公开(公告)号：US4480910A

公开(公告)日：1984-11-06

申请号：US358436

申请日：1982-03-15

申请人： Akihiro Takanashi ,  Tatsuo Harada ,  Masamoto Akeyama ,  Yataro Kondo ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Yoshio Kawamura

发明人： Akihiro Takanashi ,  Tatsuo Harada ,  Masamoto Akeyama ,  Yataro Kondo ,  Toshiei Kurosaki ,  Shinji Kuniyoshi ,  Sumio Hosaka ,  Yoshio Kawamura

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G03B27/68

CPC分类号： G03F7/70241 ,  G03F7/2041 ,  G03F7/70341

摘要： There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).

摘要翻译： 公开了一种图案形成装置，用于将形成在掩模版上的图案投影在基板上的光致抗蚀剂层上，该基板包括用于照射用于形成光学图像的图案的照明系统，用于减少光学图案图像的缩小透镜 特定的缩小率，并且将减小的光学图案图像投影到形成在用于曝光光致抗蚀剂层的基板上的光致抗蚀剂层上;以及液体维持装置，用于用光学透明液体填充至少一部分还原透镜和光致抗蚀剂层之间的间隙 折射率大于1（1）。

公开(公告)号：US4441206A

公开(公告)日：1984-04-03

申请号：US330778

申请日：1981-12-14

申请人： Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Sumio Hosaka ,  Yoshio Kawamura ,  Tsuneo Terasawa

发明人： Shinji Kuniyoshi ,  Akihiro Takanashi ,  Toshiei Kurosaki ,  Sumio Hosaka ,  Yoshio Kawamura ,  Tsuneo Terasawa

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68 ,  G06K9/20 ,  G06K9/00 ,  H04N7/00

CPC分类号： G03F9/7088 ,  H01L21/30

摘要： A pattern detecting apparatus is disclosed which comprises, in order to detect the center of a positioning pattern on a sample with high accuracy in a wide range, means for illuminating the positioning pattern, means for defining an illumination range in which the positioning pattern is illuminated, means for focusing reflected light from the positioning pattern on a predetermined image plane, means for electrically detecting a bright and dark image on the image plane in accordance with positions on the image plane, means for removing a signal corresponding to the outside of the illumination range from the output signal of the detecting means and for holding, in place of the removed signal, a level of the output signal produced within the illumination range, and means for detecting a position of the center of the positioning pattern from the output signal of the holding means.

摘要翻译： 公开了一种图案检测装置，其包括为了在宽范围内高精度地检测样品上的定位图案的中心，用于照亮定位图案的装置，用于限定定位图案被照亮的照明范围的装置 用于将来自定位图案的反射光聚焦在预定图像平面上的装置，用于根据图像平面上的位置电学检测图像平面上的亮和暗图像的装置，用于去除对应于照明外部的信号的装置 范围从检测装置的输出信号，并且代替去除的信号，保持在照明范围内产生的输出信号的电平，以及用于从位置图的输出信号中检测定位图案的中心的位置的装置 持有手段。

公开(公告)号：US07924038B2

公开(公告)日：2011-04-12

申请号：US12064620

申请日：2007-04-26

申请人： Shinji Kuniyoshi ,  Yuji Miyagi

发明人： Shinji Kuniyoshi ,  Yuji Miyagi

IPC分类号： G01R31/00

CPC分类号： G01R1/06733 ,  G01R31/2891

摘要： A probe having an alignment mark that is hardly influenced by scraps of an electrode scraped by a probe tip is provided. A probe according to the present invention comprises a base portion having an attaching end and extending in a direction distanced from the attaching end, an arm portion extending from the base portion laterally with a space in the extending direction of the base portion from the attaching end, a probe tip portion protruded from the arm portion and having a probe tip formed on its protruding end, and an alignment mark for alignment of the probe tip. The arm portion has a flat surface area on the opposite side of a side where the attaching end of the base portion is located when seen along the extending direction of the arm portion. The probe tip portion is formed to be protruded from the flat surface area, and the alignment mark is constituted by at least a part of the flat surface area.

