公开(公告)号：US08618496B2

公开(公告)日：2013-12-31

申请号：US13458861

申请日：2012-04-27

Applicant: Marco Jan-Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink ,  Alexander Hendrik Vincent van Veen ,  Alrik van den Brom

Inventor： Marco Jan-Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink ,  Alexander Hendrik Vincent van Veen ,  Alrik van den Brom

IPC: G03B27/54 ,  H01J3/14

CPC classification number: G03F7/70 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205

Abstract: A charged particle system such as a multi beam lithography system. A manipulator device manipulates one or more charged particle beams. The manipulator device includes at least one through opening in the plane of the planar substrate for passing at least one charged particle. Each through opening is provided with electrodes arranged in a first set of multiple first electrodes along a first part of a perimeter of the through opening and in a second set of multiple second electrodes along a second part of the perimeter. An electronic control circuit is arranged for providing voltage differences the electrodes in dependence of a position of the first and second electrode along the perimeter of the through opening.

Abstract translation: 带电粒子系统，如多光束光刻系统。 操纵器装置操纵一个或多个带电粒子束。 所述操纵器装置包括在所述平面基板的平面中的至少一个通孔，用于使至少一个带电粒子通过。 每个通孔具有沿着通孔的周边的第一部分和沿着周边的第二部分的第二组多个第二电极中布置在第一组多个第一电极中的电极。 电子控制电路被布置用于根据第一和第二电极沿着通孔的周边的位置来提供电极的电压差。

公开(公告)号：US20130341526A1

公开(公告)日：2013-12-26

申请号：US13915834

申请日：2013-06-12

Applicant: Canon Kabushiki Kaisha

Inventor： Yasuo Ohashi

IPC: H01J3/18

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/027 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205 ,  H01J2237/28

Abstract: Provided is an electrostatic lens array, including multiple substrates arranged with intervals, each of the multiple substrates having an aperture for passing a charged particle beam, in which: in a travelling direction of the charged particle beam, a peripheral contour line formed by any one of surfaces of the multiple substrates other than an upper surface of a most upstream substrate and a lower surface of a most downstream substrate has a protruding portion protruding from a peripheral contour line of one of the upper surface of the most upstream substrate and the lower surface of the most downstream substrate; and a position of the protruding portion is defined by a position regulating member, whereby parallelism is adjustable so that a surface including the protruding portion is parallel to a surface to be irradiated with the charged particle beam after passing through the aperture.

Abstract translation: 本发明提供一种静电透镜阵列，其包括间隔布置的多个基板，所述多个基板中的每一个具有用于使带电粒子束通过的孔，其中：在带电粒子束的行进方向上，由任何一个形成的周边轮廓线 多个基板的除了最上游基板的上表面和最下游基板的下表面以外的多个基板的表面具有从最上游基板的上表面和下游表面的上表面的周边轮廓线突出的突出部 的最下游底物; 并且突出部的位置由位置限制构件限定，由此平行度是可调节的，使得包括突出部分的表面平行于穿过孔之后被带电粒子束照射的表面。

公开(公告)号：US08558191B2

公开(公告)日：2013-10-15

申请号：US13744536

申请日：2013-01-18

Applicant: Canon Kabushiki Kaisha

Inventor： Akira Shimazu

IPC: G21K1/08

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/022 ,  H01J2237/1205 ,  H01J2237/18

Abstract: A charged particle beam lens includes a first electrode on a downstream side and a second electrode on an upstream side in a travelling direction of a charged particle beam. Each of the first electrode and the second electrode has a first through hole formed therein, through which the charged particle beam passes. The second electrode further has a second through hole formed therein, through which the charged particle beam does not pass. A distance defining member is provided between the first electrode and the second electrode such that the first electrode and the second electrode are spaced away from each other. A gap is surrounded the first electrode, the second electrode, and the distance defining member, wherein both the first through and the second through hole communicate to the gap. A third through hole passes through the first electrode and the second electrode in the travelling direction of the charged particle beam, and the third through hole is provided outside of the gap and does not communicate to the gap.

