In-situ process chamber preparation methods for plasma ion implantation systems
    11.
    发明申请
    In-situ process chamber preparation methods for plasma ion implantation systems 审中-公开
    等离子体离子注入系统的原位处理室制备方法

    公开(公告)号:US20050260354A1

    公开(公告)日:2005-11-24

    申请号:US10850222

    申请日:2004-05-20

    IPC分类号: H01J37/32 C23C14/00 C23C16/00

    CPC分类号: H01J37/32495 H01J37/32412

    摘要: A method for plasma ion implantation of a substrate includes providing a plasma ion implantation system including a process chamber, a source for producing a plasma in the process chamber, a platen for holding the substrate in the process chamber, and a voltage source for accelerating ions from the plasma into the substrate, depositing on interior surfaces of the process chamber a fresh coating that is similar in composition to a deposited film that results from plasma ion implantation of the substrate, before depositing the fresh coating, cleaning interior surfaces of the process chamber by removing an old film using one or more activated cleaning precursors, plasma ion implantation of the substrate according to a plasma ion implantation process, and repeating the steps of cleaning interior surfaces of the process chamber and depositing a fresh coating following plasma ion implantation of one or more substrates.

    摘要翻译: 用于等离子体离子注入衬底的方法包括提供等离子体离子注入系统,其包括处理室,用于在处理室中产生等离子体的源,用于将衬底保持在处理室中的压板和用于加速离子的电压源 从等离子体进入衬底,在沉积新鲜涂层之前,在沉积新鲜涂层之前,在处理室的内表面上沉积与组合物中与等离子体离子注入导致的沉积膜相似的新涂层,清洁处理室的内表面 通过使用一种或多种激活的清洁前体去除旧膜,根据等离子体离子注入工艺等离子体离子注入基板,并重复清洁处理室的内表面并在等离子体离子注入之后沉积新涂层的步骤 或更多的基材。

    Mechanism for multiple system common scheduling and analysis of unrelated events in a corrections facility
    16.
    发明授权
    Mechanism for multiple system common scheduling and analysis of unrelated events in a corrections facility 有权
    多系统共同调度和校正设施中无关事件分析的机制

    公开(公告)号:US09483756B2

    公开(公告)日:2016-11-01

    申请号:US13435018

    申请日:2012-03-30

    摘要: A method is presented for use in correctional facilities to manage resources. Particularly, the method includes using a scheduling engine capable of receiving scheduling requests from other systems or direct entry of scheduling data and which is equipped to provide reports that inform the facility of the schedules of all inmates, transportation requirements, and space accommodations. The method may be employed for evaluating the needs for transportation and space and may also be used to generate reports that show relationships between inmates based on activities, locations, and time.

    摘要翻译: 提供了一种在惩教设施中用于管理资源的方法。 特别地,该方法包括使用能够接收来自其他系统的调度请求或直接输入调度数据的调度引擎,并且其被配备为提供向所述设施通知所有囚犯的时间表,运输要求和空间住宿的报告。 该方法可用于评估运输和空间的需求,还可用于生成报告,显示基于活动,位置和时间的囚犯之间的关系。

    OUT-OF-BAND REMOTE AUTHENTICATION
    18.
    发明申请
    OUT-OF-BAND REMOTE AUTHENTICATION 审中-公开
    超宽带远程认证

    公开(公告)号:US20130347089A1

    公开(公告)日:2013-12-26

    申请号:US13976063

    申请日:2011-09-30

    IPC分类号: H04L29/06

    摘要: In an embodiment a single user authentication event, performed between a trusted path hardware module and a service provider via an out of band communication, can enable a user to transparently access multiple service providers using strong credentials that are specific to each service provider. The authentication event may be based on multifactor authentication that is indicative of a user's actual physical presence. Thus, for example, a user would not need to enter a different retinal scan to gain access to each of the service providers. Other embodiments are described herein.

    摘要翻译: 在一个实施例中,通过带外通信在可信路径硬件模块和服务提供商之间执行的单个用户认证事件可以使得用户能够使用对每个服务提供商特定的强凭证来透明地访问多个服务提供商。 认证事件可以基于指示用户的实际物理存在的多因素认证。 因此,例如,用户将不需要输入不同的视网膜扫描以获得对每个服务提供商的访问。 本文描述了其它实施例。

    LED MESA SIDEWALL ISOLATION BY ION IMPLANTATION
    19.
    发明申请
    LED MESA SIDEWALL ISOLATION BY ION IMPLANTATION 失效
    LED MESA SIDEWELL隔离离子植入

    公开(公告)号:US20120238046A1

    公开(公告)日:2012-09-20

    申请号:US13364476

    申请日:2012-02-02

    申请人: San Yu Atul Gupta

    发明人: San Yu Atul Gupta

    IPC分类号: H01L21/265 H01L33/32

    摘要: A method of LED manufacturing is disclosed. A coating is applied to a mesa. This coating may have different thicknesses on the sidewalls of the mesa compared to the top of the mesa. Ion implantation into the mesa will form implanted regions in the sidewalls in one embodiment. These implanted regions may be used for LED isolation or passivation.

    摘要翻译: 公开了一种LED制造方法。 将涂层施加到台面。 与台面的顶部相比,该涂层在台面的侧壁上可能具有不同的厚度。 在一个实施例中,离子注入台面将在侧壁中形成注入区域。 这些注入区可用于LED隔离或钝化。