摘要翻译： 提供具有难以受到由探针尖刮掉的电极的废料的影响的对准标记的探针。 根据本发明的探针包括具有附接端并沿远离安装端的方向延伸的基部，臂部从基部横向延伸，从基部的延伸方向的空间从附接端 从臂部突出并具有形成在其突出端上的探针尖端的探针尖端部分和用于对准探针尖端的对准标记。 臂部在沿着臂部的延伸方向观察时，在基部的安装端位于的一侧的相对侧上具有平坦的表面区域。 探针尖端部形成为从平坦表面区域突出，并且对准标记由平坦表面积的至少一部分构成。

公开(公告)号：US07679389B2

公开(公告)日：2010-03-16

申请号：US11817493

申请日：2005-03-07

申请人： Shinji Kuniyoshi ,  Hideki Hirakawa ,  Akira Soma ,  Takayuki Hayashizaki

发明人： Shinji Kuniyoshi ,  Hideki Hirakawa ,  Akira Soma ,  Takayuki Hayashizaki

IPC分类号： G01R31/02

CPC分类号： G01R1/06727 ,  G01R1/06738

摘要： A probe includes an arm region extending in the back and forth direction, and a tip region extending downward from the front end portion of the arm region. The tip region has a pedestal portion integrally continuous to a lower edge portion at the front end side of the arm region and having an underside inclined to an imaginary axis extending in the vertical direction; and a contact portion projected from the underside of the pedestal portion and having a tip orthogonal to an imaginary axis. Thus, the position of the tip can be accurately determined.

摘要翻译： 探头包括在前后方向上延伸的臂区域和从臂区域的前端部向下延伸的尖端区域。 尖端区域具有与臂区域的前端侧的下边缘部分整体连续的基座部分，并且具有沿垂直方向延伸的假想轴线倾斜的下侧; 以及从基座部分的下侧突出并具有与假想轴正交的尖端的接触部分。 因此，可以精确地确定尖端的位置。

公开(公告)号：US07629807B2

公开(公告)日：2009-12-08

申请号：US11995279

申请日：2005-08-09

申请人： Hideki Hirakawa ,  Akira Soma ,  Takayuki Hayashizaki ,  Shinji Kuniyoshi ,  Masahisa Tazawa

发明人： Hideki Hirakawa ,  Akira Soma ,  Takayuki Hayashizaki ,  Shinji Kuniyoshi ,  Masahisa Tazawa

IPC分类号： G01R31/02

CPC分类号： G01R1/06727 ,  G01R1/06733 ,  G01R1/06755

摘要： A probe for electrical test comprises a plate-shaped main portion having a base end to be attached to a support board and a tip end opposite the base end, and a probe tip portion arranged at the tip end of the main portion and having a probe tip to contact an electrode of a device under test, the main portion being made of a tenacity material. The main portion includes a conductive material extending from the base end to the tip end and at least part of which is buried within the tenacity material, and the tenacity material has higher resiliency than that of the conductive material while the conductive material has higher conductivity than that of the tenacity material. As a result, disorder of a signal provided via the probe is decreased without losing elastic deformation.

摘要翻译： 用于电测试的探针包括板形主要部分，其具有要附接到支撑板的基端和与基端相对的尖端，以及设置在主要部分的尖端处并具有探针的探针尖端部分 尖端接触被测器件的电极，主要部分由韧性材料制成。 主要部分包括从基端延伸到末端的导电材料，其至少一部分被埋在韧性材料内，并且韧性材料具有比导电材料更高的弹性，而导电材料具有比 坚韧的材料。 结果，通过探针提供的信号的紊乱减小而不损失弹性变形。

公开(公告)号：US07523539B2

公开(公告)日：2009-04-28

申请号：US11935378

申请日：2007-11-05

申请人： Takayuki Hayashizaki ,  Hideki Hirakawa ,  Akira Soma ,  Shinji Kuniyoshi

发明人： Takayuki Hayashizaki ,  Hideki Hirakawa ,  Akira Soma ,  Shinji Kuniyoshi

IPC分类号： G01R3/00

CPC分类号： G01R3/00 ,  G01R1/07342 ,  Y10T29/49002 ,  Y10T29/49007 ,  Y10T29/49139 ,  Y10T29/49153 ,  Y10T29/49224

摘要： In a probe manufacturing method, after a metal material for a probe is deposited on a base table, the probe can be detached from the base table relatively easily without damaging the probe. A recess corresponding to a flat surface shape of a probe is formed by a resist mask on a sacrificial layer on a base table, and a probe is formed by depositing a probe material in the recess. Thereafter, the resist mask is removed, and further the sacrificial layer is removed by an etching process with a part of the sacrificial layer remaining. For the purpose of forming an opening for control of the remaining part of the sacrificial layer in the etching process in the probe so as to let the opening pass through the probe in its plate thickness direction, a hole-forming portion for the opening is formed in the resist mask. Etching of the sacrificial layer in the etching process is promoted from an edge of the opening formed in the probe by this hole-forming portion.

