公开(公告)号：US07512926B2

公开(公告)日：2009-03-31

申请号：US11242165

申请日：2005-09-30

Applicant: Bin Hu ,  Vivek Singh ,  Yan Borodovsky

Inventor： Bin Hu ,  Vivek Singh ,  Yan Borodovsky

IPC: G06F17/50 ,  G03G13/00 ,  G03H3/00

CPC classification number: G03F7/70283 ,  G03F1/32 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/705

Abstract: The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light.

公开(公告)号：US20090053896A1

公开(公告)日：2009-02-26

申请号：US12221864

申请日：2008-08-07

Applicant: Bin Hu ,  Richard Wen ,  Deepak Mahulikar

Inventor： Bin Hu ,  Richard Wen ,  Deepak Mahulikar

IPC: H01L21/304 ,  C09K13/00

CPC classification number: C09G1/02 ,  C09G1/16 ,  H01L21/3212

Abstract: A water-soluble polymer is effective as a removal rate enhancer in a chemical mechanical polishing slurry to polish copper on semiconductor wafers or other copper laid structures, while keeping the etching rate low. The slurry may also include soft particles and certain metal chelating agents, or combinations thereof. The slurry can also comprise an abrasive particle, an organic acid, and an oxidizer.

Abstract translation: 水溶性聚合物在化学机械抛光浆料中作为去除速率增强剂是有效的，以在半导体晶片或其它铜敷设结构上抛光铜，同时保持蚀刻速率较低。 浆料还可以包括软颗粒和某些金属螯合剂，或其组合。 浆料还可以包含磨料颗粒，有机酸和氧化剂。

公开(公告)号：US20080300410A1

公开(公告)日：2008-12-04

申请号：US12093825

申请日：2006-11-16

Applicant: Mahavir Prashad ,  Yugang Liu ,  Bin Hu ,  Michael J. Girgis ,  Frank Schaefer

Inventor： Mahavir Prashad ,  Yugang Liu ,  Bin Hu ,  Michael J. Girgis ,  Frank Schaefer

IPC: C07D211/32

CPC classification number: C07D211/26 ,  C07D213/26

Abstract: The present invention relates to salts of aryl compounds as discussed below and to methods of manufacture thereof, as well as other subject matter. More particularly, the invention relates to salts useful as intermediates for the synthesis of the cinnamanilide of formula (Y): where Ra is selected from H, OH, C1, C2, C3 or C4 alkyl; and R1 is C1, C2, C3 or C4 alkyl.

Abstract translation: 本发明涉及如下所述的芳基化合物的盐及其制备方法以及其它主题。 更具体地，本发明涉及可用作合成式（Y）的肉桂酰苯胺的中间体的盐：其中R a选自H，OH，C 1，C 2，C 3或C 4烷基; 并且R 1是C 1，C 2，C 3或C 4烷基。

公开(公告)号：US07302035B2

公开(公告)日：2007-11-27

申请号：US11285974

申请日：2005-11-23

Applicant: Bin Hu ,  Shangmin Sun ,  Yucheng Wu ,  Nan Jiang ,  Zhizhong Liang ,  Wanquan Shen ,  Ning Li

Inventor： Bin Hu ,  Shangmin Sun ,  Yucheng Wu ,  Nan Jiang ,  Zhizhong Liang ,  Wanquan Shen ,  Ning Li

IPC: G01N23/04

CPC classification number: G01V5/0016 ,  G01N23/04

Abstract: A train inspection system by imaging through radiation, having a scanning arm positioned away from the track and supported on a construction base, and vibration damping elements positioned between the scanning arm and the construction base. The system includes a detector bracket with detector arrays mounted thereon, a radiation source, a calibration device, a front collimator, and a rear collimator. The sector-shaped x-rays emitted from the radiation source penetrate through the calibration device, the front collimator, the rear collimator and the train to be inspected sequentially so as to be received by the detector arrays provided on the detector bracket.

Abstract translation: 一种列车检查系统，其通过辐射成像，具有远离轨道定位并支撑在构造基座上的扫描臂，以及位于扫描臂和构造基座之间的减振元件。 该系统包括其上安装有检测器阵列的检测器支架，辐射源，校准装置，前准直仪和后准直仪。 从辐射源发射的扇形X射线穿过校准装置，前准直仪，后准直仪和列车，以便依次检查，以便由设在检测器支架上的检测器阵列接收。

公开(公告)号：US20070243536A1

公开(公告)日：2007-10-18

申请号：US11404741

申请日：2006-04-14

Applicant: Andre Abad ,  Ronald Flannagan ,  Bin Hu ,  Billy McCutchen ,  Xiaofeng Yang ,  Cao Yu