Abstract translation: 带电粒子束透镜包括下游侧的第一电极和带电粒子束的行进方向上游侧的第二电极。 第一电极和第二电极中的每一个具有形成在其中的第一通孔，带电粒子束通过该第一通孔。 第二电极还具有形成在其中的第二通孔，带电粒子束通过该通孔不通过。 在第一电极和第二电极之间设置有距离限定部件，使得第一电极和第二电极彼此间隔开。 间隙围绕第一电极，第二电极和距离限定构件，其中第一通孔和第二通孔都与间隙连通。 第三通孔在带电粒子束的行进方向上穿过第一电极和第二电极，并且第三通孔设置在间隙的外部并且不与间隙连通。

公开(公告)号：US20130256554A1

公开(公告)日：2013-10-03

申请号：US13722774

申请日：2012-12-20

Applicant: Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

Inventor： Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

IPC: H01J3/26

CPC classification number: H01J3/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  Y10T29/49002

Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

Abstract translation: 本发明涉及一种用于将多个带电粒子子束引导到位于下游方向的图像平面上的投影透镜组合模块，以及用于组装这种投影透镜组件的方法。 特别地，本发明公开了一种具有增强的结构完整性和/或其最下游电极的放置精度提高的模块化投影透镜组件。

公开(公告)号：US20130234034A1

公开(公告)日：2013-09-12

申请号：US13866315

申请日：2013-04-19

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

Inventor： Anthony Renau ,  Ludovic Godet ,  Timothy J. Miller ,  Joseph C. Olson ,  Vikram Singh ,  James Buonodono ,  Deepak A. Ramappa ,  Russell J. Low ,  Atul Gupta ,  Kevin M. Daniels

IPC: B01J19/08

CPC classification number: B01J19/081 ,  H01J37/3171 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32623 ,  H01J2237/0453 ,  H01J2237/1205 ,  H01L21/2236 ,  H01L31/022425 ,  H01L31/068 ,  H01L31/08 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

Abstract: A plasma processing apparatus comprises a plasma source configured to produce a plasma in a plasma chamber, such that the plasma contains ions for implantation into a workpiece. The apparatus also includes a focusing plate arrangement having an aperture arrangement configured to modify a shape of a plasma sheath of the plasma proximate the focusing plate such that ions exiting an aperture of the aperture arrangement define focused ions. The apparatus further includes a processing chamber containing a workpiece spaced from the focusing plate such that a stationary implant region of the focused ions at the workpiece is substantially narrower that the aperture. The apparatus is configured to create a plurality of patterned areas in the workpiece by scanning the workpiece during ion implantation.

Abstract translation: 等离子体处理装置包括等离子体源，其被配置为在等离子体室中产生等离子体，使得等离子体包含用于注入工件的离子。 该装置还包括聚焦板装置，该聚焦板装置具有孔结构，其被配置为修改离开聚焦板附近的等离子体鞘的等离子体鞘的形状，使得离开孔结构的孔的离子限定聚焦离子。 该设备还包括处理室，其包含与聚焦板间隔开的工件，使得在工件处的聚焦离子的固定注入区域基本上比孔更窄。 该装置被配置为通过在离子注入期间扫描工件来在工件中产生多个图案化区域。

公开(公告)号：US20130040240A1

公开(公告)日：2013-02-14

申请号：US13550702

申请日：2012-07-17

Applicant: Shigeru Terashima

Inventor： Shigeru Terashima

IPC: G21K5/04 ,  G03F7/20 ,  G21K5/10

CPC classification number: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G21K5/04 ,  G21K5/10 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/188

Abstract: A charged particle beam drawing apparatus includes an electrostatic lens including an electrode member and configured to project the plurality of charged particle beams onto the substrate via the electrode member. In the electrode member are formed a plurality of first openings via which the plurality of charged particle beams pass, and a plurality of second openings different from the plurality of first openings, a total area of the plurality of second openings being not smaller than a total area of the plurality of first openings.

Abstract translation: 带电粒子束描绘装置包括具有电极部件的静电透镜，并配置成经由电极部件将多根带电粒子束投射到基板上。 在电极部件中形成有多个带电粒子束通过的多个第一开口以及与多个第一开口不同的多个第二开口，多个第二开口的总面积不小于总数 多个第一开口的区域。

公开(公告)号：US20120273690A1

公开(公告)日：2012-11-01

申请号：US13458861

申请日：2012-04-27

Applicant: Marco Jan Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink ,  Alexander Hendrik Vincent van Veen ,  Alrik van den Brom

Inventor： Marco Jan Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink ,  Alexander Hendrik Vincent van Veen ,  Alrik van den Brom

IPC: G21K5/04 ,  H01J3/26 ,  H01J3/14

CPC classification number: G03F7/70 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205

Abstract: The invention relates to a charged particle system such as a multi beam lithography system, comprising a manipulator device for manipulation of one or more charged particle beams, wherein the manipulator device comprises at least one through opening in the plane of the planar substrate for passing at least one charged particle beam there through. Each through opening is provided with electrodes arranged in a first set of multiple first electrodes along a first part of a perimeter of said through opening and in a second set of multiple second electrodes along a second part of said perimeter. An electronic control circuit is arranged for providing voltage differences the electrodes in dependence of a position of the first and second electrode along the perimeter of the through opening.