摘要翻译： 在探针制造方法中，在用于探针的金属材料沉积在基台上之后，可以相对容易地将探针从基座上分离而不会损坏探针。 通过在基台上的牺牲层上的抗蚀剂掩模形成与探针的平坦表面形状对应的凹部，并且通过在凹部中沉积探针材料形成探针。 此后，去除抗蚀剂掩模，并且通过蚀刻工艺去除牺牲层，同时牺牲层的一部分残留。 为了在探针中的蚀刻工艺中形成用于控制牺牲层的剩余部分的开口以使开口在其厚度方向上穿过探针，形成用于开口的孔形成部分 在抗蚀剂掩模。 通过该孔形成部分，从形成在探针中的开口的边缘促进蚀刻工艺中的牺牲层的蚀刻。

公开(公告)号：US20080315905A1

公开(公告)日：2008-12-25

申请号：US12039027

申请日：2008-02-28

申请人： Shinji Kuniyoshi ,  Hidehiro Kiyofuji ,  Yuji Miyagi ,  Kiyotoshi Miura

发明人： Shinji Kuniyoshi ,  Hidehiro Kiyofuji ,  Yuji Miyagi ,  Kiyotoshi Miura

IPC分类号： G01R1/073

CPC分类号： G01R1/07307

摘要： The present invention provides an electrical connecting apparatus that does not cause lack of mechanical strength in a probe board. The electrical connecting apparatus comprises a probe board spaced from a support member and arranged with its one surface opposed to the support member. On one surface of the probe board is provided a fixed portion having an opened screw hole at its top portion, and on the other surface are provided probes that are connected to a tester. The electrical connecting apparatus comprises a cylindrical spacer keeping a distance from the support member to a top surface of the fixed portion and a male screw member screwed in the screw hole for the purpose of tightening the support member and the probe board at a distance in accordance with the length of the spacer. The probe board has a support plate in which a plurality of conductive paths penetrating in the plate thickness direction and connected to the tester are formed and a wiring plate in which wiring paths connected to the corresponding conductive paths are formed, whose one surface is fixed to the support plate, and on the other surface of which are provided the probes corresponding to the wiring paths. The fixed portion is constituted by a female screw member fixed to the support plate at an area where no conductive paths are formed.

摘要翻译： 本发明提供一种不会在探针板中引起机械强度不足的电连接装置。 电连接装置包括与支撑构件间隔开并且其一个表面与支撑构件相对布置的探针板。 在探针板的一个表面设置有在其顶部具有打开的螺纹孔的固定部分，而在另一个表面上设置有连接到测试器的探针。 电气连接装置包括一个圆柱形间隔件，其保持与支撑构件相对于固定部分顶表面的距离，以及螺纹连接在螺钉孔中的外螺纹构件，用于按照一定距离紧固支撑构件和探针板 具有间隔件的长度。 探针板具有支撑板，其中形成有沿板厚方向贯穿并连接到测试器的多个导电路径，并且布线板形成有连接到相应的导电路径的布线路径，其一个表面被固定到 支撑板，并且在另一表面上设置有与布线路径相对应的探针。 固定部分由在不形成导电路径的区域固定到支撑板的内螺纹构件构成。

公开(公告)号：US4933565A

公开(公告)日：1990-06-12

申请号：US216834

申请日：1988-07-08

申请人： Hiroshi Yamaguchi ,  Keiya Saito ,  Mitsuyoshi Koizumi ,  Akira Shimase ,  Satoshi Haraichi ,  Tateoki Miyauchi ,  Shinji Kuniyoshi ,  Susumu Aiuchi