Inventor： Andre Abad ,  Ronald Flannagan ,  Bin Hu ,  Billy McCutchen ,  Xiaofeng Yang ,  Cao Yu

IPC: C12Q1/68

CPC classification number: C12Q1/6809 ,  C12Q1/689 ,  C12Q2541/101

Abstract: Methods and compositions for identifying novel pesticidal gene homologues are provided. Specifically, the methods of the invention comprise systematically designing oligonucleotide primers that are specific for a pesticidal gene of interest and performing successive rounds of PCR amplification of nucleic acid material from a microorganism, particularly a Bacillus thuringiensis strain, to identify novel homologues of known pesticidal genes. Oligonucleotide primers that can be used to practice the present methods are further disclosed.

Abstract translation: 提供了鉴定新型杀虫基因同系物的方法和组合物。 具体地说，本发明的方法包括系统地设计针对目的杀虫基因特异性的寡核苷酸引物，并对来自微生物特别是苏云金芽孢杆菌属菌株的核酸材料进行连续循环的PCR扩增，以鉴定已知杀虫基因的新型同系物 。 进一步公开了可用于实施本发明方法的寡核苷酸引物。

公开(公告)号：US20070179298A1

公开(公告)日：2007-08-02

申请号：US10544919

申请日：2004-02-20

Applicant: Mahavir Prashad ,  Hong-Yong Kim ,  Bin Hu ,  Joel Slade ,  Prasad Kapa ,  Michael Girgis

Inventor： Mahavir Prashad ,  Hong-Yong Kim ,  Bin Hu ,  Joel Slade ,  Prasad Kapa ,  Michael Girgis

IPC: A61K31/4439 ,  C07D417/02 ,  C07D403/02

CPC classification number: C07D401/12 ,  C07B2200/07 ,  C07C51/487 ,  C07C239/20 ,  C07C59/01

Abstract: Improved processes for preparing intermediates useful for preparing antibacterial N-[1-oxo-2-alkyl-3-(N-hydroxyformamido)-propyl}-(carbonylamino-aryl or -heteroaryl)-azacyclo4-7alkanes or thiazacyclo4-7alkanes, which have one or more of the following features: (1) make use of a particular β-lactam intermediate; (2) which make use of a particular resolving agents, enantiomerically pure substituted propionic acids, especially (R)-2-butyl-3-hydroxy-propionic acid; (3) which avoid the use of hydrogen peroxide; and (4) which facilitate selective debenzylation reducing production of waste by-products.

Abstract translation: 用于制备可用于制备抗菌N- [1-氧代-2-烷基-3-（N-羟基甲酰氨基） - 丙基} - （羰基氨基 - 芳基或 - 杂芳基） - 偶氮基-4-7烷烃或噻唑烷-4-醇的中间体的改进方法，其具有 一个或多个以下特征：（1）利用特定的β-内酰胺中间体; （2），其使用特定的拆分剂，对映体纯的取代的丙酸，特别是（R）-2-丁基-3-羟基 - 丙酸; （3）避免使用过氧化氢; 和（4）促进选择性脱苄基化减少废弃副产物的生产。

公开(公告)号：US20070075042A1

公开(公告)日：2007-04-05

申请号：US11516002

申请日：2006-09-05

Applicant: Junaid Siddiqui ,  Timothy Compton ,  Daniel Castillo ,  Bin Hu

Inventor： Junaid Siddiqui ,  Timothy Compton ,  Daniel Castillo ,  Bin Hu

IPC: C09K13/00 ,  C03C15/00 ,  B44C1/22 ,  H01L21/302 ,  C23F1/00

CPC classification number: C23F3/06 ,  C09G1/02 ,  C09K3/1445 ,  C09K3/1463 ,  H01L21/3212

Abstract: A composition and an associated method for chemical mechanical planarization (or other polishing) are described. The composition includes a stabilizer-metal-vinyl pyridine polymer surface-modified colloidal abrasive (e.g., silica) and an oxidizing agent (e.g., hydrogen peroxide), where the metal is a Fenton's reaction metal. The method includes applying the composition to a substrate to be polished (e.g., chemical-mechanical polishing (CMP)), such as substrates containing tungsten or copper and dielectrics layers that being subjected to tungsten or copper CMP for planarization.

