and a second conductive line layer which is provided at the concave portion in the insulating layer so as to be formed apart in a horizontal direction from the first conductive line layer and has a second thickness which is smaller than the first thickness.

摘要翻译： 公开了一种半导体器件，其包括设置有电路元件的半导体衬底，设置在半导体衬底上并具有凹部的绝缘层，设置在绝缘层的凹部的第一导电线层 并且具有第一厚度，以及第二导电线层，其设置在所述绝缘层的所述凹部处，以在所述第一导电线层的水平方向上分开形成，并且具有小于所述第二导电层的第二厚度 第一厚度。

公开(公告)号：US06349670B1

公开(公告)日：2002-02-26

申请号：US09442539

申请日：1999-11-18

申请人： Akira Nakano ,  Koichi Fukuda ,  Sung Chul Kim ,  Yasuhiko Kasama ,  Tadahiro Ohmi ,  Shoichi Ono

发明人： Akira Nakano ,  Koichi Fukuda ,  Sung Chul Kim ,  Yasuhiko Kasama ,  Tadahiro Ohmi ,  Shoichi Ono

IPC分类号： C23C1600

CPC分类号： H01J37/32082 ,  G01R1/06772 ,  G01R27/02 ,  H01J37/32935

摘要： The invention provides a plasma equipment which is advantageous in that the suscepter impedance is small, the dependence on the frequency is low, the power consumption efficiency is high, the film forming speed is faster as compared with conventional plasma equipment, and the film quality is high. Metal plates AC short between a chamber wall and a shield of an electrode of the same DC potential as the chamber.

摘要翻译： 本发明提供一种等离子体设备，其优点在于，与常规等离子体设备相比，阻抗较小，对频率的依赖性低，功耗效率高，成膜速度更快，膜质量 高。 金属板在室壁与与室相同的DC电位的电极的屏蔽之间交流短路。

公开(公告)号：US06278128B1

公开(公告)日：2001-08-21

申请号：US09363033

申请日：1999-07-29

申请人： Hiroyuki Noji ,  Koichi Fukuda

发明人： Hiroyuki Noji ,  Koichi Fukuda

IPC分类号： H01L2358

CPC分类号： H01L22/32 ,  H01L23/13 ,  H01L23/49827 ,  H01L24/48 ,  H01L24/49 ,  H01L2224/05599 ,  H01L2224/4824 ,  H01L2224/49175 ,  H01L2224/85399 ,  H01L2924/00014 ,  H01L2924/01079 ,  H01L2924/12044 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/30107 ,  H01L2924/3011 ,  H01L2924/30111 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45015 ,  H01L2924/207 ,  H01L2224/45099

摘要： A first bonding pad is formed on the surface of a semiconductor chip on which a semiconductor circuit is formed. A first insulating substrate is formed on the semiconductor chip, and a wiring layer is formed on the first insulating substrate. A second insulating substrate is formed on the first insulating substrate and wiring layer. A first region is formed by forming an opening in the second insulating substrate to expose part of the surface of the wiring layer. The first region and first bonding pad are connected by a wire. A second region is formed by forming an opening in the second insulating substrate to expose part of the surface of the wiring layer. In the second region, a bump is formed. Further, a third region is formed by forming an opening in the second insulating substrate to expose part of the surface of the wiring layer. The third region has at least an area necessary for the terminal of a measurement device to contact the third region in operation measurement.

摘要翻译： 在其上形成有半导体电路的半导体芯片的表面上形成第一焊盘。 在半导体芯片上形成第一绝缘基板，在第一绝缘基板上形成布线层。 在第一绝缘基板和布线层上形成第二绝缘基板。 通过在第二绝缘基板中形成开口以露出布线层的表面的一部分来形成第一区域。 第一区域和第一焊盘通过导线连接。 通过在第二绝缘基板中形成开口以露出布线层的表面的一部分来形成第二区域。 在第二区域中形成凸块。 此外，通过在第二绝缘基板中形成开口以暴露布线层的表面的一部分来形成第三区域。 在操作测量中，第三区域至少具有测量装置的端子与第三区域接触所需的区域。

