公开(公告)号：US20180079864A1

公开(公告)日：2018-03-22

申请号：US15824360

申请日：2017-11-28

Applicant: FUJIFILM Corporation

Inventor： Takeshi KAWABATA ,  Takuma AMEMIYA ,  Hidekazu OOHASHI ,  Yu IWAI ,  Akinori SHIBUYA

IPC: C08G73/10 ,  C08F290/14 ,  G03F7/031 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  G03F7/037 ,  H01L23/29

Abstract: Provided are a photosensitive resin composition using a polyimide precursor composition, a cured film, a method for producing a cured film, a semiconductor device, and a method for producing a polyimide precursor composition.A polyimide precursor composition in which the molar ratio of repeating units represented by General Formula (1-2) among structural isomers of the polyimide precursor is 60% to 90% by mole; in General Formula (1-2), A1 and A2 each independently represent an oxygen atom or NH, R111 and R112 each independently represent a single bond or a divalent organic group, and R113 and R114 each independently represent a hydrogen atom or a monovalent organic group.

公开(公告)号：US20150338736A1

公开(公告)日：2015-11-26

申请号：US14751669

申请日：2015-06-26

Applicant: FUJIFILM CORPORATION

Inventor： Takeshi KAWABATA ,  Hiroo TAKIZAWA ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Masafumi KOJIMA ,  Keita KATO

IPC: G03F7/004 ,  C07C309/17 ,  C07D333/48 ,  C07D335/02 ,  C07D327/06 ,  C07C309/12 ,  C07D217/06 ,  G03F7/20 ,  C07D333/76

CPC classification number: G03F7/0045 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C309/29 ,  C07C311/48 ,  C07C317/04 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D217/06 ,  C07D295/185 ,  C07D327/06 ,  C07D333/46 ,  C07D333/48 ,  C07D333/76 ,  C07D335/02 ,  C07J9/005 ,  C07J17/00 ,  C07J31/006 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/20

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group.)

Abstract translation: 本发明提供一种包含树脂（A）和下述通式（I）的任何化合物（B））的光化射线或辐射敏感性树脂组合物。 （通式（I）中，Rf表示氟原子或含有至少一个氟原子的一价有机基团; R1表示氢原子或不含氟原子的一价取代基; X1表示具有至少2个碳原子的1价有机基团 原子或其中任选地引入除氟原子以外的取代基的甲基，条件是X1可以与R 1键合，从而形成环; Z表示当暴露于光化射线或辐射时被转化为 磺酸基，亚氨基酸基或甲基酸基）。

公开(公告)号：US20140349224A1

公开(公告)日：2014-11-27

申请号：US14451901

申请日：2014-08-05

Applicant: FUJIFILM CORPORATION

Inventor： Hiroo TAKIZAWA ,  Tomotaka TSUCHIMURA ,  Takeshi KAWABATA ,  Takuya TSURUTA

IPC: G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0388 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2002 ,  G03F7/325

Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a compound capable of decomposing by the action of an acid to generate an acid, and (D) a solvent; (2) a step of exposing the film by using an actinic ray or radiation, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 提供了一种图案形成方法，其包括（1）通过使用含有（A）含有酸可分解重复单元的树脂并且能够降低溶解度的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤 对于含有机溶剂的显影剂，通过酸的作用，（B）能够在用光化射线或辐射照射时能够产生酸的化合物，（C）能够通过酸的作用分解以产生酸的化合物， 酸，和（D）溶剂; （2）通过使用光化射线或辐射使膜曝光的步骤，以及（4）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。

公开(公告)号：US20140342275A1

公开(公告)日：2014-11-20

申请号：US14452093

申请日：2014-08-05

Applicant: FUJIFILM Corporation

Inventor： Takeshi INASAKI ,  Takeshi KAWABATA ,  Tomotaka TSUCHIMURA ,  Toru TSUCHIHASHI

IPC: G03F7/038 ,  C08F261/02 ,  G03F7/20

CPC classification number: G03F7/0388 ,  C08F8/02 ,  C08F12/22 ,  C08F12/24 ,  C08F12/30 ,  C08F212/14 ,  C08F261/02 ,  C09D125/18 ,  G03F1/00 ,  G03F7/0002 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  C08F212/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group has been substituted with a group represented by the following General Formula (1) (in the formula, M11 represents a single bond or a divalent linking group; Q11 represents an alkyl group, a cycloalkyl group, or an aryl group).

Abstract translation: 光化射线敏感性或辐射敏感性树脂组合物含有含有至少一个酚羟基的化合物（P）和至少一个其中酚羟基的氢原子被下列基团取代的基团 通式（1）（式中，M11表示单键或二价连接基团，Q 11表示烷基，环烷基或芳基）。

公开(公告)号：US20140199617A1

公开(公告)日：2014-07-17

申请号：US14227444

申请日：2014-03-27

Applicant: FUJIFILM CORPORATION

Inventor： Hideaki TSUBAKI ,  Hiroo TAKIZAWA ,  Takeshi KAWABATA

IPC: G03F7/20 ,  G03F7/038

CPC classification number: G03F7/20 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid and (B) a low molecular weight compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation and decomposing by an action of an acid to decrease a solubility of the low molecular weight compound (B) in an organic solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern.

