摘要:
A flash memory wordline decoder includes a plurality of voltage terminals to receive a plurality of voltages, a plurality of address terminals to receive a plurality of address signals, a procedure terminal to receive a procedure signal, and a plurality of output wordlines adapted to be coupled to a bank of flash transistors. The wordline decoder circuit is configured to decode the address signals and includes latches coupled to the wordlines, where the latches are configured to latch the wordlines and to provide an operational voltage on the wordline to accomplish a predetermined operation responsive to the procedure signal. Advantages of the invention include a verification with a low verification voltage such as 1 V or less for operating with a VDD supply voltage as low as 1.5 V. The decoder also reduces erase/write cycle time and improves expected lifetime of the flash memory due to reduced stress on the flash transistors within the flash memory.
摘要:
A novel FLASH-based EEPROM cell, decoder, and layout scheme are disclosed to eliminate the area-consuming divided triple-well in cell array and allows byte-erase and byte-program for high P/E cycles. Furthermore, the process-compatible FLASH cell for EEPROM part can be integrated with FLASH and ROM parts so that a superior combo, monolithic, nonvolatile memory is achieved. Unlike all previous arts, the novel combo nonvolatile memory of the present invention of ROM, EEPROM and FLASH or combination of any two is made of one unified, fully compatible, highly-scalable BN+ cell and unified process. In addition, its cell operation schemes have zero array overhead and zero disturbance during P/E operations. The novel combo nonvolatile memory is designed to meet the need in those markets requiring flexible write size in units of bytes, pages and blocks at a lower cost.
摘要:
A nonvolatile memory array has a single transistor flash memory cell and a two transistor EEPROM memory cell which maybe integrated on the same substrate. The nonvolatile memory cell has a floating gate with a low coupling coefficient to permit a smaller memory cell. The floating gate placed over a tunneling insulation layer, the floating gate is aligned with edges of the source region and the drain region and having a width defined by a width of the edges of the source the drain. The floating gate and control gate have a relatively small coupling ratio of less than 50% to allow scaling of the nonvolatile memory cells. The nonvolatile memory cells are programmed with channel hot electron programming and erased with Fowler Nordheim tunneling at relatively high voltages.
摘要:
A combination EEPROM and Flash memory is described containing cells in which the stacked gate transistor of the Flash cell is used in conjunction with a select transistor to form an EEPROM cell. The select transistor is made sufficiently small so as to allow the EEPROM cells to accommodate the bit line pitch of the Flash cell, which facilitates combining the two memories into memory banks containing both cells. The EEPROM cells are erased by byte while the Flash cells erased by block. The small select transistor has a small channel length and width, which is compensated by increasing gate voltages on the select transistor and pre-charge bitline during CHE program operation.
摘要:
In the present invention is disclosed a flash memory for simultaneous read and write operations. The memory is partitioned into a plurality of sectors each of which have a sector decoder. The sector decoder connects a plurality of main bit lines to a plurality of sub bit lines contained within each memory sector A 21 decoder is used to demonstrate the invention although other decoders including a 2M decoder and a hierarchical type decoder can be used. The memory array can be configured from a variety of architectures, including NOR, OR, NAND, AND, Dual-String and DINOR. The memory cells can be formed from a variety of array structures including ETOX, FLOTOX, EPROM, EEPROM, Split-Gate, and PMOS.
摘要:
In the present invention a method is shown that uses three concurrent word line voltages in memory cell operations of an a NOR type EEPROM flash memory array. A first concurrent word line voltage controls the operation on a selected word line within a selected memory block. The second concurrent word line voltage inhibits cells on non selected word lines in the selected memory block, and the third concurrent word line voltage inhibits non-selected cells in non-selected blocks from disturb conditions. In addition the three consecutive word line voltages allow a block to be erased, pages within the block to be verified as erased, and pages within the block to be inhibited from further erasure. The three consecutive voltages also allow for the detection of over erasure of cells, correction on a page basis, and verification that the threshold voltage of the corrected cells are above an over erase value but below an erased value. The methods described herein produce a cell threshold voltage that has a narrow voltage distribution.
摘要:
In the present invention a three step write of a nonvolatile single transistor cell is disclosed. The three steps comprise erasing, reverse programming and programming which can be applied to a plurality of cell types to produce a symmetrical design and allowing shrinkage of the cell beyond that which is possible with other cells designed to use a two step write procedure. The methodology can be applied to either N-channel or P-channel devices and can be used on various type memory cells such as “ETOX”, “NOR” type, “AND” type, and “OR” type. Erasing and programming steps increase the Vt of the cell transistor, whereas reverse programming decreases the Vt of the cell transistor. Over-erase problems are eliminated using the three step write procedure.
摘要:
In the present invention an array for a reverse split gate device is described for creating a flash memory that avoids both programming and erase disturb conditions. The device is designed so that the stacked gate is associated with the source and the enhancement gate is associated with the drain. This is the reverse of a conventional spit gate design and allows the drain to buffer the stacked gate from bit lines of a flash memory array. The source line now key to both program and erase operations is laid out in rows where two adjacent rows of cells share the same source line. The source line can be segmented to prevent the entire length of the pair of rows from being erased. The cell is programmed by flowing current backwards in the channel and injecting electrons into the floating gate from an impact ionization that occurs near the source. Erasure is accomplished by Fowler-Nordheim tunneling from the floating gate to the source caused by a potential between the source and the enhancement gate.
摘要:
A flash memory with a novel bitline and sourceline decoder includes a first bank of flash transistors forming a plurality of rows and a plurality of columns, and having wordlines, bitlines and a first sourceline. A second bank of flash transistors forms a plurality of rows and a plurality of columns, and has wordlines, bitlines and a second sourceline. A wordline decoder is coupled to the wordlines and configured to receive a wordline address signal and to decode the wordline address signal to select a wordline. A bitline and sourceline decoder is coupled to the bitlines and sourcelines and configured to receive a bitline address signal and to decode the bitline address signal to select predetermined bitlines and sourcelines. The bitline and sourceline decoder includes a latch coupled to the bitlines, the first sourceline and the second sourceline and configured to latch selected bitlines and sourcelines to selectively provide erase voltages on the selected bitlines and sourcelines. As a result of the novel memory architecture, a flexible number of bytes can be selected for erasure. The selected number of bytes can range from one byte to 64K bytes or more. Advantages of the invention include reduced erase/write cycle time and an improved expected lifetime of the flash memory due to reduced stress on the flash transistors within the flash memory.
摘要:
A flash memory with a high speed erasing structure includes a bank of flash transistors having a plurality of wordlines, a plurality of bitlines and a sourceline. A wordline decoder is coupled to the wordlines and configured to selectively apply voltages to the wordlines to perform procedures on the flash transistors, where the procedures include a read procedure, an erase procedure and a program procedure. During the erase procedure, the wordline decoder is configured to apply a first increasingly negative voltage in a first voltage range to at least one selected wordline until a first threshold voltage is met, then to apply a second increasingly negative voltage in a second voltage range to the selected wordline and to simultaneously apply a third negative voltage in a third voltage range to at least one deselected wordline. Another embodiment of the invention increases the selected sourceline voltage to achieve a high voltage differential between the gate and source of flash transistors selected to be erased. Advantages of the invention include a fast erasing procedure due to the increased voltage differential applied between the gate and source of flash transistors selected to be erased. Moreover, since the deselected wordlines are also ramped to a negative voltage, stress is reduced on the deselected wordline drivers, thereby increasing the longevity of the flash memory.