公开(公告)号：US06274526B1

公开(公告)日：2001-08-14

申请号：US09716237

申请日：2000-11-21

申请人： Takafumi Kawano ,  Koichi Fukuda

发明人： Takafumi Kawano ,  Koichi Fukuda

IPC分类号： C04B35468

CPC分类号： C04B35/4686

摘要： A dielectric ceramic composition for microwave which comprises a basic composition represented by compositional formula: 2aBaO—bLn2O3—cBi2O3—2dTiO2, wherein Ln2O3 represents (eNd2O3+fSm2O3+gEu2O3); a+b+c+d=l; and e+f+g=1, in which 0.0913

摘要翻译： 一种用于微波的介电陶瓷组合物，其包含由组成式：2aBaO-bLn2O3-cBi2O3-2dTiO2表示的碱性组合物，其中Ln2O3表示（eNd2O3 + fSm2O3 + gEu2O3）; a + b + c + d = 1; 和e + f + g = 1，其中0.0913

公开(公告)号：US5755938A

公开(公告)日：1998-05-26

申请号：US556188

申请日：1995-11-09

申请人： Hirofumi Fukui ,  Masanori Miyazaki ,  Masami Aihara ,  Chisato Iwasaki ,  Koichi Fukuda ,  Yasuhiko Kasama

发明人： Hirofumi Fukui ,  Masanori Miyazaki ,  Masami Aihara ,  Chisato Iwasaki ,  Koichi Fukuda ,  Yasuhiko Kasama

IPC分类号： H01L21/205 ,  C23C14/34 ,  C23C16/02 ,  C23C16/44 ,  C23C16/509 ,  H01L21/203 ,  H01L21/31 ,  H01L21/336 ,  H01L21/77 ,  H01L31/20 ,  C23C16/00

CPC分类号： H01L29/66765 ,  C23C14/34 ,  C23C16/0245 ,  C23C16/4405 ,  C23C16/5096 ,  H01J37/34 ,  H01L31/202 ,  H01J2237/32 ,  H01L27/1214 ,  Y02E10/50 ,  Y02P70/521

摘要： An apparatus which allows a first film to be formed on a substrate by chemical vapor deposition (CVD) and a second film to be formed on the substrate by sputtering, wherein the processes are performed sequentially in the same deposition chamber without exposing the substrate to an oxidative atmosphere. The deposition chamber includes a first electrode and a second electrode located under the first electrode. A transfer mechanism loads a dummy target onto the first electrode and the substrate onto the second electrode prior to a CVD process. The dummy target is resistant to sputtering and thus does not contaminate the film deposited on the substrate during CVD. After CVD and prior to sputtering, the transfer mechanism unloads the dummy target and replaces it with a sputtering target for film formation by sputtering. Both the dummy target and sputtering target can be loaded and unloaded from a single pressurized storage chamber. Thus, film formation by both sputtering and CVD can be accomplished by using a single deposition chamber without removing the substrate between processes.

摘要翻译： 一种允许通过化学气相沉积（CVD）在衬底上形成第一膜和通过溅射形成在衬底上的第二膜的装置，其中在相同的沉积室中顺序地进行处理，而不将衬底暴露于 氧化气氛。 沉积室包括位于第一电极下方的第一电极和第二电极。 转移机构在CVD工艺之前将虚拟靶加载到第二电极上的第一电极和衬底上。 虚拟靶对溅射是耐受的，因此在CVD期间不会污染沉积在衬底上的膜。 在CVD之后并且在溅射之前，转移机构卸载虚拟靶并用用溅射的成膜溅射靶代替它。 虚拟靶和溅射靶都可以从单个加压储存室装载和卸载。 因此，通过溅射和CVD的成膜可以通过使用单个沉积室而不在工艺之间移除基板来实现。