发明人： Hiroshi Yamaguchi ,  Keiya Saito ,  Mitsuyoshi Koizumi ,  Akira Shimase ,  Satoshi Haraichi ,  Tateoki Miyauchi ,  Shinji Kuniyoshi ,  Susumu Aiuchi

IPC分类号： G01Q10/00 ,  G01Q70/14 ,  G03F1/00 ,  G03F1/22 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F1/74 ,  G03F1/22

摘要： The present invention relates to a method and apparatus for correcting defects of an X-ray mask which includes a focused ion beam used to irradiate at least a region having a defective portion of an X-ray mask having a protective film and eliminating the protective film; exposing a circuit pattern having a defective portion located under the region or setting this circuit pattern to the state near the exposure; detecting one of the secondary electrons, secondary ions, reflected electrons, or absorbing current generated from that region and detecting a true defective position. Then positioning the focused ion beam to the true defective position and irradiating the focused ion beam to the defective portion thereby correcting the defect.

公开(公告)号：US4737973A

公开(公告)日：1988-04-12

申请号：US941647

申请日：1986-12-15

申请人： Taro Ogawa ,  Shinji Kuniyoshi ,  Yoshinori Nakayama ,  Takeshi Kimura

发明人： Taro Ogawa ,  Shinji Kuniyoshi ,  Yoshinori Nakayama ,  Takeshi Kimura

IPC分类号： G01N23/00 ,  G03F7/20 ,  G21K1/06 ,  G01T1/36

CPC分类号： B82Y10/00 ,  G03F7/70158 ,  G03F7/70575 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/067

摘要： A focusing X-ray crystal monochromator in which one or more crystal layers having different spacings of lattice plane are stacked on a crystal base. Due to different spacings of lattice plane, the angle of reflection and diffraction of a diverging incident X-ray beam can be so changed that the beam takes a parallel or focusing direction for monochromatization. Thus, the monochromator of the present invention can be applied to the X-ray lithography for transferring a pattern of high resolution or the X-ray analysis such as the fine X-ray diffraction.

摘要翻译： 将其中具有不同晶格面间隔的一个或多个晶体层堆叠在晶体基底上的聚焦X射线晶体单色仪。 由于晶格面的不同间隔，发散的入射X射线束的反射角和衍射角可以如此改变，使得束取平行或聚焦方向进行单色化。 因此，本发明的单色仪可以应用于用于转印高分辨率图案或X射线分析的精细X射线衍射的X射线光刻。

公开(公告)号：US4719161A

公开(公告)日：1988-01-12

申请号：US893780

申请日：1986-08-06

申请人： Takeshi Kimura ,  Kozo Mochiji ,  Hiroshi Okamoto ,  Takao Iwayanagi ,  Tetsuichi Kudo ,  Shinji Kuniyoshi

发明人： Takeshi Kimura ,  Kozo Mochiji ,  Hiroshi Okamoto ,  Takao Iwayanagi ,  Tetsuichi Kudo ,  Shinji Kuniyoshi

IPC分类号： G03F1/00 ,  G03F1/22 ,  H01L21/027 ,  H01L21/30 ,  G03F9/00

CPC分类号： G03F1/22 ,  Y10S430/143 ,  Y10S430/148 ,  Y10S430/167

摘要： There is disclosed a mask for X-ray lithography wherein a peroxopolytungsten compound is used as an absorber, and a process for producing the same. Since this compound has a sensitivity for electron beams and light and serves as an absorber for X-rays, a mask for X-ray lithorgraphy is made only by applying this compound to a substrate, exposing the same to light to form a transferred pattern, and effecting development. Thus, the step of etching the absorber which is essential in the conventional process, is not needed. Therefore, masks having a highly accurate pattern and few defects can be produced with a high production yield.

摘要翻译： 公开了一种用于X射线光刻的掩模，其中使用过氧多钨化合物作为吸收剂及其制备方法。 由于该化合物对于电子束和光具有灵敏度并且用作X射线的吸收体，所以仅通过将该化合物施加到基底上而将其曝光以形成转印图案来进行X射线透视掩模， 并实现发展。 因此，不需要在常规方法中蚀刻吸收体的步骤。 因此，可以以高的产率获得具有高精度图案和少量缺陷的掩模。