System and methods for inkjet printing for flat panel displays
    131.
    发明申请
    System and methods for inkjet printing for flat panel displays 审中-公开
    用于平板显示器的喷墨打印系统和方法

    公开(公告)号:US20060093751A1

    公开(公告)日:2006-05-04

    申请号:US11167516

    申请日:2005-06-27

    IPC分类号: B41J2/01 B05D5/06 B05D1/32

    摘要: A system for inkjet printing, which includes an inkjet printing module support having one or more inkjet heads disposed thereon. The one or more inkjet heads are configured to move along a first axis. The system further includes a substrate stage configured to move along a second axis that is perpendicular to the first axis. The substrate stage is configured to support a substrate having one or more ink landing positions disposed thereon in a pattern that is not aligned with either the first axis or the second axis. The system further includes a system controller configured to simultaneously move the one or more inkjet heads along the first axis and move the substrate stage along the second axis during a printing operation such that the one or more inkjet heads dispense ink into the ink landing positions.

    摘要翻译: 一种用于喷墨打印的系统,其包括其上设置有一个或多个喷墨头的喷墨打印模块支架。 一个或多个喷墨头被配置为沿着第一轴线移动。 该系统还包括被配置为沿着垂直于第一轴线的第二轴线移动的基底台。 衬底台被配置为以不与第一轴线或第二轴线对准的图案支撑其上设置有一个或多个墨水着陆位置的基板。 该系统还包括系统控制器,该系统控制器被配置成同时沿着第一轴线移动一个或多个喷墨头并且在打印操作期间沿着第二轴线移动衬底台,使得一个或多个喷墨头将墨水分配到墨水着陆位置。

    Vascular sealing device with locking system
    133.
    发明申请
    Vascular sealing device with locking system 审中-公开
    带锁定系统的血管密封装置

    公开(公告)号:US20060058844A1

    公开(公告)日:2006-03-16

    申请号:US10939841

    申请日:2004-09-13

    IPC分类号: A61B17/04

    摘要: An internal tissue puncture closure method and apparatus provides a locking device for compressing and holding an external component such as a collagen sponge at a puncture situs. The locking device facilitates compression of the external component in a first direction, but prevents or locks against retraction.

    摘要翻译: 内部组织穿刺闭合方法和装置提供用于在穿刺位置处压缩和保持诸如胶原海绵的外部部件的锁定装置。 锁定装置有助于在第一方向上压缩外部部件,但防止或锁定以避免收缩。

    Deposition repeatability of PECVD films
    134.
    发明申请
    Deposition repeatability of PECVD films 有权
    PECVD膜的沉积重复性

    公开(公告)号:US20060019031A1

    公开(公告)日:2006-01-26

    申请号:US10898472

    申请日:2004-07-23

    IPC分类号: C23C16/00

    CPC分类号: C23C16/0209 C23C16/5096

    摘要: We have a method of improving the deposition rate uniformity of the chemical vapor deposition (CVD) of films when a number of substrates are processed in series, sequentially in a deposition chamber. The method includes the plasma pre-heating of at least one processing volume structure within the processing volume which surrounds the substrate when the substrate is present in the deposition chamber. We also have a device-controlled method which adjusts the deposition time for a few substrates at the beginning of the processing of a number of substrates in series, sequentially in a deposition chamber, so that the deposited film thickness remains essentially constant during processing of the series of substrates. A combination of these methods into a single method provides the best overall results in terms of controlling average film thickness from substrate to substrate.

