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21 条记录 (耗时 0.015 秒)

    ZONE CONTROL HEATER PLATE FOR TRACK LITHOGRAPHY SYSTEMS
    11.
    发明申请
    ZONE CONTROL HEATER PLATE FOR TRACK LITHOGRAPHY SYSTEMS 审中-公开
    用于轨道光刻系统的区域控制加热板

    公开(公告)号：US20090032522A1

    公开(公告)日：2009-02-05

    申请号：US12192857

    申请日：2008-08-15

    申请人： Martin Jeff Salinas ,  David H. Quach

    发明人： Martin Jeff Salinas ,  David H. Quach

    IPC分类号： H05B3/68

    CPC分类号： H05B3/143 ,  H01L21/67103 ,  H01L21/67248

    摘要： A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires.

    摘要翻译： 一种基板加热器，包括具有上表面，下表面和在上表面和下表面之间延伸的周边表面的烘烤板，所述烘烤板包括至少一个加热元件，至少一个温度传感器和包括在 耦合到所述加热元件的至少一个线和耦合到所述温度传感器的至少一个线; 与烘烤板的下侧和周边侧表面间隔开并且大致围绕烘烤板的下表面和外周侧表面的护罩，所述护罩具有面向烘烤板的下表面的内部上表面，面向烘烤板的周边侧表面的内侧表面和 下表面与内部上表面相对; 形成在所述屏蔽的下表面上的图案化信号层，其中所述多根导线电耦合到形成在所述图案化信号层中的对应的多个信号迹线; 以及连接器，电连接到所述图案化信号层中的所述多个信号迹线，适于促进与所述多根电线的电连接。

    Zone control heater plate for track lithography systems
    12.
    发明授权
    Zone control heater plate for track lithography systems 失效

    公开(公告)号：US07427728B2

    公开(公告)日：2008-09-23

    申请号：US11483832

    申请日：2006-07-07

    申请人： Martin Jeff Salinas ,  David H. Quach

    发明人： Martin Jeff Salinas ,  David H. Quach

    IPC分类号： H05B3/68

    CPC分类号： H05B3/143 ,  H01L21/67103 ,  H01L21/67248

    摘要： A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires.

    Zone control heater plate for track lithography systems
    13.
    发明申请
    Zone control heater plate for track lithography systems 失效
    用于轨道光刻系统的区域控制加热板

    公开(公告)号：US20080006619A1

    公开(公告)日：2008-01-10

    申请号：US11483832

    申请日：2006-07-07

    申请人： Martin Jeff Salinas ,  David H. Quach

    发明人： Martin Jeff Salinas ,  David H. Quach

    IPC分类号： H05B3/68

    CPC分类号： H05B3/143 ,  H01L21/67103 ,  H01L21/67248

    摘要： A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires.

    摘要翻译： 一种基板加热器，包括具有上表面，下表面和在上表面和下表面之间延伸的周边表面的烘烤板，所述烘烤板包括至少一个加热元件，至少一个温度传感器和包括在 耦合到所述加热元件的至少一个线和耦合到所述温度传感器的至少一个线; 与烘烤板的下侧和周边侧表面间隔开并且大致围绕烘烤板的下表面和外周侧表面的护罩，所述护罩具有面向烘烤板的下表面的内部上表面，面向烘烤板的周边侧表面的内侧表面和 下表面与内部上表面相对; 形成在所述屏蔽的下表面上的图案化信号层，其中所述多根导线电耦合到形成在所述图案化信号层中的对应的多个信号迹线; 以及连接器，电连接到所述图案化信号层中的所述多个信号迹线，适于促进与所述多根电线的电连接。

    Integrated thermal unit having a shuttle with two-axis movement
    17.
    发明授权
    Integrated thermal unit having a shuttle with two-axis movement 有权
    具有双轴运动的梭子的集成热单元

    公开(公告)号：US07297906B2

    公开(公告)日：2007-11-20

    申请号：US11174781

    申请日：2005-07-05

    申请人： David H. Quach ,  Martin Jeff Salinas

    发明人： David H. Quach ,  Martin Jeff Salinas

    IPC分类号： H05B3/68 ,  C23C16/80

    CPC分类号： H01L21/67184 ,  H01L21/67109 ,  H01L21/67742 ,  H01L21/67748 ,  H01L21/67751

    摘要： An integrated thermal unit comprises a bake station comprising a bake plate configured to hold and heat a substrate; a chill station comprising a chill plate configured to hold and cool a substrate; and a substrate transfer shuttle configured to transfer substrates from the bake plate to the chill plate along a horizontally linear path within the thermal unit and raise and lower substrates along a vertical path within the integrated thermal unit.

    摘要翻译： 集成热单元包括烘焙站，烘烤站包括构造成保持和加热基材的烘烤板; 冷却站，包括构造成保持和冷却衬底的冷却板; 以及基板传送梭，其构造成沿着所述热单元内的水平线性路径将基板从所述烘烤板传送到所述冷却板，并且沿着所述集成热单元内的垂直路径升高和降低基板。

    Methods and apparatus for providing a gas mixture to a pair of process chambers
    18.
    发明授权
    Methods and apparatus for providing a gas mixture to a pair of process chambers 失效
    将气体混合物提供给一对处理室的方法和装置

    公开(公告)号：US08616224B2

    公开(公告)日：2013-12-31

    申请号：US12907944

    申请日：2010-10-19

    申请人： Jared Ahmad Lee ,  Martin Jeff Salinas ,  Ezra Robert Gold ,  James P. Cruse

    发明人： Jared Ahmad Lee ,  Martin Jeff Salinas ,  Ezra Robert Gold ,  James P. Cruse

    IPC分类号： B08B3/00

    CPC分类号： F17D3/03 ,  H01J37/3244 ,  H01J37/32899 ,  H01L21/02071 ,  H01L21/6719 ,  H01L21/67201 ,  Y10T137/0318 ,  Y10T137/877

    摘要： A method and apparatus for supplying a gas mixture to a load lock chamber is described. In one embodiment, the apparatus supplies a gas mixture to a pair of process chambers, comprising a first ozone generator to provide a first gas mixture to a first process chamber, a second ozone generator to provide a second gas mixture to a second process chamber, a first gas source coupled to the first ozone generator via a first mass flow controller and a first gas line, and coupled to the second ozone generator via a second mass flow controller and a second gas line, and a second gas source coupled to the first ozone generator via a third mass flow controller and a third gas line and coupled to the second ozone generator via fourth mass flow controller and a fourth gas line.

    摘要翻译： 描述了一种将气体混合物供应到负载锁定室的方法和装置。 在一个实施例中，该装置将气体混合物提供给一对处理室，包括第一臭氧发生器以向第一处理室提供第一气体混合物，第二臭氧发生器将第二气体混合物提供给第二处理室， 第一气体源，经由第一质量流量控制器和第一气体管线耦合到第一臭氧发生器，并且经由第二质量流量控制器和第二气体管线耦合到第二臭氧发生器，以及耦合到第一气体源的第一气体源 臭氧发生器，经由第三质量流量控制器和第三气体管线，并经由第四质量流量控制器和第四气体管线与第二臭氧发生器连接。