公开(公告)号：US5570031A

公开(公告)日：1996-10-29

申请号：US336903

申请日：1994-11-10

申请人： Makoto Sasaki ,  Hirofumi Fukui ,  Masami Aihara ,  Koichi Fukuda ,  Yasuhiko Kasama ,  Tadahiro Ohmi

发明人： Makoto Sasaki ,  Hirofumi Fukui ,  Masami Aihara ,  Koichi Fukuda ,  Yasuhiko Kasama ,  Tadahiro Ohmi

IPC分类号： H01L21/302 ,  G01R29/12 ,  G01R31/28 ,  H01L21/203 ,  H01L21/205 ,  H01L21/3065 ,  H01L21/66 ,  G01R31/302 ,  G01R19/00

CPC分类号： G01R29/12 ,  G01R31/2831 ,  H01L22/14 ,  H01L2924/0002

摘要： There is provided a surface potential measuring apparatus cable of accurately measuring the potential of a substrate regardless of the material of the substrate, and a plasma equipment capable of accurately measuring and controlling ion energy. The substrate surface potential measuring apparatus measures the surface potential of a substrate in a plasma processing apparatus and includes a terminal electrically connected to a suscepter electrode for holding the substrate, a first condenser disposed between the terminal and the ground and a potential measuring device for measuring the potential of the terminal. The surface potential of the substrate is found from the potential of the suscepter electrode measured by the potential measuring means.

摘要翻译： 提供了一种能够精确地测量衬底的电位的表面电位测量装置电缆，而不管衬底的材料如何，以及能够精确地测量和控制离子能量的等离子体设备。 基板表面电位测量装置测量等离子体处理装置中的基板的表面电位，并且包括电连接到用于保持基板的可变电极的端子，设置在端子和地之间的第一冷凝器和用于测量的电位测量装置 终端的潜力。 基于由电位测量装置测量的电容器的电位，找到衬底的表面电位。

公开(公告)号：US5202215A

公开(公告)日：1993-04-13

申请号：US666667

申请日：1991-03-07

申请人： Akihiro Kanakura ,  Koichi Fukuda ,  Chikayuki Otsuka ,  Masayuki Maruta ,  Naoya Yabuuchi

发明人： Akihiro Kanakura ,  Koichi Fukuda ,  Chikayuki Otsuka ,  Masayuki Maruta ,  Naoya Yabuuchi

IPC分类号： G03G9/08 ,  C08F283/12 ,  C08F285/00 ,  C08L51/08 ,  G03G9/087

CPC分类号： C08F285/00 ,  C08F283/12 ,  C08L51/085 ,  G03G9/08702

摘要： The present invention provides a toner which substantially excludes off set and blocking of the toner particles, and a process for preparing the toner. The toner is prepared by dispersion-polymerizing a vinyl monomer in the presence of a dispersion polymerization stabilizer, a polymerization initiator and silicone-containing organic resin microparticles in a dispersion medium which dissolves said vinyl monomer, dispersion polymerization stabilizer and polymerization initiator and which does not dissolve said silicone-containing organic resin microparticles and resulting toner particles.

公开(公告)号：US08872962B2

公开(公告)日：2014-10-28

申请号：US13809982

申请日：2011-07-29

申请人： Koichi Fukuda

发明人： Koichi Fukuda

IPC分类号： H04N5/232 ,  H04N3/14 ,  H04N5/228 ,  H04N13/02 ,  G03B13/36 ,  G02B7/28 ,  H04N5/369

CPC分类号： H04N5/23212 ,  G02B7/28 ,  G03B13/36 ,  H04N5/3696

摘要： The focus detection apparatus includes an image pickup part (101-107) including first and second pixels photoelectrically converting first and second images formed by light fluxes passing through different pupil area of an image-forming optical system to produce first and second image signals, a first signal processor (121) performing a first process to smooth the first and second image signals by using mutually different filters, a second signal processor (121) performing a second process to sharpen the first and second image signals by using mutually different filters. A calculating part (121) calculates a defocus amount by using the first and second image signals subjected to the first process when a contrast value is higher than a predetermined value, and calculates the defocus amount by using the first and second image signals subjected to the second process when the contrast value is lower than the predetermined value.