Abstract translation: 本发明涉及带电粒子系统，例如多光束光刻系统，其包括用于操纵一个或多个带电粒子束的操纵器装置，其中所述操纵器装置包括在所述平面基板的平面中的至少一个通孔，用于通过 至少一个带电粒子束通过。 每个通孔具有沿着所述通孔的周边的第一部分布置在第一组多个第一电极中的电极和沿着所述周边的第二部分的第二组多个第二电极。 电子控制电路被布置用于根据第一和第二电极沿着通孔的周边的位置来提供电极的电压差。

公开(公告)号：US08173978B2

公开(公告)日：2012-05-08

申请号：US11571695

申请日：2005-07-05

Applicant: Ho Seob Kim ,  Byeng Jin Kim

Inventor： Ho Seob Kim ,  Byeng Jin Kim

IPC: H01J37/08

CPC classification number: H01J37/263 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/14 ,  H01J37/04 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/248 ,  H01J2237/28 ,  H01J2237/31752

Abstract: Provided is a method for controlling electron beams in a multi-microcolumn, in which unit microcolumns having an electron emitter, a lens, and a deflector are arranged in an n×m matrix. A voltage is uniformly or differentially applied to each electron emitter or extractor. The same control voltage or different voltages are applied to a region at coordinates in a control division area of each extractor to deflect the electron beams. Lens layers not corresponding to the extractors are collectively or individually controlled so as to efficiently control the electron beams of the unit microcolumn. Further, a multi-microcolumn using the method is provided.

Abstract translation: 提供了一种用于控制多微柱中的电子束的方法，其中具有电子发射器，透镜和偏转器的单元微柱以n×m矩阵排列。 电压均匀或差分施加到每个电子发射器或提取器。 将相同的控制电压或不同的电压施加到每个提取器的控制分割区域中的坐标处的区域以偏转电子束。 不对应于提取器的透镜层被集体地或单独地控制，以便有效地控制单元微柱的电子束。 此外，提供了使用该方法的多微柱。

公开(公告)号：US08134135B2

公开(公告)日：2012-03-13

申请号：US11880872

申请日：2007-07-23

Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/302 ,  H01J37/04

CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

Abstract translation: 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

公开(公告)号：US20110268252A1

公开(公告)日：2011-11-03

申请号：US13142787

申请日：2010-06-30

Applicant: Tetsuya Ozawa ,  Ryuji Matsuo ,  Licai Jiang ,  Boris Verman ,  Kazuhiko Omote

Inventor： Tetsuya Ozawa ,  Ryuji Matsuo ,  Licai Jiang ,  Boris Verman ,  Kazuhiko Omote

IPC: G01T1/36

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G01J3/12 ,  G21K1/062 ,  G21K2201/064 ,  H01J2237/1205 ,  H01J2237/1516

Abstract: An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided.An X-ray apparatus 100 includes a spectrometer 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal point 110 and by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus 100, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, Kα1 ray from Kα2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.

Abstract translation: 一种X射线装置，其产生具有窄能带宽的虚拟光源，并能进行高分辨率X射线衍射测量; 使用该方法的方法; 并提供X射线照射方法。 X射线装置100包括分光器105，其分散发散的X射线束;以及选择部107，其安装在聚光X射线束的聚光位置，用于选择具有波长的X射线束 在一个特定的范围内，允许它通过，并创建一个虚拟源。 利用这种布置，可以在焦点110处创建具有窄能带宽的虚拟源，并且借助于虚拟源，可以获得高分辨率X射线衍射测量。 通过使用X射线装置100，能够从Kα2射线充分地分离具有例如Kα1射线的极窄能量带宽的X射线束。 此外，还可以切出部分连续X射线束以创建虚拟源。