TRENCH MOSFET DEVICE AND THE PREPARATION METHOD THEREOF

    公开(公告)号:US20180323155A1

    公开(公告)日:2018-11-08

    申请号:US16015091

    申请日:2018-06-21

    摘要: A trench-type metal-oxide-semiconductor field-effect transistor (MOSFET) device and a fabrication method are disclosed. A semiconductor substrate of a first conductivity type is provided. A plurality of first trenches arranged side by side in a first stripe layout extending along a first direction in a first preset area of the semiconductor substrate are formed. A plurality of second trenches arranged side by side in a second stripe layout extending along a second direction perpendicular to the first direction in a second preset area of the semiconductor substrate are formed. The plurality of first trenches and the plurality of second trenches are filled with a conductive material so as to form a plurality of control gates.