Abstract translation: 图案形成方法包括以下顺序：用电子束敏感或极紫外线辐射敏感性树脂组合物形成膜的步骤（1），其包含（A）具有酸分解重复单元并能够降低的树脂 通过酸的作用使树脂（A）在含有有机溶剂的显影剂中的溶解度和（B）在电子束照射或极紫外线照射时能产生酸的低分子量化合物，并通过动作分解 的酸，以降低低分子量化合物（B）在有机溶剂中的溶解度; 步骤（2），用电子束或极紫外线辐射曝光胶片; 以及在暴露之后用含有机溶剂的显影剂显影该膜以形成负图案的步骤（4）。

公开(公告)号：US20140099572A1

公开(公告)日：2014-04-10

申请号：US14104821

申请日：2013-12-12

Applicant: FUJIFILM Corporation

Inventor： Takeshi INASAKI ,  Takeshi KAWABATA ,  Tomotaka TSUCHIMURA

IPC: G03F7/004 ,  G03F7/20 ,  G03F1/22 ,  G03F1/20

CPC classification number: G03F7/004 ,  C08F8/00 ,  C08F12/26 ,  C08F12/30 ,  C08F212/14 ,  C08F257/00 ,  C09D125/18 ,  G03F1/20 ,  G03F1/22 ,  G03F1/56 ,  G03F1/78 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2004 ,  G03F7/2039 ,  C08F12/24 ,  C08F212/32

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (P) containing at least one phenolic hydroxyl group and at least one group with a phenolic hydroxyl group whose hydrogen atom is replaced by any of groups of general formula (1) below.

Abstract translation: 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括含有至少一个酚羟基的化合物（P）和至少一个具有酚羟基的基团，其氢原子被任何一般的基团 下面的公式（1）。

公开(公告)号：US20220283499A1

公开(公告)日：2022-09-08

申请号：US17748500

申请日：2022-05-19

Applicant: FUJIFILM Corporation

Inventor： Takeshi KAWABATA ,  Kei YAMAMOTO ,  Kazuyoshi MIZUTANI

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/32 ,  G03F7/20

Abstract: The present invention provides a composition for forming an underlayer film, with which an underlayer film having excellent surface flatness and solvent resistance can be formed. In addition, the present invention provides a resist pattern forming method and a manufacturing method of an electronic device, which are related to the composition for forming an underlayer film. The composition for forming an underlayer film according to the present invention is a composition for forming an underlayer film, which is used for forming an underlayer film under a resist film, including a monomer or a polymer containing an aromatic ring and a halogen-based organic solvent, in which a content of the halogen-based organic solvent is 0.001 to 50 ppm by mass with respect to a total mass of the composition for forming an underlayer film.

公开(公告)号：US20220252985A1

公开(公告)日：2022-08-11

申请号：US17724956

申请日：2022-04-20

Applicant: FUJIFILM Corporation

Inventor： Toshiaki FUKUHARA ,  Takeshi KAWABATA ,  Sou KAMIMURA

IPC: G03F7/075 ,  G03F7/11 ,  G03F7/32 ,  G03F7/20

Abstract: A composition for forming an underlayer film is used for forming an underlayer film under a resist film, the composition including a silicon atom-containing compound and a halogen-based solvent, in which a content of the halogen-based solvent is 1.0 ppb by mass to 50.0 ppm by mass with respect to a total mass of the composition for forming an underlayer film.

公开(公告)号：US20140349223A1

公开(公告)日：2014-11-27

申请号：US14451814

申请日：2014-08-05

Applicant: FUJIFILM CORPORATION

Inventor： Takeshi KAWABATA ,  Hideaki TSUBAKI ,  Hiroo TAKIZAWA

IPC: G03F7/027 ,  G03F7/20 ,  G03F7/038

CPC classification number: G03F7/027 ,  C08K5/42 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/2059

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (I) below.

Abstract translation: 本发明提供一种光化学射线或辐射敏感性树脂组合物，其包括当暴露于光化射线或辐射时产生下列通式（I）的任何酸的化合物。

公开(公告)号：US20140272692A1

公开(公告)日：2014-09-18

申请号：US14289718

申请日：2014-05-29

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Takeshi KAWABATA ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI ,  Shuji HIRANO

IPC: G03F7/038

CPC classification number: G03F7/0388 ,  C08F8/00 ,  C08F212/00 ,  C08F222/10 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive composition comprising (P) a compound having a phenolic hydroxyl group and a group formed by substituting for the hydrogen atom in a phenolic hydroxyl group by a group represented by the specific formula, a resist film formed using the specific actinic ray-sensitive or radiation-sensitive composition, a pattern forming method containing steps of exposing and developing the resist film, a manufacturing method of an electronic device, containing the pattern forming method, and an electronic device manufactured by the specific manufacturing method of an electronic device.

Abstract translation: 提供了光化射线敏感或辐射敏感性组合物，其包含（P）具有酚羟基的化合物和通过用特定式表示的基团取代酚羟基中的氢原子形成的基团，抗蚀剂 使用特定的光化射线敏感或辐射敏感组合物形成的膜，包含曝光和显影抗蚀剂膜的步骤的图案形成方法，包含图案形成方法的电子器件的制造方法和由 电子设备的具体制造方法。