    摘要翻译: 当在沉积室中顺序地处理多个基板时,我们具有提高膜的化学气相沉积(CVD)的沉积速率均匀性的方法。 该方法包括当衬底存在于沉积室中时,围绕衬底的处理体积内的至少一个处理体积结构的等离子体预热。 我们还有一种装置控制的方法,其可以在沉积室中顺次地串联处理多个基板的开始时调整几个基板的沉积时间,使得沉积膜厚度在处理期间保持基本恒定 系列底物。 将这些方法组合成单一方法提供了从基材到底物控制平均膜厚度方面的最佳总体结果。

    Methods and apparatus for reducing arcing during plasma processing
    135.
    发明申请
    Methods and apparatus for reducing arcing during plasma processing 失效
    在等离子体处理期间减少电弧的方法和装置

    公开(公告)号:US20050266174A1

    公开(公告)日:2005-12-01

    申请号:US10858267

    申请日:2004-06-01

    摘要: In a first aspect, a method is provided for use during plasma processing. The first method includes the steps of (1) placing a substrate on a substrate holder of a plasma chamber; (2) positioning a cover frame adjacent and below a perimeter of the substrate; and (3) employing the cover frame to reduce arcing during plasma processing within the plasma chamber. Numerous other aspects are provided.

    摘要翻译: 在第一方面,提供了一种在等离子体处理期间使用的方法。 第一种方法包括以下步骤:(1)将衬底放置在等离子体室的衬底保持器上; (2)将盖框架定位在所述基板的周边附近和下方; 和(3)采用盖框架来减小等离子体室内的等离子体处理期间的电弧。 提供了许多其他方面。

    Method of controlling the film properties of PECVD-deposited thin films
    136.
    发明申请
    Method of controlling the film properties of PECVD-deposited thin films 有权
    控制PECVD沉积薄膜的膜性能的方法

    公开(公告)号:US20050255257A1

    公开(公告)日:2005-11-17

    申请号:US11021416

    申请日:2004-12-22

    摘要: We have discovered methods of controlling a combination of PECVD deposition process parameters during deposition of thin films which provides improved control over surface standing wave effects which affect deposited film thickness uniformity and physical property uniformity. By minimizing surface standing wave effects, the uniformity of film properties across a substrate surface onto which the films have been deposited is improved. In addition, we have developed a gas diffusion plate design which assists in the control of plasma density to be symmetrical or asymmetrical over a substrate surface during film deposition, which also provides improved control over uniformity of deposited film thickness.

    摘要翻译: 我们已经发现了在沉积薄膜期间控制PECVD沉积工艺参数的组合的方法,其提供了影响沉积膜厚度均匀性和物理性质均匀性的表面驻波效应的改进控制。 通过最小化表面驻波效应,改善了膜沉积在其上的衬底表面上的膜性质的均匀性。 此外,我们开发了一种气体扩散板设计,其有助于在膜沉积期间等离子体密度在衬底表面上对称或不对称,这也提供了对沉积膜厚度的均匀性的改进的控制。

    Automatically adjustable caisson clamp
    138.
    发明申请
    Automatically adjustable caisson clamp 审中-公开
    自动调节沉箱夹

    公开(公告)号:US20050232708A1

    公开(公告)日:2005-10-20

    申请号:US11137219

    申请日:2005-05-24

    申请人: John White

    发明人: John White

    摘要: A clamp system for allowing a pile driving/pulling system to be attached to a caisson to be driven into or extracted from the earth. The clamp system comprises a structural member, first and second clamp assemblies, first and second locking assemblies, and a clamp displacement system. The structural member is attached to the pile driving/pulling system. The first and second clamp assemblies move along the structural member and either clamp onto portions of the caisson or are disengaged from the caisson. The first and second locking assemblies either fix a position of the clamp assemblies relative to the structural member or allow the clamp assemblies to move relative to the structural member. The clamp displacement system displaces the first and second clamp assemblies relative to the structural member to obtain a desired clamp distance between the first and second clamp assemblies.

    摘要翻译: 用于允许打桩/拉动系统连接到沉箱以被驱动进入或从地球抽出的夹紧系统。 夹紧系统包括结构构件,第一和第二夹紧组件,第一和第二锁定组件以及夹紧位移系统。 结构件附着在打桩/牵引系统上。 第一和第二夹具组件沿着结构构件移动并且夹紧在沉箱的部分上或者与沉箱脱离接合。 第一和第二锁定组件相对于结构构件固定夹具组件的位置或允许夹具组件相对于结构构件移动。 夹紧位移系统相对于结构构件移动第一和第二夹具组件,以获得第一和第二夹具组件之间期望的夹紧距离。