Abstract translation: 描述了用于化学机械平面化（或其它抛光）的组合物和相关方法。 组合物包括稳定剂 - 金属 - 乙烯基吡啶聚合物表面改性的胶体磨料（例如二氧化硅）和氧化剂（例如过氧化氢），其中金属是芬顿的反应金属。 该方法包括将组合物施加到待抛光的基底（例如化学机械抛光（CMP））上，例如含有钨或铜的基底和经受钨或铜CMP的平坦化的电介质层。

公开(公告)号：US07153335B2

公开(公告)日：2006-12-26

申请号：US10683232

申请日：2003-10-10

Applicant: Junaid Ahmed Siddiqui ,  Timothy Frederick Compton ,  Bin Hu ,  Robin Edward Richards

Inventor： Junaid Ahmed Siddiqui ,  Timothy Frederick Compton ,  Bin Hu ,  Robin Edward Richards

IPC: C09G1/02 ,  C09G1/04 ,  C09K13/14 ,  B24B1/00

CPC classification number: C09G1/02

Abstract: A composition and associated method for chemical mechanical planarization (or other polishing) are described which afford high tantalum to copper selectivity in copper CMP and which are tunable (in relation to polishing performance). The composition comprises an abrasive and an N-acyl-N-hydrocarbonoxyalkyl aspartic acid compound and/or a tolyltriazole derivative.

Abstract translation: 描述了用于化学机械平面化（或其他抛光）的组合物和相关方法，其在铜CMP中提供高的钽到铜选择性，并且其可调谐（相对于抛光性能）。 该组合物包含磨料和N-酰基-N-烃氧烷基天冬氨酸化合物和/或甲苯基三唑衍生物。

公开(公告)号：US20060113163A1

公开(公告)日：2006-06-01

申请号：US11284989

申请日：2005-11-22

Applicant: Bin Hu ,  Shangmin Sun ,  Guang Yang ,  Yucheng Wu ,  Zhongrong Yang ,  Nan Jiang ,  Wanquan Shen ,  Jianjun Su

Inventor： Bin Hu ,  Shangmin Sun ,  Guang Yang ,  Yucheng Wu ,  Zhongrong Yang ,  Nan Jiang ,  Wanquan Shen ,  Jianjun Su

IPC: B65G35/00

CPC classification number: B61J3/06 ,  B66D1/60 ,  G01N9/24 ,  G01N35/04 ,  G01N2033/0081 ,  G01V5/0008

Abstract: The present invention discloses a pulling device for a container inspection system including a pulling vehicle (1) arranged inside an inspection passage, a winch (5) and wire tension mechanisms (6,6′). Front and rear ends of the pulling vehicle are connected to a wire rope so as to drive the pulling vehicle to move back and forth inside the inspection passage. The wire rope connected to front and rear ends of the pulling vehicle is wound around a wire tension mechanism arranged at front and rear ends of the inspection passage and is turned around by a swerving pulley (2) which is positioned at the same horizontal plane as that of the wire rope, the pulling vehicle, and the wire tension mechanisms, then the wire rope passes through the vertical pulley block, and finally it is connected to a single winding drum (4) of the winch (5) and wound around the single winding drum (4) respectively. Compared with the prior arts, the present invention is advantageous in reduction in equipment investment and decrease in area occupied by the pulling device. Further, the inspection operation can be carried out more reliably and safely.

Abstract translation: 本发明公开了一种用于容器检查系统的牵引装置，其包括设置在检查通道内的牵引车辆（1），绞盘（5）和线张力机构（6,6'）。 牵引车辆的前端和后端连接到钢丝绳上，以驱动牵引车辆在检查通道内前后移动。 连接到牵引车辆的前端和后端的钢丝绳缠绕在布置在检查通道的前端和后端的线张力机构上，并且通过位于与水平面相同的水平面的转动滑轮（2）转动， 钢丝绳，牵引车辆和钢丝张力机构，则钢丝绳穿过垂直滑轮组，最后连接到绞盘（5）的单个卷绕筒（4）上并缠绕在 单卷筒（4）。 与现有技术相比，本发明有利于减少设备投资并减少牵引装置占用的面积。 此外，可以更加可靠和安全地进行检查操作。

公开(公告)号：US20050076579A1

公开(公告)日：2005-04-14

申请号：US10683233

申请日：2003-10-10

Applicant: Junaid Siddiqui ,  Timothy Compton ,  Bin Hu ,  Robin Richards ,  Saifi Usmani

Inventor： Junaid Siddiqui ,  Timothy Compton ,  Bin Hu ,  Robin Richards ,  Saifi Usmani

IPC: B24B37/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/321 ,  B24D3/02 ,  H01L21/302 ,  H01L21/461

CPC classification number: C09G1/02 ,  H01L21/3212

Abstract: A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition comprises an abrasive and a tricine-type or bicine-type compound. The composition possesses high selectivities for removal of copper in relation to tantalum and dielectric materials whilst minimizing local dishing and erosion effects in CMP. The composition may further comprise an oxidizing agent in which case the composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., copper CMP).