摘要翻译： 焦点检测装置包括图像拾取部分（101-107），其包括光电转换通过图像形成光学系统的不同瞳孔区域的光束形成的第一和第二图像的第一和第二像素，以产生第一和第二图像信号， 第一信号处理器（121）执行通过使用相互不同的滤波器平滑第一和第二图像信号的第一处理器，第二信号处理器（121）执行通过使用相互不同的滤波器来锐化第一和第二图像信号的第二处理。 计算部件（121）当对比度值高于预定值时通过使用经受第一处理的第一和第二图像信号来计算散焦量，并且通过使用经受第一和第二图像信号的第一和第二图像信号来计算散焦量 当对比度值低于预定值时的第二处理。

公开(公告)号：US08872950B2

公开(公告)日：2014-10-28

申请号：US13424865

申请日：2012-03-20

申请人： Koichi Fukuda

发明人： Koichi Fukuda

IPC分类号： H04N3/14 ,  H04N5/335 ,  G03B13/00 ,  H04N5/232 ,  H04N5/369 ,  H01L27/146 ,  H04N9/04 ,  H04N5/225

CPC分类号： H01L27/14623 ,  H01L27/14605 ,  H01L27/1461 ,  H01L27/1463 ,  H04N5/2256 ,  H04N5/232 ,  H04N5/23212 ,  H04N5/3696 ,  H04N9/045

摘要： The capacitance of a charge-accumulating layer of an imaging pixel is made different from that of a charge-accumulating layer of a focusing pixel, thereby reducing the difference in saturation capacitance due to the difference between the light-reception efficiencies of the imaging pixel and the focusing pixel. The ratio between the capacitance of the charge-accumulating layer of the imaging pixel and that of the charge-accumulating layer of the focusing pixel is determined in consideration of a variation in ratio between the light-reception efficiencies of the imaging pixel and the focusing pixel with a change in at least one of the exit pupil distance and the aperture value.

摘要翻译： 使得成像像素的电荷累积层的电容与聚焦像素的电荷累积层的电容不同，从而减小由于成像像素的光接收效率和摄像像素之间的差异导致的饱和电容差 聚焦像素。 考虑到成像像素的光接收效率与聚焦像素的比例的变化，确定成像像素的电荷累积层的电容与聚焦像素的电荷累积层的电容之间的比率 出射光瞳距离和光圈值中的至少一个的变化。

公开(公告)号：US20140146221A1

公开(公告)日：2014-05-29

申请号：US14131229

申请日：2012-07-24

申请人： Masafumi Kimura ,  Koichi Fukuda

发明人： Masafumi Kimura ,  Koichi Fukuda

IPC分类号： H04N5/232

CPC分类号： G02B7/34 ,  G02B7/285 ,  G02B7/36 ,  G03B13/36 ,  H04N5/2254 ,  H04N5/23212

摘要： An image pickup apparatus which can perform an AF of a high speed and a high focusing precision by simultaneously realizing a phase difference AF and a contrast AF, decides arrange where a contrast evaluation can be performed on the basis of a correspondence relation between each pixel of an image pickup element which is restricted by pupil division means provided for restricting light of an optical image of an object which enters each pixel of the image pickup element to light from a specific exit pupil area of a photographing lens and the specific exit pupil area of the photographing lens, and decides a focus evaluation value of the object in accordance with the decided range from a contrast focus position or a correlation focus position.

摘要翻译： 可以通过同时实现相位差AF和对比度AF来执行高速度和高聚焦精度的AF的图像拾取装置，基于每个像素之间的对应关系来确定可以执行对比度评估的位置 由光瞳分割装置限制的图像拾取元件，其被设置用于限制进入图像拾取元件的每个像素的物体的光学图像，以便从拍摄镜头的特定出射瞳孔区域到特定出射瞳孔区域 拍摄镜头，并且根据来自对比度聚焦位置或相关焦点位置的所确定的范围来确定对象的焦点评估值。